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公开(公告)号：US06537735B1
公开(公告)日：2003-03-25
申请号：US09477893
申请日：2000-01-05
申请人： Christopher David McCullough , Kevin Barry Ray , Alan Stanley Victor Monk , Stuart Bayes , Mark John Spowage
发明人： Christopher David McCullough , Kevin Barry Ray , Alan Stanley Victor Monk , Stuart Bayes , Mark John Spowage
IPC分类号： G03F730
CPC分类号： G03F7/2022 , B41C1/1008 , B41C2210/02 , B41C2210/06 , B41C2210/14 , B41C2210/22 , B41C2210/262 , B41M5/368 , B41M5/465 , G03F7/022 , G03F7/023 , G03F7/0233 , H05K3/0082
摘要： The invention is directed to a method for producing a predetermined resist pattern on a substrate. The method includes the patternwise application of infrared radiation to a precursor which contains the substrate, having a coating thereon, wherein the coating contains a positive working composition; and the development of the pattern using a developer. The composition contains a polymeric substance having functional groups Q thereon, such that the functionalized polymeric substance has the property that it is developer insoluble prior to delivery of infrared radiation and developer soluble thereafter.
摘要翻译： 本发明涉及一种在基板上制造预定抗蚀剂图案的方法。 该方法包括将红外辐射图案化地应用于含有基材的前体，其上具有涂层，其中涂层含有正性工作组合物; 并使用开发人员开发模式。 该组合物含有其上具有官能团Q的聚合物质，使得官能化聚合物质具有在红外辐射传递之前是显影剂不溶性的特性，此后可显影剂可溶。
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公开(公告)号：US06558869B1
公开(公告)日：2003-05-06
申请号：US09558110
申请日：2000-04-25
申请人： Christopher David McCullough , Kevin Barry Ray , Alan Stanley Monk , John David Riches , Anthony Paul Kitson , Gareth Rhodri Parsons , David Stephen Riley , Peter Andrew Reath Bennett , Richard David Hoare , James Laurence Mulligan , John Andrew Hearson , Carole-Anne Smith , Stuart Bayes , Mark John Spowage
发明人： Christopher David McCullough , Kevin Barry Ray , Alan Stanley Monk , John David Riches , Anthony Paul Kitson , Gareth Rhodri Parsons , David Stephen Riley , Peter Andrew Reath Bennett , Richard David Hoare , James Laurence Mulligan , John Andrew Hearson , Carole-Anne Smith , Stuart Bayes , Mark John Spowage
IPC分类号： G03F7039
CPC分类号： B41C1/1008 , B41C2210/02 , B41C2210/06 , B41C2210/22 , B41C2210/24 , B41C2210/262 , B41M5/368 , B41M5/46 , B41M5/465 , Y10S430/145 , Y10S430/146 , Y10S430/165
摘要： This invention is directed to a precursor for preparing a resist pattern by heat mode imaging, the precursor comprising a heat sensitive composition, the solubility of which in an aqueous alkaline developer is arranged to increase in heated areas, and a means for increasing the resistance of non-heated areas of the heat sensitive composition to dissolution in an aqueous alkaline developer (the “developer resistance means”), wherein said developer resistance means comprises one or more compounds selected from the group consisting of: (A) compounds which include a poly(alkylene oxide) unit; (B) siloxanes; and (C) esters, ethers and amides of polyhydric alcohols, wherein said heat-sensitive composition comprises an aqueous alkaline developer soluble polymeric substance (i.e. the “active polymer”) and a compound which reduces the aqueous alkaline developer solubility of the polymeric substance (i.e. the “reversible insolubilizer compound”) such that the aqueous alkaline developer solubility of the composition is increased on heating and the aqueous alkaline developer solubility of the composition is not increased by incident UV radiation. The invention provides a solution to the problem of the relatively narrow solubility differential between imaged and non-imaged areas of heat sensitive positive working radiation sensitive compositions.
