公开(公告)号：US20190193264A1

公开(公告)日：2019-06-27

申请号：US16225157

申请日：2018-12-19

Applicant: MITUTOYO CORPORATION

Inventor： Hiromu MAIE ,  Tomohiro ARIZONO

IPC: B25J9/10 ,  B25J19/00 ,  B25J19/02 ,  G05G5/04 ,  G01B11/24

CPC classification number: B25J9/101 ,  B25J19/0041 ,  B25J19/021 ,  G01B11/24 ,  G05G5/04

Abstract: A Z slider includes a rotating shaft capable of at least one revolution centered on a rotation axis, in a state Where the rotating shaft supports a measurement head that is connected to a plurality of cables; a θ axis drive motor that causes the rotating shaft, to perform normal rotation in a clockwise direction and reverse rotation in a counterclockwise direction; and an oscillating link that oscillates in a state of contact with the rotating shaft when the rotating shaft is performing normal rotation in the clockwise direction and limits normal rotation in the clockwise direction that is equal to or greater than a predetermined angle, and that oscillates in a state of contact with the rotating shaft when the rotating shaft is performing reverse rotation in the counterclockwise direction and limits reverse rotation in the counterclockwise direction that is equal to or greater than a predetermined angle.

公开(公告)号：US20210072022A1

公开(公告)日：2021-03-11

申请号：US17014308

申请日：2020-09-08

Applicant: MITUTOYO CORPORATION

Inventor： Masato KON ,  Hiromu MAIE ,  Seiji SASAKI ,  Jyota MIYAKURA

IPC: G01B15/04

Abstract: A calibration method of an X-ray measuring device includes: a front-stage feature position calculation step of parallelly moving spheres disposed in N places a plurality of times, and identifying centroid positions ImPos(1 to Q)_Dis(1 to M)_Sphr_(1 to N) of projected images of the spheres in the N places; an individual matrix calculation step of calculating an individual projection matrix PPj (j=1 to Q) for each of the spheres; an individual position calculation step of calculating moving positions Xb of the spheres on the basis of the individual projection matrix PPj (j=1 to Q); a coordinate integration step of calculating specific relative position intervals X(1 to N) of the spheres; a rear-stage feature position calculation step; a transformation matrix calculation step of calculating a projective transformation matrix Hk (k=1 to Q); a rotation detection step; a position calculation step; and a center position calculation step.

公开(公告)号：US20210068777A1

公开(公告)日：2021-03-11

申请号：US17015618

申请日：2020-09-09

Applicant: MITUTOYO CORPORATION

Inventor： Masato KON ,  Hiromu MAIE ,  Seiji SASAKI ,  Jyota MIYAKURA

IPC: A61B6/00 ,  A61B6/04 ,  A61B6/03

Abstract: A calibration method of an X-ray measuring device includes: mounting a calibration tool on a rotating table; a moving position acquisition step of parallelly moving a position of an j-th sphere with respect to a position of a first sphere, irradiating the calibration tool with an X-ray, and acquiring, form an output of an X-ray image detector, a moving position Mj where the magnitude of a differential position Erj of a centroid position ImDisjh_Sphr_j of a projected image of the j(2≤j≤N)-th sphere with respect to a centroid position ImDis1_Sphr_1 of a projected image of the first sphere becomes equal to or less than a specified value Vx; a relative position calculation step of performing the moving position acquisition step on the remaining spheres a feature position calculation step; a transformation matrix calculation step; a rotation detection step; a position calculation step; and a center position calculation step.

公开(公告)号：US20170248415A1

公开(公告)日：2017-08-31

申请号：US15433234

申请日：2017-02-15

Applicant: MITUTOYO CORPORATION

Inventor： Sadayuki MATSUMIYA ,  Shuichi KAMIYAMA ,  Hidemitsu ASANO ,  Hiroshi SAKAI ,  Hiromu MAIE ,  Yoshihiko TAKAHASHI ,  Masanori ARAI ,  Ken MOTOHASHI

IPC: G01B11/30 ,  G01B5/012 ,  G01B9/02

CPC classification number: G01B11/30 ,  G01B5/003 ,  G01B5/012 ,  G01B5/061 ,  G01B5/12 ,  G01B9/02 ,  G01B9/02041 ,  G01B11/0608 ,  G01B11/12 ,  G01B11/2441 ,  G01B11/303

Abstract: A surface texture measuring apparatus includes an X axis displacement mechanism and a Y axis displacement mechanism displacing a measurable object having an interior wall along an XY plane; a measurement sensor measuring a surface texture of the interior wall without contact; a Z axis displacement mechanism displacing the measurement sensor in a Z axis direction orthogonal to the XY plane and bringing the measurement sensor to face the interior wall; a W axis displacement mechanism displacing the measurement sensor facing the interior wall in a normal direction of the interior wall; and a θ axis displacement mechanism displacing the measurement sensor facing the interior wall along the interior wall.

公开(公告)号：US20210404976A1

公开(公告)日：2021-12-30

申请号：US17360304

申请日：2021-06-28

Applicant: MITUTOYO CORPORATION

Inventor： Masato KON ,  Hiromu MAIE ,  Seiji SASAKI ,  Jyota MIYAKURA

IPC: G01N23/083 ,  G01N23/18

Abstract: A calibration method for an X-ray measuring device includes mounting a calibration tool on a rotating table, identifying centroid positions from an output of an X-ray image detector, calculating projection transformation matrixes from the centroid positions and known relative positional intervals, repeating to identify the centroid positions from the output of the X-ray image detector and to calculate the projection transformation matrixes from the centroid positions and known relative positional intervals while the rotating table is rotated twice or more by a predetermined angle, and calculating a rotation center position of the rotating table on the basis of the projection transformation matrixes. The calibration method thereby allows easy calculation of the rotation center position of the rotating table on which an object to be measured is mounted in a rotatable manner, with the simple process.

公开(公告)号：US20200271901A1

公开(公告)日：2020-08-27

申请号：US16789970

申请日：2020-02-13

Applicant: MITUTOYO CORPORATION

Inventor： Kazuhiko HIDAKA ,  Hiromu MAIE ,  Jyota MIYAKURA

IPC: G02B13/00 ,  G02B3/00

Abstract: The present invention provides a lens substrate stacking position calculating apparatus capable of calculating a stacking position at which the number of lens sets whose optical axis deviation falls within an allowable range is maximized, when a plurality of wafer lens arrays are bonded together even if the position of each lens formed on a wafer substrate is deviated between wafer lens arrays to be stacked. The lens substrate stacking position calculating apparatus calculates the positional relationship of two or more transparent substrates to be stacked when the two or more transparent substrates on which a plurality of lenses are two-dimensionally arranged are stacked to form a plurality of lens sets each including two or more lenses. A position of each lens is specified in advance in a common coordinate system.