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公开(公告)号：US5185812A
公开(公告)日：1993-02-09
申请号：US653236
申请日：1991-02-11
CPC分类号： G06T7/001 , G06K9/6202 , G06T2207/30148
摘要： A pattern inspection apparatus comprises a sensor data input section for inputting a two-dimensional inspected pattern as image data (sensor data) having a multivalued (non-binary) density distribution, design data input section for inputting reference pattern data (reference data) corresponding to the inspected pattern, a compare section for making a comparison between the image data and the reference data to obtain the difference in density therebeween, a minimum compare section for performing spatial differentiation filtering on the distribution of density between the inspected pattern and the reference pattern in different directions and obtaining the minimum of the absolute values of the filtered outputs, and a first defect determining section for detecting a defect on the basis of the minimum obtained by the compare section. In place of the first defect determining section, a maximum/minimum compare section for obtaining the minimum and maximum of the absolute values of the filtered outputs and a second defect determining section for detecting a defect on the basis of the density difference, the minimum and the maximum may be provided.
摘要翻译： 图案检查装置包括用于输入二维检查图案的传感器数据输入部分作为具有多值（非二进制）密度分布的图像数据（传感器数据），设计数据输入部分，用于输入相应的参考图案数据（参考数据） 检查图案的比较部分，用于对图像数据和参考数据进行比较以获得其密度差的比较部分，用于对被检查图案和参考图案之间的密度分布进行空间微分滤波的最小比较部分 并且获得滤波输出的绝对值的最小值;以及第一缺陷确定部分，用于基于由比较部分获得的最小值来检测缺陷。 代替第一缺陷确定部分，用于获得滤波输出的绝对值的最小值和最大值的最大/最小比较部分和用于基于密度差检测缺陷的第二缺陷确定部分， 可以提供最大值。
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公开(公告)号：US5404410A
公开(公告)日：1995-04-04
申请号：US180813
申请日：1994-01-10
申请人： Toru Tojo , Hideo Tsuchiya , Kyoji Yamashita , Mitsuo Tabata , Ryoichi Yoshikawa
发明人： Toru Tojo , Hideo Tsuchiya , Kyoji Yamashita , Mitsuo Tabata , Ryoichi Yoshikawa
CPC分类号： G06T7/001 , G06T2207/30148
摘要： A pattern defect inspection apparatus according to this invention comprises an irradiation circuit for irradiating a substrate on which a given pattern is drawn, a detector circuit for detecting said irradiated pattern on said substrate, a bit pattern generating circuit for quantizing and generating previously given design data by processing said design data based on specified figure information to obtain bit pattern data composed of a finite number of pixels, and a comparator circuit for detecting defects on said substrate by comparing the detected data from said detecting means with the data from said bit pattern generating means, wherein the bit pattern generating circuit has an additional parameter conditioner for setting the dimension of each pixel to be quantized into said bit pattern data to the desired value.
摘要翻译： 根据本发明的图案缺陷检查装置包括用于照射给定图案的基板的照射电路，用于检测所述基板上的所述照射图案的检测器电路，用于量化和生成先前给定的设计数据的位图生成电路 通过基于指定的图形信息处理所述设计数据以获得由有限数量的像素组成的位模式数据;以及比较器电路，用于通过将来自所述检测装置的检测数据与来自所述位图形生成的数据进行比较来检测所述衬底上的缺陷 装置，其中位模式产生电路具有附加参数调节器，用于将要量化的每个像素的尺寸设置为所述位模式数据为期望值。
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3.发明授权Multi charged particle beam writing apparatus and multi charged particle beam writing method 有权多带电粒子束写入装置和多带电粒子束写入方法公开(公告)号：US08710467B2
公开(公告)日：2014-04-29
申请号：US13597699
申请日：2012-08-29
IPC分类号： H01J37/302
CPC分类号： H01J37/3177 , B82Y10/00 , B82Y40/00 , H01J37/3026 , H01J37/3174 , H01J2237/31764 , H01J2237/31766 , H01L21/263 , H01L21/2633 , H01L21/3085
摘要： In accordance with one aspect of this invention, a multi charged particle beam writing apparatus includes an aperture member, in which a plurality of openings are formed, configured to form multi-beams by making portions of the charged particle beam pass through the plurality of openings; a plurality of blankers configured to perform blanking-deflect regarding beams corresponding to the multi-beams; a writing processing control unit configured to control writing processing with a plurality of beams having passed through different openings among the plurality of openings being irradiated on the target object at a predetermined control grid interval; and a dose controlling unit configured to variably control a dose of a beam associated with deviation according to a deviation amount when an interval between the plurality of beams irradiated is deviated from the control grid interval.
