公开(公告)号：US20200227232A1

公开(公告)日：2020-07-16

申请号：US16832973

申请日：2020-03-27

Applicant: KLA-Tencor Corporation

Inventor： Doug K. Masnaghetti ,  Gabor Toth ,  David Trease ,  Rohit Bothra ,  Grace Hsiu-Ling Chen ,  Rainer Knippelmeyer

IPC: H01J37/28 ,  H01J37/244 ,  G01N23/203 ,  H01J37/10

Abstract: A scanning electron microscopy system with improved image beam stability is disclosed. The system includes an electron beam source configured to generate an electron beam and a set of electron-optical elements to direct at least a portion of the electron beam onto a portion of the sample. The system includes an emittance analyzer assembly. The system includes a splitter element configured to direct at least a portion secondary electrons and/or backscattered electrons emitted by a surface of the sample to the emittance analyzer assembly. The emittance analyzer assembly is configured to image at least one of the secondary electrons and/or the backscattered electrons.

公开(公告)号：US10770258B2

公开(公告)日：2020-09-08

申请号：US16105632

申请日：2018-08-20

Applicant: KLA-Tencor Corporation

Inventor： Xinrong Jiang ,  Christopher Sears ,  Harsh Sinha ,  David Trease ,  David Kaz ,  Wei Ye

IPC: H01J37/26 ,  H01J37/22 ,  H01J37/153

Abstract: An electron-optical system for inspecting or reviewing an edge portion of a sample includes an electron beam source configured to generate one or more electron beams, a sample stage configured to secure the sample and an electron-optical column including a set of electron-optical elements configured to direct at least a portion of the one or more electron beams onto an edge portion of the sample. The system also includes a sample position reference device disposed about the sample and a guard ring device disposed between the edge of the sample and the sample position reference device to compensate for one or more fringe fields. One or more characteristics of the guard ring device are adjustable. The system also includes a detector assembly configured to detect electrons emanating from the surface of the sample.

公开(公告)号：US20190006143A1

公开(公告)日：2019-01-03

申请号：US16105632

申请日：2018-08-20

Applicant: KLA-Tencor Corporation

Inventor： Xinrong Jiang ,  Christopher Sears ,  Harsh Sinha ,  David Trease ,  David Kaz ,  Wei Ye

IPC: H01J37/153

Abstract: An electron-optical system for inspecting or reviewing an edge portion of a sample includes an electron beam source configured to generate one or more electron beams, a sample stage configured to secure the sample and an electron-optical column including a set of electron-optical elements configured to direct at least a portion of the one or more electron beams onto an edge portion of the sample. The system also includes a sample position reference device disposed about the sample and a guard ring device disposed between the edge of the sample and the sample position reference device to compensate for one or more fringe fields. One or more characteristics of the guard ring device are adjustable. The system also includes a detector assembly configured to detect electrons emanating from the surface of the sample.

公开(公告)号：US10056224B2

公开(公告)日：2018-08-21

申请号：US15231728

申请日：2016-08-08

Applicant: KLA-Tencor Corporation

Inventor： Xinrong Jiang ,  Christopher Sears ,  Harsh Sinha ,  David Trease ,  David Kaz ,  Wei Ye

IPC: H01J37/153 ,  H01J37/141

CPC classification number: H01J37/153 ,  H01J2237/1532 ,  H01J2237/1534 ,  H01J2237/1536

Abstract: An electron-optical system for inspecting or reviewing an edge portion of a sample includes an electron beam source configured to generate one or more electron beams, a sample stage configured to secure the sample and an electron-optical column including a set of electron-optical elements configured to direct at least a portion of the one or more electron beams onto an edge portion of the sample. The system also includes a sample position reference device disposed about the sample and a guard ring device disposed between the edge of the sample and the sample position reference device to compensate for one or more fringe fields. One or more characteristics of the guard ring device are adjustable. The system also includes a detector assembly configured to detect electrons emanating from the surface of the sample.

