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公开(公告)号：US06787387B2
公开(公告)日：2004-09-07
申请号：US10601470
申请日：2003-06-23
IPC分类号： H01L2100
CPC分类号： G01J5/20 , B81B3/0072 , B81B2201/0207 , B81B2203/0127 , B81C1/00047 , B81C1/00801 , B81C2201/0109 , B81C2201/014 , G01F1/6845 , G01J5/023 , G01J5/024 , G01J5/045 , G01J5/10 , G01J5/34
摘要： A method for fabricating an electronic device includes the steps of: preparing a cavity defining sacrificial layer, at least the upper surface of which is covered with an etch stop layer; forming at least one first opening in the etch stop layer, thereby partially exposing the surface of the cavity defining sacrificial layer; etching the cavity defining sacrificial layer through the first opening, thereby defining a provisional cavity under the etch stop layer and a supporting portion that supports the etch stop layer thereon; and etching away a portion of the etch stop layer, thereby defining at least one second opening that reaches the provisional cavity through the etch stop layer and expanding the provisional cavity into a final cavity.
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公开(公告)号：US07364932B2
公开(公告)日：2008-04-29
申请号：US10515359
申请日：2003-12-25
IPC分类号： H01L28/00
摘要： In the present invention, an etching hole 21 is formed in a polysilicon film 14 as a cavity-wall member. Through the etching hole 21, hydrofluoric acid is injected, so as to dissolve a silicon oxide film 13, thereby forming a cavity 22. In the cavity 22, a detecting unit 12 of a sensor is in an exposed condition. Next, by sputtering, an Al film 16 is deposited in the etching hole 21 and on an upper face of a substrate. Thereafter, a portion of the Al film 16 positioned on the polysilicon film 14 is removed by etching back, thereby leaving only a metal closure 16a of Al which closes the etching hole. The sputtering step is performed under a pressure of 5 Pa or less, so that the pressure in the cavity can be held to be low.
摘要翻译： 在本发明中，在作为空腔壁构件的多晶硅膜14中形成蚀刻孔21。 通过蚀刻孔21注入氢氟酸，以溶解氧化硅膜13，从而形成空腔22。 在空腔22中，传感器的检测单元12处于暴露状态。 接下来，通过溅射，在蚀刻孔21中和基板的上表面上沉积Al膜16。 此后，通过蚀刻去除位于多晶硅膜14上的Al膜16的一部分，从而仅留下关闭蚀刻孔的Al的金属封闭体16a。 在5Pa以下的压力下进行溅射工序，能够将空腔内的压力保持为低。
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公开(公告)号：US20050017276A1
公开(公告)日：2005-01-27
申请号：US10877696
申请日：2004-06-25
CPC分类号： G01J5/20 , B81B3/0072 , B81B2201/0207 , B81B2203/0127 , B81C1/00047 , B81C1/00801 , B81C2201/0109 , B81C2201/014 , G01F1/6845 , G01J5/023 , G01J5/024 , G01J5/045 , G01J5/10 , G01J5/34
摘要： A method for fabricating an electronic device includes the steps of: preparing a cavity defining sacrificial layer, at least the upper surface of which is covered with an etch stop layer; forming at least one first opening in the etch stop layer, thereby partially exposing the surface of the cavity defining sacrificial layer; etching the cavity defining sacrificial layer through the first opening, thereby defining a provisional cavity under the etch stop layer and a supporting portion that supports the etch stop layer thereon; and etching away a portion of the etch stop layer, thereby defining at least one second opening that reaches the provisional cavity through the etch stop layer and expanding the provisional cavity into a final cavity.
摘要翻译： 一种制造电子器件的方法包括以下步骤：制备限定牺牲层的空腔，其至少其上表面被蚀刻停止层覆盖; 在蚀刻停止层中形成至少一个第一开口，从而部分地暴露限定牺牲层的空腔的表面; 蚀刻通过所述第一开口限定牺牲层的所述腔，从而在所述蚀刻停止层下方限定临时空腔，以及在其上支撑所述蚀刻停止层的支撑部分; 并且蚀刻掉蚀刻停止层的一部分，从而限定通过蚀刻停止层到达临时腔的至少一个第二开口，并将临时空腔膨胀成最终空腔。
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公开(公告)号：US07563635B2
公开(公告)日：2009-07-21
申请号：US11838937
申请日：2007-08-15
IPC分类号： H01L21/00
摘要： In the present invention, an etching hole 21 is formed in a polysilicon film 14 as a cavity-wall member. Through the etching hole 21, hydrofluoric acid is injected, so as to dissolve a silicon oxide film 13, thereby forming a cavity 22. In the cavity 22, a detecting unit 12 of a sensor is in an exposed condition. Next, by sputtering, an Al film 16 is deposited in the etching hole 21 and on an upper face of a substrate. Thereafter, a portion of the Al film 16 positioned on the polysilicon film 14 is removed by etching back, thereby leaving only a metal closure 16a of Al which closes the etching hole. The sputtering step is performed under a pressure of 5 Pa or less, so that the pressure in the cavity can be held to be low.
