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公开(公告)号:US10181515B2
公开(公告)日:2019-01-15
申请号:US15436179
申请日:2017-02-17
发明人: Mariko Suzuki , Tadashi Sakai
IPC分类号: H01L29/16 , H01L29/47 , H01L29/40 , H01L29/872 , H01L29/36 , H01L23/29 , H01L23/31 , H01L29/66 , H01L29/732 , H01L29/861 , H01L29/868 , H01L29/06
摘要: Provided is a semiconductor device according to an embodiment including an i-type or first-conductivity-type first diamond semiconductor layer having a first side surface, a second-conductivity-type second diamond semiconductor layer provided on the first diamond semiconductor layer and having a second side surface, a third diamond semiconductor layer being in contact with the first side surface and the second side surface, the third diamond semiconductor containing nitrogen, a first electrode electrically connected to the first diamond semiconductor layer, and a second electrode electrically connected to the second diamond semiconductor layer.
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公开(公告)号:US09741663B2
公开(公告)日:2017-08-22
申请号:US15067140
申请日:2016-03-10
IPC分类号: H01L21/00 , H01L23/532 , H01L21/768
CPC分类号: H01L23/53276 , H01L21/76834 , H01L21/76871 , H01L21/76885 , H01L21/76892 , H01L23/5226 , H01L23/5283
摘要: According to one embodiment, a semiconductor device includes an underlayer formed on a substrate, a catalyst layer disposed on the underlayer and extending in an interconnect length direction. The device further includes an upper graphene layer formed on an upper face of the catalyst layer, and side graphene layers provided on two respective side faces of the catalyst layer, the two side faces extending in the interconnect length direction.
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公开(公告)号:US09679851B2
公开(公告)日:2017-06-13
申请号:US15055894
申请日:2016-02-29
IPC分类号: H01L23/532 , H01L23/528 , H01L21/02 , H01L21/768
CPC分类号: H01L23/53276 , H01L21/02227 , H01L21/02236 , H01L21/02247 , H01L21/02252 , H01L21/76838 , H01L23/5329
摘要: A graphene wring structure of an embodiment includes multilayer graphene, a first interlayer compound existing in an interlayer space of the multilayer graphene, and a second interlayer compound existing in the interlayer space of the multilayer graphene. The second interlayer compound containing at least one of an oxide, a nitride and a carbide.
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公开(公告)号:US09418938B2
公开(公告)日:2016-08-16
申请号:US14336134
申请日:2014-07-21
IPC分类号: H01L29/06 , H01L23/52 , H01L23/532 , H01L23/522 , H01L21/768 , H01L29/16
CPC分类号: H01L23/53276 , H01L21/76805 , H01L21/76814 , H01L21/76879 , H01L21/76897 , H01L23/522 , H01L23/5226 , H01L23/53223 , H01L23/53238 , H01L23/53266 , H01L29/1606 , H01L2221/1094 , H01L2924/0002 , H01L2924/00
摘要: A semiconductor device includes a graphene interconnect, an insulation film formed on the graphene interconnect, and a via conducting portion formed in a via hole provided in the graphene interconnect and the insulation film. The graphene interconnect has a region containing an impurity at least around the via hole.
摘要翻译: 半导体器件包括石墨烯互连,形成在石墨烯互连上的绝缘膜和形成在设置在石墨烯互连中的通孔中的通孔导电部分和绝缘膜。 石墨烯互连具有至少在通孔周围含有杂质的区域。
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公开(公告)号:US09184133B2
公开(公告)日:2015-11-10
申请号:US14658442
申请日:2015-03-16
发明人: Masayuki Katagiri , Tadashi Sakai
IPC分类号: H01L23/532
CPC分类号: H01L23/53276 , H01L2924/0002 , H01L2924/00
摘要: A graphene wiring of an embodiment includes graphene, first conductive layers, second conductive layers, and a third conductive layer. The first conductive layers are connected to first sides of the graphene opposite to each other in a longitudinal direction of the wiring. The second conductive layers are connected to second sides of the graphene opposite to each other in a widthwise direction of the wiring. The third conductive layer is connected to a top surface of the graphene. The first and second conductive layers are connected to each other.
摘要翻译: 实施例的石墨烯布线包括石墨烯,第一导电层,第二导电层和第三导电层。 第一导电层在布线的纵向方向上连接到彼此相对的石墨烯的第一侧。 第二导电层在布线的宽度方向上彼此相对的石墨烯的第二侧连接。 第三导电层连接到石墨烯的顶表面。 第一和第二导电层彼此连接。
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公开(公告)号:US09123720B2
公开(公告)日:2015-09-01
申请号:US13950442
申请日:2013-07-25
IPC分类号: H01L23/532 , H01L23/522 , H01L21/768 , H01L51/00 , C01B31/02 , H01L51/44 , H01L29/06 , H01L29/41
CPC分类号: H01L21/76877 , C01B31/0206 , C01B32/15 , H01L21/2855 , H01L21/28556 , H01L21/76838 , H01L21/76843 , H01L21/76846 , H01L21/76876 , H01L21/76879 , H01L23/5226 , H01L23/53276 , H01L29/0669 , H01L29/413 , H01L51/0048 , H01L51/444 , H01L2221/1094 , H01L2924/0002 , H01L2924/00
摘要: A semiconductor device of an embodiment includes: a substrate on which a semiconductor circuit is formed; an interlayer insulating film in which a contact hole is formed on the substrate; a catalyst metal film on a side wall of the contact hole; catalyst metal particles on a bottom of the contact hole; graphene on the catalyst metal film; and carbon nanotubes, which penetrates the contact hole, on the catalyst metal particles.