公开(公告)号：US20160372304A1

公开(公告)日：2016-12-22

申请号：US15079046

申请日：2016-03-24

Applicant: KLA-Tencor Corporation

Inventor： Doug K. Masnaghetti ,  Gabor Toth ,  David Trease ,  Rohit Bothra ,  Grace Hsiu-Ling Chen ,  Rainer Knippelmeyer

IPC: H01J37/28 ,  H01J37/244 ,  H01J37/10

CPC classification number: H01J37/28 ,  G01N23/203 ,  G01N2223/6116 ,  H01J37/10 ,  H01J37/244 ,  H01J2237/0044 ,  H01J2237/0048 ,  H01J2237/057 ,  H01J2237/24465 ,  H01J2237/24475 ,  H01J2237/2448 ,  H01J2237/24485 ,  H01J2237/2449 ,  H01J2237/2804 ,  H01J2237/2806

Abstract: A scanning electron microscopy system with improved image beam stability is disclosed. The system includes an electron beam source configured to generate an electron beam and a set of electron-optical elements to direct at least a portion of the electron beam onto a portion of the sample. The system includes an emittance analyzer assembly. The system includes a splitter element configured to direct at least a portion secondary electrons and/or backscattered electrons emitted by a surface of the sample to the emittance analyzer assembly. The emittance analyzer assembly is configured to image at least one of the secondary electrons and/or the backscattered electrons.

Abstract translation: 公开了一种具有改善的图像束稳定性的扫描电子显微镜系统。 该系统包括被配置为产生电子束的电子束源和一组电子 - 光学元件以将至少一部分电子束引导到样品的一部分上。 该系统包括发射体分析器组件。 该系统包括分配器元件，其被配置为将由样品的表面发射的至少一部分二次电子和/或反向散射电子引导到发射体分析器组件。 发射分析器组件被配置成对二次电子和/或后向散射电子中的至少一个进行成像。

公开(公告)号：US11120969B2

公开(公告)日：2021-09-14

申请号：US16832973

申请日：2020-03-27

Applicant: KLA-Tencor Corporation

Inventor： Doug K. Masnaghetti ,  Gabor Toth ,  David Trease ,  Rohit Bothra ,  Grace Hsiu-Ling Chen ,  Rainer Knippelmeyer

IPC: H01J37/28 ,  H01J37/244 ,  G01N23/203 ,  H01J37/10

Abstract: A scanning electron microscopy system with improved image beam stability is disclosed. The system includes an electron beam source configured to generate an electron beam and a set of electron-optical elements to direct at least a portion of the electron beam onto a portion of the sample. The system includes an emittance analyzer assembly. The system includes a splitter element configured to direct at least a portion secondary electrons and/or backscattered electrons emitted by a surface of the sample to the emittance analyzer assembly. The emittance analyzer assembly is configured to image at least one of the secondary electrons and/or the backscattered electrons.

公开(公告)号：US20170047193A1

公开(公告)日：2017-02-16

申请号：US15231728

申请日：2016-08-08

Applicant: KLA-Tencor Corporation

Inventor： Xinrong Jiang ,  Christopher Sears ,  Harsh Sinha ,  David Trease ,  David Kaz ,  Wei Ye

IPC: H01J37/153 ,  H01J37/147 ,  H01J37/20 ,  H01J37/244

CPC classification number: H01J37/153 ,  H01J2237/1532 ,  H01J2237/1534 ,  H01J2237/1536

Abstract: An electron-optical system for inspecting or reviewing an edge portion of a sample includes an electron beam source configured to generate one or more electron beams, a sample stage configured to secure the sample and an electron-optical column including a set of electron-optical elements configured to direct at least a portion of the one or more electron beams onto an edge portion of the sample. The system also includes a sample position reference device disposed about the sample and a guard ring device disposed between the edge of the sample and the sample position reference device to compensate for one or more fringe fields. One or more characteristics of the guard ring device are adjustable. The system also includes a detector assembly configured to detect electrons emanating from the surface of the sample.

Abstract translation: 用于检查或检查样品的边缘部分的电子光学系统包括被配置为产生一个或多个电子束的电子束源，被配置为固定样品的样品台和包括一组电子光学的电子 - 光学柱 被配置为将一个或多个电子束的至少一部分引导到样品的边缘部分上的元件。 该系统还包括围绕样品设置的样品位置参考装置和设置在样品边缘与样品位置参考装置之间的保护环装置，以补偿一个或多个边缘场。 保护环装置的一个或多个特性是可调节的。 该系统还包括被配置为检测从样品表面发出的电子的检测器组件。