摘要:
When a method for increasing density by providing a tracking guide such as a land/groove and introducing a plurality of strings of super-resolution pits into one track thereof is applied to a reproduction-dedicated optical disk, there are problems in that the production cost is increased, the structure is complicated, and the space which can be used for a recording pits is narrowed because of the land/groove structure.In the invention, a concept of group tracking is applied. One track is formed by a plurality of pit strings having a size not greater than the optical resolution limit in the radial direction and a size not less than or not greater than the optical resolution limit or only not greater than the optical resolution limit in the tangential direction. Reproduction of the super-resolution pit itself is performed by using a non-linear phenomenon generated locally, but, in tracking, a plurality of strings of pits are considered to be one track, and detection of the movement of a laser light for read out is realized by the method used for an existing optical disk by using a reflected light or a transmitted light from the optical disk.
摘要:
An etching resist containing a metallic oxynitride. The etching resist of the present invention can be suitably used, for example, in the production of a molded article for surface-working an optical member such as a microlens sheet, a light diffusing sheet, a non-reflective sheet, a sheet for encapsulating photosemiconductor elements, an optical waveguide, an optical disk, or a photosensor.
摘要:
An etching resist has a first heat-generating layer, a second heat-generating layer, and a metal compound layer including a metallic oxynitride layer containing a metallic oxynitride. The first heat-generating layer, the metallic oxynitride layer, and the second heat-generating layer are directly or indirectly laminated such that the metallic oxynitride layer is positioned between the first heat-generating layer and the second heat-generating layer.
摘要:
The invention performs super resolution reproduction with a recording layer and a signal reproducing functional layer laminated on a grooved substrate. A length of a mark recorded in a Mark Position method is only one length that is less than the resolution limit in an optical system to be used, and recording marks are formed both on a land and in a groove of the grooved substrate.
摘要:
A process for producing through simple operations a molding die for optical device having an antireflective structure of nano-order microscopic uneven plane on a substratum surface. The molding die for optical device having microscopic uneven plane (antireflective structure die plane) on a surface of substratum is produced by a process comprising forming one or more etching transfer layers on substratum; forming thin film for formation of semispherical microparticles on the etching transfer layers; causing the thin film to undergo aggregation, or decomposition, or nucleation of the material by the use of any of thermal reaction, photoreaction and gas reaction or a combination of these reactions so as to form multiple semispherical islandlike microparticles; and using the multiple islandlike microparticles as a protective mask, carrying out sequential etching of the etching transfer layers and substratum by reactive gas to thereby form a conical pattern on the microscopic surface of the substratum.
摘要:
A process for producing through simple operations a molding die for optical device having an antireflective structure of nano-order microscopic uneven plane on a substratum surface. The molding die for optical device having microscopic uneven plane (antireflective structure die plane) on a surface of substratum is produced by a process comprising forming one or more etching transfer layers on substratum; forming thin film for formation of semisperical microparticles on the etching transfer layers; causing the thin film to undergo aggregation, or decomposition, or nucleation of the material by the use of any of thermal reaction, photoreaction and gas reaction or a combination of these reactions so as to form multiple semispherical islandlike microparticles; and using the multiple island like microparticles as a protective mask, carrying out sequential etching of the etching transfer layers and substratum by reactive gas to thereby form a conical pattern on the microscopic surface of the substratum.
摘要:
A process for producing through simple operations a molding die for optical device having an antireflective structure of nano-order microscopic uneven plane on a substratum surface. The molding die for optical device having microscopic uneven plane (antireflective structure die plane) on a surface of substratum is produced by a process comprising forming one or more etching transfer layers on substratum; forming thin film for formation of semispherical microparticles on the etching transfer layers; causing the thin film to undergo aggregation, or decomposition, or nucleation of the material by the use of any of thermal reaction, photoreaction and gas reaction or a combination of these reactions so as to form multiple semispherical island-like microparticles; and using the multiple islandlike microparticles as a protective mask, carrying out sequential etching of the etching transfer layers and substratum by reactive gas to thereby form a conical pattern on the microscopic surface of the substratum.
摘要:
According to the present invention, whether recoding pits are larger or smaller than diffraction limit is determined. Then, a signal process suitable for processing of the recording pits larger than the diffraction limit and a signal process suitable for processing of the recording pits smaller than diffraction limit are divided to divisionally perform equalizer processing. The respective signals subjected to the divisional processing are synthesized to obtain a processed output signal. A reproduction signal with reduced impact of intersymbol interference is thus obtained.
摘要:
According to the present invention, whether recoding pits are larger or smaller than diffraction limit is determined. Then, a signal process suitable for processing of the recording pits larger than the diffraction limit and a signal process suitable for processing of the recording pits smaller than diffraction limit are divided to divisionally perform equalizer processing. The respective signals subjected to the divisional processing are synthesized to obtain a processed output signal. A reproduction signal with reduced impact of intersymbol interference is thus obtained.
摘要:
There are included a sensor 310 which outputs pulse signals corresponding to the traveling distances of a vehicle, a vehicle display device 100 which displays, based on the pulse signals, vehicle information including the traveling distance, and a navigation unit 200 which receives the distance data related to the traveling distances, obtained by processing the pulse signals, being outputted from the vehicle display device 100 or the pulse signals at a certain reception period to calculate the present position of the vehicle, and controls the vehicle display device 100 to display road traffic information including the display synthesized with the present position on a map in accordance with map data read from a map information memory medium 230. If the navigation unit 200 can not receive the distance data or the pulse signals within the reception period, an estimated value of a value to be received this time is obtained from the difference between a value inputted last time and a value inputted last time but one and the navigation unit 200 calculates the present position in accordance with the estimated value.