摘要翻译: 实施例的半导体器件包括:形成半导体电路的基板; 在基板上形成有接触孔的层间绝缘膜; 在接触孔的侧壁上的催化剂金属膜; 催化剂金属颗粒在接触孔的底部; 催化剂金属膜上的石墨烯; 和穿过接触孔的碳纳米管在催化剂金属颗粒上。
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公开(公告)号:US09117738B2
公开(公告)日:2015-08-25
申请号:US13966164
申请日:2013-08-13
发明人: Makoto Wada , Hisao Miyazaki , Akihiro Kajita , Atsunobu Isobayashi , Tatsuro Saito , Tadashi Sakai
IPC分类号: H01L29/16 , H01L21/768 , H01L21/3215 , H01L23/532 , H01L27/105
CPC分类号: H01L29/1606 , H01L21/3215 , H01L21/76805 , H01L21/76876 , H01L21/76885 , H01L21/76886 , H01L23/53276 , H01L27/1052 , H01L2924/0002 , H01L2924/00
摘要: According to one embodiment, a semiconductor device using multi-layered graphene wires includes a substrate having semiconductor elements formed therein, a first graphene wire formed above the substrate and including a multi-layered graphene layer having a preset impurity doped therein, a second graphene wire formed on the same layer as the first multi-layered graphene wire above the substrate and including a multi-layered graphene layer into which the preset impurity is not doped, a lower-layer contact connected to the undersurface side of the first multi-layered graphene wire, and an upper-layer contact connected to the upper surface side of the second multi-layered graphene wire.
摘要翻译: 根据一个实施例,使用多层石墨烯线的半导体器件包括其中形成有半导体元件的衬底,在衬底上形成的第一个石墨烯线,并且包括掺杂有预置杂质的多层石墨烯层,第二石墨烯线 形成在与衬底上方的第一多层石墨烯线相同的层上,并且包括未掺杂预置杂质的多层石墨烯层,连接到第一多层石墨烯的下表面侧的下层接触 电线,以及连接到第二多层石墨烯线的上表面侧的上层接触。
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公开(公告)号:US09000591B2
公开(公告)日:2015-04-07
申请号:US13768567
申请日:2013-02-15
发明人: Yuichi Yamazaki , Makoto Wada , Tatsuro Saito , Tadashi Sakai
IPC分类号: H01L23/48 , H01L23/498 , H01L23/532 , B82Y30/00
CPC分类号: H01L23/53276 , B82Y30/00 , H01L23/49866 , H01L23/5226 , H01L23/528 , H01L2924/0002 , Y10S977/734 , H01L2924/00
摘要: A conductive film of an embodiment includes: a fine catalytic metal particle as a junction and a graphene extending in a network form from the junction.
摘要翻译: 一个实施方案的导电膜包括:作为结的细的催化金属颗粒和从接合部以网络形式延伸的石墨烯。
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公开(公告)号:US20140284798A1
公开(公告)日:2014-09-25
申请号:US14202013
申请日:2014-03-10
IPC分类号: H01L23/532 , H01L21/285
CPC分类号: H01L23/53276 , H01L2924/0002 , H01L2924/00
摘要: A graphene wiring has a substrate a catalyst layer on the substrate a first graphene sheet layer on the catalyst layer and a second graphene sheet layer on the first graphene layer. The second graphene layer comprises multilayer graphene sheets. The multilayer graphene sheets are intercalated with an atomic or molecular species.
摘要翻译: 石墨烯布线在衬底上具有催化剂层,催化剂层在催化剂层上的第一石墨烯片层和第一石墨烯层上的第二石墨烯片层。 第二石墨烯层包括多层石墨烯片。 多层石墨烯片被插入原子或分子物质。
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公开(公告)号:US10325851B2
公开(公告)日:2019-06-18
申请号:US15691257
申请日:2017-08-30
发明人: Hisao Miyazaki , Tadashi Sakai , Yasutaka Nishida , Takashi Yoshida , Yuichi Yamazaki , Masayuki Katagiri , Naoshi Sakuma
IPC分类号: H01L21/768 , H01L23/522 , H01L23/532 , H01L21/3205 , H01L21/3213 , H01L27/1157 , H01L27/11524 , H01L27/11556 , H01L27/11582
摘要: A graphene wiring structure of an embodiment has: an amorphous or polycrystalline insulating film; and a multilayer graphene on the insulating film. The multilayer graphene including a plurality of graphene crystals having a zigzag direction is oriented at 17 degrees or less with respect to an electric conduction direction on the insulating film.
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