公开(公告)号：US06461790B1

公开(公告)日：2002-10-08

申请号：US09658604

申请日：2000-09-08

申请人： Jun Hatakeyama ,  Jun Watanabe ,  Yuji Harada ,  Mutsuo Nakashima ,  Masaru Sasago ,  Shinji Kishimura

发明人： Jun Hatakeyama ,  Jun Watanabe ,  Yuji Harada ,  Mutsuo Nakashima ,  Masaru Sasago ,  Shinji Kishimura

IPC分类号： G03F7039

CPC分类号： G03F7/0046 ,  G03F7/0045 ,  G03F7/0382 ,  G03F7/0392 ,  Y10S430/106

摘要： Polymers comprising fluorinated vinyl phenol units and having acid labile groups partially introduced are novel. Using such polymers, resist compositions featuring transparency to excimer laser and alkali solubility are obtained.

摘要翻译： 包含氟化乙烯基苯酚单元和部分引入酸不稳定基团的聚合物是新颖的。 使用这种聚合物，获得具有对准分子激光的透明度和碱溶性的抗蚀剂组合物。

公开(公告)号：US06511787B2

公开(公告)日：2003-01-28

申请号：US09947764

申请日：2001-09-07

申请人： Yuji Harada ,  Jun Hatakeyama ,  Jun Watanabe ,  Yoshio Kawai ,  Masaru Sasago ,  Masayuki Endo ,  Shinji Kishimura ,  Michitaka Ootani ,  Satoru Miyazawa ,  Kentaro Tsutsumi ,  Kazuhiko Maeda

发明人： Yuji Harada ,  Jun Hatakeyama ,  Jun Watanabe ,  Yoshio Kawai ,  Masaru Sasago ,  Masayuki Endo ,  Shinji Kishimura ,  Michitaka Ootani ,  Satoru Miyazawa ,  Kentaro Tsutsumi ,  Kazuhiko Maeda

IPC分类号： G03F7004

CPC分类号： G03F7/0397 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0395 ,  Y10S430/108 ,  Y10S430/111

摘要： An acrylic resin containing hexafluoroisopropanol units has high transmittance to VUV radiation. A resist composition using the resin as a base polymer has high transparency, substrate adhesion, alkali developability and acid-elimination capability and is suited for lithographic microprocessing.

公开(公告)号：US06861197B2

公开(公告)日：2005-03-01

申请号：US10084828

申请日：2002-02-28

申请人： Yuji Harada ,  Jun Watanabe ,  Jun Hatakeyama ,  Yoshio Kawai ,  Masaru Sasago ,  Masayuki Endo ,  Shinji Kishimura ,  Michitaka Ootani ,  Satoru Miyazawa ,  Kentaro Tsutsumi ,  Kazuhiko Maeda

发明人： Yuji Harada ,  Jun Watanabe ,  Jun Hatakeyama ,  Yoshio Kawai ,  Masaru Sasago ,  Masayuki Endo ,  Shinji Kishimura ,  Michitaka Ootani ,  Satoru Miyazawa ,  Kentaro Tsutsumi ,  Kazuhiko Maeda

IPC分类号： C08F220/22 ,  G03F7/004 ,  G03F7/039

CPC分类号： C08F220/22 ,  G03F7/0046 ,  G03F7/0397 ,  Y10S430/108 ,  Y10S430/126 ,  Y10S430/168

摘要： A base polymer having incorporated an ester group having a fluorinated alicyclic unit is provided. A resist composition comprising the polymer is sensitive to high-energy radiation, and has excellent sensitivity at a wavelength of less than 200 nm, significantly improved transparency by virtue of the fluorinated alicyclic units incorporated as well as satisfactory plasma etching resistance. The resist composition has a low absorption at the exposure wavelength of a F2 laser and is ideal as a micropatterning material in VLSI fabrication.

摘要翻译： 提供了具有含有氟化脂环族单元的酯基的基础聚合物。 包含聚合物的抗蚀剂组合物对高能量辐射敏感，并且在小于200nm的波长下具有优异的灵敏度，由于所掺入的氟化脂环族单元以及令人满意的等离子体耐蚀刻性而显着提高了透明度。 抗蚀剂组合物在F2激光的曝光波长处具有低吸收，并且在VLSI制造中是理想的微图案材料。

公开(公告)号：US06582880B2

公开(公告)日：2003-06-24

申请号：US09947765

申请日：2001-09-07

申请人： Yuji Harada ,  Jun Watanabe ,  Jun Hatakeyama ,  Yoshio Kawai ,  Masaru Sasago ,  Masayuki Endo ,  Shinji Kishimura ,  Michitaka Ootani ,  Satoru Miyazawa ,  Kentaro Tsutsumi ,  Kazuhiko Maeda

发明人： Yuji Harada ,  Jun Watanabe ,  Jun Hatakeyama ,  Yoshio Kawai ,  Masaru Sasago ,  Masayuki Endo ,  Shinji Kishimura ,  Michitaka Ootani ,  Satoru Miyazawa ,  Kentaro Tsutsumi ,  Kazuhiko Maeda

IPC分类号： G03F7004

CPC分类号： G03F7/0392 ,  C08F220/22 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  Y10S430/108 ,  Y10S430/111

摘要： An acrylate resin containing fluorinated alkyl groups in ester side chains has high transmittance to VUV radiation. A resist composition using the resin as a base polymer is sensitive to high-energy radiation, has excellent sensitivity and resolution, and is suited for lithographic microprocessing.

公开(公告)号：US06790586B2

公开(公告)日：2004-09-14

申请号：US09947504

申请日：2001-09-07

申请人： Jun Hatakeyama ,  Yuji Harada ,  Jun Watanabe ,  Yoshio Kawai ,  Masaru Sasago ,  Masayuki Endo ,  Shinji Kishimura ,  Michitaka Ootani ,  Satoru Miyazawa ,  Kentaro Tsutsumi ,  Kazuhiko Maeda

发明人： Jun Hatakeyama ,  Yuji Harada ,  Jun Watanabe ,  Yoshio Kawai ,  Masaru Sasago ,  Masayuki Endo ,  Shinji Kishimura ,  Michitaka Ootani ,  Satoru Miyazawa ,  Kentaro Tsutsumi ,  Kazuhiko Maeda

IPC分类号： G03F7038

CPC分类号： G03F7/0395 ,  G03F7/0046 ,  G03F7/0397 ,  Y10S430/106 ,  Y10S430/108

摘要： A resist composition comprising (A) a polymer comprising recurring units having an alicyclic hydrocarbon backbone to which a carboxylate moiety capable of generating carboxylic acid when decomposed under acidic conditions is attached through a C1-C20 alkylene spacer, (B) a photoacid generator, and (C) an organic solvent is sensitive to high-energy radiation, and has excellent sensitivity and resolution at a wavelength below 180 nm, and good plasma etching resistance. Because these features of the inventive resist composition enable its use particularly as a resist at the exposure wavelength of a F2 excimer laser, a finely defined pattern can easily be formed, making the resist ideal as a micropatterning material in VLSI fabrication.

摘要翻译： 一种抗蚀剂组合物，其包含（A）包含具有脂环族烃主链的重复单元的聚合物，当在酸性条件下分解时，能够产生羧酸的羧酸酯部分通过C1-C20亚烷基间隔基，（B）光致酸产生剂和 （C）有机溶剂对高能辐射敏感，并且在低于180nm的波长下具有优异的灵敏度和分辨率，以及良好的等离子体耐蚀刻性。 由于本发明抗蚀剂组合物的这些特征使得其能够特别用作F2准分子激光器的曝光波长处的抗蚀剂，因此可以容易地形成精细限定的图案，使得抗蚀剂在VLSI制造中理想为微图案材料。

公开(公告)号：US06710148B2

公开(公告)日：2004-03-23

申请号：US10068298

申请日：2002-02-08

申请人： Yuji Harada ,  Jun Hatakeyama ,  Jun Watanabe ,  Yoshio Kawai ,  Masaru Sasago ,  Masayuki Endo ,  Shinji Kishimura ,  Michitaka Ootani ,  Satoru Miyazawa ,  Kentaro Tsutsumi ,  Kazuhiko Maeda

发明人： Yuji Harada ,  Jun Hatakeyama ,  Jun Watanabe ,  Yoshio Kawai ,  Masaru Sasago ,  Masayuki Endo ,  Shinji Kishimura ,  Michitaka Ootani ,  Satoru Miyazawa ,  Kentaro Tsutsumi ,  Kazuhiko Maeda

IPC分类号： C08F11800

CPC分类号： G03F7/0395 ,  C08F232/08 ,  G03F7/0046 ,  G03F7/0397

摘要： A copolymer of an acrylate monomer containing fluorine at &agr;-position with a norbornene derivative is highly transparent to VUV radiation and resistant to dry etching. A resist composition using the resin as a base polymer is sensitive to high-energy radiation below 200 nm, has excellent sensitivity, and is suited for lithographic microprocessing.

摘要翻译： 在α-位含氟的丙烯酸酯单体与降冰片烯衍生物的共聚物对VUV辐射是高度透明的并且耐干蚀刻。 使用树脂作为基础聚合物的抗蚀剂组合物对于低于200nm的高能辐射敏感，具有优异的灵敏度，并且适用于光刻微处理。

公开(公告)号：US06660447B2

公开(公告)日：2003-12-09

申请号：US09947767

申请日：2001-09-07

申请人： Jun Hatakeyama ,  Yuji Harada ,  Jun Watanabe ,  Masaru Sasago ,  Masayuki Endo ,  Shinji Kishimura

发明人： Jun Hatakeyama ,  Yuji Harada ,  Jun Watanabe ,  Masaru Sasago ,  Masayuki Endo ,  Shinji Kishimura

IPC分类号： G03F7004

CPC分类号： G03F7/0392 ,  C08F212/14

摘要： A polymer having fluorinated vinyl phenol units copolymerized with acrylonitrile units has high transmittance to VUV radiation. A resist composition using the polymer as a base resin has high sensitivity and resolution to high-energy radiation and good plasma etching resistance and is suited for lithographic microprocessing.

