Method of manufacturing an inverted bottom-emitting OLED device
    1.
    发明授权
    Method of manufacturing an inverted bottom-emitting OLED device 有权
    反向底部发射OLED器件的制造方法

    公开(公告)号:US08102114B2

    公开(公告)日:2012-01-24

    申请号:US12394077

    申请日:2009-02-27

    IPC分类号: H01L51/50

    摘要: A method of making an inverted bottom-emitting OLED device, comprising: providing a substrate; providing one or more first electrodes driven by n-type transistors on the substrate; providing an electron-transporting layer over the substrate and first electrode(s), wherein the electron-transporting layer comprises an n-type inorganic semiconductive material with a resistivity in the range of 1 to 105 ohm-cm and a bandgap greater than 2.5 eV; providing an organic light-emitting layer over the electron-transporting layer; providing a hole-transporting layer over the organic emitting layer; and providing a second electrode over the hole-transporting layer.

    摘要翻译: 一种制造反向底部发射OLED器件的方法,包括:提供衬底; 提供由衬底上的n型晶体管驱动的一个或多个第一电极; 在所述衬底和所述第一电极之上提供电子传输层,其中所述电子传输层包括电阻率在1至105欧姆 - 厘米和带隙大于2.5eV的n型无机半导体材料 ; 在电子传输层上提供有机发光层; 在有机发光层上提供空穴传输层; 并在空穴传输层上方提供第二电极。

    INVERTED BOTTOM-EMITTING OLED DEVICE
    2.
    发明申请
    INVERTED BOTTOM-EMITTING OLED DEVICE 有权
    反射底层发光OLED器件

    公开(公告)号:US20100219747A1

    公开(公告)日:2010-09-02

    申请号:US12394077

    申请日:2009-02-27

    IPC分类号: H01J1/63 H01L21/28

    摘要: A method of making an inverted bottom-emitting OLED device, comprising: providing a substrate; providing one or more first electrodes driven by n-type transistors on the substrate; providing an electron-transporting layer over the substrate and first electrode(s), wherein the electron-transporting layer comprises an n-type inorganic semiconductive material with a resistivity in the range of 1 to 105 ohm-cm and a bandgap greater than 2.5 eV; providing an organic light-emitting layer over the electron-transporting layer; providing a hole-transporting layer over the organic emitting layer; and providing a second electrode over the hole-transporting layer.

    摘要翻译: 一种制造反向底部发射OLED器件的方法,包括:提供衬底; 提供由衬底上的n型晶体管驱动的一个或多个第一电极; 在所述衬底和所述第一电极之上提供电子传输层,其中所述电子传输层包括电阻率在1至105欧姆 - 厘米和带隙大于2.5eV的n型无机半导体材料 ; 在电子传输层上提供有机发光层; 在有机发光层上提供空穴传输层; 并在空穴传输层上方提供第二电极。

    Inverted Bottom-Emitting OLED Device
    3.
    发明申请
    Inverted Bottom-Emitting OLED Device 审中-公开
    倒置底部发光OLED器件

    公开(公告)号:US20110024770A1

    公开(公告)日:2011-02-03

    申请号:US12902643

    申请日:2010-10-12

    IPC分类号: H01L51/50

    摘要: A method of making an inverted bottom-emitting OLED device, comprising: providing a substrate; providing one or more first electrodes driven by n-type transistors on the substrate; providing an electron-transporting layer over the substrate and first electrode(s), wherein the electron-transporting layer comprises an n-type inorganic semiconductive material with a resistivity in the range of 1 to 105 ohm-cm and a bandgap greater than 2.5 eV; providing an organic light-emitting layer over the electron-transporting layer; providing a hole-transporting layer over the organic emitting layer; and providing a second electrode over the hole-transporting layer.

