利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

24 条记录 (耗时 0.027 秒)

    Pattern forming method utilizing material with photoresist film underlayer and contrast enhancement overlayer containing photosensitive diazonium salt
    1.
    发明授权
    Pattern forming method utilizing material with photoresist film underlayer and contrast enhancement overlayer containing photosensitive diazonium salt 失效
    图案形成方法利用具有光致抗蚀剂膜底层和含有光敏重氮盐的对比度增强覆盖层的材料

    公开(公告)号：US5188924A

    公开(公告)日：1993-02-23

    申请号：US777449

    申请日：1991-10-16

    申请人： Kunihiro Ikari, deceased ,  Hirokazu Niki ,  Makoto Nakase ,  Toshiaki Shinozaki

    发明人： Kunihiro Ikari, deceased ,  Hirokazu Niki ,  Makoto Nakase ,  Toshiaki Shinozaki

    IPC分类号： G03F7/095

    CPC分类号： G03F7/095

    摘要： A pattern forming method, comprising the steps of providing a resist film on a substrate; providing a photosensitive film containing a photosensitive diazonium salt on the resist film; and then subjecting the resultant composite to pattern exposure by use of a light to which both of the resist film and the photosensitive diazonium salt are sensitive, can employ a composition for pattern formation which comprises a photosensitive diazonium salt, a resin binder and a solvent. By this method, a minute pattern of 1 .mu.m or less can be formed, utilizing effectively the UV-ray exposure technique of the prior art, with good dimensional precision and stability.

    摘要翻译： 一种图案形成方法，包括以下步骤：在基底上提供抗蚀剂膜; 在抗蚀剂膜上提供含有光敏重氮盐的感光膜; 然后使用所述抗蚀剂膜和感光重氮盐两者都敏感的光来对所得复合材料进行图案曝光，可以使用包含光敏重氮盐，树脂粘合剂和溶剂的图案形成用组合物。 通过该方法，可以有效利用现有技术的紫外线照射技术形成1μm以下的微小图案，具有良好的尺寸精度和稳定性。

    Photosensitive composition
    2.
    再颁专利
    Photosensitive composition 有权
    感光组合物

    公开(公告)号：USRE38256E1

    公开(公告)日：2003-09-23

    申请号：US09448977

    申请日：1999-11-24

    申请人： Toru Ushirogouchi ,  Naomi Shida ,  Takuya Naito ,  Koji Asakawa ,  Akinori Hongu ,  Makoto Nakase ,  Hirokazu Niki

    发明人： Toru Ushirogouchi ,  Naomi Shida ,  Takuya Naito ,  Koji Asakawa ,  Akinori Hongu ,  Makoto Nakase ,  Hirokazu Niki

    IPC分类号： G03F7021

    CPC分类号： G03F7/039 ,  G03F7/0045 ,  G03F7/0215 ,  G03F7/038 ,  Y10S430/107 ,  Y10S430/11 ,  Y10S430/111

    摘要： Disclosed are a safe slurry photosensitive composition superior in image formation capabilities such as resolution and sensitivity and containing no harmful compound, and a safe water-soluble photosensitive composition capable of being dissolved in water without using any organic solvent while maintaining a sufficient sensitivity as a resist and containing no harmful substance. The slurry photosensitive composition contains a compound which generates an acid when irradiated with light or ionizing radiation, at least one type of a resin with acid-crosslinkability or acid-decomposability, and a powder. Various devices can be manufactured by forming a layer of this photosensitive composition on a substrate, exposing the layer to light in accordance with a desired pattern, and heating the layer. The water-soluble photosensitive composition contains a compound which generates an acid when irradiated with light or ionizing radiation, and an acetal resin. This water-soluble photosensitive composition is coated on a substrate and irradiated with light or ionizing radiation in accordance with a desired pattern. The resultant substrate is chemically amplified by heating and developed with water. This makes it possible to safely form a pattern without using any ventilator.

    Photosensitive composition
    3.
    发明授权
    Photosensitive composition 失效
    感光组合物

    公开(公告)号：US5691101A

    公开(公告)日：1997-11-25

    申请号：US644395

    申请日：1996-05-09

    申请人： Toru Ushirogouchi ,  Naomi Shida ,  Takuya Naito ,  Koji Asakawa ,  Akinori Hongu ,  Makoto Nakase ,  Hirokazu Niki

    发明人： Toru Ushirogouchi ,  Naomi Shida ,  Takuya Naito ,  Koji Asakawa ,  Akinori Hongu ,  Makoto Nakase ,  Hirokazu Niki

