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    PROCESS CONTROL APPARATUS
    2.
    发明申请
    PROCESS CONTROL APPARATUS 有权
    过程控制装置

    公开(公告)号：US20080200996A1

    公开(公告)日：2008-08-21

    申请号：US12031185

    申请日：2008-02-14

    申请人： Hiroyuki Miyamoto ,  Takashi Sasaki

    发明人： Hiroyuki Miyamoto ,  Takashi Sasaki

    IPC分类号： G05B19/18

    CPC分类号： G05B13/045

    摘要： A process control apparatus for controlling a control target includes, but is not limited to, first and second control units. The first control unit is designed in a design environment unspecifying any period of disturbance. The first control unit performs a feedback control to the control target by using a setting value of the control target and a measured value of the control target. The first control unit is included in a feedback loop. The second control unit is also included in the feedback loop. The second control unit is designed by using an internal model principle. The second control unit rejects the disturbance, which is applied to the feedback loop, by using the measured value of the control target.

    摘要翻译： 用于控制控制目标的过程控制装置包括但不限于第一和第二控制单元。 第一个控制单元设计在设计环境中，不指定任何干扰周期。 第一控制单元通过使用控制对象的设定值和控制对象的测定值对控制对象进行反馈控制。 第一个控制单元包含在反馈回路中。 第二控制单元也包括在反馈回路中。 第二个控制单元是通过使用内部模型原理设计的。 第二控制单元通过使用控制目标的测量值来拒绝施加到反馈回路的扰动。

    Method for enabling extension points through plug-ins
    4.
    发明申请
    Method for enabling extension points through plug-ins 审中-公开
    通过插件启用扩展点的方法

    公开(公告)号：US20070156913A1

    公开(公告)日：2007-07-05

    申请号：US11322670

    申请日：2005-12-30

    申请人： Hiroyuki Miyamoto ,  Sami Shalabi

    发明人： Hiroyuki Miyamoto ,  Sami Shalabi

    IPC分类号： G06F15/16

    CPC分类号： G06F9/44526 ,  G06F9/44505

    摘要： Methods and software are described which provide the ability to use plug-ins to extend functionality for J2EE applications. The methods involve use of an application deployment package including a plug-in manifest file containing plug-in meta-data, a unique identifier for the plug-in and interconnection data representing interconnections to other plug-in packages. An extension registry service uses the plug-in package to provide extensibility to the application by locating plug-ins and determining the interconnections between them based on the interconnection data. The extension registry service collects plug-in packages dynamically as J2EE modules are loaded by the J2EE platform and maintains the unique identifiers for all extension point(s) and extension(s) defined in the plug-in packages. The extension registry is used to find the associated extensions when the application executes an extension point. Identified extensions can then be invoked by extension point code.

    摘要翻译： 描述了提供使用插件扩展J2EE应用程序功能的方法和软件。 该方法涉及使用包括包含插件元数据的插件清单文件，插件的唯一标识符和表示与其他插件包的互连的互连数据的应用程序部署包。 扩展注册表服务使用插件包通过定位插件并根据互连数据确定它们之间的互连来为应用程序提供可扩展性。 扩展注册表服务由J2EE平台加载的J2EE模块动态收集插件包，并维护插件包中定义的所有扩展点和扩展名的唯一标识符。 当应用程序执行扩展点时，扩展注册表用于查找关联的扩展。 标识的扩展可以由扩展点代码调用。

    Method for fabricating a thin film magnetic head
    6.
    发明授权
    Method for fabricating a thin film magnetic head 失效
    薄膜磁头制造方法

    公开(公告)号：US07175972B2

    公开(公告)日：2007-02-13

    申请号：US10844400

    申请日：2004-05-13

    申请人： Kenji Takeo ,  Hiroyuki Miyamoto

    发明人： Kenji Takeo ,  Hiroyuki Miyamoto

    IPC分类号： G03F7/26

    CPC分类号： G11B5/6005

    摘要： A plating underlayer is formed on an insulating film. An anti-reflection film is formed on the plating underlayer. A photoresist is formed over the antireflection film 62. The photoresist and the antireflection film are exposed and developed to form a resistframe made thereof. A second magnetic layer is formed within an inner pattern enclosed by the resistframe. The anti-reflection film is made of a material soluble for a developer through exposure.

    摘要翻译： 在绝缘膜上形成电镀底层。 在镀层底层上形成防反射膜。 在抗反射膜62上形成光致抗蚀剂。光致抗蚀剂和抗反射膜被曝光和显影以形成由其制成的抗蚀剂框架。 在由抗蚀剂框包围的内部图案中形成第二磁性层。 防反射膜由通过曝光可溶于显影剂的材料制成。

    Process liquid supply mechanism and process liquid supply method
    7.
    发明授权
    Process liquid supply mechanism and process liquid supply method 有权
    工艺液体供给机构和工艺液体供应方式

    公开(公告)号：US06848625B2

    公开(公告)日：2005-02-01

    申请号：US10388357

    申请日：2003-03-14

    申请人： Takashi Takekuma ,  Toshinobu Furusho ,  Takeshi Ohto ,  Hiroyuki Miyamoto ,  Kousuke Yoshihara ,  Shinya Hori ,  Hiroyuki Hara

    发明人： Takashi Takekuma ,  Toshinobu Furusho ,  Takeshi Ohto ,  Hiroyuki Miyamoto ,  Kousuke Yoshihara ,  Shinya Hori ,  Hiroyuki Hara

    IPC分类号： H01L21/00 ,  B05B17/00

    CPC分类号： H01L21/67253 ,  H01L21/6715

    摘要： A process liquid supply mechanism for supplying a process liquid comprises a process liquid supply source for supplying a process liquid, a process liquid discharging nozzle for discharging the process liquid, a pipe connecting the process liquid supply source to the process liquid discharging nozzle, a pump mounted to the pipe for allowing the process liquid to be discharged from the process liquid discharging nozzle, a pressure sensor for detecting the pressure of the process liquid at a prescribed position intermediate between the pump and the process liquid discharging nozzle, and a controller for controlling the inner pressure of the pump based on the pressure value detected by the pressure sensor and the relationship obtained in advance between the pressure and the discharging rate of the process liquid such that the process liquid is discharged at a prescribed discharging rate.