摘要翻译： 在本发明中，在作为空腔壁构件的多晶硅膜14中形成蚀刻孔21。 通过蚀刻孔21注入氢氟酸以溶解氧化硅膜13，从而形成空腔22.在空腔22中，传感器的检测单元12处于暴露状态。 接下来，通过溅射，在蚀刻孔21中和基板的上表面上沉积Al膜16。 此后，通过蚀刻去除位于多晶硅膜14上的Al膜16的一部分，从而仅留下关闭蚀刻孔的Al的金属封闭件16a。 在5Pa以下的压力下进行溅射工序，能够将空腔内的压力保持为低。
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公开(公告)号：US20050176179A1
公开(公告)日：2005-08-11
申请号：US10515359
申请日：2003-12-25
摘要： In the present invention, an etching hole 21 is formed in a polysilicon film 14 as a cavity-wall member. Through the etching hole 21, hydrofluoric acid is injected, so as to dissolve a silicon oxide film 13, thereby forming a cavity 22. In the cavity 22, a detecting unit 12 of a sensor is in an exposed condition. Next, by sputtering, an Al film 16 is deposited in the etching hole 21 and on an upper face of a substrate. Thereafter, a portion of the Al film 16 positioned on the polysilicon film 14 is removed by etching back, thereby leaving only a metal closure 16a of Al which closes the etching hole. The sputtering step is performed under a pressure of 5 Pa or less, so that the pressure in the cavity can be held to be low.
摘要翻译： 在本发明中，在作为空腔壁构件的多晶硅膜14中形成蚀刻孔21。 通过蚀刻孔21注入氢氟酸以溶解氧化硅膜13，从而形成空腔22.在空腔22中，传感器的检测单元12处于暴露状态。 接下来，通过溅射，在蚀刻孔21中和基板的上表面上沉积Al膜16。 此后，通过蚀刻去除位于多晶硅膜14上的Al膜16的一部分，从而仅留下关闭蚀刻孔的Al的金属封闭体16a。 在5Pa以下的压力下进行溅射工序，能够将空腔内的压力保持为低。
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公开(公告)号：US20060131501A1
公开(公告)日：2006-06-22
申请号：US11348357
申请日：2006-02-07
申请人： Kimiya Ikushima , Hiroyoshi Komobuchi , Asako Baba
发明人： Kimiya Ikushima , Hiroyoshi Komobuchi , Asako Baba
IPC分类号： G01J5/00
摘要： An electronic device according to the present invention includes: a cavity, which is surrounded with a cavity wall portion and which has a reduced pressure; a gettering thin film, which is arranged in the cavity and has the function of adsorbing a surrounding substance; and an activating portion, at least a part of which is arranged in the cavity and which has the function of activating the gettering thin film by generating heat.
摘要翻译： 根据本发明的电子设备包括：腔体，其被空腔壁部分包围并具有减压; 吸气薄膜，其布置在空腔中并具有吸附周围物质的功能; 以及激活部，其至少一部分配置在所述空腔内，具有通过产生热量来活化吸气薄膜的功能。
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公开(公告)号：US07309865B2
公开(公告)日：2007-12-18
申请号：US11348357
申请日：2006-02-07
申请人： Kimiya Ikushima , Hiroyoshi Komobuchi , Asako Baba
发明人： Kimiya Ikushima , Hiroyoshi Komobuchi , Asako Baba
IPC分类号： G01J5/00 , H01L29/74 , H01L23/20 , H01L21/322
摘要： An electronic device according to the present invention includes: a cavity, which is surrounded with a cavity wall portion and which has a reduced pressure; a gettering thin film, which is arranged in the cavity and has the function of adsorbing a surrounding substance; and an activating portion, at least a part of which is arranged in the cavity and which has the function of activating the gettering thin film by generating heat.
