公开(公告)号：US20070132979A1

公开(公告)日：2007-06-14

申请号：US11482122

申请日：2006-07-07

申请人： Joeri Lof ,  Erik Maria Bijlaart ,  Roelof Aeilko Ritsema ,  Frank Schaik ,  Timotheus Sengers ,  Klaus Simon ,  Joannes De Smit ,  Arie Den Boef ,  Hans Butler ,  Sjoerd Lambertus Donders ,  Christiaan Hoogendam ,  Marcus Van De Kerkhof ,  Aleksey Kolesnychenko ,  Mark Kroon ,  Erik Loopstra ,  Hendricus Maria Meijer ,  Jeroen Sophia Maria Mertens ,  Johannes Hubertus Mulkens ,  Joost Ottens ,  Alexander Straaijer ,  Bob Streefkerk ,  Helmar Santen

发明人： Joeri Lof ,  Erik Maria Bijlaart ,  Roelof Aeilko Ritsema ,  Frank Schaik ,  Timotheus Sengers ,  Klaus Simon ,  Joannes De Smit ,  Arie Den Boef ,  Hans Butler ,  Sjoerd Lambertus Donders ,  Christiaan Hoogendam ,  Marcus Van De Kerkhof ,  Aleksey Kolesnychenko ,  Mark Kroon ,  Erik Loopstra ,  Hendricus Maria Meijer ,  Jeroen Sophia Maria Mertens ,  Johannes Hubertus Mulkens ,  Joost Ottens ,  Alexander Straaijer ,  Bob Streefkerk ,  Helmar Santen

IPC分类号： G03B27/72

CPC分类号： G03F7/70141 ,  G03F7/70341 ,  G03F7/7085 ,  G03F7/70883

摘要： A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.

公开(公告)号：US20050264778A1

公开(公告)日：2005-12-01

申请号：US10857614

申请日：2004-06-01

申请人： Joeri Lof ,  Erik Bijlaart ,  Roelof Aeilko Ritsema ,  Frank Schaik ,  Timotheus Sengers ,  Klaus Simon ,  Joannes De Smit ,  Arie Den Boef ,  Hans Butler ,  Sjoerd Donders ,  Christiaan Hoogendam ,  Marcus Van De Kerkhof ,  Aleksey Kolesnychenko ,  Mark Kroon ,  Erik Loopstra ,  Hendricus Meijer ,  Jeroen Maria Mertens ,  Johannes Mulkens ,  Joost Ottens ,  Alexander Straaijer ,  Bob Streefkerk ,  Helmar Van Santen

发明人： Joeri Lof ,  Erik Bijlaart ,  Roelof Aeilko Ritsema ,  Frank Schaik ,  Timotheus Sengers ,  Klaus Simon ,  Joannes De Smit ,  Arie Den Boef ,  Hans Butler ,  Sjoerd Donders ,  Christiaan Hoogendam ,  Marcus Van De Kerkhof ,  Aleksey Kolesnychenko ,  Mark Kroon ,  Erik Loopstra ,  Hendricus Meijer ,  Jeroen Maria Mertens ,  Johannes Mulkens ,  Joost Ottens ,  Alexander Straaijer ,  Bob Streefkerk ,  Helmar Van Santen

IPC分类号： G03F7/20 ,  H01L21/027 ,  G03B27/42

CPC分类号： G03F7/70141 ,  G03F7/70341 ,  G03F7/7085 ,  G03F7/70883

摘要： A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.