    摘要翻译： 一种用于提供处理液的处理液供给机构包括：用于供给处理液的处理液供给源，用于排出处理液的处理液排出喷嘴，将处理液供给源与处理液排出喷嘴连接的管，泵 安装到管道上以允许处理液体从处理液体排放喷嘴排出;压力传感器，用于检测在泵和处理液体排放喷嘴之间的预定位置处的处理液体的压力;以及控制器，用于控制 基于由压力传感器检测到的压力值的泵的内部压力以及预处理液体的压力和排出速率之间获得的关系，使得处理液体以规定的排出速率排出。

    Cathode and process for producing the same
    8.
    发明授权
    Cathode and process for producing the same 失效

    公开(公告)号：US06559582B2

    公开(公告)日：2003-05-06

    申请号：US09971226

    申请日：2001-10-03

    申请人： Hiroyuki Miyamoto ,  Misao Iseki ,  Manabu Arai ,  Hideaki Tamai ,  Chikao Kimura

    发明人： Hiroyuki Miyamoto ,  Misao Iseki ,  Manabu Arai ,  Hideaki Tamai ,  Chikao Kimura

    IPC分类号： H01J114

    CPC分类号： H01J1/144

    摘要： There is provided a cathode which is easily operable, harmless, and stable at high temperature at least 1,400° C. as well as excellent in electron emission characteristics at the same time, and the process for preparing the same. The cathode of the present invention comprises a polycrystalline substance or a polycrystalline porous substance of high-melting point metal material and an emitter material dispersed into said polycrystalline substance or polycrystalline porous substance in an amount of 0.1 to 30% by weight in the cathode, wherein the emitter material comprises at least one selected from the group consisting of hafnium oxide, zirconium oxide, lanthanum oxide, cerium oxide and titanium oxide.

    Hydrogen storage alloy powder and an electrode comprising the same
    9.
    发明授权
    Hydrogen storage alloy powder and an electrode comprising the same 失效
    储氢合金粉末和包含该储氢合金粉末的电极

    公开(公告)号：US5968225A

    公开(公告)日：1999-10-19

    申请号：US972249

    申请日：1997-11-18

    申请人： Masatoshi Ishii ,  Hiroyuki Miyamoto ,  Genji Noguki ,  Hajime Kitamura

    发明人： Masatoshi Ishii ,  Hiroyuki Miyamoto ,  Genji Noguki ,  Hajime Kitamura

    IPC分类号： H01M4/38

    CPC分类号： H01M4/383 ,  Y10S420/90

    摘要： A powder of a hydrogen storage alloy which comprises metallic nickel in or on the surfaces of the powder in an amount sufficient to impart a magnetization intensity of 0.5 to 6 emu/g to the powder. The powder has a specific surface area of 0.15 to 0.7 m.sup.2 /g when determined according to a BET adsorption method, an oxygen concentration of 0.15 to 1.5 wt %, and an average particle size of 10 to 100 .mu.m, with a size distribution wherein the content of particles having a size of 8 .mu.m or below is in the range of 30 wt % or below. An electrode for secondary cells is also described, which comprises the powder defined above.

    摘要翻译： 一种储氢合金的粉末，其在粉末中或表面上含有足以使粉末具有0.5至6emu / g的磁化强度的金属镍。 当根据BET吸附法，氧浓度为0.15〜1.5重量％，平均粒径为10〜100μm，测定粉体的比表面积为0.15〜0.7m 2 / g，其尺寸分布为 尺寸为8μm或更小的颗粒的含量在30wt％或更低的范围内。 还描述了用于二次电池的电极，其包括上述定义的粉末。

    Method for designing a large scale integrated (LSI) layout
    10.
    发明授权
    Method for designing a large scale integrated (LSI) layout 失效
    大规模集成（LSI）布局设计方法

    公开(公告)号：US5694328A

    公开(公告)日：1997-12-02

    申请号：US631904

    申请日：1996-04-12

    申请人： Emi Hayashi ,  Hiroyuki Miyamoto ,  Yoshihiro Tabira

    发明人： Emi Hayashi ,  Hiroyuki Miyamoto ,  Yoshihiro Tabira

    IPC分类号： G06F17/50 ,  H01L27/02

    CPC分类号： H01L27/0207 ,  G06F17/5068

    摘要： A plurality of cells which have input terminals and output terminals on four sides are divided into a plurality of groups of cells. The plurality of cells are placed in an array form at positions which are either adjacent or nonadjacent. A plurality of groups of cells are placed one after another such that the resulting layout becomes substantially rectangular or square. Power buses are routed parallel to each other, and power supply lines are routed from the power buses to cells. Data lines are routed between the terminals of the cells.

    摘要翻译： 在四侧具有输入端子和输出端子的多个单元被分成多组单元。 多个单元格以与阵列形式相邻或不相邻的位置放置。 多个单元组被一个接一个放置，使得所得到的布局变成基本上矩形或正方形。 电源总线彼此并联连接，电源线从电源总线路由到单元。 数据线在单元的端子之间路由。