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公开(公告)号：US08513135B2
公开(公告)日：2013-08-20
申请号：US13246050
申请日：2011-09-27
IPC分类号： H01L21/302
CPC分类号： H01L21/0337
摘要： Methods for reducing line roughness of spacers and other features utilizing a non-plasma and non-wet etch fluoride processing technology are provided. Embodiments of the methods can be used for spacer or line reduction and/or smoothing the surfaces along the edges of such features through the reaction and subsequent removal of material.
摘要翻译： 提供了利用非等离子体和非湿蚀刻氟化物处理技术减少间隔物的线粗糙度和其它特征的方法。 这些方法的实施方案可以用于通过反应和随后的材料去除而沿着这些特征的边缘的间隔物或线减少和/或平滑表面。
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公开(公告)号：US20090017627A1
公开(公告)日：2009-01-15
申请号：US11777005
申请日：2007-07-12
IPC分类号： H01L21/311
CPC分类号： H01L21/0337
摘要： Methods for reducing line roughness of spacers and other features utilizing a non-plasma and non-wet etch fluoride processing technology are provided. Embodiments of the methods can be used for spacer or line reduction and/or smoothing the surfaces along the edges of such features through the reaction and subsequent removal of material.
摘要翻译： 提供了利用非等离子体和非湿蚀刻氟化物处理技术减少间隔物的线粗糙度和其它特征的方法。 这些方法的实施方案可以用于通过反应和随后的材料去除而沿着这些特征的边缘的间隔物或线减少和/或平滑表面。
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公开(公告)号：US20120015520A1
公开(公告)日：2012-01-19
申请号：US13246050
申请日：2011-09-27
IPC分类号： H01L21/308 , H01L21/306
CPC分类号： H01L21/0337
摘要： Methods for reducing line roughness of spacers and other features utilizing a non-plasma and non-wet etch fluoride processing technology are provided. Embodiments of the methods can be used for spacer or line reduction and/or smoothing the surfaces along the edges of such features through the reaction and subsequent removal of material.
摘要翻译： 提供了利用非等离子体和非湿蚀刻氟化物处理技术减少间隔物的线粗糙度和其它特征的方法。 这些方法的实施方案可以用于通过反应和随后的材料去除而沿着这些特征的边缘的间隔物或线减少和/或平滑表面。
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公开(公告)号：US08026180B2
公开(公告)日：2011-09-27
申请号：US11777005
申请日：2007-07-12
IPC分类号： H01N21/302
CPC分类号： H01L21/0337
摘要： Methods for reducing line roughness of spacers and other features utilizing a non-plasma and non-wet etch fluoride processing technology are provided. Embodiments of the methods can be used for spacer or line reduction and/or smoothing the surfaces along the edges of such features through the reaction and subsequent removal of material.
摘要翻译： 提供了利用非等离子体和非湿蚀刻氟化物处理技术减少间隔物的线粗糙度和其它特征的方法。 这些方法的实施方案可以用于通过反应和随后的材料去除而沿着这些特征的边缘的间隔物或线减少和/或平滑表面。
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公开(公告)号：US11807771B2
公开(公告)日：2023-11-07
申请号：US17499463
申请日：2021-10-12
申请人： Paul Morgan , Brodie Wright
发明人： Paul Morgan , Brodie Wright
IPC分类号： C09D105/00 , C09D7/20 , C08K3/36 , C08L5/00 , C09D175/04 , C09D133/08 , C09D179/02 , C09D133/26 , C09D139/02 , C08G18/08
CPC分类号： C09D175/04 , C08G18/0814 , C09D105/00 , C09D133/08 , C09D133/26 , C09D139/02 , C09D179/02 , C08L2201/54
摘要： A cationic-stabilized dispersion for use in fabricating an in-mold coated article including at least one of a cationic-stabilized polyurethane dispersion, a cationic-stabilized acrylic dispersion, a cationic-stabilized polyacrylamide dispersion, a cationic-stabilized polyallylamine dispersion, a cationic-stabilized polyetheramine dispersion, and a cationic-stabilized chitosan dispersion.
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公开(公告)号：US20220169885A1
公开(公告)日：2022-06-02
申请号：US17499463
申请日：2021-10-12
申请人： Paul Morgan , Brodie Wright
发明人： Paul Morgan , Brodie Wright
IPC分类号： C09D175/04 , C09D133/08 , C09D179/02 , C09D133/26 , C09D105/00 , C09D139/02 , C08G18/08
摘要： A cationic-stabilized dispersion for use in fabricating an in-mold coated article including at least one of a cationic-stabilized polyurethane dispersion, a cationic-stabilized acrylic dispersion, a cationic-stabilized polyacrylamide dispersion, a cationic-stabilized polyallylamine dispersion, a cationic-stabilized polyetheramine dispersion, and a cationic-stabilized chitosan dispersion.
