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    Projection exposure apparatus
    2.
    发明授权
    Projection exposure apparatus 失效
    投影曝光装置

    公开(公告)号：US4814829A

    公开(公告)日：1989-03-21

    申请号：US60398

    申请日：1987-06-10

    申请人： Masao Kosugi ,  Akiyoshi Suzuki ,  Hideki Ina ,  Kazuhito Outsuka ,  Shigeki Ogawa ,  Masao Totsuka ,  Fumio Sakai

    发明人： Masao Kosugi ,  Akiyoshi Suzuki ,  Hideki Ina ,  Kazuhito Outsuka ,  Shigeki Ogawa ,  Masao Totsuka ,  Fumio Sakai

    IPC分类号： G03F9/00 ,  G03B27/52 ,  G03B27/70

    CPC分类号： G03F9/7069 ,  G03F9/7023

    摘要： A projection exposure apparatus for projecting a pattern of a reticle upon a wafer by use of a projection lens system, is disclosed. The apparatus is arranged so that a mark illuminating light is projected upon the wafer from between the projection lens system and the wafer and not by way of the projection lens system. The light diffracted by an edge of a wafer alignment mark is photoelectrically detected by way of the projection lens system, whereby an electrical signal corresponding to an image of the alignment mark is obtained. On the basis of the detected signal, the wafer is aligned with the reticle. This arrangement allows detection of the alignment mark without being affected by a photoresist applied to the wafer surface. Thus, the reticle-to-wafer alignment can be made accurately. Also, a novel and unique alignment method is disclosed. The disclosed method assures high-accuracy reticle-to-wafer alignment.

    摘要翻译： 公开了一种用于通过使用投影透镜系统将掩模版图案投影到晶片上的投影曝光装置。 该装置被布置成使得标记照明光从投影透镜系统和晶片之间而不是通过投影透镜系统投射到晶片上。 通过投影透镜系统对由晶片对准标记的边缘衍射的光进行光电检测，从而获得与对准标记的图像对应的电信号。 基于检测到的信号，晶片与掩模版对准。 这种布置允许检测对准标记而不受施加到晶片表面的光致抗蚀剂的影响。 因此，可以准确地进行标线片到晶片对准。 此外，公开了一种新颖且独特的对准方法。 所公开的方法确保了高精度的光罩对晶片对准。

    Imprint apparatus, imprint method, and method for producing device
    3.
    发明授权
    Imprint apparatus, imprint method, and method for producing device 有权
    印刷装置，印刷方法及其制造方法

    公开(公告)号：US09387607B2

    公开(公告)日：2016-07-12

    申请号：US13451925

    申请日：2012-04-20

    申请人： Hideki Matsumoto ,  Fumio Sakai

    发明人： Hideki Matsumoto ,  Fumio Sakai

    IPC分类号： G03F7/00 ,  B29C37/00 ,  B29C43/02 ,  B29C43/56 ,  B29C59/02 ,  B29L31/00

    CPC分类号： B29C37/0003 ,  B29C43/021 ,  B29C43/56 ,  B29C59/02 ,  B29C59/026 ,  B29C2059/023 ,  B29L2031/757 ,  G03F7/0002

    摘要： An imprint apparatus for transferring a pattern to an imprint material using a mold includes a substrate holding mechanism and a control unit. The substrate holding mechanism is configured to be divided into a plurality of areas, capable of varying an attracting force for attracting the substrate in each of the areas and to hold the substrate. The control unit is configured to, when a plurality of shots is formed on the substrate, control an imprint operation of transferring the pattern to the plurality of shots which are not adjacent to one another, makes the attracting force in the area of the substrate holding mechanism corresponding to the shot to which the pattern is transferred among the plurality of areas smaller than the attracting force at the time of the imprint operation and suck the substrate.

    摘要翻译： 使用模具将图案转印到压印材料的压印装置包括基板保持机构和控制单元。 基板保持机构被构造成被分成多个区域，能够改变吸引每个区域中的基板的吸引力并保持基板。 控制单元被配置为当在基板上形成多个拍摄时，控制将图案转印到彼此不相邻的多个拍摄中的印记操作，使得在基板保持的区域中的吸引力 对应于在压印操作时小于吸引力的多个区域中的图案转印的图像的机构，并吸附基板。

    Novel 2-pyridinecarboxamide derivatives
    4.
    发明申请
    Novel 2-pyridinecarboxamide derivatives 有权
    新型2-吡啶甲酰胺衍生物

    公开(公告)号：US20060258701A1

    公开(公告)日：2006-11-16

    申请号：US10545424

    申请日：2004-02-13

    申请人： Morihiro Mitsuya ,  Makoto Bamba ,  Fumio Sakai ,  Hitomi Watanabe ,  Yasuhiro Sasaki ,  Teruyuki Nishimura ,  Jun-ichi Eiki

