公开(公告)号：US20050264782A1

公开(公告)日：2005-12-01

申请号：US10853558

申请日：2004-05-26

申请人： Lev Ryzhikov ,  Yuli Vladimirsky ,  Lev Sakin

发明人： Lev Ryzhikov ,  Yuli Vladimirsky ,  Lev Sakin

IPC分类号： G03F7/20 ,  G03B27/52 ,  H01L21/027

CPC分类号： G03F7/70791 ,  G03F7/70275 ,  G03F7/70291

摘要： A lithography system has a magnification module having multiple magnifications at a same time within an object plane, which can include a pattern generator therein. The pattern generator is used to pattern light from an illumination system, which is directed by a projection optical system onto a substrate to form features on a substrate. Having multiple magnifications in the object plate allows for patterning of both large and small features on an image plane, which can include the substrate therein. In one example, an array of pattern generators are used. In this example, substantially an entire surface of the substrate can be patterned with large and small features at substantially a same time.

摘要翻译： 光刻系统具有在物平面内同时具有多个倍率的放大模块，其中可以包括图案发生器。 图案发生器用于将来自投影光学系统的照明系统的光图案化到衬底上以在衬底上形成特征。 在对象板中具有多个放大率允许在可以包括其中的基板的图像平面上图案化大和小特征。 在一个示例中，使用图案生成器的阵列。 在该示例中，基本上整个表面的基板可以在大致相同的时间以大的和小的特征图案化。

公开(公告)号：US07242456B2

公开(公告)日：2007-07-10

申请号：US10853558

申请日：2004-05-26

申请人： Lev Ryzhikov ,  Yuli Vladimirsky ,  Lev Sakin

发明人： Lev Ryzhikov ,  Yuli Vladimirsky ,  Lev Sakin

IPC分类号： G03B27/52 ,  G03B27/42 ,  G03B27/54

CPC分类号： G03F7/70791 ,  G03F7/70275 ,  G03F7/70291

摘要： A lithography system has a magnification module having multiple magnifications at a same time within an object plane, which can include a pattern generator therein. The pattern generator is used to pattern light from an illumination system, which is directed by a projection optical system onto a substrate to form features on a substrate. Having multiple magnifications in the object plate allows for patterning of both large and small features on an image plane, which can include the substrate therein. In one example, an array of pattern generators are used. In this example, substantially an entire surface of the substrate can be patterned with large and small features at substantially a same time.

摘要翻译： 光刻系统具有在物平面内同时具有多个倍率的放大模块，其中可以包括图案发生器。 图案发生器用于将来自投影光学系统的照明系统的光图案化到衬底上以在衬底上形成特征。 在对象板中具有多个放大率允许在可以包括其中的基板的图像平面上图案化大和小特征。 在一个示例中，使用图案生成器的阵列。 在该示例中，基本上整个表面的基板可以在大致相同的时间以大的和小的特征图案化。

公开(公告)号：US20060044533A1

公开(公告)日：2006-03-02

申请号：US10927394

申请日：2004-08-27

申请人： Lev Ryzhikov ,  Yuli Vladimirsky

发明人： Lev Ryzhikov ,  Yuli Vladimirsky

IPC分类号： G03B27/52

CPC分类号： G03F7/70275 ,  G03F7/70258 ,  G03F7/70341 ,  G03F7/709

摘要： In an immersion lithography system, a moveable substrate unit is formed from a substrate and at least one optical element, with immersion liquid between them. The immersion liquid and the optical element move in unison with the substrate. Movement of the substrate unit reduces refractive index disturbance produced by turbulence during exposure scans. The projection optical system is enhanced with a dynamic axial compensation group. Elements in the dynamic axial compensation group can move to compensate aberrations caused by deviation of axial symmetry due to movement of the optical element in the substrate unit. The space in the substrate unit filled with immersion liquid may be dynamically controlled to provide proper working distance. If the optical element in the substrate unit has optical power, both resolution and depth of focus may be enhanced. Even if the optical element has no optical power, depth of focus may still be enhanced.

摘要翻译： 在浸没式光刻系统中，可移动基板单元由基板和至少一个光学元件形成，其间具有浸没液体。 浸没液体和光学元件与基底一致地移动。 衬底单元的移动降低了曝光扫描期间由湍流产生的折射率干扰。 投影光学系统通过动态轴向补偿组增强。 动态轴向补偿组中的元件可以移动以补偿由于基板单元中的光学元件的移动引起的轴对称偏差引起的像差。 填充有浸没液体的基板单元中的空间可以被动态地控制以提供适当的工作距离。 如果基板单元中的光学元件具有光学功率，则可以提高分辨率和聚焦深度。 即使光学元件没有光学功率，仍然可以提高焦深。

公开(公告)号：US20090251786A1

公开(公告)日：2009-10-08

申请号：US12413963

申请日：2009-03-30

申请人： Lev RYZHIKOV ,  Yuli Vladimirsky

发明人： Lev RYZHIKOV ,  Yuli Vladimirsky

IPC分类号： G02B27/10

CPC分类号： G03F7/70291 ,  G03F7/70075 ,  G03F7/70208 ,  G03F7/70275

摘要： A system is provided to form illumination light beams having desirable divergence and directivity. For instance, the system can include an optical element and a relay. The optical element can include a pupil defining element. Further, the relay can have a first and second lens array arranged in series and configured to receive the plurality of beams and to re-image the plurality of beams into a corresponding plurality of beams in an image plane. Each of the plurality of corresponding beams can have a numerical aperture less than a numerical aperture of each of the plurality of beams.