摘要翻译： 本发明涉及通过热模式成像来制备抗蚀剂图案的前体，前体包括热敏组合物，其热溶性在碱性显影剂的水溶液中被设置为增加加热区域， 热敏组合物的非加热区域溶解在含水碱性显影剂（“显影剂阻挡装置”）中，其中所述显影剂阻力装置包括一种或多种选自以下的化合物：（A）包括聚 （环氧烷）单元;（B）硅氧烷; 和（C）多元醇的酯，醚和酰胺，其中所述热敏组合物包含水性碱性显影剂可溶性聚合物质（即“活性聚合物”）和降低聚合物质的碱性显影剂水溶液的化合物（ 即“可逆不溶物化合物”），使得组合物的碱性显影剂水溶液在加热时增加，并且组合物的水性碱性显影剂溶解度不会因入射的紫外线辐射而增加。 本发明提供了解决热敏感正性辐射敏感组合物的成像区域和非成像区域之间相对窄的溶解度差异的问题的解决方案。
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公开(公告)号：US06596469B2
公开(公告)日：2003-07-22
申请号：US09503095
申请日：2000-02-11
申请人： Christopher David McCullough , Kevin Barry Ray , Alan Stanley Victor Monk , John David Riches , Anthony Paul Kitson , Gareth Rhodri Parsons , David Stephen Riley , Peter Andrew Reath Bennett , Richard David Hoare
发明人： Christopher David McCullough , Kevin Barry Ray , Alan Stanley Victor Monk , John David Riches , Anthony Paul Kitson , Gareth Rhodri Parsons , David Stephen Riley , Peter Andrew Reath Bennett , Richard David Hoare
IPC分类号： G03C176
CPC分类号： G03F7/2022 , B41C1/1008 , B41C1/1016 , B41C2210/02 , B41C2210/06 , B41C2210/14 , B41C2210/22 , B41C2210/24 , B41C2210/262 , G03F7/022 , G03F7/023 , G03F7/0233 , H05K3/0082
摘要： A method of making a mask or an electronic part, for example a printed circuit, comprises the steps of delivering heat in a desired pattern to a precursor of the mask or electronic part, the precursor comprising a surface coated with a coating, the coating comprising a heat-sensitive composition itself comprising an aqueous developer soluble polymeric substance and a compound which reduces the aqueous developer solubility of the polymeric substance, wherein the aqueous developer solubility of the composition is not increased by incident UV radiation but is increased by the delivery of heat; then developing the precursor to remove the heat-sensitive composition in regions to which the heat was delivered. In the case of a printed circuit precursor the surface may be then etched in conventional manner to yield the required printed circuit.
摘要翻译： 制造掩模或电子部件（例如印刷电路）的方法包括以期望的图案将热量输送到掩模或电子部件的前体的步骤，前体包括涂覆有涂层的表面，该涂层包含 包含显影剂可溶性水溶性聚合物的热敏组合物和降低聚合物质的显影剂水溶性的化合物，其中组合物的水性显影剂溶解度不会因入射的紫外线辐射而增加，而是通过传递热而增加 ; 然后展开该前体以在传送热量的区域中除去热敏组合物。 在印刷电路前体的情况下，可以以常规方式蚀刻表面以产生所需的印刷电路。
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公开(公告)号：US06764807B2
公开(公告)日：2004-07-20
申请号：US09946756
申请日：2001-09-05
IPC分类号： G03F7004
CPC分类号： G03F7/0755 , B41C1/1008 , B41C1/1016 , B41C2210/04 , B41C2210/08 , B41C2210/16 , B41C2210/22 , B41C2210/24 , B41N1/003 , G03F7/0752 , Y10S430/106 , Y10S430/11 , Y10S430/112
摘要： A planographic printing member precursor comprises a first component, for example a hydroxy group containing polymer, and a second component which may be a siloxane or a compound of general formula (I), wherein M represents a silicon or a titanium atom and each of R1, R2, R3 and R4 is independently selected from hydrogen or halogen atoms; a hydroxy group; an optionally substituted alkyl, alkenyl or alkynyl group; an optionally substituted alkoxy group; or an optionally substituted saturated or unsaturated cyclic or heterocyclic group. On exposure, the second component reacts with the first component to define an oleophobic/hydrophilic material in exposed areas and in non-exposed areas the second component is removed, on processing of the precursor.
