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13 条记录 (耗时 0.022 秒)

    Controlling the flow through the collector during cleaning
    1.
    发明申请
    Controlling the flow through the collector during cleaning 失效
    在清洁过程中控制通过收集器的流量

    公开(公告)号：US20070131878A1

    公开(公告)日：2007-06-14

    申请号：US11296701

    申请日：2005-12-08

    申请人： Vadim Banine ,  Sonia Skelly ,  Derk Klunder ,  Maarten Marinus Wilhelmus Van Herpen

    发明人： Vadim Banine ,  Sonia Skelly ,  Derk Klunder ,  Maarten Marinus Wilhelmus Van Herpen

    IPC分类号： G03F7/20

    CPC分类号： G03F7/70933 ,  B82Y10/00 ,  G03F7/70166 ,  G03F7/70925

    摘要： A lithographic apparatus includes a collector configured to collect radiation from a radiation source, the collector including a plurality of shells forming separate compartments, and a cleaning arrangement including a gas inlet and a gas outlet, the cleaning arrangement being configured to clean surfaces of the plurality of shells by guiding a gas flow from the inlet through the compartments to the outlet. The cleaning arrangement includes a distribution system configured to divide the gas flow into several sub flows, each of the sub flows corresponding to one or more of the compartments, and a control system configured to control the relative amount of the sub flows.

    摘要翻译： 光刻设备包括收集器，其被配置为收集来自辐射源的辐射，所述收集器包括形成分离的隔室的多个壳体，以及包括气体入口和气体出口的清洁装置，所述清洁装置构造成清洁所述多个 通过引导气流从入口通过隔间引导到​​出口。 清洁装置包括分配系统，其配置为将气流分成几个子流，每个子流对应于一个或多个隔间，以及被配置为控制子流的相对量的控制系统。

    Method for filtering particles out of a beam of radiation and filter for a lithographic apparatus
    3.
    发明申请
    Method for filtering particles out of a beam of radiation and filter for a lithographic apparatus 失效
    用于从辐射束中过滤颗粒并用于光刻设备的过滤器的方法

    公开(公告)号：US20070023693A1

    公开(公告)日：2007-02-01

    申请号：US11493848

    申请日：2006-07-27

    申请人： Levinus Bakker ,  Derk Klunder ,  Maarten Marinus Wilhelmus Van Herpen

    发明人： Levinus Bakker ,  Derk Klunder ,  Maarten Marinus Wilhelmus Van Herpen

    IPC分类号： A61N5/00

    CPC分类号： G03F7/70916 ,  H05G2/001

    摘要： A method for filtering particles out of a beam of radiation propagating from a radiation source is provided. The method includes passing the beam of radiation through a filter having a first portion within the beam of radiation and a second portion outside of the beam of radiation, capturing at least some of the particles in the beam of radiation with the first portion, and moving the filter in a direction that is transverse to the beam of radiation so that the first portion is moved outside of the beam of radiation and the second portion is moved into the beam of radiation.

    摘要翻译： 提供了从辐射源传播的辐射束中过滤颗粒的方法。 该方法包括将辐射束通过过滤器，该过滤器具有在辐射束内的第一部分和位于辐射束之外的第二部分，用第一部分捕获辐射束中的至少一些颗粒，并移动 所述过滤器在横向于所述辐射束的方向上，使得所述第一部分移动到所述辐射束的外部，并且所述第二部分被移动到所述辐射束中。

    Method for the removal of deposition on an optical element, method for the protection of an optical element, device manufacturing method, apparatus including an optical element, and lithographic apparatus
    4.
    发明申请
    Method for the removal of deposition on an optical element, method for the protection of an optical element, device manufacturing method, apparatus including an optical element, and lithographic apparatus 失效
    用于去除光学元件上的沉积的方法，用于保护光学元件的方法，器件制造方法，包括光学元件的设备和光刻设备

    公开(公告)号：US20070040999A1

    公开(公告)日：2007-02-22

    申请号：US11207996

    申请日：2005-08-22

    申请人： Maarten Marinus Wilhelmus Van Herpen ,  Carolus Ida Spee ,  Derk Klunder ,  Antonius De Mol

    发明人： Maarten Marinus Wilhelmus Van Herpen ,  Carolus Ida Spee ,  Derk Klunder ,  Antonius De Mol