摘要翻译： 公开了一种光刻投影装置，其中投影系统和传感器之间的空间填充有液体。

公开(公告)号：US20060232756A1

公开(公告)日：2006-10-19

申请号：US11239480

申请日：2005-09-30

申请人： Joeri Lof ,  Antonius Theodorus Derksen ,  Christiaan Hoogendam ,  Aleksey Kolesnychenko ,  Erik Loopstra ,  Theodorus Modderman ,  Johannes Catharinus Mulkens ,  Roelof Aeilko Ritsema ,  Klaus Simon ,  Joannes De Smit ,  Alexander Straaijer ,  Bob Streefkerk ,  Helmar Santen ,  Sjoerd Nicolaas Donders

发明人： Joeri Lof ,  Antonius Theodorus Derksen ,  Christiaan Hoogendam ,  Aleksey Kolesnychenko ,  Erik Loopstra ,  Theodorus Modderman ,  Johannes Catharinus Mulkens ,  Roelof Aeilko Ritsema ,  Klaus Simon ,  Joannes De Smit ,  Alexander Straaijer ,  Bob Streefkerk ,  Helmar Santen ,  Sjoerd Nicolaas Donders

IPC分类号： G03B27/42

CPC分类号： G03F7/70341

摘要： In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. Gas is used between the structure and the surface of the substrate to contain liquid in the space.

摘要翻译： 在光刻投影装置中，结构围绕投影系统与光刻投影装置的基板台之间的空间。 在结构和衬底的表面之间使用气体以在空间中容纳液体。

公开(公告)号：US20060023189A1

公开(公告)日：2006-02-02

申请号：US11239493

申请日：2005-09-30

申请人： Joeri Lof ,  Antonius Theodorus Derksen ,  Christiaan Hoogendam ,  Aleksey Kolesnychenko ,  Erik Loopstra ,  Theodorus Modderman ,  Johannes Catharinus Mulkens ,  Roelof Aeilko Ritsema ,  Klaus Simon ,  Joannes De Smit ,  Alexander Straaijer ,  Bob Streefkerk ,  Helmar Santen

发明人： Joeri Lof ,  Antonius Theodorus Derksen ,  Christiaan Hoogendam ,  Aleksey Kolesnychenko ,  Erik Loopstra ,  Theodorus Modderman ,  Johannes Catharinus Mulkens ,  Roelof Aeilko Ritsema ,  Klaus Simon ,  Joannes De Smit ,  Alexander Straaijer ,  Bob Streefkerk ,  Helmar Santen

IPC分类号： G03B27/42

CPC分类号： G03F7/70341 ,  G03F7/707 ,  G03F7/7085 ,  G03F9/7088

摘要： In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space.

公开(公告)号：US20070132970A1

公开(公告)日：2007-06-14

申请号：US11448990

申请日：2006-06-08

申请人： Joeri Lof ,  Erik Bijlaart ,  Hans Butler ,  Sjoerd Donders ,  Christiaan Hoogendam ,  Aleksey Kolesnychenko ,  Erik Loopstra ,  Hendricus Meijer ,  Jeroen Johannes Mertens ,  Johannes Catharinus Mulkens ,  Roelof Ritsema ,  Frank Van Schaik ,  Thimotheus Sengers ,  Klaus Simon ,  Joannes De Smit ,  Alexander Straaijer ,  Bob Streefkerk ,  Helmar Van Santen

发明人： Joeri Lof ,  Erik Bijlaart ,  Hans Butler ,  Sjoerd Donders ,  Christiaan Hoogendam ,  Aleksey Kolesnychenko ,  Erik Loopstra ,  Hendricus Meijer ,  Jeroen Johannes Mertens ,  Johannes Catharinus Mulkens ,  Roelof Ritsema ,  Frank Van Schaik ,  Thimotheus Sengers ,  Klaus Simon ,  Joannes De Smit ,  Alexander Straaijer ,  Bob Streefkerk ,  Helmar Van Santen

IPC分类号： G03B27/42

CPC分类号： G03F7/70341 ,  G03F7/707 ,  G03F7/7085 ,  G03F7/70866

摘要： A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated.

