公开(公告)号：US06608667B2

公开(公告)日：2003-08-19

申请号：US09771979

申请日：2001-01-30

申请人： Hiroyuki Koide ,  Kazuhito Outsuka

发明人： Hiroyuki Koide ,  Kazuhito Outsuka

IPC分类号： G03B2772

CPC分类号： G03F7/70066 ,  G03F7/70358 ,  G03F7/70475

摘要： An exposure apparatus has an illumination system for transferring a reticle pattern formed on a reticle as a master onto a wafer as a photosensitive member by a laser source, a stop for setting an illumination region by the laser source, and a mechanism for synchronously scanning the reticle and wafer in predetermined scanning directions. Exposure processing by synchronous scanning of the reticle and wafer and relative movement of the wafer in a direction crossing the scanning direction are repeated, thereby forming a transfer pattern with connected exposure regions on the wafer. The stop driving mechanism performs exposure while driving a vane of the stop for setting the illumination region in the direction perpendicular to the scanning direction in the direction crossing the scanning direction during the exposure processing.

摘要翻译： 曝光装置具有照射系统，用于通过激光源将作为母体的标线片上形成的标线图案作为感光构件转印到作为感光构件的晶片上，通过激光源将用于设定照明区域的停止点和用于同步扫描 标线片和晶片。 重复通过掩模版和晶片的同步扫描的曝光处理以及晶片在与扫描方向交叉的方向上的相对移动，由此形成具有连接的曝光区域的转印图案。 在曝光处理期间，与沿着扫描方向的方向垂直的扫描方向的方向驱动用于设置照明区域的停止片的叶片，停止驱动机构进行曝光。

公开(公告)号：US06909372B2

公开(公告)日：2005-06-21

申请号：US10662471

申请日：2003-09-16

申请人： Takehiko Iwanaga ,  Kazuhito Outsuka ,  Toshiyuki Shigaraki

发明人： Takehiko Iwanaga ,  Kazuhito Outsuka ,  Toshiyuki Shigaraki

IPC分类号： G03F7/20 ,  G01R19/165 ,  G01R31/40 ,  G05B19/18 ,  H01L21/027 ,  G08B17/00

CPC分类号： G01R19/16538 ,  G01R31/40

摘要： A power monitoring apparatus monitors the voltage fluctuation range of an AC power supply and the duration of voltage fluctuations within the voltage fluctuation range. The power monitoring apparatus looks up a power failure rank table for determining the power failure rank of the power supply on the basis of the voltage fluctuation range and the duration obtained as the monitoring result to determine the power failure rank of the power supply. The power monitoring apparatus sends a power failure signal indicating the power failure rank to a power supply destination of an AC power supply.

摘要翻译： 功率监视装置监视交流电源的电压波动范围和电压波动范围内的电压波动的持续时间。 功率监视装置基于电压波动范围和作为监视结果获得的持续时间来查找用于确定电源的电源故障等级的电源故障等级表，以确定电源的电源故障等级。 电力监视装置向AC电源的供电目的地发送指示电力故障等级的停电信号。

公开(公告)号：US06714691B2

公开(公告)日：2004-03-30

申请号：US09328797

申请日：1999-06-09

申请人： Kazuhito Outsuka

发明人： Kazuhito Outsuka

IPC分类号： G06K932

CPC分类号： G03F9/7069 ,  G03F7/70716 ,  G03F9/7011 ,  G03F9/7015

摘要： An exposure apparatus for transferring a pattern of a first object onto a second object. The apparatus includes a holding member for holding the first object. The first object is positioned on the holding member and then is held thereon, and the first object as held by the holding member is then aligned with respect to the second object. A detecting device, provided on the holding member, directly detects in real time a relative positional deviation between the first object and the holding member. The detecting device detects the relative positional deviation after the first object is held by the holding member and before the holding member releases the holding of the first object.