    IPC分类号： G03F7/004 ,  G03F7/021 ,  G03F7/038 ,  G03F7/039 ,  G03F7/023

    CPC分类号： G03F7/039 ,  G03F7/0045 ,  G03F7/0215 ,  G03F7/038 ,  Y10S430/107 ,  Y10S430/11 ,  Y10S430/111

    摘要： Disclosed are a safe slurry photosensitive composition superior in image formation capabilities such as resolution and sensitivity and containing no harmful compound, and a safe water-soluble photosensitive composition capable of being dissolved in water without using any organic solvent while maintaining a sufficient sensitivity as a resist and containing no harmful substance. The slurry photosensitive composition contains a compound which generates an acid when irradiated with light or ionizing radiation, at least one type of a resin with acid-crosslinkability or acid-decomposability, and a powder. Various devices can be manufactured by forming a layer of this photosensitive composition on a substrate, exposing the layer to light in accordance with a desired pattern, and heating the layer. The water-soluble photosensitive composition contains a compound which generates an acid when irradiated with light or ionizing radiation, and an acetal resin. This water-soluble photosensitive composition is coated on a substrate and irradiated with light or ionizing radiation in accordance with a desired pattern. The resultant substrate is chemically amplified by heating and developed with water. This makes it possible to safely form a pattern without using any ventilator.

    摘要翻译： 公开了一种安全的浆料感光性组合物，其成像能力如分辨率和灵敏度优异且不含有害化合物，以及能够在不使用任何有机溶剂的情况下溶解在水中的安全的水溶性光敏组合物，同时保持足够的灵敏度作为抗蚀剂 不含有害物质。 浆料光敏组合物含有当用光或电离辐射照射时产生酸的化合物，至少一种具有酸交联性或酸分解性的树脂和粉末。 可以通过在基板上形成这种感光性组合物的层来制造各种装置，根据期望的图案将该层曝光，并加热该层。 水溶性光敏组合物含有当用光或电离辐射照射时产生酸的化合物和缩醛树脂。 将该水溶性感光性组合物涂布在基材上，并根据期望的图案用光或电离辐射照射。 所得到的底物通过加热化学放大并用水显影。 这使得可以安全地形成图案而不使用任何呼吸机。

    Method of fabricating a reticle
    5.
    发明授权
    Method of fabricating a reticle 失效
    制作掩模版的方法

    公开(公告)号：US5589305A

    公开(公告)日：1996-12-31

    申请号：US453465

    申请日：1995-05-30

    申请人： Yoko Tomofuji ,  Makoto Nakase ,  Takashi Sato ,  Hiroaki Hazama ,  Haruki Komano ,  Shinichi Ito

    发明人： Yoko Tomofuji ,  Makoto Nakase ,  Takashi Sato ,  Hiroaki Hazama ,  Haruki Komano ,  Shinichi Ito

    IPC分类号： G03F1/00 ,  G03F9/00

    CPC分类号： G03F1/32 ,  G03F1/29 ,  G03F1/36

    摘要： In a reticle, a semi-transparent film pattern in place of a light blocking film pattern is used as a mask pattern having a size within a certain range, whereby an exposure system can be improved in resolution limit and faithful pattern transfer can be realized with a constant light quantity. A reticle may be of a stacked layer structure which comprises a shift film for providing a different optical path to exposure light, a mask substrate formed on the top or bottom of the shift film, and a transmissivity ratio adjustment layer having a predetermined transmissivity ratio to the exposure light. The material of a phase shifter may be adjusted in amplitude transmissivity ratio so that a shifter width for effectively improving a contrast can be made large and an accuracy necessary for a shifter width can be loosened. The mask pattern may include a semi-transparent film pattern which is made of silicon, a silicon compound, a mixture containing silicon, germanium, a germanium compound or a mixture containing germanium to provide a different optical path from that of the transparent part with respect to lithographic light. A silicon compound, a mixture containing silicon, germanium, a germanium compound or a mixture containing germanium is controlled in its composition ratio to form a semi-transparent film pattern on a transparent substrate.

    摘要翻译： 在掩模版中，代替遮光膜图案的半透明膜图案被用作尺寸在一定范围内的掩模图案，由此可以提高曝光系统的分辨率极限，并且可以实现忠实的图案转印 恒定光量。 掩模版可以是堆叠层结构，其包括用于向曝光光提供不同光路的移动膜，形成在换挡膜的顶部或底部上的掩模基板，以及透射比调节层，其具有预定的透射率与 曝光灯。 可以调节移相器的材料的振幅透射比，从而可以使用于有效地改善对比度的移位器宽度变大，并且可以松动换档器宽度所需的准确度。 掩模图案可以包括由硅制成的半透明膜图案，硅化合物，含有硅，锗，锗化合物或含有锗的混合物的混合物，以提供与透明部分不同的光路， 到平版印刷光。 将硅化合物，含有硅，锗，锗化合物或含有锗的混合物的混合物以其组成比控制，以在透明基板上形成半透明膜图案。

