摘要:
An electromechanical transducer includes a first electrode; a silicon oxide film disposed on the first electrode; and a vibration film including a silicon nitride film disposed on the silicon oxide film with a space therebetween and a second electrode disposed on the silicon nitride film so as to oppose the first electrode.
摘要:
An electromechanical transducer includes a substrate, a first electrode disposed on the substrate, and a vibration film including a membrane disposed on the first electrode with a space therebetween and a second electrode disposed on the membrane so as to oppose the first electrode. The first electrode has a surface roughness value of 6 nm RMS or less.
摘要:
An electromechanical transducer includes a first electrode; a silicon oxide film disposed on the first electrode; and a vibration film including a silicon nitride film disposed on the silicon oxide film with a space therebetween and a second electrode disposed on the silicon nitride film so as to oppose the first electrode.
摘要:
An electromechanical transducer includes a substrate, a first electrode disposed on the substrate, and a vibration film including a membrane disposed on the first electrode with a space therebetween and a second electrode disposed on the membrane so as to oppose the first electrode. The first electrode has a surface roughness value of 6 nm RMS or less.
摘要:
A method of producing an electromechanical transducer includes forming an insulating film on a first electrode, forming a sacrificial layer on the insulating film, forming a first membrane on the sacrificial layer, forming a second electrode on the first membrane, forming an etching-hole in the first membrane and removing the sacrificial layer through the etching-hole, and forming a second membrane on the second electrode, and sealing the etching-hole. Forming the second membrane and sealing the etching-hole are performed in one operation.
摘要:
A swing member device comprises a swingable part supported by a supporting part to be swingable around a torsional axis on a supporting base in at least one intrinsic oscillation mode: the swing member device having a temperature-raising unit for raising the temperature of ambient atmosphere in the region of swing motion of the swingable part, the temperature-raising unit raising the temperature of the ambient atmosphere to enable decrease of an influence of an unsteady dragging force caused by the ambient atmosphere.
摘要:
A method of manufacturing an oscillator based on etching a monocrystal silicon substrate, the method including a mask forming step for forming, on the monocrystal silicon substrate, an etching mask having a pattern with a repetition shape comprised of a plurality of mutually coupled oscillators each including a torsion spring between a supporting base plate and a movable member, an etching step for etching the monocrystal silicon substrate while using the etching mask as a mask, to form on the monocrystal silicon substrate a repetition shape comprised of a plurality of corresponding mutually coupled oscillators, and a dicing step for determining a width of the movable member and the supporting base plate of each of the oscillators in the repetition shape, which width is effective to determine a resonance frequency of the individual oscillators required when these are used as oscillators, and for cutting by dicing the movable member and the supporting base plate between adjoining oscillators, at the determined width.
摘要:
A swing member device comprises a swingable part supported by a supporting part to be swingable around a torsional axis on a supporting base in at least one intrinsic oscillation mode: the swing member device having a temperature-raising unit for raising the temperature of ambient atmosphere in the region of swing motion of the swingable part, the temperature-raising unit raising the temperature of the ambient atmosphere to enable decrease of an influence of an unsteady dragging force caused by the ambient atmosphere.
摘要:
A method of manufacturing an oscillator device having an oscillator supported relative to a fixed member by a torsion spring for oscillation around a torsion axis and arranged to be driven at a resonance frequency, which method includes a first step for determining an assumed value of an inertia moment weight of the oscillator, a second step for measuring the resonance frequency, a third step for calculating a spring constant of the torsion spring, from the assumed value of the inertia moment weight and the measured resonance frequency obtained at said first and second steps, a fourth step for calculating an adjustment amount for the inertia moment of the oscillator or for the spring constant of the torsion spring, based on the spring constant calculated at said third step and a target resonance frequency determined with respect to the resonance frequency of the oscillator, so as to adjust the resonance frequency to the target resonance frequency, and a fifth step for adjusting the resonance frequency of the oscillator to the target resonance frequency based on the calculated adjustment amount.
摘要:
A method of manufacturing an oscillator based on etching a monocrystal silicon substrate, the method including a mask forming step for forming, on the monocrystal silicon substrate, an etching mask having a pattern with a repetition shape comprised of a plurality of mutually coupled oscillators each including a torsion spring between a supporting base plate and a movable member, an etching step for etching the monocrystal silicon substrate while using the etching mask as a mask, to form on the monocrystal silicon substrate a repetition shape comprised of a plurality of corresponding mutually coupled oscillators, and a dicing step for determining a width of the movable member and the supporting base plate of each of the oscillators in the repetition shape, which width is effective to determine a resonance frequency of the individual oscillators required when these are used as oscillators, and for cutting by dicing the movable member and the supporting base plate between adjoining oscillators, at the determined width.