摘要翻译： 根据本发明的电子设备包括：腔体，其被空腔壁部分包围并具有减压; 吸气薄膜，其布置在空腔中并具有吸附周围物质的功能; 以及激活部，其至少一部分配置在所述空腔内，具有通过产生热量来活化吸气薄膜的功能。
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公开(公告)号：US20110043670A1
公开(公告)日：2011-02-24
申请号：US12914273
申请日：2010-10-28
申请人： Takeo AZUMA , Hiroyoshi Komobuchi , Taro Imagawa
发明人： Takeo AZUMA , Hiroyoshi Komobuchi , Taro Imagawa
IPC分类号： H04N5/335
CPC分类号： H04N9/045 , H04N5/145 , H04N5/2355 , H04N5/35554 , H04N9/07
摘要： An imaging and processing device includes: an optical element; a single imager with a color filter array of a plurality of colors attached thereto for outputting a value according to an amount of light which has been guided by the optical element and transmitted through the color filter array, thereby enabling to obtain separate images of the plurality of colors for every frame time point; a first adder section for adding together values, associated with a first color of the plurality of colors, of different images obtained over a plurality of frame time points; a second adder section for adding together a plurality of values, associated with a second color of the plurality of colors other than the first color, of an image captured at a single frame time point; and an image restoring section for restoring an image including a plurality of colors at each frame time point from an image based on the first color which has been subjected to the addition by the first adder section, and an image based on the second color which has been subjected to the addition by the second adder section.
摘要翻译： 一种成像和处理装置，包括：光学元件; 具有附着于其上的多个颜色的滤色器阵列的单个成像器，用于根据由光学元件引导并透射通过滤色器阵列的光量输出值，从而能够获得多个颜色的分离图像 每个帧时间点的颜色; 第一加法器部分，用于将与多个颜色的第一颜色相关联的值与多个帧时间点获得的不同图像相加; 第二加法器部分，用于将与单个帧时间点捕获的图像中除了第一颜色之外的多种颜色的第二颜色相关联的多个值相加在一起; 以及图像恢复部分，用于基于已经经过第一加法器部分的相加的第一颜色的图像在每个帧时间点恢复包括多种颜色的图像，以及基于第二颜色的图像，其具有 被第二加法器部分加入。
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公开(公告)号：US07340098B2
公开(公告)日：2008-03-04
申请号：US11541508
申请日：2006-09-29
IPC分类号： G06K9/46
CPC分类号： G06K9/4661
摘要： An image feature analyzing section performs an image feature analysis with respect to an input image to output an image feature vector. A parameter output section stores a plurality of image feature vectors and a plurality of parameters corresponding to the respective image feature vectors and outputs an original parameter value corresponding to an image feature vector. A parameter operation setting section determines contents of an operation of an illumination equation parameter, depending on a prescribed image conversion. A parameter operating section operates the original parameter value in accordance with a prescription of the parameter operation setting section, to obtain a new parameter value. An image generating section generates an output image based on the new parameter value.
摘要翻译： 图像特征分析部分执行关于输入图像的图像特征分析以输出图像特征向量。 参数输出部存储与各图像特征矢量对应的多个图像特征矢量和多个参数，并输出与图像特征矢量对应的原始参数值。 参数运算设定部根据规定的图像变换来决定照度方程参数的动作的内容。 参数操作部根据参数运算设定部的处方来操作原参数值，得到新的参数值。 图像生成部基于新的参数值生成输出图像。
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10.发明申请Image processing method, image processing apparatus, image processing program, and image file format 有权图像处理方法，图像处理装置，图像处理程序和图像文件格式公开(公告)号：US20070229658A1
公开(公告)日：2007-10-04
申请号：US11807716
申请日：2007-05-30
CPC分类号： H04N5/232 , G06T3/40 , H04N5/2628 , H04N7/0135
摘要： In a learning process, first, images having different resolutions are obtained from a target region of the subject (S101). Further, the subject characteristic of the target region is obtained (S102). Then, the resolution conversion rules are learned from the images having different resolutions, and those are recorded to a storage device along with the subject characteristics (S103). When converting the resolutions, the resolution conversion rules learned for the corresponding subject characteristics are applied to each region of the original image so as to convert the resolutions of the original image.
摘要翻译： 在学习处理中，首先，从对象的目标区域获得具有不同分辨率的图像（S101）。 此外，获得目标区域的对象特征（S102）。 然后，从具有不同分辨率的图像中学习分辨率转换规则，并将它们与主题特征一起记录到存储装置（S103）。 当转换分辨率时，将针对相应对象特征学习的分辨率转换规则应用于原始图像的每个区域，以便转换原始图像的分辨率。
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