摘要翻译： 一种用于将第一物体的图案转印到第二物体上的曝光装置。 该装置包括用于保持第一物体的保持构件。 第一物体位于保持构件上，然后被保持在其上，并且由保持构件保持的第一物体然后相对于第二物体对准。 设置在保持构件上的检测装置实时地直接检测第一物体与保持构件之间的相对位置偏差。 检测装置检测在第一物体被保持构件保持之后并且在保持构件松开第一物体的保持之前的相对位置偏差。

公开(公告)号：US5925887A

公开(公告)日：1999-07-20

申请号：US942698

申请日：1997-09-30

申请人： Fumio Sakai ,  Kazuhito Outsuka ,  Yuichi Yamada ,  Kazuhiro Takahashi ,  Yasuo Hasegawa ,  Hideki Nogawa ,  Shinji Utamura

发明人： Fumio Sakai ,  Kazuhito Outsuka ,  Yuichi Yamada ,  Kazuhiro Takahashi ,  Yasuo Hasegawa ,  Hideki Nogawa ,  Shinji Utamura

IPC分类号： G03F7/20 ,  G03F7/207 ,  H01L21/027 ,  G01N21/86

CPC分类号： G03F7/70558 ,  G03F7/70133 ,  G03F7/70241 ,  G03F7/706

摘要： A projection exposure apparatus including a projection optical system for projecting a pattern of a reticle onto a substrate, an optical characteristic detecting device for detecting a change in optical characteristic of the projection optical system, which change may result from the projection of the reticle pattern onto the substrate through the projection optical system, and a light detecting device for detecting at least one of (i) an intensity distribution of light from the reticle pattern, at a position adjacent to the reticle or adjacent to an imaging plane on which the reticle is to be imaged, and (ii) an intensity distribution of the light from the reticle pattern, at a position adjacent to a pupil plane of the projection optical system, wherein the optical characteristic detecting device is arranged to detect the amount of change in optical characteristic in accordance with the intensity distribution detected by the light detecting device.

摘要翻译： 一种投影曝光装置，包括用于将掩模版图案投射到基板上的投影光学系统，用于检测投影光学系统的光学特性变化的光学特性检测装置，该变化可能由于将标线图案投影到 通过投影光学系统的基板，以及光检测装置，用于检测（i）来自标线图案的光的强度分布中的至少一个，在与该掩模版相邻的位置或与该掩模版在其上的成像平面相邻的位置 以及（ii）在与投影光学系统的光瞳平面相邻的位置处的来自光罩图案的光的强度分布，其中光学特性检测装置被设置为检测光学特性的变化量 根据由光检测装置检测的强度分布。

公开(公告)号：US4814829A

公开(公告)日：1989-03-21

申请号：US60398

申请日：1987-06-10

申请人： Masao Kosugi ,  Akiyoshi Suzuki ,  Hideki Ina ,  Kazuhito Outsuka ,  Shigeki Ogawa ,  Masao Totsuka ,  Fumio Sakai

发明人： Masao Kosugi ,  Akiyoshi Suzuki ,  Hideki Ina ,  Kazuhito Outsuka ,  Shigeki Ogawa ,  Masao Totsuka ,  Fumio Sakai

IPC分类号： G03F9/00 ,  G03B27/52 ,  G03B27/70

CPC分类号： G03F9/7069 ,  G03F9/7023

摘要： A projection exposure apparatus for projecting a pattern of a reticle upon a wafer by use of a projection lens system, is disclosed. The apparatus is arranged so that a mark illuminating light is projected upon the wafer from between the projection lens system and the wafer and not by way of the projection lens system. The light diffracted by an edge of a wafer alignment mark is photoelectrically detected by way of the projection lens system, whereby an electrical signal corresponding to an image of the alignment mark is obtained. On the basis of the detected signal, the wafer is aligned with the reticle. This arrangement allows detection of the alignment mark without being affected by a photoresist applied to the wafer surface. Thus, the reticle-to-wafer alignment can be made accurately. Also, a novel and unique alignment method is disclosed. The disclosed method assures high-accuracy reticle-to-wafer alignment.

摘要翻译： 公开了一种用于通过使用投影透镜系统将掩模版图案投影到晶片上的投影曝光装置。 该装置被布置成使得标记照明光从投影透镜系统和晶片之间而不是通过投影透镜系统投射到晶片上。 通过投影透镜系统对由晶片对准标记的边缘衍射的光进行光电检测，从而获得与对准标记的图像对应的电信号。 基于检测到的信号，晶片与掩模版对准。 这种布置允许检测对准标记而不受施加到晶片表面的光致抗蚀剂的影响。 因此，可以准确地进行标线片到晶片对准。 此外，公开了一种新颖且独特的对准方法。 所公开的方法确保了高精度的光罩对晶片对准。