Display substrate, method of manufacturing the same
    1.
    发明授权
    Display substrate, method of manufacturing the same 有权
    显示基板及其制造方法

    公开(公告)号:US09570621B2

    公开(公告)日:2017-02-14

    申请号:US12977853

    申请日:2010-12-23

    摘要: The present invention discloses a thin film transistor (TFT), a method for manufacturing the TFT, and a display substrate using the TFT that may prevent degradation of the characteristics of an oxide semiconductor contained in the TFT by blocking external light from entering a channel region of the oxide semiconductor. The TFT includes an oxide semiconductor layer; a protective layer overlapping a channel region of the oxide semiconductor layer; an opaque layer disposed between the oxide semiconductor layer and the protective layer; a source electrode contacting a first side of the oxide semiconductor layer; a drain electrode contacting a second side of the oxide semiconductor layer and facing the source electrode across the channel region; a gate electrode to apply an electric field to the oxide semiconductor layer; and a gate insulating layer disposed between the gate electrode and the oxide semiconductor layer.

    摘要翻译: 本发明公开了一种薄膜晶体管(TFT),TFT的制造方法以及使用该TFT的显示基板,其可以防止外部光阻挡进入沟道区域而使TFT中包含的氧化物半导体的特性劣化 的氧化物半导体。 TFT包括氧化物半导体层; 与所述氧化物半导体层的沟道区域重叠的保护层; 设置在所述氧化物半导体层和所述保护层之间的不透明层; 与氧化物半导体层的第一面接触的源电极; 漏电极,与所述氧化物半导体层的第二侧接触,并跨过所述沟道区面对所述源电极; 用于向氧化物半导体层施加电场的栅电极; 以及设置在栅电极和氧化物半导体层之间的栅极绝缘层。

    Thin film transistor substrate and method of fabricating the same
    2.
    发明授权
    Thin film transistor substrate and method of fabricating the same 有权
    薄膜晶体管基板及其制造方法

    公开(公告)号:US08558230B2

    公开(公告)日:2013-10-15

    申请号:US12756323

    申请日:2010-04-08

    IPC分类号: H01L29/04 H01L29/10

    摘要: A thin film transistor (TFT) substrate and a method of fabricating the same are provided. The thin film transistor substrate may have low resistance characteristics and may have reduced mutual diffusion and contact resistance between an active layer pattern and data wiring. The thin film transistor substrate may include gate wiring formed on an insulating substrate. Oxide active layer patterns may be formed on the gate wiring and may include a first substance. Data wiring may be formed on the oxide active layer patterns to cross the gate wiring and may include a second substance. Barrier layer patterns may be disposed between the oxide active layer patterns and the data wiring and may include a third substance.

    摘要翻译: 提供薄膜晶体管(TFT)基板及其制造方法。 薄膜晶体管基板可以具有低电阻特性,并且可以减少有源层图案和数据布线之间的相互扩散和接触电阻。 薄膜晶体管基板可以包括形成在绝缘基板上的栅极布线。 氧化物有源层图案可以形成在栅极布线上,并且可以包括第一物质。 数据布线可以形成在氧化物有源层图案上以跨越栅极布线,并且可以包括第二物质。 阻挡层图案可以设置在氧化物活性层图案和数据布线之间,并且可以包括第三物质。

    THIN FILM TRANSISTOR SUBSTRATE AND METHOD OF FABRICATING THE SAME
    3.
    发明申请
    THIN FILM TRANSISTOR SUBSTRATE AND METHOD OF FABRICATING THE SAME 有权
    薄膜晶体管基板及其制造方法

    公开(公告)号:US20100276686A1

    公开(公告)日:2010-11-04

    申请号:US12756323

    申请日:2010-04-08

    摘要: A thin film transistor (TFT) substrate and a method of fabricating the same are provided. The thin film transistor substrate may have low resistance characteristics and may have reduced mutual diffusion and contact resistance between an active layer pattern and data wiring. The thin film transistor substrate may include gate wiring formed on an insulating substrate. Oxide active layer patterns may be formed on the gate wiring and may include a first substance. Data wiring may be formed on the oxide active layer patterns to cross the gate wiring and may include a second substance. Barrier layer patterns may be disposed between the oxide active layer patterns and the data wiring and may include a third substance.