摘要翻译： 提供一种系统以形成具有期望的发散和方向性的照明光束。 例如，该系统可以包括光学元件和继电器。 光学元件可以包括瞳孔限定元件。 此外，继电器可以具有串联布置的第一和第二透镜阵列，并且被配置为接收多个光束并且将多个光束重新成像到图像平面中的对应的多个光束。 多个对应的光束中的每一个可以具有小于多个光束中的每一个的数值孔径的数值孔径。

公开(公告)号：US08692977B2

公开(公告)日：2014-04-08

申请号：US13105364

申请日：2011-05-11

申请人： Lev Ryzhikov ,  Yuli Vladimirsky ,  James H. Walsh

发明人： Lev Ryzhikov ,  Yuli Vladimirsky ,  James H. Walsh

IPC分类号： G03B27/54 ,  G03B27/42 ,  G02B15/14

CPC分类号： G03F7/7015 ,  G01N21/94 ,  G02B13/04 ,  G02B13/18 ,  G03F1/84 ,  G03F7/7085 ,  G03F7/70908

摘要： Systems and methods for inspection are provided utilizing a wide angle optical system. The optical system includes a wide angle input lens group and an output lens group. The wide angle input lens group is configured to receive wide-angle radiation, e.g., having an angular spread of 60 degrees or more, from an object surface, and produce imagable radiation. The wide angle input lens group is arranged such that no intermediate focused image is formed within or after the wide angle input lens group. The output lens group is configured to receive the imagable radiation from the wide angle input lens group and focus the imagable radiation onto an image plane to image at least part of the object surface. A detector receives the image of the at least part of the object surface and, based on the received image, detects, for example, contamination on the object surface.

摘要翻译： 使用广角光学系统提供用于检查的系统和方法。 光学系统包括广角输入透镜组和输出透镜组。 广角输入透镜组被配置为从物体表面接收例如具有60度或更大角度扩展的广角辐射，并且产生可成像的辐射。 广角输入透镜组被布置成使得在广角输入透镜组之内或之后不形成中间聚焦图像。 输出透镜组被配置为从广角输入透镜组接收可成像的辐射并将可成像的辐射聚焦到图像平面上以对物体表面的至少一部分进行成像。 检测器接收对象表面的至少一部分的图像，并且基于接收到的图像来检测例如物体表面上的污染物。

公开(公告)号：US20110317136A1

公开(公告)日：2011-12-29

申请号：US13083002

申请日：2011-04-08

申请人： Lev Ryzhikov ,  Yuli Vladimirsky ,  James H. Walsh

发明人： Lev Ryzhikov ,  Yuli Vladimirsky ,  James H. Walsh

IPC分类号： G03B27/52 ,  G01N21/47

CPC分类号： G03F7/70841 ,  G03F1/84 ,  G03F7/70808 ,  G03F7/7085

摘要： An optical window is used to facilitate best performance for imaging an object placed in a separate ambiance. The window can be in a particle detection system, comprising a separator between first and second environments. The separator comprises an opening and an optical element located within the opening. An object is located in the second environment. An objective lens is located in the first environment and a detector is located in the second environment and is configured to detect particles on a surface of the object.

摘要翻译： 使用光学窗口来促进对放置在单独环境中的物体进行成像的最佳性能。 窗口可以在粒子检测系统中，包括在第一和第二环境之间的分离器。 分离器包括开口和位于开口内的光学元件。 一个对象位于第二个环境中。 物镜位于第一环境中，并且检测器位于第二环境中并被配置为检测物体表面上的颗粒。

公开(公告)号：US07532403B2

公开(公告)日：2009-05-12

申请号：US11347282

申请日：2006-02-06

申请人： Lev Ryzhikov ,  Yuli Vladimirsky

发明人： Lev Ryzhikov ,  Yuli Vladimirsky

IPC分类号： G02B27/10

CPC分类号： G03F7/70291 ,  G03F7/70075 ,  G03F7/70208 ,  G03F7/70275

摘要： A system and method are used to form illumination light beams having desirable divergence and directivity. The illumination light beams are shaped using a pupil defining element and a field defining element. Then, divergence or numerical apertures of the light generated by these elements is modified using an optical element that either re-images the light onto planes conjugate to one or both of the pupil defining element and a field defining element or transforms a numerical aperture of light produced by one or both of the pupil defining element and a field defining element.

