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    Thermally processable imaging element
    2.
    发明授权
    Thermally processable imaging element 失效
    热处理成像元件

    公开(公告)号：US5981156A

    公开(公告)日：1999-11-09

    申请号：US915209

    申请日：1997-08-20

    Applicant: Sharon M. Melpolder ,  Peter J. Cowdery-Corvan ,  Alfred J. Alton

    Inventor： Sharon M. Melpolder ,  Peter J. Cowdery-Corvan ,  Alfred J. Alton

    IPC: G03C1/498 ,  G03C1/76

    CPC classification number: G03C1/49872 ,  G03C1/32 ,  G03C2200/33 ,  G03C2200/50

    Abstract: A method of making a thermally processable imaging element which comprises:i) forming a solution of poly(vinyl alcohol) in water;ii) adding matte particles to the resulting aqueous medium;iii) adding a compound of the formula I or formula II to the aqueous medium in an amount sufficient to inhibit agglomeration of the matte particles: ##STR1## wherein: the substituents are as described in the specification; iv) coating an image recording layer onto one side of a support;v) coating the aqueous medium containing the matte particles as an overcoat layer over the image recording layer or as backing layer on the side of the support opposite the image recording layer.

    Abstract translation: 一种制造可热加工成像元件的方法，包括：i）在水中形成聚（乙烯醇）溶液; ii）将哑光颗粒加入到所得水介质中; iii）将式I或式II化合物以足以抑制锍颗粒附聚的量向水性介质中加入：其中：取代基如说明书中所述; iv）将图像记录层涂覆到支撑体的一侧上; v）将包含无光泽颗粒的水性介质作为覆盖层涂覆在图像记录层上，或者作为背衬层在与图像记录层相对的支撑体侧上。

    Colored mask combined with selective area deposition
    3.
    发明授权
    Colored mask combined with selective area deposition 有权
    彩色面罩与选择性区域沉积相结合

    公开(公告)号：US08129098B2

    公开(公告)日：2012-03-06

    申请号：US11986169

    申请日：2007-11-20

    Applicant: Lyn M. Irving ,  Diane C. Freeman ,  Peter J. Cowdery-Corvan ,  Cheng Yang ,  David H. Levy

    Inventor： Lyn M. Irving ,  Diane C. Freeman ,  Peter J. Cowdery-Corvan ,  Cheng Yang ,  David H. Levy

    IPC: G03F7/20

    CPC classification number: H01L27/1288 ,  G03F7/0005 ,  G03F7/2022 ,  H01L27/1214 ,  H01L27/1225 ,  H01L27/1292 ,  H01L29/66765 ,  H01L29/7869

    Abstract: The invention relates to a process for forming a structure comprising (a) providing a transparent support; (b) forming a color mask on a first side of the transparent support; (c) applying a first layer comprising a deposition inhibitor material that is sensitive to visible light; (d) patterning the first layer by exposing the first layer through the color mask with visible light to form a first pattern and developing the deposition inhibitor material to provide selected areas of the first layer effectively not having the deposition inhibitor material; and (e) depositing a second layer of functional material over the transparent support; wherein the second layer of functional material is substantially deposited only in selected areas over the transparent support not having the deposition inhibitor material.

    Abstract translation: 本发明涉及一种用于形成结构的方法，包括（a）提供透明支撑体; （b）在所述透明支撑体的第一面上形成彩色掩模; （c）施加包含对可见光敏感的沉积抑制剂材料的第一层; （d）通过用可见光将所述第一层暴露于所述彩色掩模以形成第一图案并使所述沉积抑制剂材料显影以提供所述第一层的选定区域，而不具有所述沉积抑制剂材料; 和（e）在所述透明支撑体上沉积第二层功能材料; 其中第二层功能材料仅在不具有沉积抑制剂材料的透明支撑体上基本上沉积在选定的区域中。

    PROCESS FOR DEPOSITING ORGANIC MATERIALS
    6.
    发明申请
    PROCESS FOR DEPOSITING ORGANIC MATERIALS 有权
    沉积有机材料的工艺

    公开(公告)号：US20090081883A1

    公开(公告)日：2009-03-26

    申请号：US11861618

    申请日：2007-09-26

    Applicant: Diane C. Freeman ,  David H. Levy ,  Peter J. Cowdery-Corvan

    Inventor： Diane C. Freeman ,  David H. Levy ,  Peter J. Cowdery-Corvan

    IPC: H01L21/469

    CPC classification number: C23C16/30 ,  B05D1/60 ,  B05D2252/02 ,  C23C16/45551 ,  C23C16/45553 ,  C23C16/545

    Abstract: A process of making an organic thin film on a substrate by atomic layer deposition is disclosed, the process comprising simultaneously directing a series of gas flows along substantially parallel elongated channels, and wherein the series of gas flows comprises, in order, at least a first reactive gaseous material, an inert purge gas, and a second reactive gaseous material, optionally repeated a plurality of times, wherein the first reactive gaseous material is capable of reacting with a substrate surface treated with the second reactive gaseous material wherein the first reactive gaseous material, the second reactive gaseous material or both is a volatile organic compound. The process is carried out substantially at or above atmospheric pressure and at a temperature under 250° C., during deposition of the organic thin film.

