摘要:
Provided is a destructive readout semiconductor memory device capable of avoiding concentration of a writeback current, in which a switch circuit (24) is provided between each bit line (21) and each sense amplifier (26). In writeback, the switch circuits are turned on at staggered time points. In readout, the switch circuits are turned on to read memory cell data to the sense amplifiers while the sense amplifiers are turned off, and the switch circuits are then turned off once. After that, the sense amplifiers are turned on to amplify the read data. The switch circuits are subsequently divided into groups and turned on again to write back the data amplified by the sense amplifiers to the memory cells. The switch circuits are divided into groups to be turned on at staggered time points during the writeback, to thereby avoid concentration of the writeback current in one time period.
摘要:
Provided is a destructive readout semiconductor memory device capable of avoiding concentration of a writeback current, in which a switch circuit (24) is provided between each bit line (21) and each sense amplifier (26). In writeback, the switch circuits are turned on at staggered time points. In readout, the switch circuits are turned on to read memory cell data to the sense amplifiers while the sense amplifiers are turned off, and the switch circuits are then turned off once. After that, the sense amplifiers are turned on to amplify the read data. The switch circuits are subsequently divided into groups and turned on again to write back the data amplified by the sense amplifiers to the memory cells. The switch circuits are divided into groups to be turned on at staggered time points during the writeback, to thereby avoid concentration of the writeback current in one time period.
摘要:
Provided is a semiconductor integrated circuit device including a capacitor element with an improved TDDB life. A semiconductor integrated circuit device (1) includes: a first electrode (4) including a first semiconductor layer which protrudes with respect to a plane of a substrate; a side surface insulating film (5) formed on at least a part of a side surface of the first electrode (4); an upper surface insulating film (6) formed on the first electrode (4) and the side surface insulating film (5); and a second electrode (7) which covers the side surface insulating film (5) and the upper surface insulating film (6). The first electrode (4), the side surface insulating film (5), and the second electrode (7) constitute a capacitor element. A thickness of the upper surface insulating film (6) between the first electrode (4) and the second electrode (7) is larger than a thickness of the side surface insulating film (5) between the first electrode (4) and the second electrode (7).
摘要:
A semiconductor integrated circuit device, includes a first electrode including a first semiconductor layer formed on a substrate, a side surface insulating film formed on at least a part of a side surface of the first electrode, an upper surface insulating film formed on the first electrode and the side surface insulating film, a second electrode which covers the side surface insulating film and the upper surface insulating film, and a fin-type field effect transistor. The first electrode, the side surface insulating film, and the second electrode constitute a capacitor element. A thickness of the upper surface insulating film between the first electrode and the second electrode is larger than a thickness of the side surface insulating film between the first electrode and the second electrode, and the fin-type field effect transistor includes a second semiconductor layer which protrudes with respect to the plane of the substrate.
摘要:
A semiconductor integrated circuit device, includes a first electrode including a first semiconductor layer formed on a substrate, a side surface insulating film formed on at least a part of a side surface of the first electrode, an upper surface insulating film formed on the first electrode and the side surface insulating film, a second electrode which covers the side surface insulating film and the upper surface insulating film, and a fin-type field effect transistor. The first electrode, the side surface insulating film, and the second electrode constitute a capacitor element. A thickness of the upper surface insulating film between the first electrode and the second electrode is larger than a thickness of the side surface insulating film between the first electrode and the second electrode, and the fin-type field effect transistor includes a second semiconductor layer which protrudes with respect to the plane of the substrate.
摘要:
Provided are an SiC single-crystal ingot containing an SiC single crystal having a low threading dislocation density and low resistivity; an SiC single crystal; and a production method for the SiC single crystal. The SiC single crystal ingot contains a seed crystal and a grown crystal grown by a solution process in which the seed crystal is the base point, the grown crystal of the SiC single crystal ingot containing a nitrogen density gradient layer in which the nitrogen content increases in the direction of growth from the seed crystal.
摘要:
This invention is based on the discovery by the inventors that, if a preliminary hydration hardening process and a full-scale hydration hardening process are provided after the molding process, and a process for burning a hardened body of cement at a high temperature is provided between the preliminary and full-scale hardening processes, it is possible to obtain a molded product of cement having a higher mechanical strength than any such product according to any known method including no such burning process.According to this invention, there is provided a method of manufacturing a product of cement having high mechanical strength, which method comprises the steps in sequence of adding water, and if required, glass fibers or other reinforcing material, into a mixture of cement and an aggregate, and kneading the whole completely; molding the kneaded mixture into a desired shape; hardening the molded body preliminarily by hydration; burning the preliminarily hardened body at a high temperature; and hardening the burned body on a full scale by hydration.
摘要:
Provided is a method for producing an n-type SiC single crystal, whereby it is possible to grow an n-type SiC single crystal having a low resistivity at a high speed. A method for producing an n-type SiC single crystal by bringing a SiC seed crystal substrate into contact with a Si—C solution having such a temperature gradient that the temperature gradually decreases from the inside toward the surface, thereby achieving the crystal growth of the n-type SiC single crystal. The method involves adding a nitride to a raw material for forming the Si—C solution or to the Si—C solution.
摘要:
In a rack and pinion type steering apparatus whose housing includes a pinion accommodating portion, a rack accommodating portion, a radial opening defining a rack guide hole, and a projecting portion which is formed on the side of the rack accommodating portion opposite the rack guide hole. The radial opening is covered by a plug that is fixed by swaging. The projecting portion has a contact surface being received on a jig when the plug is fixed to the housing by swaging. Therefore, the reaction of the swaging from the jig does not directly affect the pinion accommodating portion.
摘要:
A high-voltage signal detecting circuit for use in a semiconductor memory device includes a signal transfer section having first nMOSFET, pMOSFET, second nMOSFET and third nMOSFET serially connected together in this order from a first input terminal to a ground line. The gates of pMOSFET and second and third nMOSFETs are connected to a second input terminal for receiving the supply source potential. A discharge transistor is connected between the first node which connects the pMOSFET and second nMOSFET together and the ground line, to discharge electric charge from the first node before application of the source potential. The discharge section provides a high-speed start-up of the memory device.