摘要翻译： 根据本发明的一个方面，一种多带电粒子束写入装置，包括：孔部件，其中形成有多个开口，构成为通过使带电粒子束的部分通过多个开口而形成多光束; ; 多个阻挡器，被配置为对与所述多光束对应的光束执行消隐偏转; 写入处理控制单元，被配置为以预定的控制网格间隔以多个已经穿过所述多个开口中的不同开口的光束来对所述目标物体照射的所述写入处理进行控制; 以及剂量控制单元，被配置为当所述多个照射的光束之间的间隔偏离所述控制网格间隔时，根据偏差量可变地控制与偏差相关联的光束的剂量。
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公开(公告)号：US4522479A
公开(公告)日：1985-06-11
申请号：US565616
申请日：1983-12-27
申请人： Masanori Yamada , Ryoichi Yoshikawa
发明人： Masanori Yamada , Ryoichi Yoshikawa
CPC分类号： G03B15/05 , G03B2215/0514
摘要： Disclosed is a power supply control device which automatically cuts off power to a flash apparatus by turning off a power switch a predetermined time after the switch is turned on to prevent waste of electrical energy arising from careless failure to turn off the power switch. The power supply control device is provided with a timer circuit which sets the predetermined period of time and is arbitrarily resetable with a manually operable power switch.
摘要翻译： 公开了一种电源控制装置，其通过在开关开启之后的预定时间内关闭电源开关来自动切断对闪光装置的电力，以防止由于不小心故障引起的电能的浪费而关闭电源开关。 电源控制装置设置有定时器电路，其设置预定时间段，并且可由手动操作的电源开关任意地重置。
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公开(公告)号：US4466719A
公开(公告)日：1984-08-21
申请号：US494628
申请日：1983-05-16
CPC分类号： G03B17/425
摘要： A camera which is provided with a motor for driving a wind-up mechanism to perform film feeding and shutter charging and which is arranged to have photographing actions carried out one after another upon completion of the film feeding and shutter charging, a wind-up device has a switch which is arranged to force the wind-up mechanism into completing the winding up action thereof by means of the motor in response to depression of a rewinding button.
摘要翻译： 一种照相机，其设置有用于驱动卷绕机构的电动机，以执行胶片馈送和快门充电，并且被配置为在胶片馈送和快门充电完成时依次执行拍摄动作，卷绕装置 具有开关，该开关被布置成响应于按下倒转按钮而通过电动机强制卷绕机构完成其卷绕动作。
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公开(公告)号：US4181417A
公开(公告)日：1980-01-01
申请号：US886352
申请日：1978-03-14
摘要： A single lens reflux camera of the type in which actuation of a first electromagnet causes sequential operation of the diaphragm, mirror and shutter, and in which the start of the opening operation of the shutter is followed, after an electronically timed interval, by actuation of a second electromagnet which controls closing operation of the shutter. In one embodiment, a device for preventing faulty operation of the shutter includes a voltage detector responsive to the drop of voltage of a battery below a satisfactory operating level for preventing the first electromagnet from being actuated when the shutter button is depressed, and an arresting mechanism arranged upon detection of abnormal operation of the second electromagnet at the start of operation of the mirror to stop a mirror drive means from further movement which would otherwise cause actuation of the shutter release.
摘要翻译： 一种单透镜回流照相机，其中第一电磁体的致动导致光阑，反射镜和快门的顺序操作，并且其中在电子定时间隔之后遵循快门的打开操作的开始，通过致动 第二电磁体，其控制快门的关闭操作。 在一个实施例中，用于防止快门故障操作的装置包括电压检测器，该电压检测器响应于低于满意的操作水平的电池的电压下降，以防止当快门按钮被按下时第一电磁体被致动，以及阻止机构 在检测到反射镜开始操作时检测到第二电磁体的异常操作，以停止反射镜驱动装置进一步移动，否则将导致快门释放的致动。
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公开(公告)号：US4114173A
公开(公告)日：1978-09-12
申请号：US758200
申请日：1977-01-10
申请人： Nobuo Tezuka , Masanori Uchidoi , Yukio Iura , Masami Shimizu , Ryoichi Yoshikawa , Hiroshi Aizawa
发明人： Nobuo Tezuka , Masanori Uchidoi , Yukio Iura , Masami Shimizu , Ryoichi Yoshikawa , Hiroshi Aizawa
CPC分类号： G03B17/38
摘要： A camera having an electrically operated self-timer is provided with an operation mode display device arranged so that when the camera is switched to an exposure control mode by the self-timer, the display being ready for actuation of the timer is rendered recognizable from the object side or to the photographer, while when switched to any other exposure control mode, this display is shielded so as not to be recognizable from the object side or to the photographer.
