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公开(公告)号：US10302553B2
公开(公告)日：2019-05-28
申请号：US15691405
申请日：2017-08-30
Applicant: Lam Research Corporation
Inventor： Cristian Siladie , Luc Albarede , Yassine Kabouzi , Edward J. McInerney , Sassan Roham
IPC: G01N21/15 , G01N21/3504 , H01L21/67
Abstract: A gas exhaust by-product measurement system is provided. A gas chamber is configured to receive exhaust from the exhaust output. A light source, light detector, and at least one optical element are positioned so that a light beam from the light source is directed to the at least one optical element a plurality of times before reaching the light detector. At least one heater provides heat to the at least one optical element. A plurality of purge gas nozzles are in fluid connection with the optical cavity. A high flow line is in fluid connection between a purge gas source and the plurality of purge gas nozzles. A low flow line is in fluid connection between the purge gas source and the plurality of purge gas nozzles. At least one flow controller manages a plurality of flow rates including a high flow and a low flow.
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公开(公告)号：US10825659B2
公开(公告)日：2020-11-03
申请号：US15399692
申请日：2017-01-05
Applicant: Lam Research Corporation
Inventor： Jason Lee Treadwell , Ivelin Angelov , Linda Marquez , Cristian Siladie
IPC: H01J37/32 , C23C16/455 , H01L21/67 , H01L21/683
Abstract: A gas injector for a substrate processing system includes a first injector housing including a base portion defining a first gas flow channel; a projecting portion extending from the base portion; and a second gas flow channel extending through the base portion and the projecting portion. The gas injector includes a second injector housing including a first cavity including a first opening, a second opening and a first plurality of gas through holes arranged around the second opening. The first gas flow channel communicates with the first plurality of gas through holes. The second injector housing includes a second cavity that includes a second plurality of gas through holes and that extends from the second opening of the first cavity. The second gas flow channel communicates with the second plurality of gas through holes. Gas in the first and second gas flow channels flows into a processing chamber without mixing.
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公开(公告)号：US11342163B2
公开(公告)日：2022-05-24
申请号：US16871829
申请日：2020-05-11
Applicant: LAM RESEARCH CORPORATION
Inventor： Ivelin Angelov , Cristian Siladie , Dean Larson , Brian Severson
Abstract: A method of operating a substrate support includes arranging a substrate on an inner portion of the substrate support and calculating a desired pocket depth of the substrate support using data indicative of a relationship between the desired pocket depth and at least one process parameter. The desired pocket depth corresponds to a desired distance between an upper surface of an edge ring surrounding the inner portion and an upper surface of the substrate. The method further includes selectively controlling, based on the desired pocket depth as calculated, an actuator to raise and lower at least one of the edge ring and the inner portion to adjust the distance between the upper surface of the edge ring and the upper surface of the substrate.
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公开(公告)号：US10651015B2
公开(公告)日：2020-05-12
申请号：US15422823
申请日：2017-02-02
Applicant: Lam Research Corporation
Inventor： Ivelin Angelov , Cristian Siladie , Dean Larson , Brian Severson
Abstract: A substrate support includes an inner portion arranged to support a substrate, an edge ring surrounding the inner portion, and a controller that calculates a desired pocket depth of the substrate support. Pocket depth corresponds to a distance between an upper surface of the edge ring and an upper surface of the substrate. Based on the desired pocket depth, the controller selectively controls an actuator to raise and lower at least one of the edge ring and the inner portion to adjust the distance between the upper surface of the edge ring and the upper surface of the substrate.
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Patent Agency Ranking
公开(公告)号：US20240395519A1
公开(公告)日：2024-11-28
申请号：US18689023
申请日：2022-09-14
Applicant: Lam Research Corporation
Inventor： Alexander Miller Paterson , Daniel Guzman , William T. Hart , Cristian Siladie , Michael John Martin , Michael Drymon , Yuhou Wang , John Drewery , Eduardo Castanos-Martinez , Jorge Luque
IPC: H01J37/32
Abstract: A plasma processing chamber has an upper window with a coil disposed above the upper window. A coil connection enclosure is disposed above the coil. A metrology enclosure is disposed above the coil connection enclosure. A spectral reflectometry system is disposed within the metrology enclosure. The spectral reflectometry system includes an optical collimator positioned to direct a beam of light through an opening in the metrology enclosure, an opening in the coil connection enclosure, and the upper window into the plasma processing chamber. The optical collimator is also configured to receive reflected light from within the plasma processing chamber, where the reflected light passes through the upper window and through the opening in the coil connection enclosure and through the opening in the metrology enclosure. A tip angle and a tilt angle of the optical collimator are remotely adjusted to optimize an orientation of the optical collimator.
