公开(公告)号：US4464011A

公开(公告)日：1984-08-07

申请号：US406044

申请日：1982-08-06

申请人： Kensaku Takahashi ,  Yasuo Yatsugake ,  Fukuo Iwaya ,  Makoto Ito ,  Katsumi Takami ,  Kyo Suda

发明人： Kensaku Takahashi ,  Yasuo Yatsugake ,  Fukuo Iwaya ,  Makoto Ito ,  Katsumi Takami ,  Kyo Suda

IPC分类号： G02B17/00 ,  G02B26/10 ,  G02B27/17

CPC分类号： G02B26/10

摘要： A light beam scanning apparatus projects a light beam swept by a light scanner to a spherical mirror and scans by a light beam spot reflected and focused by the spherical mirror a surface of an object arranged to oppose to the spherical mirror at a position spaced from the spherical mirror by a distance equal to a focal distance f of the spherical mirror. An optical path length between the light scanner and the spherical mirror is set to 0.78 f-0.84 f to minimize a curvature of field (circle of confusion).

摘要翻译： 光束扫描装置将由扫描仪扫描的光束投射到球面镜，并且通过由球面镜反射和聚焦的光束点将与球面镜相对的物体的表面扫描在与 球面镜的距离等于球面镜的焦距f。 光扫描器和球面镜之间的光程长度设定为0.78f-0.84f，以使场曲（混乱圈）最小化。

公开(公告)号：US4685802A

公开(公告)日：1987-08-11

申请号：US721904

申请日：1985-04-10

申请人： Susumu Saito ,  Michio Suzuki ,  Kyo Suda ,  Yasuo Yatsugake ,  Kazuya Tsukada

发明人： Susumu Saito ,  Michio Suzuki ,  Kyo Suda ,  Yasuo Yatsugake ,  Kazuya Tsukada

IPC分类号： G01N15/02 ,  G01N15/14 ,  G01N21/39 ,  G01N21/00

CPC分类号： G01N15/0205 ,  G01N15/14 ,  G01N2021/391

摘要： In a small particle detection system for use in detecting small particles, which float in a gas, by utilizing the light scattering effect thereof, a detecting cell is disposed in an external optical resonator which is adapted to resonate with the output light from a laser oscillator. When the detecting cell is disposed in the laser oscillating optical resonator, the position is selectively determined; the former is set in the position in the latter in which the diameter of a laser beam is minimal.

摘要翻译： 在用于检测漂浮在气体中的小颗粒的小粒子检测系统中，通过利用其光散射效应，检测单元设置在外部光学谐振器中，该外部光学谐振器适于与来自激光振荡器的输出光共振 。 当检测单元设置在激光振荡光谐振器中时，选择性地确定位置; 前者位于激光束的直径最小的位置。

公开(公告)号：US20050185172A1

公开(公告)日：2005-08-25

申请号：US11104621

申请日：2005-04-13

申请人： Ichiro Ishimaru ,  Minori Noguchi ,  Ichiro Moriyama ,  Yoshikazu Tanabe ,  Yasuo Yatsugake ,  Yukio Kenbou ,  Kenji Watanabe ,  Hirofumi Tsuchiyama

发明人： Ichiro Ishimaru ,  Minori Noguchi ,  Ichiro Moriyama ,  Yoshikazu Tanabe ,  Yasuo Yatsugake ,  Yukio Kenbou ,  Kenji Watanabe ,  Hirofumi Tsuchiyama

IPC分类号： G01B11/30 ,  G01B11/24 ,  G01B11/245 ,  G01N21/95 ,  G01N21/956 ,  G06T1/00 ,  H01L21/66 ,  G01N21/88

CPC分类号： G01N21/88 ,  G01N21/474 ,  G01N21/94 ,  G01N21/9501 ,  G01N21/9503 ,  G01N2021/8825 ,  G01N2021/8854

摘要： A surface inspection apparatus and a method for inspecting the surface of a sample are capable of inspecting discriminatingly between scratches of various configuration and adhered foreign objects that occur on the surface of a work target when the work target (for example, an insulating film on a semiconductor substrate) is subjected to a polishing process such as CMP or a grinding process, in semiconductor manufacturing process or magnetic head manufacturing process. In the invention, the scratch and foreign object that occur on the polished or ground surface of the sample is epi-illuminated and slant-illuminated by use of approximately same light flux, the difference between the scattered light intensity from the shallow scratch and from the foreign object is applied to thereby discriminate between the shallow scratch and the foreign object, and the directionality of the scattered light is detected to discriminate between the linear scratch and the foreign object.

