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1.发明授权Multi charged particle beam writing apparatus and multi charged particle beam writing method 有权多带电粒子束写入装置和多带电粒子束写入方法公开(公告)号：US08586951B2
公开(公告)日：2013-11-19
申请号：US13597772
申请日：2012-08-29
IPC分类号： H01J37/305
CPC分类号： H01J37/305 , B82Y10/00 , B82Y40/00 , H01J37/3177 , H01J2237/31761
摘要： In accordance with one aspect of this invention, a multi charged particle beam writing apparatus includes an aperture member, in which a plurality of openings are formed, configured to form multi-beams by making portions of the charged particle beam pass through the plurality of openings; a writing processing control unit configured to control writing processing so that a plurality of beams having passed through different openings among the plurality of openings are arranged to align on the target object; and a shot interval adjusting unit configured to adjust shot intervals among beams so that a maximum shot interval among beams being a control grid interval defined by a predetermined quantization size or a size which is prescribed within a predetermined range from the predetermined quantization size, or less when the shot intervals among beams which are arranged to align on the target object are different depending on a place.
摘要翻译： 根据本发明的一个方面，一种多带电粒子束写入装置，包括：孔部件，其中形成有多个开口，构成为通过使带电粒子束的部分通过多个开口而形成多光束; ; 写入处理控制单元，被配置为控制写入处理，使得已经穿过多个开口中的不同开口的多个光束被布置成在目标对象上对准; 以及拍摄间隔调整单元，被配置为调整光束之间的拍摄间隔，使得作为由预定量化尺寸定义的控制网格间隔或者在从预定量化尺寸或更小的预定范围内规定的尺寸的光束之间的最大拍摄间隔 当在目标对象上排列成对准的光束之间的拍摄间隔根据位置而不同时。
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2.发明申请公开(公告)号：US20130056647A1
公开(公告)日：2013-03-07
申请号：US13597699
申请日：2012-08-29
IPC分类号： G21K5/04
CPC分类号： H01J37/3177 , B82Y10/00 , B82Y40/00 , H01J37/3026 , H01J37/3174 , H01J2237/31764 , H01J2237/31766 , H01L21/263 , H01L21/2633 , H01L21/3085
摘要： In accordance with one aspect of this invention, a multi charged particle beam writing apparatus includes an aperture member, in which a plurality of openings are formed, configured to form multi-beams by making portions of the charged particle beam pass through the plurality of openings; a plurality of blankers configured to perform blanking-deflect regarding beams corresponding to the multi-beams; a writing processing control unit configured to control writing processing with a plurality of beams having passed through different openings among the plurality of openings being irradiated on the target object at a predetermined control grid interval; and a dose controlling unit configured to variably control a dose of a beam associated with deviation according to a deviation amount when an interval between the plurality of beams irradiated is deviated from the control grid interval.
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3.发明申请MULTI CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTI CHARGED PARTICLE BEAM WRITING METHOD 有权多电荷粒子束写入装置和多重粒子束写入方法公开(公告)号：US20130056645A1
公开(公告)日：2013-03-07
申请号：US13597772
申请日：2012-08-29
IPC分类号： G21K5/08
CPC分类号： H01J37/305 , B82Y10/00 , B82Y40/00 , H01J37/3177 , H01J2237/31761
摘要： In accordance with one aspect of this invention, a multi charged particle beam writing apparatus includes an aperture member, in which a plurality of openings are formed, configured to form multi-beams by making portions of the charged particle beam pass through the plurality of openings; a writing processing control unit configured to control writing processing so that a plurality of beams having passed through different openings among the plurality of openings are arranged to align on the target object; and a shot interval adjusting unit configured to adjust shot intervals among beams so that a maximum shot interval among beams being a control grid interval defined by a predetermined quantization size or a size which is prescribed within a predetermined range from the predetermined quantization size, or less when the shot intervals among beams which are arranged to align on the target object are different depending on a place.
摘要翻译： 根据本发明的一个方面，一种多带电粒子束写入装置，包括：孔部件，其中形成有多个开口，构成为通过使带电粒子束的部分通过多个开口而形成多光束; ; 写入处理控制单元，被配置为控制写入处理，使得已经穿过多个开口中的不同开口的多个光束被布置成在目标对象上对准; 以及拍摄间隔调整单元，被配置为调整光束之间的拍摄间隔，使得作为由预定量化尺寸定义的控制网格间隔或者在从预定量化尺寸或更小的预定范围内规定的尺寸的光束之间的最大拍摄间隔 当在目标对象上排列成对准的光束之间的拍摄间隔根据位置而不同时。
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4.发明授权Multi charged particle beam writing apparatus and multi charged particle beam writing method 有权多带电粒子束写入装置和多带电粒子束写入方法公开(公告)号：US08710467B2
公开(公告)日：2014-04-29
申请号：US13597699
申请日：2012-08-29
IPC分类号： H01J37/302
CPC分类号： H01J37/3177 , B82Y10/00 , B82Y40/00 , H01J37/3026 , H01J37/3174 , H01J2237/31764 , H01J2237/31766 , H01L21/263 , H01L21/2633 , H01L21/3085
摘要： In accordance with one aspect of this invention, a multi charged particle beam writing apparatus includes an aperture member, in which a plurality of openings are formed, configured to form multi-beams by making portions of the charged particle beam pass through the plurality of openings; a plurality of blankers configured to perform blanking-deflect regarding beams corresponding to the multi-beams; a writing processing control unit configured to control writing processing with a plurality of beams having passed through different openings among the plurality of openings being irradiated on the target object at a predetermined control grid interval; and a dose controlling unit configured to variably control a dose of a beam associated with deviation according to a deviation amount when an interval between the plurality of beams irradiated is deviated from the control grid interval.
