公开(公告)号：US09939386B2

公开(公告)日：2018-04-10

申请号：US13779062

申请日：2013-02-27

Applicant: KLA-Tencor Corporation

Inventor： Isabella T. Lewis ,  Yakov Bobrov

IPC: G01N21/88 ,  G01N21/95

CPC classification number: G01N21/8806 ,  G01N21/9501 ,  G01N2021/8845

Abstract: The disclosure is directed to systems and methods for sample inspection and review. In some embodiments, images are collected and/or defects are located utilizing separately addressable red, green, and blue (RGB) illumination sources to improve image quality. In some embodiments, illumination sources are pulse width modulated for substantially consistent light intensity in presence of variable sample motion. In some embodiments, a stage assembly is configured to support the sample without blocking access to the supported surface of the sample, and further configured to reduce oscillations or vibrations of the sample. In some embodiments, an illumination system includes an imaging path and a focusing path to allow full field of view focusing.

公开(公告)号：US20130271596A1

公开(公告)日：2013-10-17

申请号：US13779062

申请日：2013-02-27

Applicant: KLA-TENCOR CORPORATION

Inventor： Isabella T. Lewis ,  Yakov Bobrov

IPC: G01N21/88

CPC classification number: G01N21/8806 ,  G01N21/9501 ,  G01N2021/8845

Abstract: The disclosure is directed to systems and methods for sample inspection and review. In some embodiments, images are collected and/or defects are located utilizing separately addressable red, green, and blue (RGB) illumination sources to improve image quality. In some embodiments, illumination sources are pulse width modulated for substantially consistent light intensity in presence of variable sample motion. In some embodiments, a stage assembly is configured to support the sample without blocking access to the supported surface of the sample, and further configured to reduce oscillations or vibrations of the sample. In some embodiments, an illumination system includes an imaging path and a focusing path to allow full field of view focusing.

Abstract translation: 本公开涉及用于样品检查和检查的系统和方法。 在一些实施例中，利用单独可寻址的红色，绿色和蓝色（RGB）照明源来收集图像和/或定位缺陷，以改善图像质量。 在一些实施例中，在存在可变样本运动的情况下，照明源被脉冲宽度调制以实质上一致的光强度。 在一些实施例中，台架组件被配置成支撑样品，而不阻挡对被支撑的样品表面的接近，并且还被配置为减少样品的振荡或振动。 在一些实施例中，照明系统包括成像路径和聚焦路径以允许全视野聚焦。

公开(公告)号：US09645097B2

公开(公告)日：2017-05-09

申请号：US14741866

申请日：2015-06-17

Applicant: KLA-Tencor Corporation

Inventor： Lena Nicolaides ,  Ben-ming Benjamin Tsai ,  Prashant A. Aji ,  Michael Gasvoda ,  Stanley E. Stokowski ,  Guoheng Zhao ,  Youxian Wen ,  Mohan Mahadevan ,  Paul D. Horn ,  Wolfgang Vollrath ,  Isabella T. Lewis

IPC: G03B27/52 ,  G03B27/32 ,  G01N21/95 ,  G03F7/20 ,  H01L21/66

CPC classification number: G01N21/9503 ,  G01N2201/06113 ,  G03F7/7085 ,  H01L22/12

Abstract: Disclosed are methods and apparatus for inspecting and processing semiconductor wafers. The system includes an edge detection system for receiving each wafer that is to undergo a photolithography process. The edge detection system comprises an illumination channel for directing one or more illumination beams towards a side, top, and bottom edge portion that are within a border region of the wafer. The edge detection system also includes a collection module for collecting and sensing output radiation that is scattered or reflected from the edge portion of the wafer and an analyzer module for locating defects in the edge portion and determining whether each wafer is within specification based on the sensed output radiation for such wafer. The photolithography system is configured for receiving from the edge detection system each wafer that has been found to be within specification. The edge detection system is coupled in-line with the photolithography system.