摘要翻译： 表面检查装置和检查样品表面的方法能够在工作目标（例如，工件的表面上的绝缘膜）上区别地检查在工作目标表面上发生的各种构造和附着异物的划痕 半导体衬底）在半导体制造工艺或磁头制造工艺中进行诸如CMP或研磨工艺的抛光工艺。 在本发明中，通过使用大致相同的光通量，在样品的抛光或地面上发生的划痕和异物被表面照射和倾斜照射，来自浅划痕的散射光强度与来自 应用异物，从而区分浅刮痕和异物，并且检测散射光的方向性以区分线状划痕和异物。

公开(公告)号：US20070121108A1

公开(公告)日：2007-05-31

申请号：US11657455

申请日：2007-01-25

申请人： Ichiro Ishimaru ,  Minori Noguchi ,  Ichiro Moriyama ,  Yoshikazu Tanabe ,  Yasuo Yatsugake ,  Yukio Kenbou ,  Kenji Watanabe ,  Hirofumi Tsuchiyama

发明人： Ichiro Ishimaru ,  Minori Noguchi ,  Ichiro Moriyama ,  Yoshikazu Tanabe ,  Yasuo Yatsugake ,  Yukio Kenbou ,  Kenji Watanabe ,  Hirofumi Tsuchiyama

IPC分类号： G01N21/00 ,  G01N21/88

CPC分类号： G01N21/88 ,  G01N21/474 ,  G01N21/94 ,  G01N21/9501 ,  G01N21/9503 ,  G01N2021/8825 ,  G01N2021/8854

摘要： An apparatus for detecting defects, including: a first illumination optical unit which illuminates from a normal direction or in the vicinity of the normal direction; a second illumination optical unit which illuminates from a first elevation angle; a first detection optical unit which detects light reflected by the illumination of the first illumination optical unit or the second illumination optical unit with plural detectors; a second detection optical unit which detects light reflected by the illumination of the first illumination optical unit or the second illumination optical unit with plural detectors; wherein the plural detectors of the first detection optical unit and the plural detectors of the second detection optical unit are photomultipliers, and the signal processor processes the signals outputted from the photomultipliers and are adjusted to balance in sensitivities.

摘要翻译： 一种用于检测缺陷的装置，包括：第一照明光学单元，其从法向方向或附近照射; 第二照明光学单元，其从第一仰角照亮; 第一检测光学单元，其利用多个检测器检测由第一照明光学单元或第二照明光学单元的照明反射的光; 第二检测光学单元，其利用多个检测器检测由第一照明光学单元或第二照明光学单元的照明反射的光; 其中第一检测光学单元的多个检测器和第二检测光学单元的多个检测器是光电倍增管，并且信号处理器处理从光电倍增管输出的信号，并调整其灵敏度的平衡。

公开(公告)号：US5903342A

公开(公告)日：1999-05-11

申请号：US629266

申请日：1996-04-08

申请人： Yasuo Yatsugake ,  Takashi Okawa ,  Norihiko Mizutani ,  Shigeharu Iizuka

发明人： Yasuo Yatsugake ,  Takashi Okawa ,  Norihiko Mizutani ,  Shigeharu Iizuka

IPC分类号： G01N21/94 ,  G01N21/88

CPC分类号： G01N21/94

摘要： A wafer surface inspection method and device including a low angle light receiving system having an elevation angle less than 30.degree. with reference to the wafer surface, and a high angle light receiving system having an elevation angle equal to or larger than 30.degree., scans the wafer with a laser beam, receives scattered light to perform extraneous substance detection in response to the scanning, and detects wafer defects only by the high angle light receiving system, and sticking extraneous substances by either the low angle receiving system or by both the low angle light receiving system and the high angle light receiving system.

