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    Pattern forming method, electron beam-sensitive or extreme ultraviolet-sensitive composition, resist film, manufacturing method of electronic device, and electronic device
    1.
    发明授权
    Pattern forming method, electron beam-sensitive or extreme ultraviolet-sensitive composition, resist film, manufacturing method of electronic device, and electronic device 有权
    图案形成方法，电子束敏感或极紫外敏感组合物，抗蚀膜，电子器件的制造方法和电子器件

    公开(公告)号：US08822129B2

    公开(公告)日：2014-09-02

    申请号：US13613437

    申请日：2012-09-13

    申请人： Kaoru Iwato ,  Hideaki Tsubaki ,  Shuji Hirano

    发明人： Kaoru Iwato ,  Hideaki Tsubaki ,  Shuji Hirano

    IPC分类号： G03F7/00 ,  G03F7/004 ,  G03F7/20

    CPC分类号： G03F7/11 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/2041 ,  G03F7/2059 ,  G03F7/325 ,  G03F7/40

    摘要： There is provided a pattern forming method comprising (1) a step of forming a film by using an electron beam-sensitive or extreme ultraviolet-sensitive resin composition containing (A) a resin that contains a repeating unit having a partial structure represented by the specific formula and can decrease the solubility for a developer containing an organic solvent by the action of an acid, and (B) a compound capable of generating an acid upon irradiation with an electron beam or an extreme ultraviolet ray, (2) a step of exposing the film by using an electron beam or an extreme ultraviolet ray, and (4) a step of developing the exposed film by using an organic solvent-containing developer to form a negative pattern.

    摘要翻译： 提供一种图案形成方法，其包括（1）通过使用电子束敏感或极紫外线敏感性树脂组合物形成膜的步骤，所述树脂组合物含有（A）含有具有由具体的 并且可以通过酸的作用降低含有有机溶剂的显影剂的溶解度，和（B）在用电子束或极紫外线照射时能够产生酸的化合物，（2）曝光步骤 通过使用电子束或极紫外线的膜，以及（4）通过使用含有机溶剂的显影剂显影曝光的膜以形成负图案的步骤。

    POSITIVE PHOTOSENSITIVE COMPOSITION AND A PATTERN-FORMING METHOD USING THE SAME
    2.
    发明申请
    POSITIVE PHOTOSENSITIVE COMPOSITION AND A PATTERN-FORMING METHOD USING THE SAME 有权
    正性感光性组合物和使用其的图案形成方法

    公开(公告)号：US20090081581A1

    公开(公告)日：2009-03-26

    申请号：US12055359

    申请日：2008-03-26

    申请人： Kunihiko Kodama ,  Kaoru Iwato ,  Hideaki Tsubaki ,  Norihiko Taguchi

    发明人： Kunihiko Kodama ,  Kaoru Iwato ,  Hideaki Tsubaki ,  Norihiko Taguchi

    IPC分类号： G03F7/20 ,  G03F7/004 ,  C08F220/26

    CPC分类号： G03F7/0397 ,  C08F220/26 ,  C08F220/28 ,  Y10S430/111

    摘要： A positive photosensitive composition comprises: (A) a compound that generates an acid upon irradiation with actinic ray or radiation; and (B) a resin that increases its solubility in an alkali developer by action of an acid, wherein the resin (B) has a repeating unit that has an acid-decomposable group and is represented by formula (I): wherein Xa1 represents a hydrogen atom, an alkyl group, a cyano group, or a halogen atom; Ry1 and Ry2 each independently represents an alkyl group or a cycloalkyl group; Rx represents an alkyl group having 2 or more carbon atoms, or a cycloalkyl group; and Z represents an alkylene group.

    摘要翻译： 正型光敏组合物包含：（A）在用光化射线或辐射照射时产生酸的化合物; 和（B）通过酸的作用增加其在碱性显影剂中的溶解度的树脂，其中树脂（B）具有具有酸分解性基团并由式（I）表示的重复单元：其中Xa1表示 氢原子，烷基，氰基或卤素原子; Ry1和Ry2各自独立地表示烷基或环烷基; Rx表示具有2个以上碳原子的烷基或环烷基; Z表示亚烷基。

    Positive photosensitive composition and a pattern-forming method using the same
    3.
    发明授权
    Positive photosensitive composition and a pattern-forming method using the same 有权
    正型光敏组合物和使用其的图案形成方法

    公开(公告)号：US07700261B2

    公开(公告)日：2010-04-20

    申请号：US12055359

    申请日：2008-03-26

    申请人： Kunihiko Kodama ,  Kaoru Iwato ,  Hideaki Tsubaki ,  Norihiko Taguchi

    发明人： Kunihiko Kodama ,  Kaoru Iwato ,  Hideaki Tsubaki ,  Norihiko Taguchi

    IPC分类号： G03F7/039 ,  G03F7/20 ,  G03F7/30

    CPC分类号： G03F7/0397 ,  C08F220/26 ,  C08F220/28 ,  Y10S430/111

    摘要： A positive photosensitive composition comprises: (A) a compound that generates an acid upon irradiation with actinic ray or radiation; and (B) a resin that increases its solubility in an alkali developer by action of an acid, wherein the resin (B) has a repeating unit that has an acid-decomposable group and is represented by formula (I): wherein Xa1 represents a hydrogen atom, an alkyl group, a cyano group, or a halogen atom; Ry1 and Ry2 each independently represents an alkyl group or a cycloalkyl group; Rx represents an alkyl group having 2 or more carbon atoms, or a cycloalkyl group; and Z represents an alkylene group.

    摘要翻译： 正型光敏组合物包含：（A）在用光化射线或辐射照射时产生酸的化合物; 和（B）通过酸的作用增加其在碱性显影剂中的溶解度的树脂，其中树脂（B）具有具有酸分解性基团并由式（I）表示的重复单元：其中Xa1表示 氢原子，烷基，氰基或卤素原子; Ry1和Ry2各自独立地表示烷基或环烷基; Rx表示具有2个以上碳原子的烷基或环烷基; Z表示亚烷基。