摘要:
A precursor for preparing a resist pattern comprises an imageable layer which includes a relatively volatile compound that can be volatilized by application of heat, wherein imaging radiation can be applied to the precursor to heat areas thereof and volatilizes said compound so that properties, for example, the ink accepting abilities of heated and non heated areas, are different.
摘要:
A planographic printing member precursor comprises a first component, for example a hydroxy group containing polymer, and a second component which may be a siloxane or a compound of general formula (I), wherein M represents a silicon or a titanium atom and each of R1, R2, R3 and R4 is independently selected from hydrogen or halogen atoms; a hydroxy group; an optionally substituted alkyl, alkenyl or alkynyl group; an optionally substituted alkoxy group; or an optionally substituted saturated or unsaturated cyclic or heterocyclic group. On exposure, the second component reacts with the first component to define an oleophobic/hydrophilic material in exposed areas and in non-exposed areas the second component is removed, on processing of the precursor.
摘要:
A planographic printing member precursor comprises a first component, for example a hydroxy group containing polymer, and a second component which may be a siloxane or a compound of general formula (I): wherein M represents a silicon or a titanium atom and each of R1, R2, R3 and R4 is independently selected from hydrogen or halogen atoms; a hydroxy group, an optionally substituted alkyl, alkenyl or alkynyl group; an optionally substituted alkoxy group; or an optionally substituted saturated or unsaturated cyclic or heterocyclic group. On exposure, the second component reacts with the first component to define an oleophobic/hydrophilic material in exposed areas and in non-exposed areas the second component is removed, on processing of the precursor.
摘要:
A planographic printing plate includes a radiation sensitive layer which may comprise a rubber material. Application of heat causes exposed areas to be vulcanized. The plate may be developed by applying a force to the radiation sensitive layer, for example by rubbing, thereby to remove non-exposed areas.
摘要:
This invention is directed to a precursor for preparing a resist pattern by heat mode imaging, the precursor comprising a heat sensitive composition, the solubility of which in an aqueous alkaline developer is arranged to increase in heated areas, and a means for increasing the resistance of non-heated areas of the heat sensitive composition to dissolution in an aqueous alkaline developer (the “developer resistance means”), wherein said developer resistance means comprises one or more compounds selected from the group consisting of: (A) compounds which include a poly(alkylene oxide) unit; (B) siloxanes; and (C) esters, ethers and amides of polyhydric alcohols, wherein said heat-sensitive composition comprises an aqueous alkaline developer soluble polymeric substance (i.e. the “active polymer”) and a compound which reduces the aqueous alkaline developer solubility of the polymeric substance (i.e. the “reversible insolubilizer compound”) such that the aqueous alkaline developer solubility of the composition is increased on heating and the aqueous alkaline developer solubility of the composition is not increased by incident UV radiation. The invention provides a solution to the problem of the relatively narrow solubility differential between imaged and non-imaged areas of heat sensitive positive working radiation sensitive compositions.
摘要:
The invention is directed to a method for producing a predetermined resist pattern on a substrate. The method includes the patternwise application of infrared radiation to a precursor which contains the substrate, having a coating thereon, wherein the coating contains a positive working composition; and the development of the pattern using a developer. The composition contains a polymeric substance having functional groups Q thereon, such that the functionalized polymeric substance has the property that it is developer insoluble prior to delivery of infrared radiation and developer soluble thereafter.
摘要:
There is described a method of preparing a water-less lithographic printing form using a precursor which includes a support having a coating thereon comprising a diazo salt formed from an aromatic diazonium compound and an abhesive counter anionic moiety, the method comprising heat mode imaging the precursor and processing the imaged percursor on press by the application of printing ink to remove the abhesive products of the imaging so that areas of the precursor which have been imaged are ink-accepting.