公开(公告)号：US20060121209A1

公开(公告)日：2006-06-08

申请号：US11005219

申请日：2004-12-07

申请人： Johannes Matheus Baselmans ,  Sjoerd Lambertus Donders ,  Christiaan Hoogendam ,  Jeroen Sophia Maria Mertens ,  Johannes Hubertus Mulkens ,  Bob Streefkerk

发明人： Johannes Matheus Baselmans ,  Sjoerd Lambertus Donders ,  Christiaan Hoogendam ,  Jeroen Sophia Maria Mertens ,  Johannes Hubertus Mulkens ,  Bob Streefkerk

IPC分类号： B05D1/36 ,  B05D3/00 ,  B29C71/04

CPC分类号： G03F7/70341

摘要： A lithographic projection apparatus includes a support structure configured to hold a patterning device. The patterning device is configured to pattern a beam of radiation according to a desired pattern. The lithographic apparatus further includes a substrate table configured to hold a substrate. The substrate has a surface coated at least partially with a layer of radiation sensitive material. The lithographic apparatus also includes a projection system configured to project the patterned beam onto a target portion of the substrate, and a liquid supply system. The liquid supply system is configured to supply a prewetting liquid on top of the layer of radiation sensitive material to prewet the substrate, and is configured to supply an immersion liquid in a space between the prewet substrate and at least a portion of the projection system.

摘要翻译： 光刻投影装置包括构造成保持图案形成装置的支撑结构。 图案形成装置被配置成根据期望的图案对辐射束进行图案化。 光刻设备还包括被配置为保持衬底的衬底台。 衬底具有至少部分地涂覆有辐射敏感材料层的表面。 光刻设备还包括配置成将图案化的光束投影到基板的目标部分上的投影系统和液体供应系统。 液体供应系统被配置为在辐射敏感材料层的顶部上提供预润湿液体以预润湿基底，并且被配置为在预润湿基底和至少一部分投影系统之间的空间中提供浸没液体。

公开(公告)号：US20090002652A1

公开(公告)日：2009-01-01

申请号：US12153276

申请日：2008-05-15

申请人： Joeri Lof ,  Antonius Theodorus Derksen ,  Christiaan Alexander Hoogendam ,  Aleksey Kolesnychenko ,  Erik Roelof Loopstra ,  Theodorus Marinus Modderman ,  Johannes Catharinus Mulkens ,  Roelof Aeilko Ritsema ,  Klaus Simon ,  Joannes Theodoor De Smit ,  Alexander Straaijer ,  Bob Streefkerk ,  Helmar Van Santen

发明人： Joeri Lof ,  Antonius Theodorus Derksen ,  Christiaan Alexander Hoogendam ,  Aleksey Kolesnychenko ,  Erik Roelof Loopstra ,  Theodorus Marinus Modderman ,  Johannes Catharinus Mulkens ,  Roelof Aeilko Ritsema ,  Klaus Simon ,  Joannes Theodoor De Smit ,  Alexander Straaijer ,  Bob Streefkerk ,  Helmar Van Santen

IPC分类号： G03B27/52

CPC分类号： G03F7/70341 ,  G03F7/707 ,  G03F7/7085 ,  G03F9/7088

摘要： In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space.

摘要翻译： 在光刻投影装置中，结构围绕投影系统与光刻投影装置的基板台之间的空间。 在所述结构和所述基板的表面之间形成气体密封，以在该空间内容纳液体。

公开(公告)号：US20060176458A1

公开(公告)日：2006-08-10

申请号：US11375039

申请日：2006-03-15

申请人： Antonius Maria Derksen ,  Sjoerd Donders ,  Christiaan Hoogendam ,  Joeri Lof ,  Erik Loopstra ,  Jeroen Maria Mertens ,  Johannes Mulkens ,  Timotheus Sengers ,  Alexander Straaijer ,  Bob Streefkerk

发明人： Antonius Maria Derksen ,  Sjoerd Donders ,  Christiaan Hoogendam ,  Joeri Lof ,  Erik Loopstra ,  Jeroen Maria Mertens ,  Johannes Mulkens ,  Timotheus Sengers ,  Alexander Straaijer ,  Bob Streefkerk

IPC分类号： G03B27/42

CPC分类号： G03F7/707 ,  G03F7/70341 ,  G03F7/70833 ,  G03F7/7085 ,  G03F7/70916 ,  G03F9/7088

摘要： In a lithographic projection apparatus, a liquid supply system provides liquid in a space between the final element of the projection system and the substrate of the lithographic projection apparatus. A shutter member is provided to contain liquid in the liquid supply system during, for example, substrate exchange.

