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公开(公告)号：US06740207B2
公开(公告)日：2004-05-25
申请号：US10108666
申请日：2002-03-28
IPC分类号： C23C1434
CPC分类号： H01J37/3444 , H01J37/34
摘要： Sparking is suppressed during high-frequency sputtering by a high-frequency generator (5) which has a controlled switching unit (13) that is connected upstream in relation to the output of the generator. A high-frequency supply signal that is generated at the output of the high-frequency generator is stopped for plasma discharge (PL) for a short time, by the switching unit.
摘要翻译： 通过高频发生器（5）在高频溅射期间抑制火花，该高频发生器具有相对于发生器的输出端连接到上游的受控切换单元（13）。 在高频发生器的输出处产生的高频电源信号通过开关单元停止等离子体放电（PL）短时间。
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公开(公告)号：US06623607B1
公开(公告)日：2003-09-23
申请号：US08985880
申请日：1997-12-05
IPC分类号： C23C1434
CPC分类号： C23C14/228 , C03C17/245 , C03C2217/228 , C03C2218/155 , C23C14/0057 , C23C14/0063 , C23C14/081
摘要： A method and apparatus for producing a substrate which is coated with a Mgo-layer, includes a pair of Mg targets which define a slit and which have a target purity of at least 99 percent. A working gas flows along the slit. Oxygen is provided in an area between the slit and the substrate to be coated. The temperature of the substrate is set by heating or cooling the substrate during the coating process.
摘要翻译： 用于制造涂有Mgo层的基材的方法和装置包括一对限定狭缝并且目标纯度至少为99％的Mg靶。 工作气体沿狭缝流动。 氧气设置在狭缝和待涂覆的基材之间的区域中。 通过在涂布过程中加热或冷却基底来设定基底的温度。
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公开(公告)号：US06676814B1
公开(公告)日：2004-01-13
申请号：US09687845
申请日：2000-10-13
IPC分类号： C23C1434
CPC分类号： C23C14/228 , C03C17/245 , C03C2217/228 , C03C2218/155 , C23C14/0057 , C23C14/0063 , C23C14/081
摘要： A method for manufacturing a display panel substrate has the steps of flowing a working gas along and out of a slit defined between two sputtering targets of Mg and toward the substrate thereby selecting the purity of the Mg material of the targets to be at least 99% and thereby blowing sputtered-off material out of the slit and toward the substrate. Introduction, in an area between the slit and the substrate, of a reactive gas containing oxygen, follows, and reacting the sputtered-off material with the reactive gas results in depositing on the substrate, an MgO layer. The method also includes setting the temperature of the substrate during the coating process.
摘要翻译： 一种制造显示面板基板的方法，其特征在于，使工作气体沿着Mg两个溅射靶之间限定的狭缝流过基板，从而将靶材的Mg材料的纯度选择为99％以上， 从而将溅出的材料吹出狭缝并朝向基板。 在狭缝和衬底之间的区域中介绍含有氧的反应性气体，随后将溅射材料与反应性气体反应，导致在衬底上沉积MgO层。 该方法还包括在涂覆过程中设置衬底的温度。
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公开(公告)号：US6150030A
公开(公告)日：2000-11-21
申请号：US203918
申请日：1998-12-02
IPC分类号： C03C17/245 , C23C14/08 , B32B17/00
CPC分类号： C23C14/228 , C03C17/245 , C23C14/081 , C03C2217/228 , C03C2218/155
摘要： A substrate coated has at least one MgO-layer and an extent of at least 100 mm.times.100 mm. The layer has a predominant peak in the measuring diagram of the .THETA.-2.THETA.-method and the density of the material of the layer is at least 80% of the density of stoichiometric MgO-bulk material, which is .rho.=3.58 g/cm.sup.3.
摘要翻译： 涂覆的基材具有至少一个MgO层和至少100mm×100mm的程度。 该层在THETA -2 THETA方法的测量图中具有主要峰值，并且该层的材料的密度是化学计量的MgO-散体材料的密度的至少80％，其为r = 3.58g / cm 3 。
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5.发明授权
公开(公告)号：US5283435A
公开(公告)日：1994-02-01
申请号：US881618
申请日：1992-05-12
申请人： Christoph Daube , Alfred Belz , Uwe Kopacz
发明人： Christoph Daube , Alfred Belz , Uwe Kopacz
IPC分类号： C23C14/00 , H01L21/203
CPC分类号： C23C14/0036
摘要： An apparatus for determining the concentration of a gas in a vacuum chamber is described. Internal to the vacuum chamber are one or more cathodes. The chamber is fed via a gas inlet and is connected to a separate measurement chamber for accommodating a measuring device via a connecting line between the two chambers. The connecting line in conjunction with a pumping means produces a pressure gradient between the interior of the vacuum chamber and the interior of the measurement chamber. One end of the connecting line, located within the vacuum chamber terminates directly in the central region of a cathode surfaces facing the interior of the chamber, and the length, as well as the cross section of the connecting line being dimensioned so that the pressure gradient between the interior of the vacuum chamber and the interior of the measurement chamber, is precisely that required for measurement.
