Exposure apparatus, device manufacturing method, semiconductor manufacturing factory, and exposure apparatus maintenance method
    1.
    发明授权
    Exposure apparatus, device manufacturing method, semiconductor manufacturing factory, and exposure apparatus maintenance method 有权
    曝光装置,装置制造方法,半导体制造工厂和曝光装置维护方法

    公开(公告)号:US06791670B2

    公开(公告)日:2004-09-14

    申请号:US10022506

    申请日:2001-12-20

    IPC分类号: G03B2742

    摘要: A linear motor apparatus includes a movable member having a magnet, and a coil wound about the magnet so as to generate a drive force for driving the movable member and having a multi-layer structure formed by winding a foil-like conductor and an insulating layer. The foil-like conductor (i) has a plurality of partial coils having identical current application/rotation directions, and the plurality of partial coils are formed in such a way that the foil-like conductor forms a continuous, seamless strip, and (ii) is continuously wound in a multilayered, aligned state to form the coil, and adjacent layers of the foil-like conductor are insulated by the insulating layer.

    摘要翻译: 线性电动机装置包括具有磁体的可动部件和缠绕在磁体上的线圈,以产生用于驱动可动部件的驱动力,并具有通过卷绕箔状导体和绝缘层而形成的多层结构 。 箔状导体(i)具有多个具有相同电流施加/旋转方向的部分线圈,并且多个部分线圈形成为使得箔状导体形成连续的无缝条带,并且(ii )以多层排列状态连续卷绕以形成线圈,并且箔状导体的相邻层被绝缘层绝缘。

    Linear motor and exposure apparatus using the same
    2.
    发明授权
    Linear motor and exposure apparatus using the same 失效
    线性电机和使用其的曝光装置

    公开(公告)号:US06836031B2

    公开(公告)日:2004-12-28

    申请号:US09998691

    申请日:2001-12-03

    IPC分类号: H02K4100

    摘要: Some of linear motors which constitute an exposure apparatus have coils each obtained by winding a copper foil wire as a foil-like conductor having an insulating layer around a core member in a multilayered structure. The coil is fixed to a positioning portion serving as the coil fixing portion of the linear motor by using the core member. The core member is formed from the same insulating material with low thermal conductivity as that of the positioning portion of a linear motor housing or a material with almost the same linear expansion coefficient.

    摘要翻译: 构成曝光装置的一些线性电动机具有线圈,它们是通过以多层结构缠绕铜箔线作为具有绝缘层的箔状导体而获得的线圈。 线圈通过使用芯部件固定到用作线性电动机的线圈固定部分的定位部分。 芯构件由与线性电动机壳体的定位部分或具有几乎相同的线性膨胀系数的材料相同的绝缘材料形成。

    Substrate-holding technique
    3.
    发明授权
    Substrate-holding technique 失效
    基板保持技术

    公开(公告)号:US07379162B2

    公开(公告)日:2008-05-27

    申请号:US11002900

    申请日:2004-12-03

    IPC分类号: G03B27/58 G03B27/62

    摘要: A substrate holding apparatus contacts an undersurface of a substrate and holds the substrate. At least a portion of a top surface of the substrate is to be immersed in liquid. The apparatus includes a chuck unit to attract the substrate and a preventing system to prevent the liquid from reaching the undersurface of the substrate.

    摘要翻译: 基板保持装置接触基板的下表面并保持基板。 将衬底的顶表面的至少一部分浸入液体中。 该装置包括吸引基板的卡盘单元和防止液体到达基板的下表面的防止系统。

    Positioning apparatus, exposure apparatus, and device manufacturing method
    4.
    发明授权
    Positioning apparatus, exposure apparatus, and device manufacturing method 失效
    定位装置,曝光装置和装置制造方法

    公开(公告)号:US07312848B2

    公开(公告)日:2007-12-25

    申请号:US11378511

    申请日:2006-03-17

    IPC分类号: G03B27/42 G03B27/52

    CPC分类号: G03F7/70725 G03F7/70875

    摘要: This invention discloses an apparatus having a base and a movable body which is driven to move along the base. The apparatus includes a generator configured to generate a driving signal for the movable body, a temperature adjusting mechanism configured to adjust temperature of the base, and a controller configured to control a manipulated variable for the temperature control mechanism based on the generated driving signal.

    摘要翻译: 本发明公开了一种具有基座和可移动体的装置,该移动体被驱动沿着底座移动。 该装置包括:发电机,其被配置为产生用于可移动体的驱动信号;温度调节机构,被配置为调节基座的温度;以及控制器,被配置为基于所产生的驱动信号来控制温度控制机构的操纵变量。

    Exposure apparatus
    5.
    发明授权
    Exposure apparatus 有权
    曝光装置

    公开(公告)号:US07236228B2

    公开(公告)日:2007-06-26

    申请号:US10880525

    申请日:2004-07-01

    IPC分类号: G03B27/52 G03B27/58

    摘要: An exposure apparatus includes a projection device for projecting a pattern drawn on a surface of a master, a stage apparatus which moves at least a substrate of the master and a substrate relative to the projection device, and an exposure device for repeatedly exposing the substrate to the pattern of the master. A plurality of pipes connected to movable units of the stage apparatus are joined to each other at partial outer surfaces of the pipes and constitute an integrated pipe array. Electrical cables or signal line cables connected to the movable unit pass through hollow portions of some of the pipes serving as the integrated pipe array.

