公开(公告)号：US20200227232A1

公开(公告)日：2020-07-16

申请号：US16832973

申请日：2020-03-27

Applicant: KLA-Tencor Corporation

Inventor： Doug K. Masnaghetti ,  Gabor Toth ,  David Trease ,  Rohit Bothra ,  Grace Hsiu-Ling Chen ,  Rainer Knippelmeyer

IPC: H01J37/28 ,  H01J37/244 ,  G01N23/203 ,  H01J37/10

Abstract: A scanning electron microscopy system with improved image beam stability is disclosed. The system includes an electron beam source configured to generate an electron beam and a set of electron-optical elements to direct at least a portion of the electron beam onto a portion of the sample. The system includes an emittance analyzer assembly. The system includes a splitter element configured to direct at least a portion secondary electrons and/or backscattered electrons emitted by a surface of the sample to the emittance analyzer assembly. The emittance analyzer assembly is configured to image at least one of the secondary electrons and/or the backscattered electrons.

公开(公告)号：US20160372304A1

公开(公告)日：2016-12-22

申请号：US15079046

申请日：2016-03-24

Applicant: KLA-Tencor Corporation

Inventor： Doug K. Masnaghetti ,  Gabor Toth ,  David Trease ,  Rohit Bothra ,  Grace Hsiu-Ling Chen ,  Rainer Knippelmeyer

IPC: H01J37/28 ,  H01J37/244 ,  H01J37/10

CPC classification number: H01J37/28 ,  G01N23/203 ,  G01N2223/6116 ,  H01J37/10 ,  H01J37/244 ,  H01J2237/0044 ,  H01J2237/0048 ,  H01J2237/057 ,  H01J2237/24465 ,  H01J2237/24475 ,  H01J2237/2448 ,  H01J2237/24485 ,  H01J2237/2449 ,  H01J2237/2804 ,  H01J2237/2806

Abstract: A scanning electron microscopy system with improved image beam stability is disclosed. The system includes an electron beam source configured to generate an electron beam and a set of electron-optical elements to direct at least a portion of the electron beam onto a portion of the sample. The system includes an emittance analyzer assembly. The system includes a splitter element configured to direct at least a portion secondary electrons and/or backscattered electrons emitted by a surface of the sample to the emittance analyzer assembly. The emittance analyzer assembly is configured to image at least one of the secondary electrons and/or the backscattered electrons.

Abstract translation: 公开了一种具有改善的图像束稳定性的扫描电子显微镜系统。 该系统包括被配置为产生电子束的电子束源和一组电子 - 光学元件以将至少一部分电子束引导到样品的一部分上。 该系统包括发射体分析器组件。 该系统包括分配器元件，其被配置为将由样品的表面发射的至少一部分二次电子和/或反向散射电子引导到发射体分析器组件。 发射分析器组件被配置成对二次电子和/或后向散射电子中的至少一个进行成像。

公开(公告)号：US11120969B2

公开(公告)日：2021-09-14

申请号：US16832973

申请日：2020-03-27

Applicant: KLA-Tencor Corporation

Inventor： Doug K. Masnaghetti ,  Gabor Toth ,  David Trease ,  Rohit Bothra ,  Grace Hsiu-Ling Chen ,  Rainer Knippelmeyer

IPC: H01J37/28 ,  H01J37/244 ,  G01N23/203 ,  H01J37/10

Abstract: A scanning electron microscopy system with improved image beam stability is disclosed. The system includes an electron beam source configured to generate an electron beam and a set of electron-optical elements to direct at least a portion of the electron beam onto a portion of the sample. The system includes an emittance analyzer assembly. The system includes a splitter element configured to direct at least a portion secondary electrons and/or backscattered electrons emitted by a surface of the sample to the emittance analyzer assembly. The emittance analyzer assembly is configured to image at least one of the secondary electrons and/or the backscattered electrons.