公开(公告)号：US5914607A

公开(公告)日：1999-06-22

申请号：US839402

申请日：1997-04-11

申请人： Jin-Ho Ju ,  Sang-Kyong Kim ,  Sung-Chul Kang

发明人： Jin-Ho Ju ,  Sang-Kyong Kim ,  Sung-Chul Kang

IPC分类号： G01N1/00 ,  G01N27/06 ,  G01N33/18 ,  G01R27/22 ,  H01L21/304 ,  H01L21/66 ,  G01R27/26

CPC分类号： G01N33/18

摘要： A sample solution contained in a sample vessel is analyzed using a positive ion detector and a negative ion detector. The positive ion detector and the negative ion detector are supplied with the sample solution from the sample vessel, while isolating the positive ion detector and the negative ion detector from one another. Accordingly, the sample solution is not supplied from the positive ion detector to the negative ion detector, and the sample solution is not supplied from the negative ion detector to the positive ion detector. The positive ion detector and negative ion detector are preferably supplied with sample solution from the sample vessel using a bidirectional valve having an input port and first and second output ports. The input port is connected to the sample vessel, the first output port is connected to the first detector, and the second output port is connected to the second detector.

摘要翻译： 使用正离子检测器和负离子检测器分析样品容器中包含的样品溶液。 将正离子检测器和负离子检测器从样品容器中提供样品溶液，同时将正离子检测器和负离子检测器彼此隔离。 因此，样品溶液不从正离子检测器供给负离子检测器，样品溶液不从负离子检测器供给正离子检测器。 正离子检测器和负离子检测器优选地使用具有输入端口和第一和第二输出端口的双向阀从样品容器提供样品溶液。 输入端口连接到采样容器，第一输出端口连接到第一检测器，第二输出端口连接到第二检测器。

公开(公告)号：US07144662B2

公开(公告)日：2006-12-05

申请号：US10493193

申请日：2002-02-20

申请人： Dong-Ki Lee ,  Sung-Chul Kang ,  You-Kyoung Lee ,  Jin-Ho Ju

发明人： Dong-Ki Lee ,  Sung-Chul Kang ,  You-Kyoung Lee ,  Jin-Ho Ju

IPC分类号： G03F7/023

CPC分类号： G03F7/0226

摘要： The present invention relates to a photoresist composition having high heat resistance used in the production process of an LCD, and more particularly, to a photoresist composition having high heat resistance, capable of decreasing process tact (a way), of process simplification, and of the retrenchment of expenditures. The inventive composition facilitates this through making it possible to skip 5 processes, such as Cr metal deposition forming a metal film, and the photo/etch/PR strip/etch steps of the whole surface of the metal, by substituting the inventive composition for the usual metal film, such that N+ ion doping in production of TFT-LCD can take place due its high heat resistance.

摘要翻译： 本发明涉及在LCD的生产过程中使用的具有高耐热性的光致抗蚀剂组合物，更具体地说，涉及具有高耐热性，能够降低工艺简化的工艺（一种方法）的光致抗蚀剂组合物，以及 削减支出。 本发明的组合物通过使得本发明的组合物代替本发明的组合物可以跳过5种工艺，例如形成金属膜的Cr金属沉积和金属的整个表面的光刻/蚀刻/ PR剥离/蚀刻步骤 通常的金属膜，由于其高耐热性，可以发生TFT-LCD的生产中的N + + / - 离子掺杂。

公开(公告)号：US06420440B1

公开(公告)日：2002-07-16

申请号：US09556299

申请日：2000-04-24

申请人： Bong-Woo Lee ,  Soo-Won Lee ,  Sho-Hak Nam ,  Jin-Ho Ju ,  Soo-Im Jeong ,  Hong-Sick Park ,  Sung-Chul Kang

发明人： Bong-Woo Lee ,  Soo-Won Lee ,  Sho-Hak Nam ,  Jin-Ho Ju ,  Soo-Im Jeong ,  Hong-Sick Park ,  Sung-Chul Kang

IPC分类号： C08J1104

CPC分类号： G02F1/133711

摘要： The present invention relates to a method for recycling an alignment layer material. The recycled alignment layer material shows the same characteristics as an original alignment layer material. The waste solution of the alignment layer material produced during the liquid crystal display manufacturing processes is recycled by solidifying polyamic acids and soluble polyimides by putting a waste solution of the alignment layer material into an organic solution or ultra purified water in which the alignment layer material constituents of polyamic acids and soluble polyimides are insoluble, separating polyamic acids and soluble polyimides from the organic solvent or ultra purified water, and dissolving the separated solid polyamic acids and soluble polyimides into a solvent. Recycling the alignment layer material in this method can significantly reduce the manufacturing costs.