摘要翻译： 根据本发明的一个方面，一种多带电粒子束写入装置，包括：孔部件，其中形成有多个开口，构成为通过使带电粒子束的部分通过多个开口而形成多光束; ; 多个阻挡器，被配置为对与所述多光束对应的光束执行消隐偏转; 写入处理控制单元，被配置为以预定的控制网格间隔以多个已经穿过所述多个开口中的不同开口的光束来对所述目标物体照射的所述写入处理进行控制; 以及剂量控制单元，被配置为当所述多个照射的光束之间的间隔偏离所述控制网格间隔时，根据偏差量可变地控制与偏差相关联的光束的剂量。
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5.发明授权Charged particle beam optical element charged particle beam exposure apparatus and method of adjusting the same 失效带电粒子束光学元件带电粒子束曝光装置及其调整方法
公开(公告)号：US6028317A
公开(公告)日：2000-02-22
申请号：US5640
申请日：1998-01-12
IPC分类号： G21K1/087 , G21K1/093 , H01J3/18 , H01J37/12 , H01J37/14 , H01J37/305 , H01L21/027 , G21K1/08 , H01J3/14
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , G21K1/087 , H01J3/18 , H01J37/12 , H01J2237/121 , H01J2237/151 , H01J2237/153 , H01J2237/3175
摘要： An optical element includes two electrodes 1 and 2 arranged at a distance to oppose each other and configured to converge an electron beam. The opposing surfaces of the electrodes 1 and 2 are so formed as to be cylindrically symmetrical along the beam passing direction and to form curves obtained by deforming hyperbolas in a direction perpendicular to the beam passing direction, in order that an electric field whose effective part except for an arbitrary constant of the field potential is given by.phi.=(k/2)r.sup.2 -.alpha.lnr-kz.sup.2is spatially partially formed in a cylindrical coordinate system defined by (r, z, .theta.).
摘要翻译： 光学元件包括两个彼此相对配置的距离并配置成会聚电子束的电极1和2。 电极1和2的相对表面被形成为沿着光束通过方向为圆柱对称，并且形成通过使垂直于光束通过方向的方向使双曲线变形而获得的曲线，以便将有效部分除外 对于场电位的任意常数由phi =（k / 2）给出，r2-α1nr-kz2在空间上部分地形成在由（r，z，θ）定义的圆柱坐标系中。
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6.发明授权Method for correcting astigmatism and focusing in charged particle optical lens-barrel 失效用于校正散光和聚焦在带电粒子光学镜片镜筒中的方法
公开(公告)号：US5793041A
公开(公告)日：1998-08-11
申请号：US711263
申请日：1996-09-09
IPC分类号： G01R31/302 , H01J37/153 , H01J37/21 , H01J37/28 , H01J37/10
CPC分类号： H01J37/21 , H01J37/153 , H01J37/28 , H01J2237/223
摘要： In a method for correcting astigmatism and focusing in a charged particle optical lens-barrel, according to the invention, Fourier transformation data items are obtained, which indicate images obtained by scanning a sample with a charged particle beam when the focal distance of an objective lens is set to each of at least two different values. Then, the configuration of the section of the beam is determined on the basis of the difference between the data items, thereby performing astigmatism correction and focusing. As a result, a charged particle microscope can perform highly accurate astigmatism correction and focusing during observation, irrespective of the surface configuration of the sample or the beam section on the sample.