摘要翻译： 在光刻投影设备中，液体供应系统在投影系统的最终元件和光刻投影设备的基板之间的空间中提供液体。 提供挡板构件以在例如基板交换期间容纳液体供应系统中的液体。

公开(公告)号：US20050007569A1

公开(公告)日：2005-01-13

申请号：US10844575

申请日：2004-05-13

申请人： Bob Streefkerk ,  Levinus Bakker ,  Johannes Baselmans ,  Hendrikus Cox ,  Antonius Theodorus Derksen ,  Sjoerd Donders ,  Christiaan Hoogendam ,  Joeri Lof ,  Erik Loopstra ,  Jeroen Johannes Mertens ,  Frits Van Der Meulen ,  Johannes Mulkens ,  Gerardus Van Nunen ,  Klaus Simon ,  Bernardus Slaghekke ,  Alexander Straaijer ,  Jan-Gerard Van Der Toorn ,  Martijn Houkes

发明人： Bob Streefkerk ,  Levinus Bakker ,  Johannes Baselmans ,  Hendrikus Cox ,  Antonius Theodorus Derksen ,  Sjoerd Donders ,  Christiaan Hoogendam ,  Joeri Lof ,  Erik Loopstra ,  Jeroen Johannes Mertens ,  Frits Van Der Meulen ,  Johannes Mulkens ,  Gerardus Van Nunen ,  Klaus Simon ,  Bernardus Slaghekke ,  Alexander Straaijer ,  Jan-Gerard Van Der Toorn ,  Martijn Houkes

IPC分类号： G03F7/20 ,  H01L21/027 ,  G03B27/52

CPC分类号： G03F7/70341 ,  G03F7/70425 ,  G03F7/70525 ,  G03F7/709

摘要： In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.

摘要翻译： 在光刻设备中，将投影系统下的基板表面的局部区域浸入液体中。 可以使用致动器来改变衬底表面上方的液体供应系统的高度。 控制系统使用前馈或反馈控制输入基板的表面高度，以将液体供应系统保持在基板表面上方的预定高度。

公开(公告)号：US08558989B2

公开(公告)日：2013-10-15

申请号：US12850472

申请日：2010-08-04

申请人： Joeri Lof ,  Erik Theodorus Maria Bijlaart ,  Hans Butler ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Aleksey Kolesnychenko ,  Erik Roelof Loopstra ,  Hendricus Johannes Maria Meijer ,  Jeroen Johannes Sophia Maria Mertens ,  Johannes Catharinus Hubertus Mulkens ,  Roelof Aeilko Siebrand Ritsema ,  Frank Van Schaik ,  Timotheus Franciscus Sengers ,  Klaus Simon ,  Joannes Theodoor De Smit ,  Alexander Straaijer ,  Bob Streefkerk ,  Helmar Van Santen

发明人： Joeri Lof ,  Erik Theodorus Maria Bijlaart ,  Hans Butler ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Aleksey Kolesnychenko ,  Erik Roelof Loopstra ,  Hendricus Johannes Maria Meijer ,  Jeroen Johannes Sophia Maria Mertens ,  Johannes Catharinus Hubertus Mulkens ,  Roelof Aeilko Siebrand Ritsema ,  Frank Van Schaik ,  Timotheus Franciscus Sengers ,  Klaus Simon ,  Joannes Theodoor De Smit ,  Alexander Straaijer ,  Bob Streefkerk ,  Helmar Van Santen

IPC分类号： G03B27/42 ,  G03B27/52

CPC分类号： G03F7/70341 ,  G03F7/707 ,  G03F7/7085 ,  G03F7/70866

摘要： A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated.