-
公开(公告)号：US09470639B1
公开(公告)日：2016-10-18
申请号：US15014987
申请日：2016-02-03
Applicant: KLA-Tencor Corporation
Inventor： Guorong V. Zhuang , Shankar Krishnan , Lanhua Wei , Walter Mieher , Paul Aoyagi
CPC classification number: G01N21/9501 , G01B11/0625 , G01B11/0641 , G01B2210/56 , G01N21/211 , G01N21/255 , G01N2021/213 , G01N2201/06113 , G01N2201/0683 , G01N2201/12 , G03F7/70625
Abstract: Methods and systems for performing broadband spectroscopic metrology with reduced sensitivity to grating anomalies are presented herein. A reduction in sensitivity to grating anomalies is achieved by selecting a subset of available system parameter values for measurement analysis. The reduction in sensitivity to grating anomalies enables an optimization of any combination of precision, sensitivity, accuracy, system matching, and computational effort. These benefits are particularly evident in optical metrology systems having large ranges of available azimuth angle, angle of incidence, illumination wavelength, and illumination polarization. Predictions of grating anomalies are determined based on a measurement model that accurately represents the interaction between the measurement system and the periodic metrology target under measurement. A subset of available system parameter values is selected to reduce the impact of grating anomalies on measurement results. The selected subset of available system parameters is implemented on a configurable spectroscopic metrology system performing measurements.
Abstract translation: 本文介绍了对光栅异常灵敏度降低的宽带光谱测量方法和系统。 通过选择用于测量分析的可用系统参数值的子集来实现对光栅异常的灵敏度的降低。 对光栅异常的灵敏度的降低使得能够优化精度，灵敏度，精度，系统匹配和计算工作的任何组合。 在具有大范围的可用方位角，入射角，照明波长和照明偏振的光学测量系统中，这些益处特别明显。 基于精确表示测量系统和测量周期测量目标之间的相互作用的测量模型，确定光栅异常预测。 选择可用系统参数值的一个子集来减少光栅异常对测量结果的影响。 所选择的可用系统参数的子集在执行测量的可配置光谱计量系统上实现。
-
公开(公告)号：US11156548B2
公开(公告)日：2021-10-26
申请号：US15938270
申请日：2018-03-28
Applicant: KLA-TENCOR CORPORATION
Inventor： Manh Nguyen , Phillip Atkins , Alexander Kuznetsov , Liequan Lee , Natalia Malkova , Paul Aoyagi , Mikhail Sushchik , Dawei Hu , Houssam Chouaib
Abstract: A parameterized geometric model of a structure can be determined based on spectra from a wafer metrology tool. The structure can have geometry-induced anisotropic effects. Dispersion parameters of the structure can be determined from the parameterized geometric model. This can enable metrology techniques to measure nanostructures that have geometries and relative positions with surrounding structures that induce non-negligible anisotropic effects. These techniques can be used to characterize process steps involving metal and semiconductor targets in semiconductor manufacturing of, for example, FinFETs or and gate-all-around field-effect transistors.
-
公开(公告)号：US20190178788A1
公开(公告)日：2019-06-13
申请号：US15938270
申请日：2018-03-28
Applicant: KLA-TENCOR CORPORATION
Inventor： Manh Nguyen , Phillip Atkins , Alexander Kuznetsov , Liequan Lee , Natalia Malkova , Paul Aoyagi , Mikhail Sushchik , Dawei Hu , Houssam Chouaib
Abstract: A parameterized geometric model of a structure can be determined based on spectra from a wafer metrology tool. The structure can have geometry-induced anisotropic effects. Dispersion parameters of the structure can be determined from the parameterized geometric model. This can enable metrology techniques to measure nanostructures that have geometries and relative positions with surrounding structures that induce non-negligible anisotropic effects. These techniques can be used to characterize process steps involving metal and semiconductor targets in semiconductor manufacturing of, for example, FinFETs or and gate-all-around field-effect transistors.
-
-
Search Results
3
records
(took 0.018 seconds)
