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    Electron beam apparatus
    1.
    发明申请
    Electron beam apparatus 有权
    电子束装置

    公开(公告)号：US20050253066A1

    公开(公告)日：2005-11-17

    申请号：US10999124

    申请日：2004-11-30

    申请人： Kenji Watanabe ,  Tohru Satake ,  Mamoru Nakasuji ,  Takeshi Murakami ,  Tsutomu Karimata ,  Nobuharu Noji ,  Keiichi Tohyama ,  Masahiro Hatakeyama

    发明人： Kenji Watanabe ,  Tohru Satake ,  Mamoru Nakasuji ,  Takeshi Murakami ,  Tsutomu Karimata ,  Nobuharu Noji ,  Keiichi Tohyama ,  Masahiro Hatakeyama

    IPC分类号： G01N23/225 ,  H01J37/28

    CPC分类号： H01J37/28 ,  G01N23/225 ,  H01J2237/24435

    摘要： An electron beam apparatus is provided for evaluating a sample at a high throughput and a high S/N ratio. As an electron beam emitted from an electron gun is irradiated to a sample placed on an X-Y-θ stage through an electrostatic lens, an objective lens and the like, secondary electrons or reflected electrons are emitted from the sample. The primary electron beam is incident at an incident angle set at approximately 35° or more by controlling a deflector. Electrons emitted from the sample is guided in the vertical direction, and focused on a detector. The detector is made up of an MCP, a fluorescent plate, a relay lens, and a TDI (or CCD). An electric signal from the TDI is supplied to a personal computer for image processing to generate a two-dimensional image of the sample.

    摘要翻译： 提供一种用于以高通量和高S / N比来评估样品的电子束装置。 当从电子枪发射的电子束通过静电透镜，物镜等照射到放置在X-Y-θ台上的样品时，从样品发射二次电子或反射电子。 通过控制偏转器，一次电子束入射角约为35°以上的入射角。 从样品发射的电子在垂直方向上被引导，并聚焦在检测器上。 检测器由MCP，荧光板，中继透镜和TDI（或CCD）组成。 来自TDI的电信号被提供给用于图像处理的个人计算机以产生样本的二维图像。

    Electron beam apparatus
    2.
    发明授权
    Electron beam apparatus 有权
    电子束装置

    公开(公告)号：US07176459B2

    公开(公告)日：2007-02-13

    申请号：US10999124

    申请日：2004-11-30

    申请人： Kenji Watanabe ,  Tohru Satake ,  Mamoru Nakasuji ,  Takeshi Murakami ,  Tsutomu Karimata ,  Nobuharu Noji ,  Keiichi Tohyama ,  Masahiro Hatakeyama

    发明人： Kenji Watanabe ,  Tohru Satake ,  Mamoru Nakasuji ,  Takeshi Murakami ,  Tsutomu Karimata ,  Nobuharu Noji ,  Keiichi Tohyama ,  Masahiro Hatakeyama

    IPC分类号： H01J37/28 ,  G01N23/225

    CPC分类号： H01J37/28 ,  G01N23/225 ,  H01J2237/24435

    摘要： An electron beam apparatus is provided for evaluating a sample at a high throughput and a high S/N ratio. As an electron beam emitted from an electron gun is irradiated to a sample placed on an X-Y-θ stage through an electrostatic lens, an objective lens and the like, secondary electrons or reflected electrons are emitted from the sample. The primary electron beam is incident at an incident angle set at approximately 35° or more by controlling a deflector. Electrons emitted from the sample is guided in the vertical direction, and focused on a detector. The detector is made up of an MCP, a fluorescent plate, a relay lens, and a TDI (or CCD). An electric signal from the TDI is supplied to a personal computer for image processing to generate a two-dimensional image of the sample.

    摘要翻译： 提供一种用于以高通量和高S / N比来评估样品的电子束装置。 当从电子枪发射的电子束通过静电透镜，物镜等照射到放置在X-Y-θ台上的样品时，从样品发射二次电子或反射电子。 通过控制偏转器，一次电子束入射角约为35°以上的入射角。 从样品发射的电子在垂直方向上被引导，并聚焦在检测器上。 检测器由MCP，荧光板，中继透镜和TDI（或CCD）组成。 来自TDI的电信号被提供给用于图像处理的个人计算机以产生样本的二维图像。