摘要翻译： 具有电动自拍器的相机设置有操作模式显示装置，其被布置成使得当通过自拍定时器将照相机切换到曝光控制模式时，可以从 物体侧或摄影者，当切换到任何其它曝光控制模式时，该屏幕被屏蔽，从而不能从物体侧或摄影者识别。
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公开(公告)号：US4656466A
公开(公告)日：1987-04-07
申请号：US777009
申请日：1985-09-17
IPC分类号： G02F1/1333 , G02F1/1335 , G09G3/18
CPC分类号： G02F1/133512 , G02F2001/133374
摘要： A display device in which display contents to be displayed by a display element such as a liquid crystal, as well as display portions and display forms can be recognized and display patterns can be easily recognized in cases where complicated photographing information is displayed.
摘要翻译： 在显示复杂的拍摄信息的情况下，能够识别要由液晶显示元件显示的显示内容以及显示部分和显示形式的显示装置，并且可以容易地识别显示图案。
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9.发明授权
公开(公告)号：US4623256A
公开(公告)日：1986-11-18
申请号：US674652
申请日：1984-11-26
申请人： Osamu Ikenaga , Ryoichi Yoshikawa
发明人： Osamu Ikenaga , Ryoichi Yoshikawa
IPC分类号： H01L21/66 , G01B11/24 , G01N21/94 , G01N21/956 , G03F1/84 , H01L21/027 , H01L21/30 , G01B11/00
摘要： A mask inspection apparatus is arranged to compare a measured data signal obtained by optically measuring a photomask with a design data signal representing an integrated circuit pattern so as to inspect defects of the photomask on which the integrated circuit pattern is drawn. To inspect the pattern area and its peripheral area of the mask in one step, a reference signal generator in the mask inspection apparatus is arranged to generate a reference signal containing a predetermined additional data signal representing the peripheral area of the integrated circuit pattern, in addition to the design data signal representing the integrated circuit pattern. The reference signal is compared with the measured data signal of the pattern area and its peripheral area.
摘要翻译： 掩模检查装置被布置为将通过光学测量光掩模获得的测量数据信号与表示集成电路图案的设计数据信号进行比较，以便检查其上绘制了集成电路图案的光掩模的缺陷。 为了一步检查掩模的图案区域及其外围区域，掩模检查装置中的参考信号发生器被配置为产生包含表示集成电路图案的外围区域的预定附加数据信号的参考信号，另外 到表示集成电路图案的设计数据信号。 将参考信号与图案区域及其周边区域的测量数据信号进行比较。
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10.发明授权Apparatus for inspecting a circuit pattern drawn on a photomask used in manufacturing large scale integrated circuits 失效用于检查在制造大规模集成电路中使用的光掩模上绘制的电路图案的装置
公开(公告)号：US4559603A
公开(公告)日：1985-12-17
申请号：US535334
申请日：1983-09-23
申请人： Ryoichi Yoshikawa
发明人： Ryoichi Yoshikawa
IPC分类号： H01L21/66 , G01N21/88 , G01N21/956 , G03F1/00 , G03F1/84 , H01L21/027 , H01L21/30 , H01L21/68
摘要： A photomask on which a circuit pattern is drawn is placed on an x-y table and is illuminated by a light source. A linear image sensor, on which the circuit pattern is imaged, measures the circuit pattern along the direction substantially perpendicular to a moving direction of the x-y table to generate an analog signal in units of measured positions on the mask. In order to eliminate the need for matching the size of the pixel to be measured with the pixel size of the design pattern data and allow effective detection of a defect smaller than the pixel size, an analog-to-digital converter is arranged to convert the analog signal to multi-level digital data, and a measured point calculation circuit calculates the position of the measured point in units smaller than the pixel size unit in accordance with the position of the x-y table. A reference data calculation circuit is provided to calculate multi-level reference digital data which is to be obtained when the design pattern is measured at a calculated measured point taking sensitivity distribution characteristics (including resolution characteristics of lens) of image sensor elements into consideration. A defect detector compares the measured data with the reference data to detect the presence or absence of defects of the circuit pattern on the photomask.
摘要翻译： 将其上绘制电路图案的光掩模放置在x-y台上并由光源照射。 电路图案成像的线性图像传感器沿着基本上垂直于x-y表的移动方向的方向测量电路图案，以以掩模上的测量位置为单位产生模拟信号。 为了消除将要测量的像素的尺寸与设计图案数据的像素尺寸匹配的需要，并且允许有效检测小于像素尺寸的缺陷，布置模数转换器以将 模拟信号到多级数字数据，并且测量点计算电路根据xy表的位置计算小于像素大小单位的单位的测量点的位置。 提供参考数据计算电路以计算当考虑到图像传感器元件的灵敏度分布特性（包括透镜的分辨率特性）的计算的测量点处测量设计图案时将获得的多电平参考数字数据。 缺陷检测器将测量数据与参考数据进行比较，以检测光掩模上电路图案的缺陷的存在或不存在。
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