利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

155 条记录 (耗时 0.039 秒)

    Lithographic apparatus and methods
    1.
    发明授权
    Lithographic apparatus and methods 有权
    平版印刷设备和方法

    公开(公告)号：US08427627B2

    公开(公告)日：2013-04-23

    申请号：US12398403

    申请日：2009-03-05

    申请人： Koen Kivits ,  Hans Jansen ,  Vasco Miguel Matias Serrao

    发明人： Koen Kivits ,  Hans Jansen ,  Vasco Miguel Matias Serrao

    IPC分类号： G03B27/52 ,  G03B27/32

    CPC分类号： G03F7/7085 ,  G03F7/70341 ,  G03F7/70925

    摘要： A system for cleaning a limited area of a top surface of a substrate table or an object positioned on a top surface of a substrate table is disclosed. The optical system used during normal imaging is adjusted to limit the cross-sectional area of a radiation beam to form a cleaning radiation beam which impinges on the limited area.

    摘要翻译： 公开了一种用于清洁衬底台或位于衬底台顶表面上的物体的顶表面的有限区域的系统。 调整在正常成像期间使用的光学系统以限制辐射束的横截面积以形成撞击有限区域的清洁辐射束。

    Immersion lithography apparatus
    4.
    发明授权
    Immersion lithography apparatus 有权
    浸渍光刻设备

    公开(公告)号：US08817227B2

    公开(公告)日：2014-08-26

    申请号：US12285432

    申请日：2008-10-03

    申请人： Marco Koert Stavenga ,  Hans Jansen

    发明人： Marco Koert Stavenga ,  Hans Jansen

    IPC分类号： G03B27/52 ,  G03B27/42 ,  G03B27/58 ,  G03B27/32

    CPC分类号： G03F7/7085 ,  G03F7/70341

    摘要： An immersion lithographic apparatus is disclosed that includes a detector to measure a distance between a substrate support structure and/or a substrate and a fluid handling system and/or to detect when an item is present between the fluid handling system and a top surface of the substrate and/or substrate support structure. The detector may use information of an electrical property of the fluid provided by the fluid handling system to measure the distance. The detector may measure variation in resistance and/or in capacitance between an electrode of the fluid handling system and an electrode of the substrate and/or substrate support structure.

    摘要翻译： 公开了一种浸没式光刻设备，其包括用于测量衬底支撑结构和/或衬底与流体处理系统之间的距离的检测器和/或检测在流体处理系统和流体处理系统的顶表面之间何时存在物品 衬底和/或衬底支撑结构。 检测器可以使用由流体处理系统提供的流体的电性质的信息来测量距离。 检测器可以测量流体处理系统的电极和基板和/或基板支撑结构的电极之间的电阻和/或电容的变化。

    LITHOGRAPHIC APPARATUS AND IN-LINE CLEANING APPARATUS
    7.
    发明申请
    LITHOGRAPHIC APPARATUS AND IN-LINE CLEANING APPARATUS 有权
    平面设备和在线清洁设备

    公开(公告)号：US20120281190A1

    公开(公告)日：2012-11-08

    申请号：US13549037

    申请日：2012-07-13

    申请人： Roelof Frederik DE GRAAF ,  Hans Jansen ,  Bauke Jansen ,  Hubertus Leonardus Franciscus Heusschen

    发明人： Roelof Frederik DE GRAAF ,  Hans Jansen ,  Bauke Jansen ,  Hubertus Leonardus Franciscus Heusschen

    IPC分类号： G03B27/52

    CPC分类号： G03F7/70925 ,  G03F7/70341 ,  G03F7/7085

    摘要： A lithographic system includes an immersion type lithographic apparatus, which includes a support constructed and arranged to support a substrate, a projection system constructed and arranged to project a patterned beam of radiation onto a target portion of the substrate, a liquid confinement structure configured to at least partially fill a space between the projection system and at least one of the substrate and support with an immersion liquid, a liquid supply system arranged to provide the immersion liquid to the liquid confinement structure, and a cleaning liquid supply system arranged to provide a cleaning liquid to a surface of the lithographic apparatus that comes into contact with the immersion liquid. The system includes a switch to provide the cleaning liquid directly to the liquid confinement structure and to provide the immersion liquid indirectly to the liquid confinement structure via a liquid purification system.

    摘要翻译： 光刻系统包括浸没型光刻设备，其包括构造和布置成支撑衬底的支撑件，构造和布置成将图案化的辐射束投影到衬底的目标部分上的投影系统，配置为 用浸没液体至少部分地填充所述投影系统与所述基板和支撑体中的至少一个之间的空间，布置成将所述浸没液体提供给所述液体限制结构的液体供应系统，以及布置成提供清洁 液体流到与浸没液接触的光刻设备的表面。 该系统包括将洗涤液直接提供给液体限制结构并通过液体净化系统将浸液液体间接提供给液体限制结构的开关。

    Lithographic apparatus and in-line cleaning apparatus
    8.
    发明授权
    Lithographic apparatus and in-line cleaning apparatus 有权
    平版印刷设备和在线清洁设备

    公开(公告)号：US08243255B2

    公开(公告)日：2012-08-14

    申请号：US12318037

    申请日：2008-12-19

    申请人： Roelof Frederik De Graaf ,  Hans Jansen ,  Bauke Jansen ,  Hubertus Leonardus Franciscus Heusschen

    发明人： Roelof Frederik De Graaf ,  Hans Jansen ,  Bauke Jansen ,  Hubertus Leonardus Franciscus Heusschen

    IPC分类号： G03B27/52 ,  G03B27/42

    CPC分类号： G03F7/70925 ,  G03F7/70341 ,  G03F7/7085

    摘要： An immersion type lithographic apparatus includes an immersion system configured to at least partially fill an immersion space with an immersion liquid. The apparatus also includes an indicator configured to indicate whether a part of the immersion system should be cleaned and a cleaning liquid supply system configured to supply a cleaner to the part of the lithographic apparatus. The cleaner is at least one of a plurality of different cleaners. Each cleaner or combination of cleaners is configured to clean a different type and/or level of contamination in the part of the lithographic apparatus. The apparatus also includes a controller configured to control which of the plurality of cleaners is provided to the part of the lithographic apparatus, based on an indication received from the indicator.

    摘要翻译： 浸没式光刻设备包括浸没系统，其配置为至少部分地用浸没液体填充浸没空间。 该设备还包括指示器，其被配置为指示浸没系统的一部分是否应被清洁;以及清洁液体供应系统，被配置为向光刻设备的一部分提供清洁剂。 清洁器是多个不同清洁器中的至少一个。 每个清洁器或清洁器的组合被配置为清洁光刻设备的一部分中的不同类型和/或污染水平。 该设备还包括控制器，其被配置为基于从指示器接收的指示来控制将多个清洁器中的哪一个提供给光刻设备的一部分。