公开(公告)号：US08450030B2

公开(公告)日：2013-05-28

申请号：US13109655

申请日：2011-05-17

申请人： Kazuya Sakai ,  Masaru Tanabe

发明人： Kazuya Sakai ,  Masaru Tanabe

IPC分类号： G03F1/00 ,  G06K9/00

CPC分类号： G03F1/50 ,  G03F1/82

摘要： Provided is a thin film evaluation method for a transfer mask which is adapted to be applied with ArF excimer laser exposure light and comprises a thin film formed with a pattern on a transparent substrate. The method includes intermittently irradiating pulsed laser light onto the thin film to thereby evaluate the irradiation durability of the thin film.

公开(公告)号：US20130177841A1

公开(公告)日：2013-07-11

申请号：US13823206

申请日：2011-09-29

申请人： Kazuya Sakai ,  Masahiro Hashimoto ,  Takeyuki Yamada

发明人： Kazuya Sakai ,  Masahiro Hashimoto ,  Takeyuki Yamada

IPC分类号： G03F1/50

CPC分类号： G03F1/50 ,  G03F1/38

摘要： Provided is a mask blank that is improved in adhesion of a thin film for forming a transfer pattern to a resist, thus capable of suppressing the occurrence of collapse, chipping, or the like of a formed resist pattern. The mask blank has, on a transparent substrate 1, a thin film 2 which is for forming a transfer pattern and is made of a material containing a metal. The thin film 2 has a surface modified layer in the form of an oxide film containing a hydrocarbon. The surface modified layer of the thin film 2 can be formed by, for example, causing a highly concentrated ozone gas and an unsaturated hydrocarbon gas to act on the thin film.

摘要翻译： 提供了一种掩模坯料，其提高了用于将形成转印图案的薄膜粘合到抗蚀剂上，从而能够抑制所形成的抗蚀剂图案的崩溃，碎裂等的发生。 掩模坯料在透明基板1上具有用于形成转印图案并由含有金属的材料制成的薄膜2。 薄膜2具有含有烃的氧化膜形式的表面改性层。 薄膜2的表面改性层可以通过例如使高度浓缩的臭氧气体和不饱和烃气体作用于薄膜而形成。

公开(公告)号：US08221941B2

公开(公告)日：2012-07-17

申请号：US12647808

申请日：2009-12-28

申请人： Toshiyuki Suzuki ,  Masahiro Hashimoto ,  Kazunori Ono ,  Ryo Ohkubo ,  Kazuya Sakai

发明人： Toshiyuki Suzuki ,  Masahiro Hashimoto ,  Kazunori Ono ,  Ryo Ohkubo ,  Kazuya Sakai

IPC分类号： G03F1/22

CPC分类号： G03F1/32

摘要： A thin film made of a material containing a metal and silicon is formed on a light-transmissive substrate. Then, a treatment is performed to modify a main surface of the thin film in advance so that when exposure light having a wavelength of 200 nm or less is accumulatively irradiated on a thin film pattern of a photomask to be produced by patterning the thin film, the transfer characteristic of the thin film pattern does not change more than a predetermined degree. This treatment is performed by carrying out, for example, a heat treatment in an atmosphere containing oxygen at 450° C. to 900° C.

摘要翻译： 在透光性基板上形成由含有金属和硅的材料构成的薄膜。 然后，进行处理以预先修改薄膜的主表面，使得当将具有200nm或更小的波长的曝光光累积地照射到通过对薄膜进行图案化而制造的光掩模的薄膜图案上时， 薄膜图案的转印特性不会超过预定的程度。 该处理通过例如在450℃〜900℃的含氧气氛中进行热处理来进行。

