公开(公告)号：US08589829B2

公开(公告)日：2013-11-19

申请号：US13736929

申请日：2013-01-08

申请人： Peng Liu ,  Yu Cao ,  Luoqi Chen ,  Jun Ye

发明人： Peng Liu ,  Yu Cao ,  Luoqi Chen ,  Jun Ye

IPC分类号： G06F17/50

CPC分类号： G06F17/5081 ,  G03F1/144 ,  G03F1/36 ,  G03F7/705 ,  G06F17/5009

摘要： A three-dimensional mask model of the invention provides a more realistic approximation of the three-dimensional effects of a photolithography mask with sub-wavelength features than a thin-mask model. In one embodiment, the three-dimensional mask model includes a set of filtering kernels in the spatial domain that are configured to be convolved with thin-mask transmission functions to produce a near-field image. In another embodiment, the three-dimensional mask model includes a set of correction factors in the frequency domain that are configured to be multiplied by the Fourier transform of thin-mask transmission functions to produce a near-field image.

公开(公告)号：US07117478B2

公开(公告)日：2006-10-03

申请号：US11037988

申请日：2005-01-18

申请人： Jun Ye ,  Yen-Wen Lu ,  Yu Cao ,  Luoqi Chen ,  Xun Chen

发明人： Jun Ye ,  Yen-Wen Lu ,  Yu Cao ,  Luoqi Chen ,  Xun Chen

IPC分类号： G06F17/50 ,  G03F1/00 ,  G21K5/00 ,  G06F19/00

CPC分类号： G06F17/5009 ,  G03F1/00 ,  G03F7/004 ,  G03F7/705 ,  G03F7/70666 ,  G06F17/5081 ,  G06F19/00 ,  G06F2217/12 ,  G06F2217/14 ,  G06T7/0004 ,  G06T2207/30148 ,  G21K5/00

摘要： There are many inventions described and illustrated herein. In one aspect, the present invention is directed to a technique of, and system for simulating, verifying, inspecting, characterizing, determining and/or evaluating the lithographic designs, techniques and/or systems, and/or individual functions performed thereby or components used therein. In one embodiment, the present invention is a system and method that accelerates lithography simulation, inspection, characterization and/or evaluation of the optical characteristics and/or properties, as well as the effects and/or interactions of lithographic systems and processing techniques. In this regard, in one embodiment, the present invention employs a lithography simulation system architecture, including application-specific hardware accelerators, and a processing technique to accelerate and facilitate verification, characterization and/or inspection of a mask design, for example, RET design, including detailed simulation and characterization of the entire lithography process to verify that the design achieves and/or provides the desired results on final wafer pattern. The system includes: (1) general purpose-type computing device(s) to perform the case-based logic having branches and inter-dependency in the data handling and (2) accelerator subsystems to perform a majority of the computation intensive tasks.

公开(公告)号：US20050122500A1

公开(公告)日：2005-06-09

申请号：US11037988

申请日：2005-01-18

申请人： Jun Ye ,  Yen-Wen Lu ,  Yu Cao ,  Luoqi Chen ,  Xun Chen

发明人： Jun Ye ,  Yen-Wen Lu ,  Yu Cao ,  Luoqi Chen ,  Xun Chen

IPC分类号： G03B27/54 ,  G03F20060101 ,  G03F7/20 ,  G06F17/50 ,  G06K9/00 ,  G06T7/00

CPC分类号： G06F17/5009 ,  G03F1/00 ,  G03F7/004 ,  G03F7/705 ,  G03F7/70666 ,  G06F17/5081 ,  G06F19/00 ,  G06F2217/12 ,  G06F2217/14 ,  G06T7/0004 ,  G06T2207/30148 ,  G21K5/00

摘要： There are many inventions described and illustrated herein. In one aspect, the present invention is directed to a technique of, and system for simulating, verifying, inspecting, characterizing, determining and/or evaluating the lithographic designs, techniques and/or systems, and/or individual functions performed thereby or components used therein. In one embodiment, the present invention is a system and method that accelerates lithography simulation, inspection, characterization and/or evaluation of the optical characteristics and/or properties, as well as the effects and/or interactions of lithographic systems and processing techniques. In this regard, in one embodiment, the present invention employs a lithography simulation system architecture, including application-specific hardware accelerators, and a processing technique to accelerate and facilitate verification, characterization and/or inspection of a mask design, for example, RET design, including detailed simulation and characterization of the entire lithography process to verify that the design achieves and/or provides the desired results on final wafer pattern. The system includes: (1) general purpose-type computing device(s) to perform the case-based logic having branches and inter-dependency in the data handling and (2) accelerator subsystems to perform a majority of the computation intensive tasks.

