公开(公告)号：US06300038B1

公开(公告)日：2001-10-09

申请号：US09444125

申请日：1999-11-19

申请人： Ken Shimazu ,  Gareth Rhodri Parsons ,  John David Riches

发明人： Ken Shimazu ,  Gareth Rhodri Parsons ,  John David Riches

IPC分类号： G03C176

CPC分类号： B41C1/1008 ,  B41C1/1016 ,  B41C2210/02 ,  B41C2210/06 ,  B41C2210/22 ,  B41C2210/24 ,  B41C2210/26 ,  B41C2210/262 ,  H05K1/0373 ,  H05K3/285

摘要： A heat imagable article has, in a single layer polymeric coating or in an inner layer of a multi-layer polymeric coating on a substrate, a polymeric matrix material, for example a phenolic resin, and, dispersed therein, polymeric particles, for example of polyethylene or polytetrafluoroethylene. The coating may contain a radiation absorbing compound so that suitable electromagnetic radiation, preferably infra-red radiation, may be used to heat the coating imagewise. The presence of the particles increases the physical robustness of the layer.

摘要翻译： 可热成像制品在单层聚合物涂层中或在基底上的多层聚合物涂层的内层中具有聚合物基质材料，例如酚醛树脂，并且其中分散有聚合物颗粒，例如 聚乙烯或聚四氟乙烯。 涂层可以含有辐射吸收化合物，使得可以使用合适的电磁辐射，优选红外辐射来对成像的涂层进行加热。 颗粒的存在增加了层的物理坚固性。

公开(公告)号：US06596469B2

公开(公告)日：2003-07-22

申请号：US09503095

申请日：2000-02-11

申请人： Christopher David McCullough ,  Kevin Barry Ray ,  Alan Stanley Victor Monk ,  John David Riches ,  Anthony Paul Kitson ,  Gareth Rhodri Parsons ,  David Stephen Riley ,  Peter Andrew Reath Bennett ,  Richard David Hoare

发明人： Christopher David McCullough ,  Kevin Barry Ray ,  Alan Stanley Victor Monk ,  John David Riches ,  Anthony Paul Kitson ,  Gareth Rhodri Parsons ,  David Stephen Riley ,  Peter Andrew Reath Bennett ,  Richard David Hoare

IPC分类号： G03C176

CPC分类号： G03F7/2022 ,  B41C1/1008 ,  B41C1/1016 ,  B41C2210/02 ,  B41C2210/06 ,  B41C2210/14 ,  B41C2210/22 ,  B41C2210/24 ,  B41C2210/262 ,  G03F7/022 ,  G03F7/023 ,  G03F7/0233 ,  H05K3/0082

摘要： A method of making a mask or an electronic part, for example a printed circuit, comprises the steps of delivering heat in a desired pattern to a precursor of the mask or electronic part, the precursor comprising a surface coated with a coating, the coating comprising a heat-sensitive composition itself comprising an aqueous developer soluble polymeric substance and a compound which reduces the aqueous developer solubility of the polymeric substance, wherein the aqueous developer solubility of the composition is not increased by incident UV radiation but is increased by the delivery of heat; then developing the precursor to remove the heat-sensitive composition in regions to which the heat was delivered. In the case of a printed circuit precursor the surface may be then etched in conventional manner to yield the required printed circuit.

摘要翻译： 制造掩模或电子部件（例如印刷电路）的方法包括以期望的图案将热量输送到掩模或电子部件的前体的步骤，前体包括涂覆有涂层的表面，该涂层包含 包含显影剂可溶性水溶性聚合物的热敏组合物和降低聚合物质的显影剂水溶性的化合物，其中组合物的水性显影剂溶解度不会因入射的紫外线辐射而增加，而是通过传递热而增加 ; 然后展开该前体以在传送热量的区域中除去热敏组合物。 在印刷电路前体的情况下，可以以常规方式蚀刻表面以产生所需的印刷电路。

公开(公告)号：US06706466B1

公开(公告)日：2004-03-16

申请号：US09587813

申请日：2000-06-06

申请人： Martyn Lott ,  Colin Shoesmith ,  John David Riches ,  Gareth Rhodri Parsons

发明人： Martyn Lott ,  Colin Shoesmith ,  John David Riches ,  Gareth Rhodri Parsons

IPC分类号： G03F7038

CPC分类号： G03F7/168 ,  B41C1/1008 ,  B41C2210/04 ,  B41C2210/06 ,  B41C2210/16 ,  B41C2210/22 ,  B41C2210/262 ,  H05K3/0082 ,  Y10S430/11 ,  Y10S430/145

摘要： Imageable articles comprising positive working polymeric coatings on substrates are given a heat treatment as part of their manufacture, notably at a moderate temperature for an extended period. This heat treatment improves the development characteristics of the coatings in use. It has been found that by carrying out the heat treatment on articles wrapped in a water-impermeable material or in a humidity-enhanced oven, development characteristics may be further improved, especially adjacent to the edges of articles. The imageable articles include precursors for lithographic printing plates and for printed circuits.