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公开(公告)号：US20170306176A1
公开(公告)日：2017-10-26
申请号：US15644742
申请日：2017-07-08
申请人： Paul Morgan , Brodie Wright
发明人： Paul Morgan , Brodie Wright
IPC分类号： C09D175/04 , C09D139/02 , C09D133/08 , C08G18/08 , C09D105/00 , C09D179/02 , C09D133/26
CPC分类号： C09D175/04 , C08G18/0814 , C08L2201/54 , C09D105/00 , C09D133/08 , C09D133/26 , C09D139/02 , C09D179/02
摘要： A cationic-stabilized dispersion for use in fabricating an in-mold coated article including at least one of a cationic-stabilized polyurethane dispersion, a cationic-stabilized acrylic dispersion, a cationic-stabilized polyacrylamide dispersion, a cationic-stabilized polyallylamine dispersion, a cationic-stabilized polyetheramine dispersion, and a cationic-stabilized chitosan dispersion.
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公开(公告)号：US08809198B2
公开(公告)日：2014-08-19
申请号：US12650029
申请日：2009-12-30
申请人： Ramakanth Alapati , Paul Morgan , Max Hineman
发明人： Ramakanth Alapati , Paul Morgan , Max Hineman
IPC分类号： H01L21/302
CPC分类号： H01L21/32134 , B82Y10/00 , H01L21/28273
摘要： A method for selectively removing nano-crystals on an insulating layer. The method includes providing an insulating layer with nano-crystals thereon; exposing the nano-crystals to a high density plasma comprising a source of free radical chlorine, ionic chlorine, or both to modify the nano-crystals; and removing the modified nano-crystals with a wet etchant.
摘要翻译： 一种用于在绝缘层上选择性去除纳米晶体的方法。 该方法包括在其上提供具有纳米晶体的绝缘层; 将纳米晶体暴露于包含游离基氯源，离子氯或二者的高密度等离子体，以修饰纳米晶体; 并用湿蚀刻剂去除修饰的纳米晶体。
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9.发明授权Integrated circuit having pitch reduced patterns relative to photoithography features 失效具有相对于光刻特征的节距减小图案的集成电路公开(公告)号：US08598632B2
公开(公告)日：2013-12-03
申请号：US13530679
申请日：2012-06-22
申请人： Luan Tran , William T. Rericha , John Lee , Ramakanth Alapati , Sheron Honarkhah , Shuang Meng , Puneet Sharma , Jingyi Bai , Zhiping Yin , Paul Morgan , Mirzafer K. Abatchev , Gurtej S. Sandhu , D. Mark Durcan
发明人： Luan Tran , William T. Rericha , John Lee , Ramakanth Alapati , Sheron Honarkhah , Shuang Meng , Puneet Sharma , Jingyi Bai , Zhiping Yin , Paul Morgan , Mirzafer K. Abatchev , Gurtej S. Sandhu , D. Mark Durcan
IPC分类号： H01L27/118
CPC分类号： H01L21/0338 , H01L21/0337 , H01L21/3086 , H01L21/3088
摘要： An integrated circuit having differently-sized features wherein the smaller features have a pitch multiplied relationship with the larger features, which are of such size as to be formed by conventional lithography.
摘要翻译： 具有不同尺寸特征的集成电路，其中较小特征与具有通过常规光刻形成的尺寸的较大特征具有间距倍增关系。
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10.发明申请IN-MOLD COATED ARTICLES HAVING CONTROLLED SURFACE MORPHOLOGY AND ASSOCIATED METHODS FOR MANUFACTURING SAME 审中-公开具有控制表面形态的模具涂层制品及其制造方法公开(公告)号：US20120164381A1
公开(公告)日：2012-06-28
申请号：US13270821
申请日：2011-10-11
申请人： Paul Morgan , Brodie Wright
发明人： Paul Morgan , Brodie Wright
CPC分类号： B32B3/00 , B29C37/0032 , B29C41/08 , B29C41/20 , B29C41/22 , B29C2037/0035 , B32B2605/00 , Y10T428/24355
摘要： An in-mold coated article that includes at least one of a controlled surface morphology and a predetermined color which is manufactured via a single- or multi-coat process. The in-mold coated article preferably resembles wood, leather, marble, granite, clay, etcetera.The present invention further provides methods for manufacturing in-mold coated articles using single-coat and/or multi-coat processes as disclosed herein.
摘要翻译： 一种模内涂覆制品，其包括通过单涂层或多涂层工艺制造的受控表面形态和预定颜色中的至少一种。 模内涂覆制品优选类似于木材，皮革，大理石，花岗岩，粘土等。 本发明还提供使用如本文所公开的单涂层和/或多涂层方法制造模内涂覆制品的方法。
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