公开(公告)号：US20070131878A1

公开(公告)日：2007-06-14

申请号：US11296701

申请日：2005-12-08

申请人： Vadim Banine ,  Sonia Skelly ,  Derk Klunder ,  Maarten Marinus Wilhelmus Van Herpen

发明人： Vadim Banine ,  Sonia Skelly ,  Derk Klunder ,  Maarten Marinus Wilhelmus Van Herpen

IPC分类号： G03F7/20

CPC分类号： G03F7/70933 ,  B82Y10/00 ,  G03F7/70166 ,  G03F7/70925

摘要： A lithographic apparatus includes a collector configured to collect radiation from a radiation source, the collector including a plurality of shells forming separate compartments, and a cleaning arrangement including a gas inlet and a gas outlet, the cleaning arrangement being configured to clean surfaces of the plurality of shells by guiding a gas flow from the inlet through the compartments to the outlet. The cleaning arrangement includes a distribution system configured to divide the gas flow into several sub flows, each of the sub flows corresponding to one or more of the compartments, and a control system configured to control the relative amount of the sub flows.

摘要翻译： 光刻设备包括收集器，其被配置为收集来自辐射源的辐射，所述收集器包括形成分离的隔室的多个壳体，以及包括气体入口和气体出口的清洁装置，所述清洁装置构造成清洁所述多个 通过引导气流从入口通过隔间引导到​​出口。 清洁装置包括分配系统，其配置为将气流分成几个子流，每个子流对应于一个或多个隔间，以及被配置为控制子流的相对量的控制系统。

公开(公告)号：US20060278833A1

公开(公告)日：2006-12-14

申请号：US11150466

申请日：2005-06-13

申请人： Maarten Marinus Wilhelmus Van Herpen ,  Vadim Banine ,  Derk Klunder

发明人： Maarten Marinus Wilhelmus Van Herpen ,  Vadim Banine ,  Derk Klunder

IPC分类号： G21K5/10

CPC分类号： G03F7/70925 ,  B82Y10/00 ,  G03F7/70166 ,  G03F7/70916

摘要： A lithographic apparatus is disclosed. The apparatus includes a source for supplying hydrogen radicals, a guide for use in conjunction with the source, for directing hydrogen radicals to an application surface to be targeted by the hydrogen radicals. The guide is provided with a coating having a hydrogen radical recombination constant of less than 0.2. In this way, the radicals can be transported with reduced losses and are able to better interact with remaining contaminants on application surfaces, such as mirror surfaces.

公开(公告)号：US20070146659A1

公开(公告)日：2007-06-28

申请号：US11319190

申请日：2005-12-28

申请人： Derk Jan Klunder ,  Levinus Bakker ,  Vadim Banine ,  Frank Jeroen Schuurmans ,  Dominik Vaudrevange ,  Maarten Marinus Wilhelmus Van Herpen

发明人： Derk Jan Klunder ,  Levinus Bakker ,  Vadim Banine ,  Frank Jeroen Schuurmans ,  Dominik Vaudrevange ,  Maarten Marinus Wilhelmus Van Herpen

IPC分类号： G03B27/52

CPC分类号： G03F7/70916 ,  B82Y10/00 ,  G03F7/70166

摘要： A lithographic apparatus includes a radiation system for providing a beam of radiation. The radiation system includes at least one of a contaminant trap for trapping material emanating from the radiation source and a collector for collecting the beam of radiation. The at least one of the contaminant trap and the collector includes an element arranged in the path of the radiation beam on which the material emanating from the radiation source can deposit during propagation of the radiation beam in the radiation system. At least a part of the element disposed in the path of the radiation beam has a surface that has a highly specular grazing incidence reflectivity to reduce the absorption of the radiation beam in a direction of propagation of the radiation beam substantially non-parallel to the surface of the element, so that a thermal load experienced by the element is reduced.

摘要翻译： 光刻设备包括用于提供辐射束的辐射系统。 辐射系统包括用于捕获从辐射源发出的材料的污染物阱和用于收集辐射束的收集器中的至少一个。 污染物捕集阱和收集器中的至少一个包括布置在辐射束的路径中的元件，在辐射束的辐射束在辐射系统中的传播期间，从辐射源发出的材料可以沉积。 设置在辐射束的路径中的元件的至少一部分具有表面，该表面具有高镜面的掠入射反射率，以减少辐射束在基本上不平行于表面的辐射束的传播方向上的吸收 的元件，使得元件经历的热负荷降低。

公开(公告)号：US20060115771A1

公开(公告)日：2006-06-01

申请号：US11239479

申请日：2005-09-30

申请人： Maarten Marinus Wilhelmus Van Herpen ,  Vadim Banine ,  Johannes Josephina Moors ,  Carolus Ida Maria Spee ,  Derk Jan Klunder

发明人： Maarten Marinus Wilhelmus Van Herpen ,  Vadim Banine ,  Johannes Josephina Moors ,  Carolus Ida Maria Spee ,  Derk Jan Klunder

IPC分类号： G03C5/00

CPC分类号： B82Y10/00 ,  B08B7/0035 ,  B08B17/04 ,  G03F7/70925 ,  G03F7/70983 ,  G21K1/062

摘要： A method for the removal of a deposition on an optical element of an apparatus including the optical element includes providing an H2 containing gas in at least part of the apparatus includes producing hydrogen radicals from H2 from the H2 containing gas; and bringing the optical element with deposition into contact with at least part of the hydrogen radicals and removing at least part of the deposition. Further, a method for the protection of an optical element of an apparatus including the optical element includes providing a cap layer to the optical element by a deposition process; and during or after use of the apparatus, removing at least part of the cap layer from the optical element in a removal process as described above. The methods can be applied in a lithographic apparatus.