摘要翻译： 一种晶片表面检查方法和装置，包括相对于晶片表面具有小于30°的仰角的低角度光接收系统和具有等于或大于30°的仰角的高角度光接收系统，扫描 具有激光束的晶片，响应于扫描而接收散射光以进行外来物质检测，并且仅通过高角度光接收系统检测晶片缺陷，并且通过低角度接收系统或低角度接收系统粘附外来物质 光接收系统和高角度光接收系统。

公开(公告)号：US20090103078A1

公开(公告)日：2009-04-23

申请号：US12196647

申请日：2008-08-22

申请人： Ichiro ISHIMARU ,  Minori Noguchi ,  Ichiro Moriyama ,  Yoshikazu Tanabe ,  Yasuo Yatsugake ,  Yukio Kenbou ,  Kenji Watanabe ,  Hirofumi Tsuchiyama

发明人： Ichiro ISHIMARU ,  Minori Noguchi ,  Ichiro Moriyama ,  Yoshikazu Tanabe ,  Yasuo Yatsugake ,  Yukio Kenbou ,  Kenji Watanabe ,  Hirofumi Tsuchiyama

IPC分类号： G01N21/00 ,  G01N21/88

CPC分类号： G01N21/88 ,  G01N21/474 ,  G01N21/94 ,  G01N21/9501 ,  G01N21/9503 ,  G01N2021/8825 ,  G01N2021/8854

摘要： An apparatus for detecting defects, including: a table unit which mounts a specimen to be inspected having a linearly moving stage and a rotationally moving stage; a first illumination optical unit which illuminates an inspection region of a surface of the specimen from a normal direction or in the vicinity of the normal direction while the specimen is rotating by the rotationally moving stage and moving in one direction by the linearly moving stage; a second illumination optical unit which illuminates the inspection region from a first elevation angle toward the inspection region while the specimen is rotating and moving; a first detection optical unit which detects light reflected from the inspection region by the illumination of the first illumination optical unit or the second illumination optical unit with plural detectors arranged in plural portions of a second elevation angle toward the inspection region; a second detection optical unit which detects light reflected from the inspection region by the illumination of the first illumination optical unit or the second illumination optical unit with plural detectors arranged in plural portions of a third elevation angle toward the inspection region; and a signal processor which processes signals outputted from the plural detectors of the first detection optical unit and the plural detectors of the second detection optical unit, wherein the plural detectors of the first detection optical unit and the plural detectors of the second detection optical unit are photomultipliers, and the signal processor processes the signals which are selected from the signals outputted from the plural detectors arranged in plural portions of the second elevation angle and the plural detectors arranged in plural portions of the third elevation angle.

摘要翻译： 一种用于检测缺陷的装置，包括：安装具有线性移动台和旋转移动台的待检查样本的台单元; 第一照明光学单元，其在通过旋转移动台旋转并通过线性移动台在一个方向上移动时，从正常方向或法线附近照射样本的表面的检查区域; 第二照明光学单元，其在所述检体旋转移动的同时，将所述检查区域从所述检查区域向第一仰角照射; 第一检测光学单元，其通过第一照明光学单元或第二照明光学单元的照明来检测从检查区域反射的光，多个检测器以检查区域的第二仰角的多个部分布置; 第二检测光学单元，其通过第一照明光学单元或第二照明光学单元的照射来检测从检查区域反射的光，多个检测器布置成朝向检查区域的第三仰角的多个部分; 以及处理从第一检测光学单元的多个检测器和第二检测光学单元的多个检测器输出的信号的信号处理器，其中第一检测光学单元的多个检测器和第二检测光学单元的多个检测器是 光电倍增管，并且信号处理器处理从布置在第二仰角的多个部分的多个检测器输出的信号中选择的信号和布置在第三仰角的多个部分中的多个检测器。

