公开(公告)号：US12064795B2

公开(公告)日：2024-08-20

申请号：US17211518

申请日：2021-03-24

Applicant: Lam Research Corporation

Inventor： Amir A. Yasseri ,  Hong Shih ,  John Daugherty ,  Duane Outka ,  Lin Xu ,  Armen Avoyan ,  Cliff La Croix ,  Girish Hundi

IPC: B08B7/04 ,  B08B3/04 ,  B08B3/12 ,  B08B3/14 ,  B08B5/02 ,  H01J37/32

CPC classification number: B08B7/04 ,  B08B3/048 ,  B08B3/12 ,  B08B3/14 ,  B08B5/02 ,  H01J37/32853

Abstract: A method for conditioning a component of a wafer processing chamber is provided. The component is placed in an ultrasonic conditioning solution in an ultrasonic solution tank. Ultrasonic energy is applied through the ultrasonic conditioning solution to the component to clean the component. The component is submerged in a megasonic conditioning solution in a tank. Megasonic energy is applied through the megasonic conditioning solution to the component to clean the component.

公开(公告)号：US12270748B2

公开(公告)日：2025-04-08

申请号：US17273264

申请日：2019-09-05

Applicant: LAM RESEARCH CORPORATION

Inventor： Amir A. Yasseri ,  Girish M. Hundi ,  John Michael Kerns ,  Duane Outka ,  John Daugherty ,  Cliff La Croix

IPC: G01N15/1434 ,  G01N1/22 ,  G01N15/14

Abstract: An apparatus for measuring contamination on a critical surface of a part is provided. A vessel for mounting the part is provided. An inert gas source is in fluid connection with the vessel and adapted to provide an inert gas to the vessel. At least one diffuser receives the inert gas from the vessel, wherein the critical surface of the part is exposed to the inert gas when the part is mounted in the vessel. At least one analyzer is adapted to receive inert gas from the at least one diffuser and measures contaminants in the inert gas.

公开(公告)号：US12072318B2

公开(公告)日：2024-08-27

申请号：US17612381

申请日：2020-05-19

Applicant: Lam Research Corporation

Inventor： Amir A. Yasseri ,  Duane Outka ,  Armen Avoyan ,  Kennet Cresencio Baylon ,  John Daugherty ,  Girish M. Hundi ,  Cliff La Croix

IPC: G01N29/14 ,  B08B3/12 ,  G01N1/02 ,  G01N29/02 ,  H01J37/32 ,  G01N1/00 ,  G01N1/40

CPC classification number: G01N29/14 ,  B08B3/12 ,  G01N1/02 ,  G01N29/02 ,  H01J37/32788 ,  G01N2001/002 ,  G01N2001/4094

Abstract: An apparatus for measuring contaminants on a surface of a component is provided. An extraction vessel for holding a measurement fluid has an opening adapted to form a meniscus using the measurement fluid. An actuator moves at least one of the extraction vessel and the component to a position where the meniscus is in contact with the surface of the component. A transducer is positioned to provide acoustic energy to the measurement fluid.

公开(公告)号：US11124659B2

公开(公告)日：2021-09-21

申请号：US15883787

申请日：2018-01-30

Applicant: Lam Research Corporation

Inventor： Amir A. Yasseri ,  Duane Outka ,  Hong Shih ,  John Daugherty

IPC: B05D1/32 ,  C09D5/00 ,  C09D1/00 ,  C01G25/02 ,  C23C4/02 ,  C23C4/12 ,  C23C4/01 ,  C01F7/02 ,  C23C4/18 ,  C23C4/10 ,  C23C4/11

Abstract: A method for providing a part with a plasma resistant ceramic coating for use in a plasma processing chamber is provided. A patterned mask is placed on the part. A film is deposited over the part. The patterned mask is removed. A plasma resistant ceramic coating is applied on the part.

公开(公告)号：US10967407B2

公开(公告)日：2021-04-06

申请号：US15969626

申请日：2018-05-02

Applicant: Lam Research Corporation

Inventor： Amir A. Yasseri ,  Hong Shih ,  John Daugherty ,  Duane Outka ,  Lin Xu ,  Armen Avoyan ,  Cliff La Croix ,  Girish Hundi

IPC: B08B7/00 ,  B08B7/04 ,  B08B5/02 ,  B08B3/04 ,  B08B3/14 ,  B08B3/12 ,  H01J37/32

Abstract: An apparatus for conditioning a component of a processing chamber is provided. A tank for holding a megasonic conditioning solution is provided. A mount holds the component immersed in a megasonic conditioning solution, when the tank is filled with the megasonic conditioning solution. A megasonic conditioning solution inlet system delivers the megasonic conditioning solution to the tank. A megasonic transducer head comprises at least one megasonic transducer to provide megasonic energy to the megasonic conditioning solution, wherein the megasonic energy is delivered to the component via the megasonic conditioning solution. A megasonic conditioning solution drain system drains the megasonic conditioning solution from the tank at a location above where the component is held in the megasonic conditioning solution. An actuator moves the megasonic transducer head across the tank.