High power diode laser based source
    1.
    发明申请
    High power diode laser based source 失效
    大功率二极管激光源

    公开(公告)号:US20070036190A1

    公开(公告)日:2007-02-15

    申请号:US11140602

    申请日:2005-05-27

    IPC分类号: H01S5/00 H01S3/08

    CPC分类号: H01S5/42 H01S5/141 H01S5/2031

    摘要: A high power laser system including: a plurality of emitters each including a large area waveguide and a plurality of quantum well regions optically coupled to the large area waveguide, wherein each of the quantum well regions exhibits a low modal overlap with the large area waveguide; a collimator optically coupled to the emitters; a diffraction grating optically coupled through the collimator to the emitters; and, an output coupler optically coupled through the diffraction grating to the emitters.

    摘要翻译: 一种高功率激光系统,包括:多个发射器,每个发射器包括大面积波导和光耦合到大面积波导的多个量子阱区域,其中每个量子阱区域与大面积波导呈现低模态重叠; 光学耦合到发射器的准直器; 通过准直器光学耦合到发射器的衍射光栅; 以及通过衍射光栅光学耦合到发射器的输出耦合器。

    Low voltage defect super high efficiency diode sources
    4.
    发明申请
    Low voltage defect super high efficiency diode sources 审中-公开
    低电压缺陷超高效二极管源

    公开(公告)号:US20050152424A1

    公开(公告)日:2005-07-14

    申请号:US10922795

    申请日:2004-08-20

    摘要: A high efficiency, low voltage defect laser, and a method of forming a high efficiency laser. The low voltage defect laser includes at least one p-clad layer, at least one n-clad layer, and at least one waveguide of at least a plurality of quantum wells. The at least one waveguide is sandwiched at least between the p-clad layer and the n-clad layer, and at least one permeable crystal layer may be embedded in the p-clad layer and immediately adjacent to the at least one waveguide. The method includes growing an AlGaAs layer atop a GaAs layer, etching of the AlGaAs into submicron structure, oxidizing the AlGaAs, SAG undoped growing of an SAG undoped GaAs atop the GaAs layer, and regrowing, with p++ doped GaAs, of a planar-buried p++ GaAs.

    摘要翻译: 一种高效率,低电压缺陷激光器和形成高效激光器的方法。 所述低电压缺陷激光器包括至少一个p覆盖层,至少一个n覆层和至少多个量子阱的至少一个波导。 所述至少一个波导至少夹在所述p覆盖层和所述n覆层之间,并且至少一个可透过的晶体层可以嵌入所述p覆盖层中并且紧邻所述至少一个波导。 该方法包括在GaAs层之上生长AlGaAs层,将AlGaAs蚀刻成亚微米结构,在GaAs层顶上氧化AlGaAs,SAG未掺杂的GaAs的SAG未掺杂生长,并用p + >掺杂GaAs,一个平面埋置的p ++ GaAs。