    发明人： Morihiro Mitsuya ,  Makoto Bamba ,  Fumio Sakai ,  Hitomi Watanabe ,  Yasuhiro Sasaki ,  Teruyuki Nishimura ,  Jun-ichi Eiki

    IPC分类号： A61K31/4745 ,  A61K31/444 ,  A61K31/4439 ,  C07D498/02 ,  C07D417/14

    CPC分类号： C07D471/04 ,  C07D417/14

    摘要： The present invention relates to a compound which has a glucokinase-activating effect and is useful as a therapeutic agent for diabetes mellitus, being represented by a formula (I): [wherein X1 represents a nitrogen atom, sulfur atom, oxygen atom or the like; R1 represents a 6- to 10-membered aryl group, 5- to 7-membered heteroaryl group or the like; D represents an oxygen atom or sulfur atom; R and R3 are the same or different, each representing a hydrogen atom, lower alkyl group or the like; a formula (II) represents an optionally substituted 5- to 7-membered heteroaryl group or the like; a formula (III) represents a monocyclic or bicyclic heteroaryl group] or a pharmaceutically acceptable salt thereof.

    摘要翻译： 本发明涉及具有葡糖激酶活化作用并可用作糖尿病治疗剂的化合物，其由式（I）表示：其中X 1表示氮原子， 硫原子，氧原子等; R 1表示6至10元芳基，5至7元杂芳基等; D表示氧原子或硫原子; R和R 3相同或不同，各自表示氢原子，低级烷基等; 式（II）表示任选取代的5〜7元杂芳基等; 式（III）表示单环或双环杂芳基]或其药学上可接受的盐。

    Producing acrolein and acrylic acid using a supported dual activity molybdenum, iron, and bismuth based catalyst in a fixed bed multitubular reactor
    6.
    发明授权
    Producing acrolein and acrylic acid using a supported dual activity molybdenum, iron, and bismuth based catalyst in a fixed bed multitubular reactor 失效
    在固定床多管反应器中使用支撑的双活性钼，铁和铋基催化剂生产丙烯醛和丙烯酸

    公开(公告)号：US6028220A

    公开(公告)日：2000-02-22

    申请号：US117461

    申请日：1998-07-28

    申请人： Koichi Wada ,  Yoshimasa Seo ,  Akira Iwamoto ,  Atsushi Sudo ,  Fumio Sakai ,  Kazuo Shiraishi ,  Hiroyoshi Nowatari

    发明人： Koichi Wada ,  Yoshimasa Seo ,  Akira Iwamoto ,  Atsushi Sudo ,  Fumio Sakai ,  Kazuo Shiraishi ,  Hiroyoshi Nowatari

    IPC分类号： B01J23/88 ,  B01J8/06 ,  B01J23/31 ,  B01J23/887 ,  C07B61/00 ,  C07C27/14 ,  C07C45/35 ,  C07C47/22 ,  C07C51/25 ,  C07C57/05 ,  C07C205/00 ,  C07C51/16

    CPC分类号： C07C45/35 ,  B01J23/002 ,  B01J23/31 ,  B01J23/8876 ,  B01J8/06 ,  C07C51/252 ,  B01J2208/025 ,  B01J2523/00

    摘要： The present invention concerns a method for producing acrolein and acrylic acid by carrying out vapor phase catalytic oxidation of propylene with molecular oxygen or a gas containing molecular oxygen using a oxidation catalysts comprising Mo, Bi and Fe as an essentially element and a fixed bed multitubular reactor, which comprisesa) using a plurality of supported catalysts having different activities, which was obtained, for example, by different calcination method in the production process of the supported catalysts,b) setting a catalyst layer in a reaction tube, which is formed by dividing it into plural portions in the tube axial direction, andc) arranging the aforementioned plural supported catalysts in such order that the activity becomes high toward the outlet from the inlet of the material gas in the reaction tube axial direction.According to the present invention, the generation of hot spot can be avoided and over oxidation reaction can be avoided and the acrolein and acrylic acid are produced constantly for a prolonged period of time.