摘要翻译： 描述了一种用于确定真空室中的气体浓度的装置。 真空室内部是一个或多个阴极。 腔室通过气体入口供给，并连接到单独的测量室，用于通过两个腔室之间的连接线容纳测量装置。 连接线与抽吸装置一起产生真空室内部和测量室内部之间的压力梯度。 位于真空室内的连接线的一端直接终止于面向腔室内部的阴极表面的中心区域，并且连接线的长度以及横截面被确定为使得压力梯度 在真空室的内部和测量室的内部之间，正是测量所需的。
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公开(公告)号：US5277778A
公开(公告)日：1994-01-11
申请号：US755292
申请日：1991-09-05
申请人： Christoph Daube , Uwe Kopacz , Siegfried Schulz
发明人： Christoph Daube , Uwe Kopacz , Siegfried Schulz
CPC分类号： H01J37/3452 , C23C14/3407 , H01J37/3405
摘要： Coating of components and shapes by cathode sputtering of target material of a first cathode system (6) with concentration of a first discharge space (plasma cloud) in the vicinity of the target surface by a spatially closed magnetic field (plasma trap) opposite the target (12). The field strength is reduced in front of the target surface by an additional magnet associated with a lateral boundary of the target.
摘要翻译： 通过与目标表面相对的空间闭合磁场（等离子体阱）在靶表面附近通过阴极溅射阴极溅射第一阴极系统（6）的第一放电空间（等离子体云）浓度的第一放电空间（等离子体云）来涂覆部件和形状 （12）。 通过与目标的横向边界相关联的附加磁体，在目标表面的前方减小场强。
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公开(公告)号：US5510012A
公开(公告)日：1996-04-23
申请号：US888825
申请日：1992-05-27
申请人： Siegfried Schulz , Christoph Daube , Alfred Belz , Andreas Rack
发明人： Siegfried Schulz , Christoph Daube , Alfred Belz , Andreas Rack
CPC分类号： C23C14/14
摘要： For the production of a coating formed by cathode sputtering, a target made from an alloy of gold and preferably vanadium is used. During the cathode sputtering, nitrogen gas is used as the reactive gas. The result is the formation of vanadium nitrides on the substrate to be coated. By varying the nitrogen content, the proportion of the vanadium nitrides can be changed thereby causing the appearance and the hardness of the coating to also change. This change in coating characteristics can accommodate a broad range of requirements avoiding the necessity of using different targets for different coating characteristics.
摘要翻译： 为了制造通过阴极溅射形成的涂层，使用由金和优选钒的合金制成的靶。 在阴极溅射期间，使用氮气作为反应气体。 结果是在待涂覆的基底上形成氮化钒。 通过改变氮含量，可以改变氮化钒的比例，从而导致涂层的外观和硬度也改变。 涂层特性的这种变化可以适应宽范围的要求，避免了为不同的涂层特性使用不同的目标。
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公开(公告)号：US5407548A
公开(公告)日：1995-04-18
申请号：US54690
申请日：1993-04-29
申请人： Uwe Kopacz , Christoph Daube , Andreas Rack , Horst Becker , Uwe Konietzka , Martin Weigert
发明人： Uwe Kopacz , Christoph Daube , Andreas Rack , Horst Becker , Uwe Konietzka , Martin Weigert
CPC分类号： H01J37/3426 , C23C14/0036 , C23C14/14 , C23C14/3407 , H01J37/3408 , H01J37/3491 , H01J2237/3321
摘要： The invention concerns a process for coating a substrate 1 of little or no corrosion resistance, especially a metal substrate having an alloy consisting at least of Ni, Cr and Fe, in an evacuable coating chamber 15, 15a. It comprises making an electrode that can be connected to a current supply 10, this electrode being electrically connected to a target 3 which is sputtered and the sputtered particles of which are deposited on the substrate 1. Reactive process gases are, for this purpose, supplied to the coating chamber 15, 15a, so that an amorphously depositing layer 2 is applied onto the substrate.
摘要翻译： 本发明涉及一种在可抽真空的涂布室15,15a中涂覆几乎或不具有耐腐蚀性的基材1，特别是具有至少由Ni，Cr和Fe组成的合金的金属基材的方法。 它包括制造可以连接到电流源10的电极，该电极电连接到溅射的靶3，并且溅射的颗粒沉积在衬底1上。为此，提供反应性工艺气体 到涂覆室15,15a，使得非晶体沉积层2被施加到基底上。
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