公开(公告)号：US09696268B2

公开(公告)日：2017-07-04

申请号：US14919563

申请日：2015-10-21

Applicant: KLA-Tencor Corporation

Inventor： Harsh Sinha ,  Dmitry Spivak ,  Huina Xu ,  Hong Xiao ,  Rohit Bothra

IPC: G01N23/00 ,  G01N23/22 ,  G01N23/223 ,  G01T1/36 ,  G01N23/225 ,  H01J37/28 ,  H01J37/20

CPC classification number: G01N23/2252 ,  H01J37/20 ,  H01J37/28 ,  H01J2237/22 ,  H01J2237/2806 ,  H01J2237/2807 ,  H01J2237/2817

Abstract: One embodiment relates to a method for automated review of defects detected in a defective die on the target substrate. The method includes: performing an automated review of the defects using an secondary electron microscope (SEM) so as to obtain electron-beam images of the defects; performing an automated classification of the defects into types based on morphology of the defects as determined from the electron-beam images; selecting defects of a specific type for automated energy-dispersive x-ray (EDX) review; and performing the automated EDX review on the defects of the specific type. In addition, automated techniques are disclosed for obtaining an accurate reference so as to improve the usefulness of the EDX results. Furthermore, an automated method of classifying the defects based on the EDX results is disclosed which provides a final pareto that combines both morphological and elemental information. Other embodiments, aspects and features are also disclosed.

公开(公告)号：US20200227232A1

公开(公告)日：2020-07-16

申请号：US16832973

申请日：2020-03-27

Applicant: KLA-Tencor Corporation

Inventor： Doug K. Masnaghetti ,  Gabor Toth ,  David Trease ,  Rohit Bothra ,  Grace Hsiu-Ling Chen ,  Rainer Knippelmeyer

IPC: H01J37/28 ,  H01J37/244 ,  G01N23/203 ,  H01J37/10

Abstract: A scanning electron microscopy system with improved image beam stability is disclosed. The system includes an electron beam source configured to generate an electron beam and a set of electron-optical elements to direct at least a portion of the electron beam onto a portion of the sample. The system includes an emittance analyzer assembly. The system includes a splitter element configured to direct at least a portion secondary electrons and/or backscattered electrons emitted by a surface of the sample to the emittance analyzer assembly. The emittance analyzer assembly is configured to image at least one of the secondary electrons and/or the backscattered electrons.

公开(公告)号：US11120969B2

公开(公告)日：2021-09-14

申请号：US16832973

申请日：2020-03-27

Applicant: KLA-Tencor Corporation

Inventor： Doug K. Masnaghetti ,  Gabor Toth ,  David Trease ,  Rohit Bothra ,  Grace Hsiu-Ling Chen ,  Rainer Knippelmeyer

IPC: H01J37/28 ,  H01J37/244 ,  G01N23/203 ,  H01J37/10

Abstract: A scanning electron microscopy system with improved image beam stability is disclosed. The system includes an electron beam source configured to generate an electron beam and a set of electron-optical elements to direct at least a portion of the electron beam onto a portion of the sample. The system includes an emittance analyzer assembly. The system includes a splitter element configured to direct at least a portion secondary electrons and/or backscattered electrons emitted by a surface of the sample to the emittance analyzer assembly. The emittance analyzer assembly is configured to image at least one of the secondary electrons and/or the backscattered electrons.

公开(公告)号：US20160372304A1

公开(公告)日：2016-12-22

申请号：US15079046

申请日：2016-03-24

Applicant: KLA-Tencor Corporation

Inventor： Doug K. Masnaghetti ,  Gabor Toth ,  David Trease ,  Rohit Bothra ,  Grace Hsiu-Ling Chen ,  Rainer Knippelmeyer

IPC: H01J37/28 ,  H01J37/244 ,  H01J37/10

CPC classification number: H01J37/28 ,  G01N23/203 ,  G01N2223/6116 ,  H01J37/10 ,  H01J37/244 ,  H01J2237/0044 ,  H01J2237/0048 ,  H01J2237/057 ,  H01J2237/24465 ,  H01J2237/24475 ,  H01J2237/2448 ,  H01J2237/24485 ,  H01J2237/2449 ,  H01J2237/2804 ,  H01J2237/2806

Abstract: A scanning electron microscopy system with improved image beam stability is disclosed. The system includes an electron beam source configured to generate an electron beam and a set of electron-optical elements to direct at least a portion of the electron beam onto a portion of the sample. The system includes an emittance analyzer assembly. The system includes a splitter element configured to direct at least a portion secondary electrons and/or backscattered electrons emitted by a surface of the sample to the emittance analyzer assembly. The emittance analyzer assembly is configured to image at least one of the secondary electrons and/or the backscattered electrons.

Abstract translation: 公开了一种具有改善的图像束稳定性的扫描电子显微镜系统。 该系统包括被配置为产生电子束的电子束源和一组电子 - 光学元件以将至少一部分电子束引导到样品的一部分上。 该系统包括发射体分析器组件。 该系统包括分配器元件，其被配置为将由样品的表面发射的至少一部分二次电子和/或反向散射电子引导到发射体分析器组件。 发射分析器组件被配置成对二次电子和/或后向散射电子中的至少一个进行成像。