公开(公告)号：US20050097500A1

公开(公告)日：2005-05-05

申请号：US10981914

申请日：2004-11-04

申请人： Jun Ye ,  Yen-Wen Lu ,  Yu Cao ,  Luoqi Chen ,  Xun Chen

发明人： Jun Ye ,  Yen-Wen Lu ,  Yu Cao ,  Luoqi Chen ,  Xun Chen

IPC分类号： G03B27/54 ,  G03F20060101 ,  G03F7/20 ,  G06F17/50 ,  G06K9/00 ,  G06T7/00

CPC分类号： G06F17/5009 ,  G03F1/00 ,  G03F7/004 ,  G03F7/705 ,  G03F7/70666 ,  G06F17/5081 ,  G06F19/00 ,  G06F2217/12 ,  G06F2217/14 ,  G06T7/0004 ,  G06T2207/30148 ,  G21K5/00

摘要： There are many inventions described and illustrated herein. In one aspect, the present invention is directed to a technique of, and system for simulating, verifying, inspecting, characterizing, determining and/or evaluating the lithographic designs, techniques and/or systems, and/or individual functions performed thereby or components used therein. In one embodiment, the present invention is a system and method that accelerates lithography simulation, inspection, characterization and/or evaluation of the optical characteristics and/or properties, as well as the effects and/or interactions of lithographic systems and processing techniques. In this regard, in one embodiment, the present invention employs a lithography simulation system architecture, including application-specific hardware accelerators, and a processing technique to accelerate and facilitate verification, characterization and/or inspection of a mask design, for example, RET design, including detailed simulation and characterization of the entire lithography process to verify that the design achieves and/or provides the desired results on final wafer pattern. The system includes: (1) general purpose-type computing device(s) to perform the case-based logic having branches and inter-dependency in the data handling and (2) accelerator subsystems to perform a majority of the computation intensive tasks.

公开(公告)号：US20130066716A1

公开(公告)日：2013-03-14

申请号：US13230720

申请日：2011-09-12

申请人： Luoqi Chen ,  Jun Ye ,  Ya Luo ,  Yu Cao ,  Wei Zhuang ,  Hanying Feng

发明人： Luoqi Chen ,  Jun Ye ,  Ya Luo ,  Yu Cao ,  Wei Zhuang ,  Hanying Feng

IPC分类号： G06Q30/00

CPC分类号： G06Q30/00

摘要： The various embodiments described in the present disclosure, in at least one aspect, relate to computer-implemented methods of online advertisement. In one embodiment, a method includes, in response to receiving a request for an ad to be provided to a user in an online session, identifying a plurality of ads as candidates for consideration, determining one or more sentiments of a content of the online session, and ranking the plurality of identified ads based at least in part on (i) a correlation between the content of the online session and a content of each identified ad, and (ii) a correlation between the one or more sentiments of the content of the online session and the content of each identified ad.

摘要翻译： 在至少一个方面，在本公开中描述的各种实施例涉及计算机实现的在线广告的方法。 在一个实施例中，一种方法包括响应于在在线会话中接收到要提供给用户的广告的请求，将多个广告标识为候选作为考虑，确定在线会话的内容的一个或多个情绪 并且至少部分地基于（i）在线会话的内容与每个所识别的广告的内容之间的相关性，以及（ii）所述内容的一个或多个情绪之间的相关性来对多个所识别的广告进行排名 在线会话和每个已识别广告的内容。

公开(公告)号：US07747978B2

公开(公告)日：2010-06-29

申请号：US11461994

申请日：2006-08-02

申请人： Jun Ye ,  Yu Cao ,  Luoqi Chen ,  Hua-Yu Liu

发明人： Jun Ye ,  Yu Cao ,  Luoqi Chen ,  Hua-Yu Liu

IPC分类号： G06F17/50

CPC分类号： G03F7/70641 ,  G03F7/705 ,  G03F7/70516 ,  G03F7/70625

摘要： A system and a method for creating a focus-exposure model of a lithography process are disclosed. The system and the method utilize calibration data along multiple dimensions of parameter variations, in particular within an exposure-defocus process window space. The system and the method provide a unified set of model parameter values that result in better accuracy and robustness of simulations at nominal process conditions, as well as the ability to predict lithographic performance at any point continuously throughout a complete process window area without a need for recalibration at different settings. With a smaller number of measurements required than the prior-art multiple-model calibration, the focus-exposure model provides more predictive and more robust model parameter values that can be used at any location in the process window.

