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    Substrate coated with an MGO-layer
    2.
    发明授权
    Substrate coated with an MGO-layer 失效
    涂有MGO层的基材

    公开(公告)号：US06623607B1

    公开(公告)日：2003-09-23

    申请号：US08985880

    申请日：1997-12-05

    申请人： Johannes Stollenwerk ,  Christoph Daube ,  Achim Gürke

    发明人： Johannes Stollenwerk ,  Christoph Daube ,  Achim Gürke

    IPC分类号： C23C1434

    CPC分类号： C23C14/228 ,  C03C17/245 ,  C03C2217/228 ,  C03C2218/155 ,  C23C14/0057 ,  C23C14/0063 ,  C23C14/081

    摘要： A method and apparatus for producing a substrate which is coated with a Mgo-layer, includes a pair of Mg targets which define a slit and which have a target purity of at least 99 percent. A working gas flows along the slit. Oxygen is provided in an area between the slit and the substrate to be coated. The temperature of the substrate is set by heating or cooling the substrate during the coating process.

    摘要翻译： 用于制造涂有Mgo层的基材的方法和装置包括一对限定狭缝并且目标纯度至少为99％的Mg靶。 工作气体沿狭缝流动。 氧气设置在狭缝和待涂覆的基材之间的区域中。 通过在涂布过程中加热或冷却基底来设定基底的温度。

    Substrate coated with an MgO layer
    4.
    发明授权
    Substrate coated with an MgO layer 失效
    基材涂有MgO层

    公开(公告)号：US06676814B1

    公开(公告)日：2004-01-13

    申请号：US09687845

    申请日：2000-10-13

    申请人： Johannes Stollenwerk ,  Christoph Daube ,  Achim Gürke

    发明人： Johannes Stollenwerk ,  Christoph Daube ,  Achim Gürke

    IPC分类号： C23C1434

    CPC分类号： C23C14/228 ,  C03C17/245 ,  C03C2217/228 ,  C03C2218/155 ,  C23C14/0057 ,  C23C14/0063 ,  C23C14/081

    摘要： A method for manufacturing a display panel substrate has the steps of flowing a working gas along and out of a slit defined between two sputtering targets of Mg and toward the substrate thereby selecting the purity of the Mg material of the targets to be at least 99% and thereby blowing sputtered-off material out of the slit and toward the substrate. Introduction, in an area between the slit and the substrate, of a reactive gas containing oxygen, follows, and reacting the sputtered-off material with the reactive gas results in depositing on the substrate, an MgO layer. The method also includes setting the temperature of the substrate during the coating process.

    摘要翻译： 一种制造显示面板基板的方法，其特征在于，使工作气体沿着Mg两个溅射靶之间限定的狭缝流过基板，从而将靶材的Mg材料的纯度选择为99％以上， 从而将溅出的材料吹出狭缝并朝向基板。 在狭缝和衬底之间的区域中介绍含有氧的反应性气体，随后将溅射材料与反应性气体反应，导致在衬底上沉积MgO层。 该方法还包括在涂覆过程中设置衬底的温度。

    Method and device for plasma-treating the surface of substrates by ion bombardment
    5.
    发明授权
    Method and device for plasma-treating the surface of substrates by ion bombardment 失效
    通过离子轰击等离子体处理衬底表面的方法和装置

    公开(公告)号：US07165506B2

    公开(公告)日：2007-01-23

    申请号：US10204618

    申请日：2001-02-26

    申请人： Johannes Stollenwerk

    发明人： Johannes Stollenwerk

    IPC分类号： H01L21/00

    CPC分类号： H01J37/32055 ,  H01J37/3266 ,  H05H1/48 ,  H05H2001/3426

    摘要： In an ion etching method for reducing a substrate thickness, an electric arc is generated in a vacuum chamber such that the electric arc is locally separated from the substrate and circulates about the substrate. A plasma of a supplied etching gas is produced by the electric arc, and the ions of the etching gas are accelerated onto the substrate by an electric potential. The employed device has a vacuum chamber, an etching gas supply, and first and second electrodes supplied with direct or alternating voltage for generating the electric arc that produces the plasma of the etching gas. The first electrode is ring-shaped and the second electrode is arranged centrally to the ring of the first electrode. A magnetic coil creates a migrating magnetic field such that the electric arc is locally separated from the substrate and circulates about the substrate in a carousel fashion.

    摘要翻译： 在用于降低基板厚度的离子蚀刻方法中，在真空室中产生电弧，使得电弧与基板局部分离并在基板周围循环。 通过电弧产生供给的蚀刻气体的等离子体，蚀刻气体的离子通过电位被加速到基板上。 所采用的装置具有真空室，蚀刻气体源，以及供给直接或交流电压的第一和第二电极，用于产生产生蚀刻气体的等离子体的电弧。 第一电极是环形的，第二电极布置在第一电极的环的中心。 电磁线圈产生迁移磁场，使得电弧与衬底局部分离，并以转盘方式围绕衬底循环。