公开(公告)号：US09091934B2

公开(公告)日：2015-07-28

申请号：US13995751

申请日：2011-12-22

申请人： Kazuya Sakai ,  Masahiro Hashimoto

发明人： Kazuya Sakai ,  Masahiro Hashimoto

IPC分类号： G03F1/50 ,  H01L21/3065 ,  G03F1/46 ,  H01L21/308 ,  H01L21/3213 ,  G03F1/82

CPC分类号： G03F1/50 ,  G03F1/46 ,  G03F1/82 ,  H01L21/3065 ,  H01L21/3081 ,  H01L21/3213 ,  H01L21/32136

摘要： Provided is a method of manufacturing a mask blank that is improved in cleaning resistance to ozone cleaning or the like, thus capable of preventing degradation of the mask performance due to the cleaning. The method is for manufacturing a mask blank having, on a substrate, a thin film which is formed at its surface with an antireflection layer made of a material containing a transition metal, and carries out a treatment of causing a highly concentrated ozone gas with a concentration of 50 to 100 vol % to act on the antireflection layer to thereby form a surface modified layer comprising a strong oxide film containing an oxide of the transition metal at a surface of the antireflection layer.

摘要翻译： 提供了一种制造掩模坯料的方法，该掩模坯料具有改进的耐臭氧清洁等的清洁性能，因此能够防止由于清洁而引起的掩模性能的劣化。 该方法用于制造掩模坯料，其在基板上具有在其表面形成有由含有过渡金属的材料制成的抗反射层的薄膜，并进行使高浓度的臭氧气体与 浓度为50〜100体积％，从而形成表面改性层，该表面改性层包含在抗反射层的表面含有过渡金属的氧化物的强氧化物膜。

公开(公告)号：US5602160A

公开(公告)日：1997-02-11

申请号：US423208

申请日：1995-04-17

申请人： Hideki Tanada ,  Kazuya Sakai ,  Seitaro Kajiya ,  Norio Ohto ,  Kazutoshi Horikomi ,  Akira Matsubara ,  Hideshi Shimizu ,  Akira Mizuchi

发明人： Hideki Tanada ,  Kazuya Sakai ,  Seitaro Kajiya ,  Norio Ohto ,  Kazutoshi Horikomi ,  Akira Matsubara ,  Hideshi Shimizu ,  Akira Mizuchi

IPC分类号： C07D261/08 ,  C07D261/10 ,  C07D261/20 ,  C07D275/02 ,  C07D275/04 ,  C07D413/04 ,  C07D413/06 ,  C07D417/06 ,  A61K31/38 ,  A61K31/42 ,  A61K31/425

CPC分类号： C07D261/10 ,  C07D261/08 ,  C07D261/20 ,  C07D275/02 ,  C07D275/04 ,  C07D413/04 ,  C07D413/06 ,  C07D417/06

摘要： Aminoketone derivative compounds containing a heterocyclic ring bonded to an aminoketone moiety and useful as effective ingredients of centrally acting muscle relaxants and pollakiurea curing agents.(+)3-phenyl-5-[2-(1-pyrrolidinylmethyl)butyryl] isoxazole, which has a more remarkable central muscle relaxant action as compared with its racemic modification, can be effectively separated from the racemic modification using optically active 10-camphorsulfonic acid as the agent for the optical resolution.

摘要翻译： 含有与氨基酮部分结合的杂环的氨基酮衍生物化合物，可用作中枢作用的肌肉松弛剂和藜芦素固化剂的有效成分。 （+）3-苯基-5- [2-（1-吡咯烷基甲基）丁酰基]异恶唑与其外消旋修饰相比具有更显着的中枢肌肉松弛作用，可以使用光学活性的10- 樟脑磺酸作为光学拆分剂。

公开(公告)号：US5194606A

公开(公告)日：1993-03-16

申请号：US734490

申请日：1991-07-23

申请人： Akira Matsubara ,  Kazuya Sakai ,  Hideki Tanada ,  Hironori Komatsu

发明人： Akira Matsubara ,  Kazuya Sakai ,  Hideki Tanada ,  Hironori Komatsu

IPC分类号： C07D261/08 ,  C07D261/20 ,  C07D275/02 ,  C07D275/04

CPC分类号： C07D275/02 ,  C07D261/08 ,  C07D261/20 ,  C07D275/04

摘要： Novel aminoketones useful as central muscle relaxants and their preparation processes are disclosed. The disclosed processes are novel processes which do not use any heavy metal in view of the facts that their products are will be used as drugs and which require no complex purification step such as liberation of the aminoketones from their hydrochlorides or the like.