    摘要翻译: 一种制造反向底部发射OLED器件的方法,包括:提供衬底; 提供由衬底上的n型晶体管驱动的一个或多个第一电极; 在所述衬底和所述第一电极之上提供电子传输层,其中所述电子传输层包括电阻率在1至105欧姆 - 厘米和带隙大于2.5eV的n型无机半导体材料 ; 在电子传输层上提供有机发光层; 在有机发光层上提供空穴传输层; 并在空穴传输层上方提供第二电极。

    NOVEL NANOPARTICLE PATTERNING PROCESS
    4.
    发明申请
    NOVEL NANOPARTICLE PATTERNING PROCESS 有权
    新型纳米图案方法

    公开(公告)号:US20070281249A1

    公开(公告)日:2007-12-06

    申请号:US11421894

    申请日:2006-06-02

    IPC分类号: G03F7/26

    CPC分类号: G03F7/40 G03F7/0047

    摘要: A method of making a metallic pattern (250) comprises: depositing a layer of photoresist (130) on a substrate (110); forming a patter on the photoresist; depositing a layer of metal nanoparticles (190) on the photoresist and pattern; removing the photoresist and overlying metal nanoparticles on the photoresist; and sintering the remaining nanoparticles to form a metallic pattern.

    摘要翻译: 制造金属图案(250)的方法包括:在基底(110)上沉积光致抗蚀剂层(130); 在光致抗蚀剂上形成图案; 在光致抗蚀剂和图案上沉积一层金属纳米粒子(190); 去除光致抗蚀剂并覆盖光致抗蚀剂上的金属纳米颗粒; 并烧结剩余的纳米颗粒以形成金属图案。

    Nanoparticle patterning process
    5.
    发明授权
    Nanoparticle patterning process 有权
    纳米粒子图案化过程

    公开(公告)号:US07745101B2

    公开(公告)日:2010-06-29

    申请号:US11421894

    申请日:2006-06-02

    IPC分类号: H01L21/00 G03F7/00

    CPC分类号: G03F7/40 G03F7/0047

    摘要: A method of making a metallic pattern (250) comprises: depositing a layer of photoresist (130) on a substrate (110); forming a pattern on the photoresist; depositing a layer of metal nanoparticles (190) on the photoresist and pattern; removing the photoresist and overlying metal nanoparticles on the photoresist; and sintering the remaining nanoparticles to form a metallic pattern.

    摘要翻译: 制造金属图案(250)的方法包括:在基底(110)上沉积光致抗蚀剂层(130); 在光致抗蚀剂上形成图案; 在光致抗蚀剂和图案上沉积一层金属纳米粒子(190); 去除光致抗蚀剂并覆盖光致抗蚀剂上的金属纳米颗粒; 并烧结剩余的纳米颗粒以形成金属图案。

    System for direct engraving of flexographic printing members
    6.
    发明授权
    System for direct engraving of flexographic printing members 有权
    用于直接雕刻柔版印刷构件的系统

    公开(公告)号:US08941028B2

    公开(公告)日:2015-01-27

    申请号:US13448433

    申请日:2012-04-17

    CPC分类号: B41C1/05 B41N1/12

    摘要: A system for engraving a flexographic relief member includes a laser scanning apparatus providing a focused radiation beam. The flexographic relief member includes a laser engraveable flexographic member; a thin engraveable control layer on top of the flexographic member; and wherein the engraveable control layer has an engraving sensitivity lower than the flexographic member.

    摘要翻译: 用于雕刻柔性版浮雕构件的系统包括提供聚焦辐射束的激光扫描装置。 柔性版浮雕构件包括激光雕刻柔版印刷构件; 在柔性版本的顶部上的薄的雕刻控制层; 并且其中所述可雕刻控制层具有低于所述柔版印刷构件的雕刻灵敏度。

    Digital manufacture of an optical waveguide
    7.
    发明授权
    Digital manufacture of an optical waveguide 有权
    光波导的数字制造

    公开(公告)号:US08778589B2

    公开(公告)日:2014-07-15

    申请号:US12569985

    申请日:2009-09-30

    IPC分类号: H01B11/00 H01P11/00

    摘要: The electrographic printing of one or more multi-channeled layers having a particular pattern by electrographic techniques that produces a three-dimensional optical waveguide electrographically. Such electrographic printing comprises the steps of forming a desired print image, electrographically, on a receiver member utilizing predetermined sized marking particles; and, where desired, forming one or more final multi-channeled layers utilizing marking particles of a predetermined size or size distribution.