    摘要翻译: 提供薄膜晶体管(TFT)基板及其制造方法。 薄膜晶体管基板可以具有低电阻特性,并且可以减少有源层图案和数据布线之间的相互扩散和接触电阻。 薄膜晶体管基板可以包括形成在绝缘基板上的栅极布线。 氧化物有源层图案可以形成在栅极布线上,并且可以包括第一物质。 数据布线可以形成在氧化物有源层图案上以跨越栅极布线,并且可以包括第二物质。 阻挡层图案可以设置在氧化物活性层图案和数据布线之间,并且可以包括第三物质。

    THIN FILM TRANSISTOR ARRAY SUBSTRATE AND METHOD OF FABRICATING THE SAME
    4.
    发明申请
    THIN FILM TRANSISTOR ARRAY SUBSTRATE AND METHOD OF FABRICATING THE SAME 有权
    薄膜晶体管阵列基板及其制造方法

    公开(公告)号:US20100051933A1

    公开(公告)日:2010-03-04

    申请号:US12500506

    申请日:2009-07-09

    IPC分类号: H01L29/786 H01L21/336

    CPC分类号: H01L27/1225 H01L29/7869

    摘要: A thin film transistor array substrate having a high charge mobility and that can raise a threshold voltage, and a method of fabricating the thin film transistor array substrate are provided. The thin film transistor array substrate includes: an insulating substrate; a gate electrode formed on the insulating substrate; an oxide semiconductor layer comprising a lower oxide layer formed on the gate electrode and an upper oxide layer formed on the lower oxide layer, such that the oxygen concentration of the upper oxide layer is higher than the oxygen concentration of the lower oxide layer; and a source electrode and a drain electrode formed on the oxide semiconductor layer and separated from each other.

    摘要翻译: 提供具有高电荷迁移率并且可以提高阈值电压的薄膜晶体管阵列基板,以及制造薄膜晶体管阵列基板的方法。 薄膜晶体管阵列基板包括:绝缘基板; 形成在所述绝缘基板上的栅电极; 氧化物半导体层,其包括形成在所述栅电极上的低氧化物层和形成在所述低氧化物层上的上氧化物层,使得所述上氧化物层的氧浓度高于所述低氧化物层的氧浓度; 以及形成在氧化物半导体层上并且彼此分离的源电极和漏电极。

    Thin film transistor array substrate and method of fabricating the same
    5.
    发明授权
    Thin film transistor array substrate and method of fabricating the same 有权
    薄膜晶体管阵列基板及其制造方法

    公开(公告)号:US08501551B2

    公开(公告)日:2013-08-06

    申请号:US13608981

    申请日:2012-09-10

    IPC分类号: H01L21/00

    CPC分类号: H01L27/1225 H01L29/7869

    摘要: A thin film transistor array substrate having a high charge mobility and that can raise a threshold voltage, and a method of fabricating the thin film transistor array substrate are provided. The thin film transistor array substrate includes: an insulating substrate; a gate electrode formed on the insulating substrate; an oxide semiconductor layer comprising a lower oxide layer formed on the gate electrode and an upper oxide layer formed on the lower oxide layer, such that the oxygen concentration of the upper oxide layer is higher than the oxygen concentration of the lower oxide layer; and a source electrode and a drain electrode formed on the oxide semiconductor layer and separated from each other.

    摘要翻译: 提供具有高电荷迁移率并且可以提高阈值电压的薄膜晶体管阵列基板,以及制造薄膜晶体管阵列基板的方法。 薄膜晶体管阵列基板包括:绝缘基板; 形成在所述绝缘基板上的栅电极; 氧化物半导体层,其包括形成在所述栅电极上的低氧化物层和形成在所述低氧化物层上的上氧化物层,使得所述上氧化物层的氧浓度高于所述低氧化物层的氧浓度; 以及形成在氧化物半导体层上并且彼此分离的源电极和漏电极。

    Thin film transistor array substrate and method of fabricating the same
    6.
    发明授权
    Thin film transistor array substrate and method of fabricating the same 有权
    薄膜晶体管阵列基板及其制造方法

    公开(公告)号:US08283666B2

    公开(公告)日:2012-10-09

    申请号:US12500506

    申请日:2009-07-09

    IPC分类号: H01L29/04

    CPC分类号: H01L27/1225 H01L29/7869

    摘要: A thin film transistor array substrate having a high charge mobility and that can raise a threshold voltage, and a method of fabricating the thin film transistor array substrate are provided. The thin film transistor array substrate includes: an insulating substrate; a gate electrode formed on the insulating substrate; an oxide semiconductor layer comprising a lower oxide layer formed on the gate electrode and an upper oxide layer formed on the lower oxide layer, such that the oxygen concentration of the upper oxide layer is higher than the oxygen concentration of the lower oxide layer; and a source electrode and a drain electrode formed on the oxide semiconductor layer and separated from each other.