摘要翻译： 公开了一种用于创建光刻工艺的聚焦曝光模型的系统和方法。 系统和方法利用参数变化的多个维度的校准数据，特别是在曝光 - 散焦过程窗口空间内。 该系统和方法提供了一套统一的模型参数值，可在标称工艺条件下提供更好的模拟精度和鲁棒性，以及能够在整个过程窗口区域内连续预测任何点的光刻性能，而无需 重新校准在不同的设置。 与现有技术的多模型校准相比，要进行的测量数量要少一些，聚焦曝光模型提供了更多的预测性和更健壮的模型参数值，可以在过程窗口中的任何位置使用。

公开(公告)号：US20070031745A1

公开(公告)日：2007-02-08

申请号：US11461994

申请日：2006-08-02

申请人： Jun Ye ,  Yu Cao ,  Luoqi Chen ,  Hua-Yu Liu

发明人： Jun Ye ,  Yu Cao ,  Luoqi Chen ,  Hua-Yu Liu

IPC分类号： G03C5/00 ,  G03B27/42

CPC分类号： G03F7/70641 ,  G03F7/705 ,  G03F7/70516 ,  G03F7/70625

摘要： A system and a method for creating a focus-exposure model of a lithography process are disclosed. The system and the method utilize calibration data along multiple dimensions of parameter variations, in particular within an exposure-defocus process window space. The system and the method provide a unified set of model parameter values that result in better accuracy and robustness of simulations at nominal process conditions, as well as the ability to predict lithographic performance at any point continuously throughout a complete process window area without a need for recalibration at different settings. With a smaller number of measurements required than the prior-art multiple-model calibration, the focus-exposure model provides more predictive and more robust model parameter values that can be used at any location in the process window.

摘要翻译： 公开了一种用于创建光刻工艺的聚焦曝光模型的系统和方法。 系统和方法利用参数变化的多个维度的校准数据，特别是在曝光 - 散焦过程窗口空间内。 该系统和方法提供了一套统一的模型参数值，可在标称工艺条件下提供更好的模拟精度和鲁棒性，以及能够在整个过程窗口区域内连续预测任何点的光刻性能，而无需 重新校准在不同的设置。 与现有技术的多模型校准相比，要进行的测量数量要少一些，聚焦曝光模型提供了更多的预测性和更健壮的模型参数值，可以在过程窗口中的任何位置使用。

公开(公告)号：US07111277B2

公开(公告)日：2006-09-19

申请号：US10981914

申请日：2004-11-04

申请人： Jun Ye ,  Yen-Wen Lu ,  Yu Cao ,  Luoqi Chen ,  Xun Chen

发明人： Jun Ye ,  Yen-Wen Lu ,  Yu Cao ,  Luoqi Chen ,  Xun Chen

IPC分类号： G06F17/50 ,  G03F1/00 ,  G21K5/00 ,  G06F19/00

CPC分类号： G06F17/5009 ,  G03F1/00 ,  G03F7/004 ,  G03F7/705 ,  G03F7/70666 ,  G06F17/5081 ,  G06F19/00 ,  G06F2217/12 ,  G06F2217/14 ,  G06T7/0004 ,  G06T2207/30148 ,  G21K5/00

摘要： There are many inventions described and illustrated herein. In one aspect, the present invention is directed to a technique of, and system for simulating, verifying, inspecting, characterizing, determining and/or evaluating the lithographic designs, techniques and/or systems, and/or individual functions performed thereby or components used therein. In one embodiment, the present invention is a system and method that accelerates lithography simulation, inspection, characterization and/or evaluation of the optical characteristics and/or properties, as well as the effects and/or interactions of lithographic systems and processing techniques. In this regard, in one embodiment, the present invention employs a lithography simulation system architecture, including application-specific hardware accelerators, and a processing technique to accelerate and facilitate verification, characterization and/or inspection of a mask design, for example, RET design, including detailed simulation and characterization of the entire lithography process to verify that the design achieves and/or provides the desired results on final wafer pattern. The system includes: (1) general purpose-type computing device(s) to perform the case-based logic having branches and inter-dependency in the data handling and (2) accelerator subsystems to perform a majority of the computation intensive tasks.