摘要翻译： 在根据本发明的用于校正散光和聚焦的方法中，根据本发明，获得傅立叶变换数据项，其表示当物镜的焦距被扫描时带有带电粒子束的样本获得的图像 被设置为至少两个不同值中的每一个。 然后，基于数据项之间的差来确定光束的部分的配置，从而执行散光校正和聚焦。 结果，带电粒子显微镜可以在观察期间执行高精度的像散校正和聚焦，而不管样品的表面构型或样品上的光束部分如何。
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公开(公告)号：US4794340A
公开(公告)日：1988-12-27
申请号：US127089
申请日：1987-12-01
申请人： Munehiro Ogasawara
发明人： Munehiro Ogasawara
IPC分类号： H05H13/04
CPC分类号： H05H13/04
摘要： A synchrotron-type accelerator of the invention has a torus-shaped beam duct and an acceleration section inserted in the beam duct. The acceleraton section has an accelerating cavity communicating with the interior of the beam duct. An RF electric field is applied to the interior of the accelerating cavity. A damping antenna such as a loop antenna is arranged in the accelerating cavity. The damping antenna is supported to be movable in a direction with proper angle to the axis of the accelerating cavity and is connected to a linear drive unit arranged outside the acceleration section. The linear drive unit moves the damping antenna in a direction with proper angle to the axis of the accelerating cavity, so that an insertion amount of the damping antenna with respect to the accelerating cavity is varied.
摘要翻译： 本发明的同步加速器型加速器具有环形梁管道和插入射束管道中的加速段。 加速部分具有与束管内部连通的加速腔。 RF电场施加到加速腔的内部。 诸如环形天线的阻尼天线布置在加速腔中。 阻尼天线被支撑为可以在与加速腔的轴线成适当角度的方向上移动，并且连接到布置在加速部分外部的线性驱动单元。 线性驱动单元使阻尼天线沿与加速腔的轴线成适当角度的方向移动，使阻尼天线相对于加速腔的插入量变化。
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公开(公告)号：US20120235054A1
公开(公告)日：2012-09-20
申请号：US13240242
申请日：2011-09-22
IPC分类号： H01J3/14
CPC分类号： H01J37/244
摘要： According to one embodiment, an electron beam irradiation apparatus comprises an objective lens configured to irradiate a specimen surface with an electron beam, an electron detector which is provided between the objective lens and the specimen surface and which is configured to detect reflected electrons or secondary electrons emitted from the specimen surface, and an antireflection mechanism which is provided between the electron detector and the specimen surface. The antireflection mechanism has a plurality of holes following spiral trajectories of reflected electrons or secondary electrons emitted from the specimen surface and is configured to prevent the reflected electrons or secondary electrons from being re-reflected toward the specimen surface and to direct a part of the reflected electrons or secondary electrons to the electron detector.
摘要翻译： 根据一个实施例，电子束照射装置包括被配置为用电子束照射样本表面的物镜，设置在物镜和样本表面之间并被配置为检测反射电子或二次电子的电子检测器 从样品表面发射的反射机构，以及设置在电子检测器和试样表面之间的防反射机构。 防反射机构具有从被检体表面发射的反射电子或二次电子的螺旋轨迹之后的多个孔，并且被配置为防止反射的电子或二次电子朝向试样表面再反射并且引导反射的一部分 电子或二次电子到电子检测器。
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公开(公告)号：US07388216B2
公开(公告)日：2008-06-17
申请号：US11759057
申请日：2007-06-06
申请人： Munehiro Ogasawara
发明人： Munehiro Ogasawara
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/3026 , H01J37/3174 , H01J2237/30455 , H01J2237/31769 , Y10S430/143
摘要： A pattern forming method is proposed for easy correction of a pattern-size variation occurring in an etching process. An energy beam is radiated onto a resist-applied target while the energy beam is adjusted to correct the pattern-size variation occurring in the etching process. The resist on the target is developed to form a resist pattern. The target is etched with the resist pattern as a mask, thus forming patterns thereon.
摘要翻译： 提出了一种图案形成方法，用于容易校正在蚀刻工艺中发生的图案尺寸变化。 能量束被辐射到抗蚀剂施加的目标上，同时调整能量束以校正在蚀刻过程中发生的图案尺寸变化。 开发目标上的抗蚀剂以形成抗蚀剂图案。 用抗蚀剂图案作为掩模蚀刻靶，从而在其上形成图案。
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公开(公告)号：US07270921B2
公开(公告)日：2007-09-18
申请号：US10360801
申请日：2003-02-10
申请人： Munehiro Ogasawara
发明人： Munehiro Ogasawara
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/3026 , H01J37/3174 , H01J2237/30455 , H01J2237/31769 , Y10S430/143
摘要： A pattern forming method is proposed for easy correction of a pattern-size variation occurring in an etching process. An energy beam is radiated onto a resist-applied target while the energy beam is adjusted to correct the pattern-size variation occurring in the etching process. The resist on the target is developed to form a resist pattern. The target is etched with the resist pattern as a mask, thus forming patterns thereon.
摘要翻译： 提出了一种图案形成方法，用于容易校正在蚀刻工艺中发生的图案尺寸变化。 能量束被辐射到抗蚀剂施加的目标上，同时调整能量束以校正在蚀刻过程中发生的图案尺寸变化。 开发目标上的抗蚀剂以形成抗蚀剂图案。 用抗蚀剂图案作为掩模蚀刻靶，从而在其上形成图案。
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