公开(公告)号：US07001707B2

公开(公告)日：2006-02-21

申请号：US10925014

申请日：2004-08-25

申请人： Jun Hatakeyama ,  Yuji Harada ,  Yoshio Kawai ,  Masaru Sasago ,  Masayuki Endo ,  Shinji Kishimura ,  Kazuhiko Maeda ,  Haruhiko Komoriya ,  Kazuhiro Yamanaka

发明人： Jun Hatakeyama ,  Yuji Harada ,  Yoshio Kawai ,  Masaru Sasago ,  Masayuki Endo ,  Shinji Kishimura ,  Kazuhiko Maeda ,  Haruhiko Komoriya ,  Kazuhiro Yamanaka

IPC分类号： G03F7/004 ,  C08F114/18

CPC分类号： G03F7/0046 ,  G03F7/0395 ,  G03F7/0397 ,  Y10S430/108

摘要： A resist composition comprising a blend of a cyclic polymer having alcoholic groups as soluble groups and a polymer having carboxyl or hexafluoroalcohol groups whose hydrogen atoms are replaced by acid labile groups as a base resin forms a resist film which is improved in transparency, alkali dissolution contrast and plasma etching resistance.

摘要翻译： 包含具有醇基作为可溶性基团的环状聚合物和具有羧酸或六氟醇基团的聚合物的共聚物的抗蚀剂组合物，其氢原子被酸不稳定基团替代为基础树脂形成抗蚀剂膜，其透明度提高，碱溶解对比度 和等离子体耐蚀刻性。

公开(公告)号：US06855477B2

公开(公告)日：2005-02-15

申请号：US10256141

申请日：2002-09-27

申请人： Jun Hatakeyama ,  Yuji Harada ,  Yoshio Kawai ,  Masaru Sasago ,  Masayuki Endo ,  Shinji Kishimura ,  Michitaka Ootani ,  Haruhiko Komoriya ,  Kazuhiko Maeda

发明人： Jun Hatakeyama ,  Yuji Harada ,  Yoshio Kawai ,  Masaru Sasago ,  Masayuki Endo ,  Shinji Kishimura ,  Michitaka Ootani ,  Haruhiko Komoriya ,  Kazuhiko Maeda

IPC分类号： G03F7/004 ,  G03F7/039

CPC分类号： G03F7/0045 ,  G03F7/0046 ,  G03F7/0392

摘要： A chemically amplified resist composition comprising (A) a polymer comprising recurring units containing at least one fluorine atom, (B) a compound of formula (1) wherein R1 and R2 are H, F or alkyl or fluorinated alkyl, at least one of R1 and R2 contains at least one fluorine atom, R3 is a single bond or alkylene, R4 is a n-valent aromatic or cyclic diene group, R5 is H or C(═O)R6, R6 is H or methyl, and n is 2, 3 or 4, (C) an organic solvent, and (D) a photoacid generator is sensitive to high-energy radiation and has improved sensitivity and transparency at a wavelength of less than 200 nm.

摘要翻译： 一种化学放大抗蚀剂组合物，其包含（A）包含含有至少一个氟原子的重复单元的聚合物，（B）式（1）的化合物，其中R 1和R 2为H，F或烷基或氟化烷基 ，R 1和R 2中的至少一个含有至少一个氟原子，R 3是单键或亚烷基，R 4是n价的芳族或环状二烯基，R 5 >为H或C（= O）R 6，R 6为H或甲基，n为2,3或4，（C）有机溶剂，（D）光致酸发生剂对高 能量辐射，并且在小于200nm的波长下具有改善的灵敏度和透明度。

公开(公告)号：US07169869B2

公开(公告)日：2007-01-30

申请号：US11179606

申请日：2005-07-13

申请人： Yuji Harada ,  Jun Hatakeyama ,  Yoshio Kawai ,  Masaru Sasago ,  Masayuki Endo ,  Shinji Kishimura ,  Kazuhiko Maeda ,  Michitaka Ootani ,  Haruhiko Komoriya

发明人： Yuji Harada ,  Jun Hatakeyama ,  Yoshio Kawai ,  Masaru Sasago ,  Masayuki Endo ,  Shinji Kishimura ,  Kazuhiko Maeda ,  Michitaka Ootani ,  Haruhiko Komoriya

IPC分类号： C08F12/30

CPC分类号： C08F28/02 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0397 ,  Y10S430/106 ,  Y10S430/111

摘要： A resist composition comprising a polymer containing vinyl sulfonate units having fluorinated hydrophilic groups as a base resin has excellent transparency, substrate adhesion and developer penetrability as well as plasma etching resistance, and is suited for lithographic microprocessing.

摘要翻译： 包含具有氟化亲水基团的乙烯基磺酸酯单元作为基础树脂的聚合物的抗蚀剂组合物具有优异的透明性，底物粘合性和显影剂渗透性以及耐等离子体耐蚀刻性，并且适用于光刻微处理。