公开(公告)号：US07417244B2

公开(公告)日：2008-08-26

申请号：US11657455

申请日：2007-01-25

申请人： Ichiro Ishimaru ,  Minori Noguchi ,  Ichiro Moriyama ,  Yoshikazu Tanabe ,  Yasuo Yatsugake ,  Yukio Kenbou ,  Kenji Watanabe ,  Hirofumi Tsuchiyama

发明人： Ichiro Ishimaru ,  Minori Noguchi ,  Ichiro Moriyama ,  Yoshikazu Tanabe ,  Yasuo Yatsugake ,  Yukio Kenbou ,  Kenji Watanabe ,  Hirofumi Tsuchiyama

IPC分类号： G01N21/88

CPC分类号： G01N21/88 ,  G01N21/474 ,  G01N21/94 ,  G01N21/9501 ,  G01N21/9503 ,  G01N2021/8825 ,  G01N2021/8854

摘要： An apparatus for detecting defects, including: a first illumination optical unit which illuminates from a normal direction or in the vicinity of the normal direction; a second illumination optical unit which illuminates from a first elevation angle; a first detection optical unit which detects light reflected by the illumination of the first illumination optical unit or the second illumination optical unit with plural detectors; a second detection optical unit which detects light reflected by the illumination of the first illumination optical unit or the second illumination optical unit with plural detectors; wherein the plural detectors of the first detection optical unit and the plural detectors of the second detection optical unit are photomultipliers, and the signal processor processes the signals outputted from the photomultipliers and are adjusted to balance in sensitivities.

摘要翻译： 一种用于检测缺陷的装置，包括：第一照明光学单元，其从法向方向或附近照射; 第二照明光学单元，其从第一仰角照亮; 第一检测光学单元，其利用多个检测器检测由第一照明光学单元或第二照明光学单元的照明反射的光; 第二检测光学单元，其利用多个检测器检测由第一照明光学单元或第二照明光学单元的照明反射的光; 其中第一检测光学单元的多个检测器和第二检测光学单元的多个检测器是光电倍增管，并且信号处理器处理从光电倍增管输出的信号，并调整其灵敏度的平衡。

公开(公告)号：US20070268483A1

公开(公告)日：2007-11-22

申请号：US11484993

申请日：2006-07-12

申请人： Yasuo Yatsugake ,  Yoshitsugu Taniguchi

发明人： Yasuo Yatsugake ,  Yoshitsugu Taniguchi

IPC分类号： G01N21/00

CPC分类号： G01N21/84

摘要： A probe card is equipped with a plurality of openings that transmit light to an image pickup device. An optical inspection unit that emits a test light through the plurality of openings of the probe card while being arranged in opposition to a light receiving portion of the image pickup device, a holding means that simultaneously positions and holds a plurality of optical inspection units, and an individual adjustment means that makes a converting adjustment carried out, for light from a light irradiator corresponding to the image pickup device, so as to match the same with specifications of the image pickup device be individually carried out for each optical inspection unit are provided. By replacing or adjusting each optical inspection unit while making the same attachable and detachable, an optical axis adjustment can be easily carried out, and the cost can be reduced.

摘要翻译： 探针卡配备有将光传送到图像拾取装置的多个开口。 光学检查单元，其在与图像拾取装置的光接收部分相对布置的同时，通过探针卡的多个开口发射测试光;保持装置，其同时定位和保持多个光学检查单元;以及 提供了对于每个光学检查单元分别执行对来自与图像拾取装置相对应的光照射器的光进行转换调节以便与对于图像拾取装置的规格进行匹配的个体调整装置。 通过更换或调整每个光学检查单元，同时可以进行相同的安装和拆卸，可以容易地执行光轴调整，并且可以降低成本。

公开(公告)号：US08729514B2

公开(公告)日：2014-05-20

申请号：US13114160

申请日：2011-05-24

申请人： Ichiro Ishimaru ,  Minori Noguchi ,  Ichiro Moriyama ,  Yoshikazu Tanabe ,  Yasuo Yatsugake ,  Yukio Kenbou ,  Kenji Watanabe ,  Hirofumi Tsuchiyama