摘要翻译： 本发明涉及一种再循环对准层材料的方法。 再生取向层材料与原来的配向层材料具有相同的特性。 在液晶显示器制造过程中产生的取向层材料的废溶液通过将取向层材料的废溶液放入有机溶液或超纯水中来固化聚酰胺酸和可溶性聚酰亚胺来再循环，其中取向层材料成分 的聚酰胺酸和可溶性聚酰亚胺是不溶的，从有机溶剂或超纯水中分离聚酰胺酸和可溶性聚酰亚胺，并将分离的固体聚酰胺酸和可溶性聚酰亚胺溶解在溶剂中。 以这种方法回收对准层材料可以显着降低制造成本。

公开(公告)号：US06893791B2

公开(公告)日：2005-05-17

申请号：US10259152

申请日：2002-09-27

申请人： You-Kyoung Lee ,  Sung-Chul Kang ,  Jin-Ho Ju ,  Dong-Ki Lee ,  Seung-Uk Lee ,  Hoon Kang

发明人： You-Kyoung Lee ,  Sung-Chul Kang ,  Jin-Ho Ju ,  Dong-Ki Lee ,  Seung-Uk Lee ,  Hoon Kang

IPC分类号： G03F7/004 ,  G02F1/13 ,  G03F7/008 ,  G03F7/022 ,  G03F7/023 ,  G03F7/40 ,  G03F7/30

CPC分类号： G03F7/0236 ,  G03F7/0226 ,  G03F7/40

摘要： Disclosed is a photoresist composition having a good sensitivity and residual layer characteristic and a method of forming a pattern using the same. The photoresist composition includes 5-30% by weight of a polymer resin, 2-10% by weight of a photosensitive compound, 0.1-10% by weight of a sensitivity enhancing agent, 0.1-10% by weight of a sensitivity restraining agent and 60-90% by weight of an organic solvent. A photoresist layer is formed by coating the photoresist composition on a substrate and then drying the coated photoresist composition. Then, thus obtained photoresist layer is exposed by using a mask having a predetermined pattern. Then, a photoresist pattern is formed by developing thus exposed photoresist layer. The photoresist pattern exhibits a uniform layer thickness and critical dimension.

摘要翻译： 公开了具有良好的灵敏度和残留层特性的光致抗蚀剂组合物和使用其形成图案的方法。 光致抗蚀剂组合物包含5-30重量％的聚合物树脂，2-10重量％的感光性化合物，0.1-10重量％的敏感性增强剂，0.1-10重量％的敏感性抑制剂和 60-90重量％的有机溶剂。 通过将光致抗蚀剂组合物涂覆在基材上，然后干燥涂覆的光致抗蚀剂组合物，形成光致抗蚀剂层 然后，通过使用具有预定图案的掩模曝光所得到的光致抗蚀剂层。 然后，通过显影这样曝光的光刻胶层形成光致抗蚀剂图案。 光致抗蚀剂图案具有均匀的层厚度和临界尺寸。

公开(公告)号：US06461785B1

公开(公告)日：2002-10-08

申请号：US09651114

申请日：2000-08-30

申请人： Jin-Ho Ju ,  Yu-Kyung Lee ,  Hong-Sik Park ,  Yun-Jung Nah ,  Ki-Soo Kim ,  Sung-Chul Kang

发明人： Jin-Ho Ju ,  Yu-Kyung Lee ,  Hong-Sik Park ,  Yun-Jung Nah ,  Ki-Soo Kim ,  Sung-Chul Kang

IPC分类号： G03F7023

CPC分类号： G03F7/0048 ,  G03F7/0226

摘要： A photoresist composition is provided. The photoresist composition includes a polymer resin for forming a photoresist layer, a photosensitive chemical for changing solubility of the photoresist layer when exposed to some form of radiation, and 3-methoxybutyl acetate, 2-heptanone, and 4-butyrolactone as a solvent. The composition has a good photosensitivity and remainder ratio, and no unpleasant odor.