    摘要翻译: 提供具有高电荷迁移率并且可以提高阈值电压的薄膜晶体管阵列基板,以及制造薄膜晶体管阵列基板的方法。 薄膜晶体管阵列基板包括:绝缘基板; 形成在所述绝缘基板上的栅电极; 氧化物半导体层,其包括形成在所述栅电极上的低氧化物层和形成在所述低氧化物层上的上氧化物层,使得所述上氧化物层的氧浓度高于所述低氧化物层的氧浓度; 以及形成在氧化物半导体层上并且彼此分离的源电极和漏电极。

    Thin-film transistor substrate having oxide active layer patterns and method of fabricating the same
    7.
    发明授权
    Thin-film transistor substrate having oxide active layer patterns and method of fabricating the same 有权
    具有氧化物活性层图案的薄膜晶体管衬底及其制造方法

    公开(公告)号:US08035110B2

    公开(公告)日:2011-10-11

    申请号:US12498816

    申请日:2009-07-07

    IPC分类号: H01L29/04

    摘要: A thin-film transistor (TFT) substrate has improved electrical properties and reduced appearance defects and a method of fabricating the TFT substrate, are provided. The TFT substrate includes: gate wiring which is formed on a surface of an insulating substrate; oxide active layer patterns which are formed on the gate wiring and include an oxide of a first material; buffer layer patterns which are disposed on the oxide active layer patterns to directly contact the oxide active layer patterns and include a second material; and data wiring which is formed on the buffer layer patterns to insulatedly cross the gate wiring, wherein a Gibbs free energy of the oxide of the first material is lower than a Gibbs free energy of an oxide of the second material.

    摘要翻译: 薄膜晶体管(TFT)基板具有改善的电性能和减少的外观缺陷以及制造TFT基板的方法。 TFT基板包括:形成在绝缘基板的表面上的栅极布线; 氧化物活性层图案,其形成在栅极布线上并且包括第一材料的氧化物; 缓冲层图案,其设置在所述氧化物活性层图案上以直接接触所述氧化物活性层图案并且包括第二材料; 以及形成在所述缓冲层图案上以绝缘地穿过所述栅极布线的数据布线,其中所述第一材料的氧化物的吉布斯自由能低于所述第二材料的氧化物的吉布斯自由能。

    Thin film transistor array panel and method for manufacturing the same
    8.
    发明授权
    Thin film transistor array panel and method for manufacturing the same 有权
    薄膜晶体管阵列面板及其制造方法

    公开(公告)号:US08198657B2

    公开(公告)日:2012-06-12

    申请号:US12652379

    申请日:2010-01-05

    IPC分类号: H01L23/52 H01L21/82

    CPC分类号: H01L27/124 H01L29/78618

    摘要: A thin film transistor array panel includes an insulating substrate. A gate line is formed on the insulating substrate and has a gate electrode. A gate insulating layer is formed on the gate line. A semiconductor layer is formed on the gate insulating layer and overlaps the gate electrode. Diffusion barriers are formed on the semiconductor layer and contain nitrogen. A data line crosses the gate line and has a source electrode partially contacting the diffusion barriers and a drain electrode partially contacting the diffusion barriers and facing the source electrode. The drain electrode is on the gate electrode. A pixel electrode is electrically connected to the drain electrode.

    摘要翻译: 薄膜晶体管阵列面板包括绝缘基板。 在绝缘基板上形成栅极线,并具有栅电极。 在栅极线上形成栅绝缘层。 半导体层形成在栅极绝缘层上并与栅电极重叠。 在半导体层上形成扩散阻挡层并含有氮。 数据线与栅极线交叉,并且具有部分地接触扩散阻挡层的源电极和部分地接触扩散阻挡层并面向源电极的漏电极。 漏电极在栅电极上。 像素电极电连接到漏电极。

    SPUTTERING TARGET APPARATUS
    9.
    发明申请
    SPUTTERING TARGET APPARATUS 有权
    喷射目标装置

    公开(公告)号:US20110031117A1

    公开(公告)日:2011-02-10

    申请号:US12779459

    申请日:2010-05-13

    IPC分类号: C23C14/34

    摘要: A sputtering target apparatus is provided. The sputtering target apparatus includes a first target assembly including a first target array having a first target, a second target disposed adjacent to the first target, and a first target dividing region disposed between the first and second targets, the first target assembly extending along a first direction, wherein the first target dividing region has a longitudinal cross-section that is oblique with respect to the first direction.

    摘要翻译: 提供溅射靶设备。 溅射靶设备包括:第一目标组件,其包括具有第一靶的第一靶阵列,与第一靶相邻设置的第二靶;以及设置在第一靶和第二靶之间的第一靶分离区, 第一方向,其中第一目标分割区域具有相对于第一方向倾斜的纵向横截面。