    摘要翻译: 曝光装置包括用于投影在主表面上绘制的图案的投影装置,相对于投影装置移动至少基板和基板的平台装置,以及用于将基板重复曝光的曝光装置 主人的模式。 连接到舞台装置的可移动单元的多个管道在管的部分外表面处彼此接合,并构成一体的管阵列。 连接到可移动单元的电缆或信号线电缆穿过用作集成管阵列的一些管道的中空部分。

    Exposure apparatus and device manufacturing method
    6.
    发明授权
    Exposure apparatus and device manufacturing method 失效
    曝光装置和装置制造方法

    公开(公告)号:US07315347B2

    公开(公告)日:2008-01-01

    申请号:US11006629

    申请日:2004-12-08

    IPC分类号: G03B27/52 G03B27/42

    CPC分类号: G03F7/70891

    摘要: An exposure apparatus includes a light source, an illumination optical system for illuminating an original with light from the light source, and a projection optical system for projecting a pattern of the original, illuminated by the illumination optical system, onto a substrate. In addition, a radiation member is disposed opposite to a subject of temperature adjustment which corresponds to at least one of an optical element of the illumination optical system, an optical element of the projection optical system and the original, and a control system controls a temperature of the radiation member in accordance with a state or exposure of the subject of temperature adjustment.

    摘要翻译: 曝光装置包括光源,用于利用来自光源的光照射原件的照明光学系统和用于将由照明光学系统照明的原稿的图案投射到基板上的投影光学系统。 此外,辐射构件与温度调节对象相对设置,对应于照明光学系统的光学元件,投影光学系统的光学元件和原件中的至少一个,并且控制系统控制温度 的辐射构件根据温度调节对象的状态或曝光。

    Stage apparatus and exposure apparatus
    7.
    发明授权
    Stage apparatus and exposure apparatus 有权
    舞台装置和曝光装置

    公开(公告)号:US07301602B2

    公开(公告)日:2007-11-27

    申请号:US11094311

    申请日:2005-03-31

    摘要: A moving element to be propelled across a stator includes a coil unit, including coils, for generating a force to propel the moving unit, and a cooling unit for cooling the coil unit. A thermal conductive member, arranged between the cooling unit and the coil unit, transmits heat away from the coil unit. In addition, a housing unit houses the coil unit, the cooling unit and the thermal conductive member.

    摘要翻译: 要跨越定子推进的移动元件包括用于产生推动移动单元的力的线圈单元,以及用于冷却线圈单元的冷却单元。 布置在冷却单元和线圈单元之间的导热构件将热量从线圈单元传递出去。 此外,壳体单元容纳线圈单元,冷却单元和导热构件。

    Exposure apparatus and device fabrication method
    8.
    发明授权
    Exposure apparatus and device fabrication method 失效
    曝光装置和装置制造方法

    公开(公告)号:US07061580B2

    公开(公告)日:2006-06-13

    申请号:US10824989

    申请日:2004-04-15

    IPC分类号: G03B27/42 G21K5/00

    CPC分类号: G03F7/706 G03F7/70258

    摘要: An exposure apparatus includes a reflective element for reflecting and introducing light from a light source to a plate, at least one first driver for providing the reflective element with a force and/or a displacement in at least one directions, and at least one second driver for providing the reflective element with a force and/or a displacement in at least one directions, wherein the first and second drives are connected in series to each other.

    摘要翻译: 曝光装置包括用于将光从光源反射和引入到板的反射元件,至少一个用于在至少一个方向上提供反射元件和/或位移的第一驱动器,以及至少一个第二驱动器 用于在至少一个方向上提供反射元件的力和/或位移,其中第一和第二驱动器彼此串联连接。

    Stage device, exposure apparatus using the unit, and device manufacturing method
    9.
    发明申请
    Stage device, exposure apparatus using the unit, and device manufacturing method 有权
    舞台装置,使用该装置的曝光装置和装置制造方法

    公开(公告)号:US20060113040A1

    公开(公告)日:2006-06-01

    申请号:US11286780

    申请日:2005-11-23

    IPC分类号: C23F1/00 H01L21/00 G21K5/10

    CPC分类号: G03F7/70733 G03F7/70816

    摘要: A stage device includes a plurality of bases positioned adjacent each other with a space therebetween, a plurality of stages movable along surfaces of the bases, and a plurality of gas bearings provided in each of the stages. The gas bearings extend in a direction in which the bases are adjacently arranged.

    摘要翻译: 舞台装置包括多个彼此相邻定位的基座,其间具有空间,可沿基座的表面移动的多个台阶以及设置在每个台阶中的多个气体轴承。 气体轴承在基座相邻布置的方向上延伸。

    Exposure apparatus and device manufacturing method
    10.
    发明申请
    Exposure apparatus and device manufacturing method 失效
    曝光装置和装置制造方法

    公开(公告)号:US20050140947A1

    公开(公告)日:2005-06-30

    申请号:US11006629

    申请日:2004-12-08

    IPC分类号: G03F7/20 H01L21/027 G03B27/52

    CPC分类号: G03F7/70891

    摘要: Disclosed is an exposure apparatus which includes a light source, an illumination optical system for illuminating an original with light from the light source, a projection optical system for projecting a pattern of the original, illuminated by the illumination optical system, onto a substrate, a radiation member disposed to be opposed to a subject of temperature adjustment which corresponds to at least one of an optical element of the illumination optical system, an optical element of the projection optical system and the original, and a control system for controlling a temperature of the radiation member in accordance with a state of exposure of the subject of temperature adjustment.

    摘要翻译: 公开了一种曝光装置,其包括光源,用于利用来自光源的光照射原稿的照明光学系统,用于将由照明光学系统照明的原稿的图案投影到基板上的投影光学系统, 辐射部件设置成与对应于照明光学系统的光学元件,投影光学系统的光学元件和原件中的至少一个的温度调节对象相对,以及用于控制投影光学系统的温度的控制系统 辐射构件根据受试者的暴露温度调节状态。