发明人： Ichiro Ishimaru ,  Minori Noguchi ,  Ichiro Moriyama ,  Yoshikazu Tanabe ,  Yasuo Yatsugake ,  Yukio Kenbou ,  Kenji Watanabe ,  Hirofumi Tsuchiyama

IPC分类号： G01N21/88

CPC分类号： G01N21/88 ,  G01N21/474 ,  G01N21/94 ,  G01N21/9501 ,  G01N21/9503 ,  G01N2021/8825 ,  G01N2021/8854

摘要： A defect inspection apparatus including: a first illumination optical system which is configured to illuminate the inspection area on a sample surface from a normal line direction or a direction near thereof with respect to said sample surface; a second illumination optical system which is configured to illuminate said inspection area from a slant direction with respect to said sample surface; a detection optical system having a plurality of first detectors which are located, in front of, on the sides of, and behind said inspection area, respectively, with respect to the illumination direction of said second illumination optical system, and where the regular reflected light component, from said sample surface, by illumination light of said second illumination optical system, is not converged; and a signal processing system which is configured to inspect a defect, upon basis of signals obtained from said plurality of first detectors.

摘要翻译： 一种缺陷检查装置，包括：第一照明光学系统，被配置为从相对于所述样品表面的法线方向或近似的方向照射样品表面上的检查区域; 第二照明光学系统，被配置为相对于所述样品表面从倾斜方向照射所述检查区域; 检测光学系统，具有分别相对于所述第二照明光学系统的照明方向位于所述检查区域的所述检查区域的前方和后方的多个第一检测器，并且其中所述规则反射光 从所述样品表面通过所述第二照明光学系统的照明光分量不会收敛; 以及信号处理系统，其被配置为基于从所述多个第一检测器获得的信号来检查缺陷。

公开(公告)号：US20070076942A1

公开(公告)日：2007-04-05

申请号：US10554087

申请日：2004-04-20

申请人： Yasuo Yatsugake ,  Hitoshi Kato ,  Moyuru Yasuhara ,  Takashi Irie

发明人： Yasuo Yatsugake ,  Hitoshi Kato ,  Moyuru Yasuhara ,  Takashi Irie

IPC分类号： G06K9/00

CPC分类号： G01N21/9501 ,  G01N21/94

摘要： The present invention provides a system capable of automatically making a diagnosis of a semiconductor device manufacturing apparatus, based on a result of particle detection on a substrate such as a semiconductor wafer. In one preferred embodiment, the surface of the wafer is divided into square-shaped minute areas of 0.1 mm to 0.5 mm, and existence of particles in each minute area is inspected. Based on the inspection result, data, in which existence of particles in each minute area is correlated with the address thereof, is created. The surface of the wafer is divided into several tens to several hundreds of evaluation areas. A binarized data is assigned to each evaluation area, and is determined based on the fact that the number of the minute areas in which particles are detected included in the evaluation area is larger, or not larger than a predetermined reference value. A correspondence table, showing the relationship between binarized data arrangements and the causes of particle adhesion, which is made based on empirical rules or experimental results, is prepared. By applying the binarized data made based on the inspection result to the correspondence table, the cause of particle adhesion can be identified.

摘要翻译： 本发明提供一种能够基于半导体晶片等基板上的粒子检测结果自动进行半导体装置制造装置的诊断的系统。 在一个优选实施例中，将晶片的表面分成0.1mm至0.5mm的方形微小区域，并且检查每个微小区域中的颗粒的存在。 基于检查结果，创建了每个微小区域中的粒子的存在与其地址相关联的数据。 晶片的表面分为几十到几百个评估区域。 将二值化数据分配给每个评估区域，并且基于包括在评估区域中的检测粒子的微小区域的数量较大或不大于预定参考值的事实来确定。 准备了基于经验规则或实验结果的二值化数据配置与颗粒粘附原因之间的关系的对应表。 通过将基于检查结果的二值化数据应用于对应表，可以确定颗粒附着的原因。