摘要翻译： 提供光致抗蚀剂组合物。 光致抗蚀剂组合物包括用于形成光致抗蚀剂层的聚合物树脂，当暴露于某种形式的辐射时改变光致抗蚀剂层的溶解度的光敏化学品，以及3-甲氧基丁基乙酸酯，2-庚酮和4-丁内酯作为溶剂。 该组合物具有良好的光敏性和余量比，并且没有令人不愉快的气味。

公开(公告)号：US06645682B2

公开(公告)日：2003-11-11

申请号：US10169033

申请日：2002-06-25

申请人： Hong-Sick Park ,  Jin-Ho Ju ,  Yu-Kyung Lee ,  Sung-Chul Kang ,  Sae-Tae Oh ,  Doek-Man Kang

发明人： Hong-Sick Park ,  Jin-Ho Ju ,  Yu-Kyung Lee ,  Sung-Chul Kang ,  Sae-Tae Oh ,  Doek-Man Kang

IPC分类号： G03F742

CPC分类号： G03F7/168 ,  G03F7/38 ,  G03F7/42 ,  G03F7/422 ,  H01L21/02052 ,  H01L21/0274 ,  H01L21/31133

摘要： A thinner for rinsing photoresist including 50 to 80 wt. % of n-butyl acetate, propylene glycol alkyl ether, and propylene glycol alkyl ether acetate, is provided. The thinner is neither toxic to humans nor ecologically undesirable and has no unpleasant odor. The waste solutions thereof and associated waste water are easily handed so as to render this thinner environmental friendly. Additionally, the photoresist thinner of the present invention has excellent rinsing ability.

摘要翻译： 用于冲洗光致抗蚀剂的稀释剂，包括50至80wt。 提供了乙酸正丁酯，丙二醇烷基醚和丙二醇烷基醚乙酸酯的％。 稀释剂既不对人体有毒，也不对生态有害，无异味。 其废溶液和相关的废水容易交付，以使其更环保。 此外，本发明的光致抗蚀剂薄膜具有优异的漂洗能力。

公开(公告)号：US07378230B2

公开(公告)日：2008-05-27

申请号：US10750845

申请日：2004-01-05

申请人： Sung-Chul Kang ,  Jin-Ho Ju ,  You-Kyoung Lee ,  Dong-Ki Lee ,  Hyo-Youl Kim ,  Hoon Kang ,  Seung-Uk Lee ,  Byung-Uk Kim

发明人： Sung-Chul Kang ,  Jin-Ho Ju ,  You-Kyoung Lee ,  Dong-Ki Lee ,  Hyo-Youl Kim ,  Hoon Kang ,  Seung-Uk Lee ,  Byung-Uk Kim

IPC分类号： G03F7/32 ,  G03F7/023

CPC分类号： G03F7/0236 ,  G03F7/0048

摘要： The present invention relates to a photoresist composition for an MMN (multi-micro nozzle) head coater, more particularly to a photoresist composition comprising a novolak resin with a molecular weight ranging from 2000 to 12,000, a diazide photoactive compound, an organic solvent, and a Si-based surfactant for use in liquid crystal display circuits.The photoresist composition for liquid crystal display circuits of the present invention solves the stain problem, which occurs in MMN head coaters used for large-scale substrate glass, and improves coating characteristics, so that it can be utilized industrially and is expected to significantly improve productivity.

摘要翻译： 本发明涉及一种用于MMN（多微喷嘴）喷涂机的光致抗蚀剂组合物，更具体地说涉及一种光致抗蚀剂组合物，其包含分子量范围为2000-12,000的酚醛清漆树脂，二叠氮光敏化合物，有机溶剂和 用于液晶显示电路的Si基表面活性剂。 本发明的液晶显示电路用光致抗蚀剂组合物解决了用于大规模基板玻璃的MMN头涂布机中发生的污渍问题，并且改善了涂布特性，从而可以在工业上得到利用并且预期显着提高生产率 。

公开(公告)号：US06686120B2

公开(公告)日：2004-02-03

申请号：US10219711

申请日：2002-08-15

申请人： You-Kyoung Lee ,  Sung-Chul Kang ,  Jin-Ho Ju ,  Dong-Ki Lee

发明人： You-Kyoung Lee ,  Sung-Chul Kang ,  Jin-Ho Ju ,  Dong-Ki Lee

IPC分类号： G03F7023

CPC分类号： G03F7/0233 ,  G03F7/40

摘要： Disclosed is a photoresist composition including a thermal acid generator and a method of forming a pattern using the same. The photoresist composition includes about 100 parts by weight of an alkali-soluble acryl copolymer, about 5-100 parts by weight of 1,2-quinonediazide compound, about 2-35 parts by weight of nitrogen-containing cross-linking agent and about 0.1-10 parts by weight of a thermal acid generator which produces an acid by heat. The photoresist composition is coated on a substrate and dried to form a photoresist layer. The photoresist layer is exposed by using a mask having a predetermined shape. Thus obtained exposed photoresist layer is developed by using an aqueous alkaline solution to form a photoresist pattern. Thus obtained photoresist pattern is heated to be cured without generating thermal reflow.