摘要翻译： 使用系统和方法来形成具有期望的发散和方向性的照明光束。 照明光束使用光瞳限定元件和场限定元件成形。 然后，使用光学元件修改由这些元件产生的光的发散度或数值孔径，该光学元件将光重新映射到共轭于瞳孔限定元件中的一个或两个的平面上，以及场限定元件或转换光的数值孔径 由光瞳定义元件中的一个或两个产生，以及场定义元件。

公开(公告)号：US20070165200A1

公开(公告)日：2007-07-19

申请号：US11693517

申请日：2007-03-29

申请人： Lev Ryzhikov ,  Yuli Vladimirsky

发明人： Lev Ryzhikov ,  Yuli Vladimirsky

IPC分类号： G03B27/42

CPC分类号： G03F7/70275 ,  G03F7/70258 ,  G03F7/70341 ,  G03F7/709

摘要： In an immersion lithography system, a moveable substrate unit is formed from a substrate and at least one optical element, with immersion liquid between them. The immersion liquid and the optical element move in unison with the substrate. Movement of the substrate unit reduces refractive index disturbance produced by turbulence during exposure scans. The projection optical system is enhanced with a dynamic axial compensation group. Elements in the dynamic axial compensation group can move to compensate aberrations caused by deviation of axial symmetry due to movement of the optical element in the substrate unit. The space in the substrate unit filled with immersion liquid may be dynamically controlled to provide proper working distance. If the optical element in the substrate unit has optical power, both resolution and depth of focus may be enhanced. Even if the optical element has no optical power, depth of focus may still be enhanced.

摘要翻译： 在浸没式光刻系统中，可移动基板单元由基板和至少一个光学元件形成，其间具有浸没液体。 浸没液体和光学元件与基底一致地移动。 衬底单元的移动降低了曝光扫描期间由湍流产生的折射率干扰。 投影光学系统通过动态轴向补偿组增强。 动态轴向补偿组中的元件可以移动以补偿由于基板单元中的光学元件的移动引起的轴对称偏差引起的像差。 填充有浸没液体的基板单元中的空间可以被动态地控制以提供适当的工作距离。 如果基板单元中的光学元件具有光学功率，则可以提高分辨率和聚焦深度。 即使光学元件没有光学功率，仍然可以提高焦深。

公开(公告)号：US08558988B2

公开(公告)日：2013-10-15

申请号：US12265235

申请日：2008-11-05

申请人： Yuli Vladimirsky ,  Lev Ryzhikov ,  Ronald A. Wilklow

发明人： Yuli Vladimirsky ,  Lev Ryzhikov ,  Ronald A. Wilklow

IPC分类号： G03B27/42 ,  G03B27/54 ,  G03B27/72

CPC分类号： G03B27/54 ,  G03F7/70191

摘要： A system and method for use of a lithography apparatus having a substrate and an absorbing film formed on the substrate. A thickness of the absorbing film is spatially modulated across at least a part of the substrate to reduce a non-uniform intensity of a radiation beam transmitted through the substrate.

摘要翻译： 一种使用具有在基板上形成的基板和吸收膜的光刻设备的系统和方法。 吸收膜的厚度跨越衬底的至少一部分进行空间调制，以减少透射通过衬底的辐射束的不均匀的强度。

公开(公告)号：US20110279805A1

公开(公告)日：2011-11-17

申请号：US13105364

申请日：2011-05-11

申请人： Lev Ryzhikov ,  Yuli Vladimirsky ,  James H. Walsh

发明人： Lev Ryzhikov ,  Yuli Vladimirsky ,  James H. Walsh

IPC分类号： G03B27/58 ,  G01B11/25 ,  G02B13/18

CPC分类号： G03F7/7015 ,  G01N21/94 ,  G02B13/04 ,  G02B13/18 ,  G03F1/84 ,  G03F7/7085 ,  G03F7/70908

摘要： Systems and methods for inspection are provided utilizing a wide angle optical system. The optical system includes a wide angle input lens group and an output lens group. The wide angle input lens group is configured to receive wide-angle radiation, e.g., having an angular spread of 60 degrees or more, from an object surface, and produce imageable radiation. The wide angle input lens group is arranged such that no intermediate focused image is formed within or after the wide angle input lens group. The output lens group is configured to receive the imageable radiation from the wide angle input lens group and focus the imageable radiation onto an image plane to image at least part of the object surface. A detector receives the image of the at least part of the object surface and, based on the received image, detects, for example, contamination on the object surface.

摘要翻译： 使用广角光学系统提供用于检查的系统和方法。 光学系统包括广角输入透镜组和输出透镜组。 广角输入透镜组被配置为从物体表面接收例如具有60度或更大角度扩展的广角辐射，并且产生可成像的辐射。 广角输入透镜组被布置成使得在广角输入透镜组之内或之后不形成中间聚焦图像。 输出透镜组被配置为从广角输入透镜组接收可成像的辐射，并将可成像的辐射聚焦到图像平面上以对物体表面的至少一部分进行成像。 检测器接收对象表面的至少一部分的图像，并且基于接收到的图像来检测例如物体表面上的污染物。