摘要翻译： 公开了用作中枢肌肉松弛剂的新型氨基酮及其制备方法。 所公开的方法是鉴于其产物将被用作药物并且不需要复杂的纯化步骤如氨基酮从其盐酸盐等中解离的事实，不使用任何重金属的新方法。

公开(公告)号：US20110217635A1

公开(公告)日：2011-09-08

申请号：US13122680

申请日：2010-10-08

申请人： Masahiro Hashimoto ,  Kazuya Sakai ,  Toshiyuki Suzuki ,  Kazunori Ono

发明人： Masahiro Hashimoto ,  Kazuya Sakai ,  Toshiyuki Suzuki ,  Kazunori Ono

IPC分类号： G03F1/00

CPC分类号： G03F1/46 ,  G03F1/54 ,  G03F1/80 ,  G03F1/82

摘要： The present invention is a method of manufacturing a transfer mask with use of a mask blank in which a thin film for pattern formation and a chromium-based thin film made of a material containing chromium are stacked on a transparent substrate in this order. The thin film for pattern formation is made of material containing silicon and a transition metal other than chromium. The chromium-based thin film is made of a material containing chromium. Exposure light having a wavelength of 200 nm or less is applied to the transfer mask. In the manufacturing method, the transfer mask is produced by performing, in the following order, a process of forming a resist film having a transfer pattern on the chromium-based thin film, a process of forming a transfer pattern in the chromium-based thin film with use of a mask of the resist film having the transfer pattern, a process of forming a transfer pattern in the thin film for pattern formation with use of a mask of the chromium-based thin film having the transfer pattern, and a process of removing the chromium-based thin film by etching. The manufacturing method further includes a cleaning process of at least one of alkali solution cleaning, hot water cleaning, and ozone-containing water cleaning on the produced transfer mask until a width of the transfer pattern of the thin film for pattern formation is reduced by 4 nm or a space width of the thin film for pattern formation is increased by 4 nm.

摘要翻译： 本发明是一种使用掩模坯料制造转印掩模的方法，其中用于图案形成的薄膜和由含铬材料制成的铬基薄膜依次层叠在透明基板上。 用于图案形成的薄膜由含有硅和除铬以外的过渡金属的材料制成。 铬基薄膜由含铬的材料制成。 将具有200nm以下波长的曝光光施加到转印掩模。 在制造方法中，通过以下顺序，通过在铬系薄膜上形成具有转印图案的抗蚀剂膜的工序来制造转印掩模，在铬系薄膜中形成转印图案的工序 使用具有转印图案的抗蚀剂膜的掩模的膜，使用具有转印图案的铬基薄膜的掩模在图案形成用薄膜中形成转印图案的工序，以及 通过蚀刻去除铬基薄膜。 该制造方法还包括在制造的转印掩模上进行碱溶液清洗，热水清洗和含臭氧水清洗中的至少一种的清洗处理，直到图案形成用薄膜的转印图案的宽度减少4 nm或用于图案形成的薄膜的空间宽度增加4nm。

公开(公告)号：US07343810B2

公开(公告)日：2008-03-18

申请号：US11342535

申请日：2006-01-31

申请人： Kazushi Suzuki ,  Kazuya Sakai ,  Isamu Kandori

发明人： Kazushi Suzuki ,  Kazuya Sakai ,  Isamu Kandori

IPC分类号： G01L7/00

CPC分类号： G01L19/0645 ,  G01L19/146

摘要： A pressure sensor is composed of a pressure housing having a pressure chamber inside and a pressure sensitive element arranged in the pressure chamber, and a joint housing having a fluid passage for leading fluid into the pressure housing, wherein the pressure housing and the joint housing are jointed by brazing with an insulating member interposed at a joint section therebetween. A stress relieving member is interposed at least either between the metal housing and the insulating member or between the joint housing and the insulating member, so that the insulating member can be relieved of a stress which is caused by the braze jointing to act on the insulating member.