公开(公告)号：US20150370175A1

公开(公告)日：2015-12-24

申请号：US14741866

申请日：2015-06-17

Applicant: KLA-Tencor Corporation

Inventor： Lena Nicolaides ,  Ben-ming Benjamin Tsai ,  Prashant A. Aji ,  Michael Gasvoda ,  Stanley E. Stokowski ,  Guoheng Zhao ,  Youxian Wen ,  Mohan Mahadevan ,  Paul D. Horn ,  Wolfgang Vollrath ,  Isabella T. Lewis

IPC: G03F7/20 ,  G01N21/95

CPC classification number: G01N21/9503 ,  G01N2201/06113 ,  G03F7/7085 ,  H01L22/12

Abstract: Disclosed are methods and apparatus for inspecting and processing semiconductor wafers. The system includes an edge detection system for receiving each wafer that is to undergo a photolithography process. The edge detection system comprises an illumination channel for directing one or more illumination beams towards a side, top, and bottom edge portion that are within a border region of the wafer. The edge detection system also includes a collection module for collecting and sensing output radiation that is scattered or reflected from the edge portion of the wafer and an analyzer module for locating defects in the edge portion and determining whether each wafer is within specification based on the sensed output radiation for such wafer. The photolithography system is configured for receiving from the edge detection system each wafer that has been found to be within specification. The edge detection system is coupled in-line with the photolithography system.

Abstract translation: 公开了用于检查和处理半导体晶片的方法和装置。 该系统包括边缘检测系统，用于接收将进行光刻工艺的每个晶片。 边缘检测系统包括用于将一个或多个照明光束朝向位于晶片的边界区域内的侧面，顶部和底部边缘部分引导的照明通道。 边缘检测系统还包括用于收集和感测从晶片的边缘部分散射或反射的输出辐射的收集模块和用于定位边缘部分中的缺陷的分析器模块，并且基于所感测到的每个晶片是否在规格范围内 这种晶片的输出辐射。 光刻系统被配置为从边缘检测系统接收已发现在规格范围内的每个晶片。 边缘检测系统与光刻系统成对连接。

公开(公告)号：US09157868B2

公开(公告)日：2015-10-13

申请号：US13788756

申请日：2013-03-07

Applicant: KLA-Tencor Corporation

Inventor： Isabella T. Lewis

IPC: G01N21/00 ,  G01N21/95

CPC classification number: G01N21/9503 ,  G01N21/9515

Abstract: The disclosure is directed to a system and method for reviewing a curved edge of a sample. A line scan detector is actuated along an actuation path defined by the edge of the sample to scan a plurality of locations along the sample edge. The scan data is assembled to generate at least one review image of at least a portion of the edge of the sample. In some embodiments a substantially normal angle of incidence is maintained between the sample edge and the scanning illumination. In some embodiments, brightfield and darkfield images may be collected utilizing a common objective with separately operable illumination sources directing illumination along a first and second illumination path to the sample edge for review.

Abstract translation: 本公开涉及用于检查样品的弯曲边缘的系统和方法。 线扫描检测器沿着由样品边缘限定的致动路径被致动以扫描沿着样品边缘的多个位置。 组装扫描数据以产生样品边缘的至少一部分的至少一个检查图像。 在一些实施例中，在采样边缘和扫描照明之间保持基本上正常的入射角。 在一些实施例中，利用具有单独可操作的照明源的共同物镜可收集亮场和暗场图像，所述照明源将沿着第一和第二照明路径的照明引导到样本边缘以供审查。

公开(公告)号：US20140253910A1

公开(公告)日：2014-09-11

申请号：US13788756

申请日：2013-03-07

Applicant: KLA-Tencor Corporation

Inventor： Isabella T. Lewis

IPC: G01N21/95

CPC classification number: G01N21/9503 ,  G01N21/9515

Abstract: The disclosure is directed to a system and method for reviewing a curved edge of a sample. A line scan detector is actuated along an actuation path defined by the edge of the sample to scan a plurality of locations along the sample edge. The scan data is assembled to generate at least one review image of at least a portion of the edge of the sample. In some embodiments a substantially normal angle of incidence is maintained between the sample edge and the scanning illumination. In some embodiments, brightfield and darkfield images may be collected utilizing a common objective with separately operable illumination sources directing illumination along a first and second illumination path to the sample edge for review.

Abstract translation: 本公开涉及用于检查样品的弯曲边缘的系统和方法。 线扫描检测器沿着由样品边缘限定的致动路径被致动以扫描沿着样品边缘的多个位置。 组装扫描数据以产生样品边缘的至少一部分的至少一个检查图像。 在一些实施例中，在采样边缘和扫描照明之间保持基本上正常的入射角。 在一些实施例中，利用具有单独可操作的照明源的共同物镜可收集亮场和暗场图像，所述照明源将沿着第一和第二照明路径的照明引导到样本边缘以供审查。