    IPC分类号： B08B6/00

    CPC分类号： G03F7/70925

    摘要： A method for the removal of a deposition on an optical element of an apparatus including the optical element includes providing an H2 containing gas and one or more additional compounds selected from the group of hydrocarbon compounds and silane compounds in at least part of the apparatus includes producing hydrogen radicals from H2 from the H2 containing gas; and bringing the optical element with deposition into contact with at least part of the hydrogen radicals and removing at least part of the deposition. Further, a method for the protection of an optical element of an apparatus including the optical element includes providing a cap layer to the optical element by a deposition process; and during or after use of the apparatus, removing at least part of the cap layer from the optical element in a removal process as described above. The methods can be applied in a lithographic apparatus.

    摘要翻译： 在包括光学元件的设备的光学元件上去除沉积物的方法包括提供含H2S气体和一种或多种选自烃化合物和硅烷化合物的其它化合物 该装置的至少一部分包括从含H 2 N 2气体从H 2 H生成氢自由基; 并使具有沉积的光学元件与至少部分氢自由基接触并除去至少部分沉积物。 此外，用于保护包括光学元件的装置的光学元件的方法包括通过沉积工艺向光学元件提供盖层; 并且在使用所述装置期间或之后，如上所述在去除过程中从所述光学元件中去除所述盖层的至少一部分。 该方法可以应用在光刻设备中。

    Radiation system and lithographic apparatus
    5.
    发明申请
    Radiation system and lithographic apparatus 失效
    辐射系统和光刻设备

    公开(公告)号：US20060261290A1

    公开(公告)日：2006-11-23

    申请号：US11133460

    申请日：2005-05-20

    申请人： Maarten Wilhelmus Van Herpen ,  Vadim Banine ,  Arnoud Wassink ,  Derk Klunder

    发明人： Maarten Wilhelmus Van Herpen ,  Vadim Banine ,  Arnoud Wassink ,  Derk Klunder

    IPC分类号： A61N5/00

    CPC分类号： G03F7/70916 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70166

    摘要： A radiation system for providing a projection beam of radiation in a lithographic apparatus is disclosed. The radiation system includes an EUV source for providing EUV radiation, and a contamination barrier that includes a plurality of foil plates for trapping contaminant material coming from the EUV source. The foil plates are arranged in an optically closed arrangement so that at least one of the foil plates reflects EUV radiation passing the contamination barrier at least one time.

    摘要翻译： 公开了一种用于在光刻设备中提供投影辐射束的辐射系统。 辐射系统包括用于提供EUV辐射的EUV源，以及包括用于捕获来自EUV源的污染物质的多个箔板的污染屏障。 箔板以光学关闭的布置布置，使得至少一个箔片板反射至少一次通过污染屏障的EUV辐射。

    Anti-reflection coating for an EUV mask
    6.
    发明申请
    Anti-reflection coating for an EUV mask 有权
    防反射涂层用于EUV面罩

    公开(公告)号：US20070259275A1

    公开(公告)日：2007-11-08

    申请号：US11418465

    申请日：2006-05-05

    申请人： Maarten Marinus Johannes Van Herpen ,  Vadim Banine ,  Koen Schenau ,  Derk Klunder

    发明人： Maarten Marinus Johannes Van Herpen ,  Vadim Banine ,  Koen Schenau ,  Derk Klunder

    IPC分类号： G03B27/42 ,  G21K5/00 ,  G03F1/00

    CPC分类号： G03F1/24 ,  B82Y10/00 ,  B82Y40/00 ,  G02B5/0816 ,  G03F7/70575 ,  G21K1/062

    摘要： An EUV mask includes, on top of a multi-layer mirror, a spectral purity enhancement layer, for application in an EUV lithographic apparatus. On top of the spectral purity enhancement layer, a patterned absorber layer is provided. The spectral purity enhancement layer includes a first spectral purity enhancement layer, but between the multi-layer mirror and first spectral purity enhancement layer there may be an intermediate layer or a second spectral purity enhancement layer and intermediate layer. The patterned absorber layer may also itself function as an anti-reflection (AR) coating. The AR effect of this absorber layer is a function of the aperture sizes in the pattern. The spectral purity of a mask may be enhanced, such that DUV radiation is diminished relatively stronger than EUV radiation.