摘要翻译： 平版印刷构件前体包含第一组分，例如含羟基的聚合物，和第二组分，其可以是硅氧烷或通式（I）的化合物，其中M表示硅或钛原子，R各自 R 1，R 2，R 3和R 4独立地选自氢或卤原子; 羟基; 任选取代的烷基，烯基或炔基; 任选取代的烷氧基; 或任选取代的饱和或不饱和的环状或杂环基团。 在曝光时，第二组分与第一组分反应以在曝光区域和未暴露区域中限定疏油/亲水材料，在处理前体时，第二组分被除去。
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公开(公告)号：US06399271B1
公开(公告)日：2002-06-04
申请号：US09517846
申请日：2000-03-02
IPC分类号： G03C1735
CPC分类号： G03F7/0755 , B41C1/1008 , B41C1/1016 , B41C2210/04 , B41C2210/08 , B41C2210/16 , B41C2210/22 , B41C2210/24 , B41N1/003 , G03F7/0752 , Y10S430/106 , Y10S430/11 , Y10S430/112
摘要： A planographic printing member precursor comprises a first component, for example a hydroxy group containing polymer, and a second component which may be a siloxane or a compound of general formula (I): wherein M represents a silicon or a titanium atom and each of R1, R2, R3 and R4 is independently selected from hydrogen or halogen atoms; a hydroxy group, an optionally substituted alkyl, alkenyl or alkynyl group; an optionally substituted alkoxy group; or an optionally substituted saturated or unsaturated cyclic or heterocyclic group. On exposure, the second component reacts with the first component to define an oleophobic/hydrophilic material in exposed areas and in non-exposed areas the second component is removed, on processing of the precursor.
摘要翻译： 平版印刷构件前体包括第一组分，例如含羟基的聚合物，和第二组分，其可以是硅氧烷或通式（I）的化合物：其中M表示硅或钛原子，并且每个R 1 R2，R3和R4独立地选自氢或卤素原子; 羟基，任选取代的烷基，烯基或炔基; 任选取代的烷氧基; 或任选取代的饱和或不饱和的环状或杂环基团。 在曝光时，第二组分与第一组分反应以在曝光区域和未暴露区域中限定疏油/亲水材料，在处理前体时，第二组分被除去。
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6.发明授权Method of preparing a planographic printing member with a radiation sensitive member 失效制备具有辐射敏感元件的平版印刷元件的方法
公开(公告)号：US6138567A
公开(公告)日：2000-10-31
申请号：US373858
申请日：1999-08-13
CPC分类号： G03F7/36 , B41C1/1008 , B41C2210/04 , B41C2210/24 , B41N3/03
摘要： A planographic printing plate includes a radiation sensitive layer which may comprise a rubber material. Application of heat causes exposed areas to be vulcanized. The plate may be developed by applying a force to the radiation sensitive layer, for example by rubbing, thereby to remove non-exposed areas.
摘要翻译： 平版印刷版包括可以包括橡胶材料的辐射敏感层。 热的应用导致暴露的区域被硫化。 可以通过例如通过摩擦对辐射敏感层施加力来显影板，从而去除未暴露的区域。
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公开(公告)号：US06242159B1
公开(公告)日：2001-06-05
申请号：US09464201
申请日：1999-12-15
IPC分类号： G03F730
CPC分类号： B41C1/1008 , B41C1/1016 , B41C2210/04 , B41C2210/14 , B41C2210/16 , B41C2210/22 , G03F7/016
摘要： There is described a method of preparing a water-less lithographic printing form using a precursor which includes a support having a coating thereon comprising a diazo salt formed from an aromatic diazonium compound and an abhesive counter anionic moiety, the method comprising heat mode imaging the precursor and processing the imaged percursor on press by the application of printing ink to remove the abhesive products of the imaging so that areas of the precursor which have been imaged are ink-accepting.