公开(公告)号：US20060261290A1

公开(公告)日：2006-11-23

申请号：US11133460

申请日：2005-05-20

申请人： Maarten Wilhelmus Van Herpen ,  Vadim Banine ,  Arnoud Wassink ,  Derk Klunder

发明人： Maarten Wilhelmus Van Herpen ,  Vadim Banine ,  Arnoud Wassink ,  Derk Klunder

IPC分类号： A61N5/00

CPC分类号： G03F7/70916 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70166

摘要： A radiation system for providing a projection beam of radiation in a lithographic apparatus is disclosed. The radiation system includes an EUV source for providing EUV radiation, and a contamination barrier that includes a plurality of foil plates for trapping contaminant material coming from the EUV source. The foil plates are arranged in an optically closed arrangement so that at least one of the foil plates reflects EUV radiation passing the contamination barrier at least one time.

摘要翻译： 公开了一种用于在光刻设备中提供投影辐射束的辐射系统。 辐射系统包括用于提供EUV辐射的EUV源，以及包括用于捕获来自EUV源的污染物质的多个箔板的污染屏障。 箔板以光学关闭的布置布置，使得至少一个箔片板反射至少一次通过污染屏障的EUV辐射。

公开(公告)号：US20060151717A1

公开(公告)日：2006-07-13

申请号：US11031535

申请日：2005-01-10

申请人： Derk Klunder ,  Levinus Bakker ,  Vadim Banine ,  Maarten Marinus Johannes Wilhelmus Herpen

发明人： Derk Klunder ,  Levinus Bakker ,  Vadim Banine ,  Maarten Marinus Johannes Wilhelmus Herpen

IPC分类号： G21K3/00 ,  G21K5/00 ,  G03F7/20

CPC分类号： G03F7/70916

摘要： Particles emitted by a radiation source, and moving from the radiation source towards a processing system for processing the radiation from the radiation source, are filtered out of radiation propagating through a predetermined cross section of the radiation as emitted by the radiation source by a filter system. The filter system includes a plurality of foils and a transporter for transporting the foils along a trajectory which extends within the beam so that the foils intercept the particles within the beam. The transporter is arranged to transport the foils by a substantially translatory movement of the foils along at least a part of the trajectory.

摘要翻译： 由辐射源发射并从辐射源朝向用于处理来自辐射源的辐射的处理系统移动的颗粒被从辐射源通过辐射源发射的预定横截面传播的辐射过滤掉，该辐射源由过滤系统 。 过滤器系统包括多个箔片和运送器，用于沿着在光束内延伸的轨迹传送箔片，使得箔片截取光束内的颗粒。 输送器布置成通过沿着轨迹的至少一部分的箔片的基本上平移的运动来运输箔片。

公开(公告)号：US20070259275A1

公开(公告)日：2007-11-08

申请号：US11418465

申请日：2006-05-05

申请人： Maarten Marinus Johannes Van Herpen ,  Vadim Banine ,  Koen Schenau ,  Derk Klunder

发明人： Maarten Marinus Johannes Van Herpen ,  Vadim Banine ,  Koen Schenau ,  Derk Klunder

IPC分类号： G03B27/42 ,  G21K5/00 ,  G03F1/00

CPC分类号： G03F1/24 ,  B82Y10/00 ,  B82Y40/00 ,  G02B5/0816 ,  G03F7/70575 ,  G21K1/062

摘要： An EUV mask includes, on top of a multi-layer mirror, a spectral purity enhancement layer, for application in an EUV lithographic apparatus. On top of the spectral purity enhancement layer, a patterned absorber layer is provided. The spectral purity enhancement layer includes a first spectral purity enhancement layer, but between the multi-layer mirror and first spectral purity enhancement layer there may be an intermediate layer or a second spectral purity enhancement layer and intermediate layer. The patterned absorber layer may also itself function as an anti-reflection (AR) coating. The AR effect of this absorber layer is a function of the aperture sizes in the pattern. The spectral purity of a mask may be enhanced, such that DUV radiation is diminished relatively stronger than EUV radiation.