摘要翻译： 在基材上包含正性聚合物涂层的可成像制品作为其制造的一部分被给予热处理，特别是在中等温度下长时间。 该热处理改善了使用中的涂层的显影特性。 已经发现，通过对包裹在不透水材料或增湿烤箱中的物品进行热处理，可以进一步提高显影特性，特别是在物品边缘附近。 可成像制品包括平版印刷版和印刷电路用前体。

公开(公告)号：US06558869B1

公开(公告)日：2003-05-06

申请号：US09558110

申请日：2000-04-25

申请人： Christopher David McCullough ,  Kevin Barry Ray ,  Alan Stanley Monk ,  John David Riches ,  Anthony Paul Kitson ,  Gareth Rhodri Parsons ,  David Stephen Riley ,  Peter Andrew Reath Bennett ,  Richard David Hoare ,  James Laurence Mulligan ,  John Andrew Hearson ,  Carole-Anne Smith ,  Stuart Bayes ,  Mark John Spowage

发明人： Christopher David McCullough ,  Kevin Barry Ray ,  Alan Stanley Monk ,  John David Riches ,  Anthony Paul Kitson ,  Gareth Rhodri Parsons ,  David Stephen Riley ,  Peter Andrew Reath Bennett ,  Richard David Hoare ,  James Laurence Mulligan ,  John Andrew Hearson ,  Carole-Anne Smith ,  Stuart Bayes ,  Mark John Spowage

IPC分类号： G03F7039

CPC分类号： B41C1/1008 ,  B41C2210/02 ,  B41C2210/06 ,  B41C2210/22 ,  B41C2210/24 ,  B41C2210/262 ,  B41M5/368 ,  B41M5/46 ,  B41M5/465 ,  Y10S430/145 ,  Y10S430/146 ,  Y10S430/165

摘要： This invention is directed to a precursor for preparing a resist pattern by heat mode imaging, the precursor comprising a heat sensitive composition, the solubility of which in an aqueous alkaline developer is arranged to increase in heated areas, and a means for increasing the resistance of non-heated areas of the heat sensitive composition to dissolution in an aqueous alkaline developer (the “developer resistance means”), wherein said developer resistance means comprises one or more compounds selected from the group consisting of: (A) compounds which include a poly(alkylene oxide) unit; (B) siloxanes; and (C) esters, ethers and amides of polyhydric alcohols, wherein said heat-sensitive composition comprises an aqueous alkaline developer soluble polymeric substance (i.e. the “active polymer”) and a compound which reduces the aqueous alkaline developer solubility of the polymeric substance (i.e. the “reversible insolubilizer compound”) such that the aqueous alkaline developer solubility of the composition is increased on heating and the aqueous alkaline developer solubility of the composition is not increased by incident UV radiation. The invention provides a solution to the problem of the relatively narrow solubility differential between imaged and non-imaged areas of heat sensitive positive working radiation sensitive compositions.

摘要翻译： 本发明涉及通过热模式成像来制备抗蚀剂图案的前体，前体包括热敏组合物，其热溶性在碱性显影剂的水溶液中被设置为增加加热区域， 热敏组合物的非加热区域溶解在含水碱性显影剂（“显影剂阻挡装置”）中，其中所述显影剂阻力装置包括一种或多种选自以下的化合物：（A）包括聚 （环氧烷）单元;（B）硅氧烷; 和（C）多元醇的酯，醚和酰胺，其中所述热敏组合物包含水性碱性显影剂可溶性聚合物质（即“活性聚合物”）和降低聚合物质的碱性显影剂水溶液的化合物（ 即“可逆不溶物化合物”），使得组合物的碱性显影剂水溶液在加热时增加，并且组合物的水性碱性显影剂溶解度不会因入射的紫外线辐射而增加。 本发明提供了解决热敏感正性辐射敏感组合物的成像区域和非成像区域之间相对窄的溶解度差异的问题的解决方案。

公开(公告)号：US06461795B1

公开(公告)日：2002-10-08

申请号：US09558109

申请日：2000-04-25

申请人： Christopher David McCullough ,  Kevin Barry Ray ,  Alan Stanley Monk ,  John David Riches ,  Anthony Paul Kitson ,  Gareth Rhodri Parsons ,  David Stephen Riley

发明人： Christopher David McCullough ,  Kevin Barry Ray ,  Alan Stanley Monk ,  John David Riches ,  Anthony Paul Kitson ,  Gareth Rhodri Parsons ,  David Stephen Riley

IPC分类号： G03F7039

CPC分类号： B41N3/00 ,  B41M5/368 ,  H05K3/0082 ,  Y10S430/145 ,  Y10S430/146 ,  Y10S430/165

摘要： Phenolic resin compositions formulated for use in lithographic exposure processes are given a heat treatment at 40-90° C. for at least 4 hours shortly after their coating onto lithographic substrates, to produce lithographic printing forms. It is found that such a heat treatment improves later exposure processes, in particular by rendering the sensitivity of the compositions less variable, over time.

摘要翻译： 配制用于光刻曝光工艺的酚醛树脂组合物在其涂布在平版印刷基材上不久后在40-90℃下进行至少4小时的热处理，以产生平版印刷形式。 发现这种热处理改进了后续的曝光过程，特别是通过使组合物的灵敏度随时间变化而变小。