摘要翻译： 公开了一种光致抗蚀剂组合物，其包括热酸产生剂和使用其形成图案的方法。 光致抗蚀剂组合物包括约100重量份的碱溶性丙烯酸共聚物，约5-100重量份的1,2-醌二叠氮化合物，约2-35重量份含氮交联剂和约0.1重量份 -10重量份的通过加热产生酸的热酸发生剂。 将光致抗蚀剂组合物涂布在基材上并干燥以形成光致抗蚀剂层。 通过使用具有预定形状的掩模来曝光光致抗蚀剂层。 通过使用碱性水溶液来形成曝光的光致抗蚀剂层以形成光致抗蚀剂图案。 将得到的光致抗蚀剂图案加热固化而不产生热回流。

公开(公告)号：US06447975B1

公开(公告)日：2002-09-10

申请号：US09650898

申请日：2000-08-30

申请人： Jin-Ho Ju ,  Yu-Kyung Lee ,  Hong-Sik Park ,  Yun-Jung Nah ,  Ki-Soo Kim ,  Sung-Chul Kang

发明人： Jin-Ho Ju ,  Yu-Kyung Lee ,  Hong-Sik Park ,  Yun-Jung Nah ,  Ki-Soo Kim ,  Sung-Chul Kang

IPC分类号： G03F7023

CPC分类号： G03F7/0048 ,  G03F7/0226

摘要： A photoresist composition including a polymer resin for forming a photoresist layer, a photosensitive chemical that changes the solubility of the photoresist layer when exposed to some form of radiation and 3-methoxybutyl acetate and 4-butyrolactone as a solvent, is provided. The composition has a good photosensitivity and remainder ratio and no unpleasant odor.

摘要翻译： 提供了包含用于形成光致抗蚀剂层的聚合物树脂的光致抗蚀剂组合物，当暴露于某种形式的辐射时改变光致抗蚀剂层的溶解度的光敏化合物和作为溶剂的4-丁内酯的4-乙内酯。 该组合物具有良好的光敏性和余量比，无异味。

公开(公告)号：US06338930B1

公开(公告)日：2002-01-15

申请号：US09654927

申请日：2000-09-05

申请人： Jin-Ho Ju ,  Yu-Kyung Lee ,  Hong-Sik Park ,  Yun-Jung Nah ,  Ki-Soo Kim ,  Sung-Chul Kang

发明人： Jin-Ho Ju ,  Yu-Kyung Lee ,  Hong-Sik Park ,  Yun-Jung Nah ,  Ki-Soo Kim ,  Sung-Chul Kang

IPC分类号： G03C174

CPC分类号： G03F7/0048 ,  G03F7/0226 ,  G03F7/162

摘要： A method for preparing a positive photoresist layer is provided. In this method, a photoresist composition is drop-wise applied on an insulator layer or a conductive metal layer formed on a substrate. The photoresist composition includes a polymer resin, a sensitizer for changing solubility of the photoresist layer when exposed and a solvent. The coated substrate is rotated at the speed of 1,250 to 1,350 rpm for 4.2 to 4.8 seconds. The coated substrate is then dried and the dried substrate is exposed to some form of radiation. Next, the exposed portion is removed by using an alkaline developing solution. The solvent preferably includes 3-methoxybutyl acetate and 4-butyrolactone, or includes 3-methoxybutyl acetate, 2-heptanone, and 4-butyrolactone.

摘要翻译： 提供了制备正性光致抗蚀剂层的方法。 在该方法中，将光致抗蚀剂组合物逐滴施加在形成在基板上的绝缘体层或导电金属层上。 光致抗蚀剂组合物包括聚合物树脂，当曝光时改变光致抗蚀剂层的溶解度的敏化剂和溶剂。 涂布的基材以1,250至1350rpm的速度旋转4.2至4.8秒。 然后将涂覆的基材干燥并将干燥的基材暴露于某种形式的辐射。 接下来，通过使用碱性显影液去除曝光部分。 溶剂优选包括3-甲氧基丁酸乙酯和4-丁内酯，或包括3-甲氧基丁酸乙酯，2-庚酮和4-丁内酯。