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公开(公告)号：US20170236741A1
公开(公告)日：2017-08-17
申请号：US15422823
申请日：2017-02-02
Applicant: Lam Research Corporation
Inventor： Ivelin Angelov , Cristian Siladie , Dean Larson , Brian Severson
IPC: H01L21/683 , H01J37/32
CPC classification number: H01J37/3244 , H01J37/32082 , H01J37/32715 , H01J2237/334
Abstract: A substrate support includes an inner portion arranged to support a substrate, an edge ring surrounding the inner portion, and a controller that calculates a desired pocket depth of the substrate support. Pocket depth corresponds to a distance between an upper surface of the edge ring and an upper surface of the substrate. Based on the desired pocket depth, the controller selectively controls an actuator to raise and lower at least one of the edge ring and the inner portion to adjust the distance between the upper surface of the edge ring and the upper surface of the substrate.
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公开(公告)号：US20240404804A1
公开(公告)日：2024-12-05
申请号：US18689017
申请日：2022-09-13
Applicant: Lam Research Corporation
Inventor： Alexander Miller Paterson , Daniel Guzman , William T. Hart , Cristian Siladie , Michael John Martin , Yuhou Wang , Michael Drymon , John Drewery , Robert Griffith O'Neill , Luc Albarede , Neil Simon Ocampo
Abstract: A radiofrequency calibration system for a direct-drive radiofrequency power supply includes a reference box that includes a reference circuit for converting a non-reference input impedance to a reference output impedance. The reference box has an input connector electrically connected to a radiofrequency output coupling of the direct-drive radiofrequency power supply. A radiofrequency power meter has a radiofrequency power input electrically connected to an output connector of the reference box. The radiofrequency power meter has an input impedance and an output impedance that substantially match the reference output impedance of the reference box. A cable has a first end electrically connected to a radiofrequency power output of the radiofrequency power meter and a second end connected to a test load that has an impedance that substantially matches the reference output impedance of the reference box. A controller is connected in data communication with a data interface of the radiofrequency power meter.
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公开(公告)号：US20200273671A1
公开(公告)日：2020-08-27
申请号：US16871829
申请日：2020-05-11
Applicant: LAM RESEARCH CORPORATION
Inventor： Ivelin ANGELOV , Cristian Siladie , Dean Larson , Brian Severson
Abstract: A method of operating a substrate support includes arranging a substrate on an inner portion of the substrate support and calculating a desired pocket depth of the substrate support using data indicative of a relationship between the desired pocket depth and at least one process parameter. The desired pocket depth corresponds to a desired distance between an upper surface of an edge ring surrounding the inner portion and an upper surface of the substrate. The method further includes selectively controlling, based on the desired pocket depth as calculated, an actuator to raise and lower at least one of the edge ring and the inner portion to adjust the distance between the upper surface of the edge ring and the upper surface of the substrate.
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9.发明申请公开(公告)号：US20170200586A1
公开(公告)日：2017-07-13
申请号：US15399692
申请日：2017-01-05
Applicant: Lam Research Corporation
Inventor： Jason Lee Treadwell , Ivelin Angelov , Linda Marquez , Cristian Siladie
IPC: H01J37/32 , H01L21/683 , H01L21/67
Abstract: A gas injector for a substrate processing system includes a first injector housing including a base portion defining a first gas flow channel; a projecting portion extending from the base portion; and a second gas flow channel extending through the base portion and the projecting portion. The gas injector includes a second injector housing including a first cavity including a first opening, a second opening and a first plurality of gas through holes arranged around the second opening. The first gas flow channel communicates with the first plurality of gas through holes. The second injector housing includes a second cavity that includes a second plurality of gas through holes and that extends from the second opening of the first cavity. The second gas flow channel communicates with the second plurality of gas through holes. Gas in the first and second gas flow channels flows into a processing chamber without mixing.
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