摘要翻译： EUV掩模在多层反射镜之上包括光谱纯度增强层，用于EUV光刻设备中。 在光谱纯度增强层的顶部，提供了图案化的吸收层。 光谱纯度增强层包括第一光谱纯度增强层，但是在多层反射镜和第一光谱纯度增强层之间，可以存在中间层或第二光谱纯度增强层和中间层。 图案化的吸收层本身也可以用作抗反射（AR）涂层。 该吸收层的AR效应是图案中孔径尺寸的函数。 可以增强掩模的光谱纯度，使得DUV辐射比EUV辐射相对更强。

公开(公告)号：US08279397B2

公开(公告)日：2012-10-02

申请号：US12469546

申请日：2009-05-20

申请人： Dirk Heinrich Ehm ,  Johannes Hubertus Josephina Moors ,  Bastiaan Theodoor Wolschrijn ,  Vadim Banine ,  Vladimir Vitalevitsch Ivanov

发明人： Dirk Heinrich Ehm ,  Johannes Hubertus Josephina Moors ,  Bastiaan Theodoor Wolschrijn ,  Vadim Banine ,  Vladimir Vitalevitsch Ivanov

IPC分类号： G03B27/52

CPC分类号： G03F7/70916 ,  G03F7/70925

摘要： A method and an optical arrangement for removing contamination on optical surfaces (26), which are arranged in a vacuum environment in an optical arrangement, preferably in a projection exposure apparatus (1) for EUV lithography. The method includes generating a residual gas atmosphere containing molecular hydrogen (18) and at least one inert gas (17) in the vacuum environment, generating inert gas ions (21) by ionization of the inert gas (17), preferably with EUV radiation (20), and generating atomic hydrogen (27) by acceleration of the inert gas ions (21) in the residual gas atmosphere, to remove the contamination.

摘要翻译： 一种用于去除在光学装置的真空环境中布置的光学表面（26）上的污染的方法和光学装置，优选在用于EUV光刻的投影曝光装置（1）中。 该方法包括在真空环境中产生含有分子氢（18）和至少一种惰性气体（17）的残余气体气氛，通过惰性气体（17）的电离产生惰性气体离子（21），优选用EUV辐射 20），并且通过加热惰性气体离子（21）在残留气体气氛中产生原子氢（27），以除去污染物。

公开(公告)号：US20070018118A1

公开(公告)日：2007-01-25

申请号：US11481252

申请日：2006-07-06

申请人： Leonid Sjmaenok ,  Vadim Banine ,  Josephus Smits ,  Lambertus Wildenberg ,  Alexander Schmidt ,  Arnoud Wassink ,  Eric Verpalen ,  Antonius Van De Pas ,  Paul Peter Anna Brom

发明人： Leonid Sjmaenok ,  Vadim Banine ,  Josephus Smits ,  Lambertus Wildenberg ,  Alexander Schmidt ,  Arnoud Wassink ,  Eric Verpalen ,  Antonius Van De Pas ,  Paul Peter Anna Brom

IPC分类号： A61N5/00

CPC分类号： B82Y10/00 ,  G03F7/70166 ,  G03F7/70908 ,  G03F7/70916

摘要： A lithographic apparatus includes a radiation system including a radiation source for the production of a radiation beam, and a contaminant trap arranged in a path of the radiation beam. The contaminant trap includes a plurality of foils or plates defining channels that are arranged substantially parallel to the direction of propagation of said radiation beam. The foils or plates can be oriented substantially radially with respect to an optical axis of the radiation beam. The contaminant trap can be provided with a gas injector which is configured to inject gas at least at two different positions directly into at least one of the channels of the contaminant trap.

摘要翻译： 光刻设备包括包括用于产生辐射束的辐射源的辐射系统和布置在辐射束的路径中的污染物阱。 污染物捕集器包括限定通道的多个箔或板，其基本上平行于所述辐射束的传播方向布置。 箔或板可以相对于辐射束的光轴基本上径向定向。 污染物阱可以设置有气体注射器，其被配置为至少在两个不同位置将气体喷射到污染物阱的至少一个通道中。

公开(公告)号：US20070001126A1

公开(公告)日：2007-01-04

申请号：US11170788

申请日：2005-06-30

申请人： Robert Gayazov ,  Vadim Banine ,  Vladimir Ivanov ,  Evgenii Korob ,  Konstantin Koshelev ,  Givi Zukavishvili ,  Yurii Sidelnikov

发明人： Robert Gayazov ,  Vadim Banine ,  Vladimir Ivanov ,  Evgenii Korob ,  Konstantin Koshelev ,  Givi Zukavishvili ,  Yurii Sidelnikov

IPC分类号： A61N5/00

CPC分类号： G03F7/70916

摘要： A foil trap is located in a path of a radiation beam. The foil trap includes an array of conductive strips. A voltage application circuit is coupled to the strips to apply voltage differences between pairs of adjacent ones of the strips. The voltage application circuit includes a current limiting circuit arranged to limit currents to the strips to values below a threshold value above which self-sustained arc discharge may arise in the foil trap.

摘要翻译： 箔陷阱位于辐射束的路径中。 箔阱包括导电条的阵列。 电压施加电路耦合到条带以在相邻条带之间施加电压差。 电压施加电路包括限流电路，其被布置为将电流限制到条带以下的值到低于阈值的值，在该阈值以上可能在箔阱中产生自持电弧放电。