    Exposure mask, method of manufacturing the same, and exposure method using the same
    6.
    发明授权
    Exposure mask, method of manufacturing the same, and exposure method using the same 失效
    曝光掩模，其制造方法和使用其的曝光方法

    公开(公告)号：US5358808A

    公开(公告)日：1994-10-25

    申请号：US94442

    申请日：1993-07-21

    申请人： Akihiro Nitayama ,  Makoto Nakase ,  Kouji Hishimoto ,  Hirotsugu Wada

    发明人： Akihiro Nitayama ,  Makoto Nakase ,  Kouji Hishimoto ,  Hirotsugu Wada

    IPC分类号： G03F1/00 ,  G03F9/00

    CPC分类号： G03F1/29

    摘要： An exposure mask for lithography, a method of manufacturing the same, and an exposure method using the same are disclosed. A light-transmitting opening of the exposure mask has a main light-transmitting region located in the middle of the opening and having a first optical path length, and phase shift regions adjacent to a light-shielding layer and having a second optical path length, different from the first optical path length. Light transmitted through each phase shift region interferes with light transmitted through the main light-transmitting region at the edges of the light-transmitting opening, thus enabling a sharp photo-intensity distribution of total transmitted light to be obtained. As a result, the resolution of the exposure mask is improved.

    摘要翻译： 公开了一种用于光刻的曝光掩模，其制造方法和使用其的曝光方法。 曝光掩模的透光开口具有位于开口中间并具有第一光程长度的主透光区域和与遮光层相邻并且具有第二光程长度的相移区域， 不同于第一光路长度。 透过各相移区域的光干涉透过透光开口边缘的主透光区域的光，从而能够得到总透光的尖锐的光强度分布。 结果，改善了曝光掩模的分辨率。

    Reticle and method of fabricating reticle
    10.
    发明授权
    Reticle and method of fabricating reticle 失效
    刻线及其制作方法

    公开(公告)号：US5660956A

    公开(公告)日：1997-08-26

    申请号：US608946

    申请日：1996-02-29

    申请人： Yoko Tomofuji ,  Makoto Nakase ,  Takashi Sato ,  Hiroaki Hazama ,  Haruki Komano ,  Shinichi Ito

    发明人： Yoko Tomofuji ,  Makoto Nakase ,  Takashi Sato ,  Hiroaki Hazama ,  Haruki Komano ,  Shinichi Ito

    IPC分类号： G03F1/32 ,  G03F9/00

    CPC分类号： G03F1/32

    摘要： In a reticle, a semi-transparent film pattern in place of a light blocking film pattern is used as a mask pattern having a size within a certain range, whereby an exposure system can be improved in resolution limit and faithful pattern transfer can be realized with a constant light quantity. A reticle may be of a stacked layer structure which comprises a shift film for providing a different optical path to exposure light, a mask substrate formed on the top or bottom of the shift film, and a transmissivity ratio adjustment layer having a predetermined transmissivity ratio to the exposure light. The material of a phase shifter may be adjusted in amplitude transmissivity ratio so that a shifter width for effectively improving a contrast can be made large and an accuracy necessary for a shifter width can be loosened. The mask pattern may include a semi-transparent film pattern which is made of silicon, a silicon compound, a mixture containing silicon, germanium, a germanium compound or a mixture containing germanium to provide a different optical path from that of the transparent part with respect to lithographic light. A silicon compound, a mixture containing silicon, germanium, a germanium compound or a mixture containing germanium is controlled in its composition ratio to form a semi-transparent film pattern on a transparent substrate.

    摘要翻译： 在掩模版中，代替遮光膜图案的半透明膜图案被用作尺寸在一定范围内的掩模图案，由此可以提高曝光系统的分辨率极限，并且可以实现忠实的图案转印 恒定光量。 掩模版可以是堆叠层结构，其包括用于向曝光光提供不同光路的移动膜，形成在换挡膜的顶部或底部上的掩模基板，以及透射比调节层，其具有预定的透射率与 曝光灯。 可以调节移相器的材料的振幅透射比，从而可以使用于有效地改善对比度的移位器宽度变大，并且可以松动换档器宽度所需的准确度。 掩模图案可以包括由硅制成的半透明膜图案，硅化合物，含有硅，锗，锗化合物或含有锗的混合物的混合物，以提供与透明部分不同的光路， 到平版印刷光。 将硅化合物，含有硅，锗，锗化合物或含有锗的混合物的混合物以其组成比控制，以在透明基板上形成半透明膜图案。