公开(公告)号：US20140012672A1

公开(公告)日：2014-01-09

申请号：US13543708

申请日：2012-07-06

申请人： Jun Ye ,  Yu Cao ,  Luoqi Chen ,  Ya Luo ,  Wei Zhuang ,  Hanying Feng ,  Hong Chen

发明人： Jun Ye ,  Yu Cao ,  Luoqi Chen ,  Ya Luo ,  Wei Zhuang ,  Hanying Feng ,  Hong Chen

IPC分类号： G06Q30/02

CPC分类号： G06Q30/0241

摘要： A method of providing targeted online advertisement includes receiving a request for an ad impression. The request includes a first content and a second content. The method also includes determining information related to (i) a context of the first content, (ii) a context of the second content, and (iii) a correlation between the context of the first content and the context of the second content, and providing the determined information to a bidding service, thereby enabling one or more advertisers to place one or more bids on the ad impression based on the provided information. Each of the one or more bids includes a bid price. The method further includes receiving the one or more bids for the ad impression, selecting one of the one or more received bids based at least in part on the bid prices, and providing an ad impression associated with the selected bid.

摘要翻译： 提供有针对性的在线广告的方法包括接收对广告印象的请求。 该请求包括第一内容和第二内容。 该方法还包括确定与（i）第一内容的上下文相关的信息，（ii）第二内容的上下文，以及（iii）第一内容的上下文与第二内容的上下文之间的相关性，以及 将确定的信息提供给投标服务，从而使得一个或多个广告商能够基于所提供的信息对广告印象进行一个或多个出价。 每个一个或多个出价都包含一个出价。 所述方法还包括接收针对所述广告展示的所述一个或多个出价，至少部分地基于所述出价来选择所述一个或多个所接收的出价中的一个，以及提供与所选择的出价相关联的广告展示。

公开(公告)号：US20110083113A1

公开(公告)日：2011-04-07

申请号：US12964697

申请日：2010-12-09

申请人： Jun Ye ,  Yen-Wen Lu ,  Yu Cao ,  Luoqi Chen ,  Xun Chen

发明人： Jun Ye ,  Yen-Wen Lu ,  Yu Cao ,  Luoqi Chen ,  Xun Chen

IPC分类号： G06F17/50

CPC分类号： G06F17/5009 ,  G03F1/00 ,  G03F7/004 ,  G03F7/705 ,  G03F7/70666 ,  G06F17/5081 ,  G06F19/00 ,  G06F2217/12 ,  G06F2217/14 ,  G06T7/0004 ,  G06T2207/30148 ,  G21K5/00

摘要： There are many inventions described and illustrated herein. In one aspect, the present invention is directed to a technique of, and system for simulating, verifying, inspecting, characterizing, determining and/or evaluating the lithographic designs, techniques and/or systems, and/or individual functions performed thereby or components used therein. In one embodiment, the present invention is a system and method that accelerates lithography simulation, inspection, characterization and/or evaluation of the optical characteristics and/or properties, as well as the effects and/or interactions of lithographic systems and processing techniques. In this regard, in one embodiment, the present invention employs a lithography simulation system architecture, including application-specific hardware accelerators, and a processing technique to accelerate and facilitate verification, characterization and/or inspection of a mask design, for example, RET design, including detailed simulation and characterization of the entire lithography process to verify that the design achieves and/or provides the desired results on final wafer pattern. The system includes: (1) general purpose-type computing device(s) to perform the case-based logic having branches and inter-dependency in the data handling and (2) accelerator subsystems to perform a majority of the computation intensive tasks.

摘要翻译： 这里描述和说明了许多发明。 在一个方面，本发明涉及用于模拟，验证，检查，表征，确定和/或评估光刻设计，技术和/或系统的技术和系统，和/或由其执行的单独功能或所使用的组件 其中。 在一个实施例中，本发明是加速光刻特性和/或性质的光刻模拟，检查，表征和/或评估以及光刻系统和处理技术的效果和/或相互作用的系统和方法。 在这方面，在一个实施例中，本发明采用光刻仿真系统架构，包括特定于应用的硬件加速器，以及用于加速和促进掩模设计的验证，表征和/或检验的处理技术，例如RET设计 ，包括对整个光刻工艺进行详细的仿真和表征，以验证设计在最终的晶片图案上实现和/或提供期望的结果。 该系统包括：（1）通用目的型计算设备，用于执行在数据处理中具有分支和相互依赖性的基于案例的逻辑，以及（2）加速器子系统执行大部分计算密集型任务。