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    Photosensitive composition
    1.
    再颁专利
    Photosensitive composition 有权
    感光组合物

    公开(公告)号：USRE38256E1

    公开(公告)日：2003-09-23

    申请号：US09448977

    申请日：1999-11-24

    申请人： Toru Ushirogouchi ,  Naomi Shida ,  Takuya Naito ,  Koji Asakawa ,  Akinori Hongu ,  Makoto Nakase ,  Hirokazu Niki

    发明人： Toru Ushirogouchi ,  Naomi Shida ,  Takuya Naito ,  Koji Asakawa ,  Akinori Hongu ,  Makoto Nakase ,  Hirokazu Niki

    IPC分类号： G03F7021

    CPC分类号： G03F7/039 ,  G03F7/0045 ,  G03F7/0215 ,  G03F7/038 ,  Y10S430/107 ,  Y10S430/11 ,  Y10S430/111

    摘要： Disclosed are a safe slurry photosensitive composition superior in image formation capabilities such as resolution and sensitivity and containing no harmful compound, and a safe water-soluble photosensitive composition capable of being dissolved in water without using any organic solvent while maintaining a sufficient sensitivity as a resist and containing no harmful substance. The slurry photosensitive composition contains a compound which generates an acid when irradiated with light or ionizing radiation, at least one type of a resin with acid-crosslinkability or acid-decomposability, and a powder. Various devices can be manufactured by forming a layer of this photosensitive composition on a substrate, exposing the layer to light in accordance with a desired pattern, and heating the layer. The water-soluble photosensitive composition contains a compound which generates an acid when irradiated with light or ionizing radiation, and an acetal resin. This water-soluble photosensitive composition is coated on a substrate and irradiated with light or ionizing radiation in accordance with a desired pattern. The resultant substrate is chemically amplified by heating and developed with water. This makes it possible to safely form a pattern without using any ventilator.

    Photosensitive composition
    2.
    发明授权
    Photosensitive composition 失效
    感光组合物

    公开(公告)号：US5691101A

    公开(公告)日：1997-11-25

    申请号：US644395

    申请日：1996-05-09

    申请人： Toru Ushirogouchi ,  Naomi Shida ,  Takuya Naito ,  Koji Asakawa ,  Akinori Hongu ,  Makoto Nakase ,  Hirokazu Niki

    发明人： Toru Ushirogouchi ,  Naomi Shida ,  Takuya Naito ,  Koji Asakawa ,  Akinori Hongu ,  Makoto Nakase ,  Hirokazu Niki

    IPC分类号： G03F7/004 ,  G03F7/021 ,  G03F7/038 ,  G03F7/039 ,  G03F7/023

    CPC分类号： G03F7/039 ,  G03F7/0045 ,  G03F7/0215 ,  G03F7/038 ,  Y10S430/107 ,  Y10S430/11 ,  Y10S430/111

    摘要： Disclosed are a safe slurry photosensitive composition superior in image formation capabilities such as resolution and sensitivity and containing no harmful compound, and a safe water-soluble photosensitive composition capable of being dissolved in water without using any organic solvent while maintaining a sufficient sensitivity as a resist and containing no harmful substance. The slurry photosensitive composition contains a compound which generates an acid when irradiated with light or ionizing radiation, at least one type of a resin with acid-crosslinkability or acid-decomposability, and a powder. Various devices can be manufactured by forming a layer of this photosensitive composition on a substrate, exposing the layer to light in accordance with a desired pattern, and heating the layer. The water-soluble photosensitive composition contains a compound which generates an acid when irradiated with light or ionizing radiation, and an acetal resin. This water-soluble photosensitive composition is coated on a substrate and irradiated with light or ionizing radiation in accordance with a desired pattern. The resultant substrate is chemically amplified by heating and developed with water. This makes it possible to safely form a pattern without using any ventilator.

    摘要翻译： 公开了一种安全的浆料感光性组合物，其成像能力如分辨率和灵敏度优异且不含有害化合物，以及能够在不使用任何有机溶剂的情况下溶解在水中的安全的水溶性光敏组合物，同时保持足够的灵敏度作为抗蚀剂 不含有害物质。 浆料光敏组合物含有当用光或电离辐射照射时产生酸的化合物，至少一种具有酸交联性或酸分解性的树脂和粉末。 可以通过在基板上形成这种感光性组合物的层来制造各种装置，根据期望的图案将该层曝光，并加热该层。 水溶性光敏组合物含有当用光或电离辐射照射时产生酸的化合物和缩醛树脂。 将该水溶性感光性组合物涂布在基材上，并根据期望的图案用光或电离辐射照射。 所得到的底物通过加热化学放大并用水显影。 这使得可以安全地形成图案而不使用任何呼吸机。

    Photosensitive material
    6.
    发明授权
    Photosensitive material 失效
    感光材料

    公开(公告)号：US6060207A

    公开(公告)日：2000-05-09

    申请号：US499974

    申请日：1995-07-10

    申请人： Naomi Shida ,  Toru Ushirogouchi ,  Takuya Naito ,  Makoto Nakase

    发明人： Naomi Shida ,  Toru Ushirogouchi ,  Takuya Naito ,  Makoto Nakase

    IPC分类号： G03F7/004 ,  G03F7/039 ,  G03F7/008

    CPC分类号： G03F7/039 ,  G03F7/0045 ,  Y10S430/111 ,  Y10S430/115 ,  Y10S430/122

    摘要： A photosensitive material which is very low in absorption of a light source of short wavelength and excellent in dry etch resistance. This photosensitive material comprises a compound having a terpenoid skeleton. Preferably, the compound having a terpenoid skeleton is a compound having a monovalent menthyl group or menthyl derivative group which can be represented by the general formula (1). ##STR1## wherein R is a hydrogen atom or a monovalent hydrocarbon group, R.sup.1 may be the same with or different from each other and individually represents a hydrogen atom, a halogen atom, a hydrocarbon group, a hydroxyl group, an alkoxyl group, an amino group, an alkoxy group, an amino group, an imide group, an amide group, or a sulfonyl group, a carboxyl group, a carbonyl group, or a sulfonamide group, and a pair of neighboring R.sup.1 may be connected together to form a closed ring.

    摘要翻译： 一种感光材料，其对短波长的光源的吸收非常低，并且具有优异的耐干蚀刻性。 该感光材料包含具有萜类骨架的化合物。 优选具有萜类骨架的化合物是具有可以由通式（1）表示的一价薄荷基或薄荷基衍生物基团的化合物。 其中R为氢原子或一价烃基，R 1可以相同或不同，分别表示氢原子，卤素原子，烃基，羟基，烷氧基，氨基， 烷氧基，氨基，酰亚胺基，酰胺基或磺酰基，羧基，羰基或磺酰胺基，并且一对相邻的R 1可以连接在一起形成封闭环。