    Abstract translation: 公开了通过原子层沉积在衬底上制造有机薄膜的方法，该方法包括同时引导一系列沿着大致平行的细长通道的气流，并且其中一系列气流依次包括至少第一 反应性气态材料，惰性吹扫气体和第二反应性气体材料，任选地重复多次，其中第一反应性气体材料能够与用第二反应性气态材料处理的基底表面反应，其中第一反应性气态材料 ，第二反应性气体物质或两者都是挥发性有机化合物。 在有机薄膜的沉积期间，该过程基本上在大气压以上且在250℃以下的温度下进行。

    Photothermographic and thermographic films containing low levels of formate to prevent fog
    9.
    发明授权
    Photothermographic and thermographic films containing low levels of formate to prevent fog 失效
    光热成像和热成像薄膜含有低水平的甲酸盐以防止雾

    公开(公告)号：US6037115A

    公开(公告)日：2000-03-14

    申请号：US890892

    申请日：1997-07-10

    Applicant: Alfred J. Alton ,  James P. Besse ,  Peter J. Cowdery-Corvan ,  Leo J. Magee, Jr. ,  Michael W. Martin

    Inventor： Alfred J. Alton ,  James P. Besse ,  Peter J. Cowdery-Corvan ,  Leo J. Magee, Jr. ,  Michael W. Martin

    IPC: G03C1/498

    CPC classification number: G03C1/49881 ,  G03C1/49818 ,  G03C1/49845 ,  G03C1/4989

    Abstract: A method of obtaining a photothermographic or thermographic film with reduced fog, such as pepper fog, comprises preparing a dispersion of: an oxidation-reduction image-forming combination comprising: a silver salt oxidizing agent and an organic reducing agent with: a synthetic polymer-peptized photosensitive silver halide, and a cyclic imide toner in a non-gelatin polymeric binder and mixing with said dispersion a sensitizing concentration of non-silver iodide salt formed from an ionic formate the improvement wherein said non-silver iodide salt contains less than about 100 micrograms of ionic formate per gram of iodide salt or the film contains less than about 0.5 micrograms of ionic formate per gram of emulsion in the film.

    Abstract translation: 一种获得具有减少灰雾的光热照相或热成像薄膜（例如胡椒雾）的方法包括制备分散体：一种氧化还原成像组合，其包含：银盐氧化剂和有机还原剂，其具有：合成聚合物 - 胶状感光卤化银和环状酰亚胺调色剂在非明胶聚合物粘合剂中并与所述分散体混合，其由离子甲酸盐形成的敏化浓度的非碘化银盐的改进，其中所述非碘化银盐含有小于约100 每克碘盐的微克离子型甲酸盐或薄膜中每克乳液含有小于约0.5微克的离子型甲酸盐。

    Thermally processable imaging element comprising aryliodonium compounds
    10.
    发明授权
    Thermally processable imaging element comprising aryliodonium compounds 失效
    含有芳基碘化合物的可热处理的成像元件

    公开(公告)号：US5714311A

    公开(公告)日：1998-02-03

    申请号：US780510

    申请日：1997-01-08

    Applicant: Peter J. Cowdery-Corvan ,  Roger L. Klaus ,  Franklin D. Saeva

    Inventor： Peter J. Cowdery-Corvan ,  Roger L. Klaus ,  Franklin D. Saeva

    IPC: G03C1/498

    CPC classification number: G03C1/4989 ,  G03C1/49845

    Abstract: This invention provides a thermally processable imaging element comprising a support and a thermographic or photothermographic imaging layer, said imaging layer comprising an aryliodonium compound represented by the formula: ##STR1## wherein R.sup.1 and R.sup.2 and R.sup.3 are independently H, or aliphatic, aromatic or heterocyclic groups, alkoxy groups, hydroxy groups, halogen atoms, aryloxy groups, alkylthio groups, arylthio groups, acyl groups, sulfonyl groups, acyloxy groups, carboxyl groups, cyano groups, nitro groups, sulfo groups, alkylsulfoxide or trifluoralkyl groups, or any two of R.sup.1, R.sup.2 and R.sup.3 together represent the atoms necessary to form a five or six-membered ring or a multiple ring system; R.sup.4 is a carboxylate salt or 0.sup.- ; w is 0 or 1; and X.sup.- is an anionic counter ion; with the proviso that when R.sup.3 is a carboxyl or sulfo group, w is 0 and R.sup.4 is 0.sup.-. In one embodiment the thermally processable imaging element comprises: (a) photographic silver halide, and (b) an image-forming combination comprising (i) an organic silver salt oxidizing agent, with (ii) a reducing agent for the organic silver salt oxidizing agent.

    Abstract translation: 本发明提供了一种可热加工的成像元件，其包括载体和热成像或光热成像层，所述成像层包含由下式表示的芳基碘鎓化合物：其中R 1和R 2和R 3独立地为H，或脂族，芳族或杂环 基团，烷氧基，羟基，卤素原子，芳氧基，烷硫基，芳硫基，酰基，磺酰基，酰氧基，羧基，氰基，硝基，磺基，烷基亚砜或三氟烷基， R1，R2和R3一起表示形成五元或六元环或多环体系所必需的原子; R 4是羧酸盐或O- w为0或1; X-是阴离子抗衡离子; 条件是当R3为羧基或磺基时，w为0且R4为0-。 在一个实施方案中，可热加工的成像元件包括：（a）照相卤化银，和（b）成像组合，其包含（i）有机银盐氧化剂，和（ii）有机银盐的还原剂氧化 代理商

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