    摘要翻译: 通过电摄影技术对一个或多个具有特定图案的多通道层的电印打印,其通过电摄影产生三维光波导。 这种电印打印包括以下步骤:利用预定尺寸的标记颗粒在接收器构件上以电摄影形成期望的打印图像; 并且如果需要,使用预定尺寸或尺寸分布的标记颗粒形成一个或多个最终的多通道层。

    Laser leveling highlight control
    8.
    发明授权
    Laser leveling highlight control 有权
    激光水平仪高亮度控制

    公开(公告)号:US08539881B2

    公开(公告)日:2013-09-24

    申请号:US13011103

    申请日:2011-01-21

    IPC分类号: B41C1/05

    CPC分类号: B41C1/05

    摘要: A method of preparing a flexographic printing member includes forming a relief image that consists of both fine-featured regions and coarse-featured regions; and leveling a top most surface of at least one of the coarse-featured regions by means of laser engravings.

    摘要翻译: 制备柔性版印刷构件的方法包括形成由精细特征区域和粗糙特征区域组成的浮雕图像; 并通过激光雕刻来平整至少一个粗糙特征区域的最顶面。

    LASER LEVELING HIGHLIGHT CONTROL
    9.
    发明申请
    LASER LEVELING HIGHLIGHT CONTROL 有权
    激光亮度控制

    公开(公告)号:US20120187603A1

    公开(公告)日:2012-07-26

    申请号:US13011103

    申请日:2011-01-21

    IPC分类号: B29C35/08

    CPC分类号: B41C1/05

    摘要: A method of preparing a flexographic printing member includes forming a relief image that consists of both fine-featured regions and coarse-featured regions; and leveling a top most surface of at least one of the coarse-featured regions by means of laser engravings.

    摘要翻译: 制备柔性版印刷构件的方法包括形成由精细特征区域和粗糙特征区域组成的浮雕图像; 并通过激光雕刻来平整至少一个粗糙特征区域的最顶面。

    Method for selective deposition and devices
    10.
    发明授权
    Method for selective deposition and devices 有权
    选择性沉积和器件的方法

    公开(公告)号:US07998878B2

    公开(公告)日:2011-08-16

    申请号:US12622550

    申请日:2009-11-20

    IPC分类号: H01L21/469 H01L21/31

    摘要: A chemical vapor deposition method such as an atomic-layer-deposition method for forming a patterned thin film includes applying a deposition inhibitor material to a substrate. The deposition inhibitor material is a hydrophilic polymer that is soluble in an aqueous solution comprising at least 50 weight % water and has an acid content of less than 2.5 meq/g of polymer. The deposition inhibitor material is patterned simultaneously or subsequently to its application to the substrate, to provide selected areas of the substrate effectively not having the deposition inhibitor material. A thin film is substantially deposited only in the selected areas of the substrate not having the deposition inhibitor material.

    摘要翻译: 用于形成图案化薄膜的诸如原子层沉积方法的化学气相沉积方法包括将沉积抑制剂材料施加到基底上。 沉积抑制剂材料是可溶于包含至少50重量%水并且酸含量低于2.5meq / g聚合物的水溶液的亲水性聚合物。 沉积抑制剂材料被图案化同时或随后被应用于基底,以提供有效地不具有沉积抑制剂材料的基底的选定区域。 薄膜仅基本沉积在不具有沉积抑制剂材料的基底的选定区域中。