摘要翻译： 描述了使用前体制备无水平版印刷版的方法，所述前体包括其上具有涂层的载体，其上包含由芳族重氮化合物形成的重氮盐和抗反阴离子部分，所述方法包括对所述前体进行加热模式成像 并且通过施加印刷油墨来处理成像的压痕物，以去除成像的粘合产物，使得已经被成像的前体的区域是油墨接受的。
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公开(公告)号：US06551763B1
公开(公告)日：2003-04-22
申请号：US09587224
申请日：2000-06-02
申请人： Anthony Paul Kitson , Peter Andrew Reath Bennett , Christopher David McCullough , Stuart Bayes , Kevin Barry Ray
发明人： Anthony Paul Kitson , Peter Andrew Reath Bennett , Christopher David McCullough , Stuart Bayes , Kevin Barry Ray
IPC分类号： G03F7039
CPC分类号： B41M5/368 , H05K3/0082 , Y10S430/106 , Y10S430/11 , Y10S430/111 , Y10S430/145 , Y10S430/146
摘要： A composition used as a resist in the manufacture of electronic parts, for example printed circuits, and which is rendered soluble in a developer by pattemwise delivery of heat, comprises a polymer and optionally an infrared absorbing compound. However in contrast to conventional compositions no compound is present which alters the solubility of the polymer in an aqueous developer.
摘要翻译： 在电子部件例如印刷电路的制造中用作抗蚀剂的组合物，其通过温度传递热量而变得可溶于显影剂，包括聚合物和任选的红外吸收化合物。 然而，与常规组合物不同，不存在改变聚合物在含水显影剂中的溶解度的化合物。
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公开(公告)号：US06461795B1
公开(公告)日：2002-10-08
申请号：US09558109
申请日：2000-04-25
申请人： Christopher David McCullough , Kevin Barry Ray , Alan Stanley Monk , John David Riches , Anthony Paul Kitson , Gareth Rhodri Parsons , David Stephen Riley
发明人： Christopher David McCullough , Kevin Barry Ray , Alan Stanley Monk , John David Riches , Anthony Paul Kitson , Gareth Rhodri Parsons , David Stephen Riley
IPC分类号： G03F7039
CPC分类号： B41N3/00 , B41M5/368 , H05K3/0082 , Y10S430/145 , Y10S430/146 , Y10S430/165
摘要： Phenolic resin compositions formulated for use in lithographic exposure processes are given a heat treatment at 40-90° C. for at least 4 hours shortly after their coating onto lithographic substrates, to produce lithographic printing forms. It is found that such a heat treatment improves later exposure processes, in particular by rendering the sensitivity of the compositions less variable, over time.
摘要翻译： 配制用于光刻曝光工艺的酚醛树脂组合物在其涂布在平版印刷基材上不久后在40-90℃下进行至少4小时的热处理，以产生平版印刷形式。 发现这种热处理改进了后续的曝光过程，特别是通过使组合物的灵敏度随时间变化而变小。
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公开(公告)号：US06416932B1
公开(公告)日：2002-07-09
申请号：US09669991
申请日：2000-09-26
IPC分类号： G03F726
CPC分类号： B41C1/1041 , B41C2210/16 , C08G8/32
摘要： A method of producing a resist pattern on a substrate using a precursor which comprises a coating composition which includes a heat sensitive polymeric substance having functional groups Q thereon (wherein groups Q may be siloxane or optionally substituted fluoroalkyl groups) wherein groups Q cause the polymeric substance to have a reduced adhesive interaction with ink for use in waterless lithographic printing compared to aid polymeric substance in the absence of said groups, the method including the step of causing the patternwise application of heat to said coating composition and optional development thereby to define ink accepting areas in heat exposed areas and non-ink accepting areas in non-exposed areas.
摘要翻译： 一种使用前体制备抗蚀剂图案的方法，该前体包括包含其上具有官能团Q（其中基团Q可以是硅氧烷或任选取代的氟烷基）的热敏聚合物质的涂料组合物，其中基团Q引起聚合物质 与没有所述基团的帮助聚合物质相比，与无水平版印刷中使用的油墨具有降低的与油墨的相互作用，该方法包括对所述涂料组合物进行图案加热以及任选的显影步骤，从而定义油墨接受 非暴露地区的曝光区域和非油墨接收区域的区域。
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