    摘要翻译： PCT No.PCT / JP97 / 04402 Sec。 371日期：1998年7月28日 102（e）日期1998年7月28日PCT 1997年12月2日PCT PCT。 第WO98 / 24746号公报 日期1998年6月11日本发明涉及通过使用包含Mo，Bi和Fe作为基本元素的氧化催化剂，通过用分子氧或含有分子氧的气体进行丙烯的气相催化氧化来生产丙烯醛和丙烯酸的方法， 一种固定床多管反应器，其包括a）使用多种活性不同的负载催化剂，其通过例如在负载型催化剂的制备方法中通过不同的煅烧方法获得，b）将催化剂层设置在反应管 通过在管轴方向上分成多个部分而形成，以及c）按照反应管轴向从原料气体的入口出口的活性变高的顺序排列上述多个负载型催化剂。 根据本发明，可以避免产生热点，可以避免过度氧化反应，并且持续长时间地生产丙烯醛和丙烯酸。

    Exposure apparatus and method wherein alignment is carried out by comparing marks which are incident on both reticle stage and wafer stage reference plates
    9.
    发明授权
    Exposure apparatus and method wherein alignment is carried out by comparing marks which are incident on both reticle stage and wafer stage reference plates 失效
    曝光装置和方法，其中通过比较入射在标线片台和晶片台参考板上的标记进行对准

    公开(公告)号：US5751404A

    公开(公告)日：1998-05-12

    申请号：US684100

    申请日：1996-07-22

    申请人： Eiichi Murakami ,  Fumio Sakai ,  Shigeyuki Uzawa ,  Shigeki Ogawa ,  Tetsuya Mori

    发明人： Eiichi Murakami ,  Fumio Sakai ,  Shigeyuki Uzawa ,  Shigeki Ogawa ,  Tetsuya Mori

    IPC分类号： G03F7/20 ,  G03F9/00 ,  G03B27/42 ,  G02B11/00 ,  G03B27/32 ,  G03B27/52

    CPC分类号： G03F7/70691 ,  G03F7/70358 ,  G03F9/7015

    摘要： A scanning exposure apparatus includes a first movable stage being movable while carrying a first object thereon, a second movable stage being movable while carrying a second object thereon, a projection optical system for projecting a pattern, a control system serviceable to scan the first and second movable stages in a timed relation and relative to the projection optical system and to project a pattern of the first object onto the second object through the projection optical system, a first reference plate fixedly mounted on the first movable stage, a second reference plate fixedly mounted on the second movable stage, and a detecting system serviceable to scan at least one of the first and second movable stages to detect a relative positional relationship between alignment marks of the first and second reference plates to thereby determine a scan direction of one of the first and second movable stages.

    摘要翻译： 一种扫描曝光装置，包括：可移动的第一可移动台，其上携带有第一物体;可移动的第二可移动台，其上携带有第二物体;投影光学系统，用于投影图案;可控制的扫描第一和第二物体的控制系统 以相对于投影光学系统的定时关系的可移动台阶，并且通过投影光学系统将第一物体的图案投射到第二物体上，固定地安装在第一可移动台上的第一参考板，固定地安装在第二参考板上的第二参考板 在第二可移动台上，以及检测系统，其能够扫描第一和第二可移动台中的至少一个，以检测第一和第二参考板的对准标记之间的相对位置关系，从而确定第一和第二可移动台之一的扫描方向 和第二可动台。

    Alignment method and a projection exposure apparatus using the same
    10.
    发明授权
    Alignment method and a projection exposure apparatus using the same 失效
    对准方法和使用其的投影曝光装置

    公开(公告)号：US4952060A

    公开(公告)日：1990-08-28

    申请号：US463886

    申请日：1990-01-10

    申请人： Hideki Ina ,  Fumio Sakai ,  Hitoshi Nakano

    发明人： Hideki Ina ,  Fumio Sakai ,  Hitoshi Nakano

    IPC分类号： H01L21/30 ,  G03F9/00 ,  H01L21/027 ,  H01L21/67 ,  H01L21/68

    CPC分类号： G03F9/7084

    摘要： A projection exposure apparatus is disclosed for exposing a semiconductor wafer to a pattern, formed on a reticle, by projection using a projection lens system. The apparatus includes an alignment optical system disposed at a side of the wafer remote from the projection lens system. The alignment optical system is used to detect an alignment mark provided on the wafer, from the back of the wafer. In accordance with the detection, the wafer is moved so that its alignment mark is brought into a predetermined positional relation with the alignment optical system, whereby the reticle and the wafer are relatively aligned. With this arrangement, the wafer alignment mark can be detected without being adversely affected by a resist layer applied to the wafer surface. Thus, the reticle and the wafer can be aligned very accurately.

    摘要翻译： 公开了一种投影曝光装置，用于通过使用投影透镜系统的投影将半导体晶片暴露于形成在掩模版上的图案。 该装置包括配置在远离投影透镜系统的晶片侧的对准光学系统。 对准光学系统用于从晶片的背面检测设置在晶片上的对准标记。 根据检测，移动晶片使其对准标记与取向光学系统成预定的位置关系，由此标线片和晶片相对对准。 利用这种布置，可以检测晶片对准标记，而不受施加到晶片表面的抗蚀剂层的不利影响。 因此，可以非常准确地对准标线片和晶片。