    摘要翻译： EUV掩模在多层反射镜之上包括光谱纯度增强层，用于EUV光刻设备中。 在光谱纯度增强层的顶部，提供了图案化的吸收层。 光谱纯度增强层包括第一光谱纯度增强层，但是在多层反射镜和第一光谱纯度增强层之间，可以存在中间层或第二光谱纯度增强层和中间层。 图案化的吸收层本身也可以用作抗反射（AR）涂层。 该吸收层的AR效应是图案中孔径尺寸的函数。 可以增强掩模的光谱纯度，使得DUV辐射比EUV辐射相对更强。

    RADIATION SYSTEM AND LITHOGRAPHIC APPARATUS
    8.
    发明申请
    RADIATION SYSTEM AND LITHOGRAPHIC APPARATUS 失效
    辐射系统和光刻设备

    公开(公告)号：US20070125963A1

    公开(公告)日：2007-06-07

    申请号：US11292310

    申请日：2005-12-02

    申请人： Maarten Marinus Johannes Van Herpen ,  Johannes Moors ,  Derk Klunder

    发明人： Maarten Marinus Johannes Van Herpen ,  Johannes Moors ,  Derk Klunder

    IPC分类号： G03F7/20

    CPC分类号： G03F7/70916 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70041 ,  G03F7/70191 ,  G03F7/7055 ,  G03F7/70908 ,  G21K1/043 ,  G21K1/062

    摘要： A radiation system for generating a beam of radiation is disclosed. The radiation system includes a pulsed EUV source for generating EUV radiation, and a spectral filter mounted in front of the EUV source for selectively passing a spectral range of a beam of EUV radiation from the EUV source. The spectral filter is mounted on a movable mount configured to be moved in synchronicity with the pulsed EUV source to prevent debris traveling from the EUV source from impacting the spectral filter. Accordingly, the spectral filter is kept substantially free from contamination by the debris.

    摘要翻译： 公开了一种用于产生辐射束的辐射系统。 辐射系统包括用于产生EUV辐射的脉冲EUV源和安装在EUV源前面的光谱滤波器，用于选择性地通过来自EUV源的EUV辐射束的光谱范围。 光谱滤光器安装在可移动的安装座上，可移动的安装件被配置为与脉冲EUV源同步地移动，以防止从EUV源传播的碎屑撞击光谱滤波器。 因此，光谱滤波器基本上不受碎屑的污染。

    LITHOGRAPHIC APPARATUS, ILLUMINATION SYSTEM AND DEBRIS TRAPPING SYSTEM
    9.
    发明申请
    LITHOGRAPHIC APPARATUS, ILLUMINATION SYSTEM AND DEBRIS TRAPPING SYSTEM 有权
    LITHOGRAPHIC装置，照明系统和DEBRIS TRAPPING系统

    公开(公告)号：US20060138362A1

    公开(公告)日：2006-06-29

    申请号：US11020674

    申请日：2004-12-27

    申请人： Levinus Bakker ,  Derk Klunder ,  Maarten Marinus Johannes Van Herpen

    发明人： Levinus Bakker ,  Derk Klunder ,  Maarten Marinus Johannes Van Herpen

    IPC分类号： G01J3/10

    CPC分类号： G03F7/70058 ,  G03F7/70916 ,  G03F7/70933

    摘要： A debris trapping system for trapping debris particles released with the generation of radiation by a radiation source in a lithographic apparatus includes first and second sets of channels. Each channel of the first set enables radiation from a radiating source to propagate therethrough and has an inner wall for catching debris particles. The second set of channels is situated downstream of the first set with respect to a propagation direction of the radiation. Each channel of the second set enables radiation from the radiating source to also propagate therethrough and has an inner wall for catching debris particles. A gas supply and a gas exhaust are configured to provide between the first set and the second set of channels a gas flow having a net flow direction substantially across the propagation direction of the radiation from a radiating source.

    摘要翻译： 用于捕获由光刻设备中的辐射源产生辐射而释放的碎屑颗粒的碎片捕集系统包括第一和第二组通道。 第一组的每个通道使来自辐射源的辐射能够通过其传播并具有用于捕获碎屑颗粒的内壁。 相对于辐射的传播方向，第二组通道位于第一组的下游。 第二组的每个通道使得来自辐射源的辐射也能够通过其传播，并且具有用于捕获碎屑颗粒的内壁。 气体供应和排气被配置为在第一组和第二组通道之间提供气流，其具有基本上横跨辐射源的辐射的传播方向的净流动方向。