摘要翻译： 压力传感器由在内部具有压力室的压力壳体和布置在压力室中的压力敏感元件组成，以及具有用于将流体引入压力壳体的流体通道的接头壳体，其中压力壳体和接头壳体 通过钎焊与插入其间的接合部分处的绝缘构件接合。 应力消除部件至少插入在金属壳体和绝缘构件之间或者在接头壳体和绝缘构件之间，使得绝缘构件能够消除由钎焊接合作用于绝缘体上的应力 会员。

公开(公告)号：US20050249800A1

公开(公告)日：2005-11-10

申请号：US11181898

申请日：2005-07-15

申请人： Yumio Kudo ,  Hiroki Ueshima ,  Kazuya Sakai

发明人： Yumio Kudo ,  Hiroki Ueshima ,  Kazuya Sakai

IPC分类号： A61K9/48 ,  A61K9/56 ,  A61K9/70 ,  A61K9/14

CPC分类号： A61K9/4891 ,  A61K9/7007

摘要： A system whereby a substance which is orally taken and to be delivered into the lower digestive tract is selectively delivered into the lower digestive tract. More particularly, a system which makes it possible to surely and quickly deliver the aimed substance to the lower digestive tract without being affected by pH change in the digestive tract due to change in bacterial flora. Compositions disintegrating in the lower digestive tract characterized by containing a compound , which has a molecular weight of 1000 or less and has a disulfide bond, and a polymer , which has a molecular weight exceeding 1000 and is digested by enteric bacteria and/or undergoes softening, swelling or dissolution due to a decrease in pH; molded products with the use of these compositions; and preparations with the use of these molded products.

摘要翻译： 将口服并被输送到下消化道的物质选择性地输送到下消化道中的系统。 更具体地，涉及一种能够将目标物质可靠且快速地传递到下消化道而不受细菌菌群变化引起的消化道pH变化的影响的系统。 在下消化道中分解的组合物，其特征在于含有分子量为1000以下且具有二硫键的化合物和分子量超过1000的聚合物B，并被肠溶 细菌和/或由于pH降低而发生软化，溶胀或溶解; 使用这些组合物的成型产品; 以及使用这些模制产品的制备。

公开(公告)号：US06670447B2

公开(公告)日：2003-12-30

申请号：US10070156

申请日：2002-03-04

申请人： Hidetoshi Tsunoda ,  Michiru Sekiguchi ,  Hajime Iizuka ,  Kazuya Sakai

发明人： Hidetoshi Tsunoda ,  Michiru Sekiguchi ,  Hajime Iizuka ,  Kazuya Sakai

IPC分类号： C07K1600

CPC分类号： C07D263/44 ,  C07C231/10 ,  C07C237/22 ,  C07D231/12 ,  C07D233/56 ,  C07D249/08 ,  C07D295/185 ,  C07D413/06 ,  C07D413/14 ,  C07D417/06 ,  C07D417/14 ,  C07D471/04 ,  C07D487/08

摘要： This invention provides amino acid N-carboxyanhydrides, each of which has an N-acyl substituent on its nitrogen atom, is represented by the following formula (1): readily reacts with nucleophilic reagents such as free amino acids, alcohols, anions or the like, and are intermediates useful for the high-yield production of amino acid derivatives, optically active compounds, peptides, polypeptides and the like useful in many fields lead by the fields of pharmaceuticals and agrochemicals, and also provides a process for the production of the amino acid N-carboxyanhydrides. Further, the present invention also provides a process for the production of diamides, which uses the compounds of the formula (1) and amine derivatives represented by the following formula (7): These diamides can also be suitably used for the production of amino acid derivatives, optically active compounds, peptides, polypeptides and the like.

摘要翻译： 本发明提供氨基酸N-羧酸酐，其各自在其氮原子上具有N-酰基取代基，由下式（1）表示：容易与亲核试剂如游离氨基酸，醇，阴离子等反应 并且是用于高产量生产氨基酸衍生物，光学活性化合物，肽，多肽等的中间体，其在许多领域中可用于药物和农用化学品的领域，并且还提供了制备氨基酸的方法 酸性N-羧酸酐。 此外，本发明还提供了使用式（1）的化合物和由下式（7）表示的胺衍生物的二酰胺的制备方法：这些二酰胺也可以适合用于制备氨基酸 衍生物，光学活性化合物，肽，多肽等。