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9 条记录 (耗时 0.022 秒)

    Controlling the flow through the collector during cleaning
    1.
    发明申请
    Controlling the flow through the collector during cleaning 失效
    在清洁过程中控制通过收集器的流量

    公开(公告)号：US20070131878A1

    公开(公告)日：2007-06-14

    申请号：US11296701

    申请日：2005-12-08

    申请人： Vadim Banine ,  Sonia Skelly ,  Derk Klunder ,  Maarten Marinus Wilhelmus Van Herpen

    发明人： Vadim Banine ,  Sonia Skelly ,  Derk Klunder ,  Maarten Marinus Wilhelmus Van Herpen

    IPC分类号： G03F7/20

    CPC分类号： G03F7/70933 ,  B82Y10/00 ,  G03F7/70166 ,  G03F7/70925

    摘要： A lithographic apparatus includes a collector configured to collect radiation from a radiation source, the collector including a plurality of shells forming separate compartments, and a cleaning arrangement including a gas inlet and a gas outlet, the cleaning arrangement being configured to clean surfaces of the plurality of shells by guiding a gas flow from the inlet through the compartments to the outlet. The cleaning arrangement includes a distribution system configured to divide the gas flow into several sub flows, each of the sub flows corresponding to one or more of the compartments, and a control system configured to control the relative amount of the sub flows.

    摘要翻译： 光刻设备包括收集器，其被配置为收集来自辐射源的辐射，所述收集器包括形成分离的隔室的多个壳体，以及包括气体入口和气体出口的清洁装置，所述清洁装置构造成清洁所述多个 通过引导气流从入口通过隔间引导到​​出口。 清洁装置包括分配系统，其配置为将气流分成几个子流，每个子流对应于一个或多个隔间，以及被配置为控制子流的相对量的控制系统。

    Method for the removal of deposition on an optical element, method for the protection of an optical element, device manufacturing method, apparatus including an optical element, and lithographic apparatus
    3.
    发明申请
    Method for the removal of deposition on an optical element, method for the protection of an optical element, device manufacturing method, apparatus including an optical element, and lithographic apparatus 失效
    用于去除光学元件上的沉积的方法，用于保护光学元件的方法，器件制造方法，包括光学元件的设备和光刻设备

    公开(公告)号：US20070040999A1

    公开(公告)日：2007-02-22

    申请号：US11207996

    申请日：2005-08-22

    申请人： Maarten Marinus Wilhelmus Van Herpen ,  Carolus Ida Spee ,  Derk Klunder ,  Antonius De Mol

    发明人： Maarten Marinus Wilhelmus Van Herpen ,  Carolus Ida Spee ,  Derk Klunder ,  Antonius De Mol

    IPC分类号： B08B6/00

    CPC分类号： G03F7/70925

    摘要： A method for the removal of a deposition on an optical element of an apparatus including the optical element includes providing an H2 containing gas and one or more additional compounds selected from the group of hydrocarbon compounds and silane compounds in at least part of the apparatus includes producing hydrogen radicals from H2 from the H2 containing gas; and bringing the optical element with deposition into contact with at least part of the hydrogen radicals and removing at least part of the deposition. Further, a method for the protection of an optical element of an apparatus including the optical element includes providing a cap layer to the optical element by a deposition process; and during or after use of the apparatus, removing at least part of the cap layer from the optical element in a removal process as described above. The methods can be applied in a lithographic apparatus.

    摘要翻译： 在包括光学元件的设备的光学元件上去除沉积物的方法包括提供含H2S气体和一种或多种选自烃化合物和硅烷化合物的其它化合物 该装置的至少一部分包括从含H 2 N 2气体从H 2 H生成氢自由基; 并使具有沉积的光学元件与至少部分氢自由基接触并除去至少部分沉积物。 此外，用于保护包括光学元件的装置的光学元件的方法包括通过沉积工艺向光学元件提供盖层; 并且在使用所述装置期间或之后，如上所述在去除过程中从所述光学元件中去除所述盖层的至少一部分。 该方法可以应用在光刻设备中。

    Method for filtering particles out of a beam of radiation and filter for a lithographic apparatus
    4.
    发明申请
    Method for filtering particles out of a beam of radiation and filter for a lithographic apparatus 失效
    用于从辐射束中过滤颗粒并用于光刻设备的过滤器的方法

    公开(公告)号：US20070023693A1

    公开(公告)日：2007-02-01

    申请号：US11493848

    申请日：2006-07-27

    申请人： Levinus Bakker ,  Derk Klunder ,  Maarten Marinus Wilhelmus Van Herpen

    发明人： Levinus Bakker ,  Derk Klunder ,  Maarten Marinus Wilhelmus Van Herpen

    IPC分类号： A61N5/00

    CPC分类号： G03F7/70916 ,  H05G2/001

    摘要： A method for filtering particles out of a beam of radiation propagating from a radiation source is provided. The method includes passing the beam of radiation through a filter having a first portion within the beam of radiation and a second portion outside of the beam of radiation, capturing at least some of the particles in the beam of radiation with the first portion, and moving the filter in a direction that is transverse to the beam of radiation so that the first portion is moved outside of the beam of radiation and the second portion is moved into the beam of radiation.

    摘要翻译： 提供了从辐射源传播的辐射束中过滤颗粒的方法。 该方法包括将辐射束通过过滤器，该过滤器具有在辐射束内的第一部分和位于辐射束之外的第二部分，用第一部分捕获辐射束中的至少一些颗粒，并移动 所述过滤器在横向于所述辐射束的方向上，使得所述第一部分移动到所述辐射束的外部，并且所述第二部分被移动到所述辐射束中。

    Lithographic apparatus and device manufacturing method
    5.
    发明申请
    Lithographic apparatus and device manufacturing method 失效
    平版印刷设备和器件制造方法

    公开(公告)号：US20070146659A1

    公开(公告)日：2007-06-28

    申请号：US11319190

    申请日：2005-12-28

    申请人： Derk Jan Klunder ,  Levinus Bakker ,  Vadim Banine ,  Frank Jeroen Schuurmans ,  Dominik Vaudrevange ,  Maarten Marinus Wilhelmus Van Herpen

    发明人： Derk Jan Klunder ,  Levinus Bakker ,  Vadim Banine ,  Frank Jeroen Schuurmans ,  Dominik Vaudrevange ,  Maarten Marinus Wilhelmus Van Herpen

    IPC分类号： G03B27/52

    CPC分类号： G03F7/70916 ,  B82Y10/00 ,  G03F7/70166

    摘要： A lithographic apparatus includes a radiation system for providing a beam of radiation. The radiation system includes at least one of a contaminant trap for trapping material emanating from the radiation source and a collector for collecting the beam of radiation. The at least one of the contaminant trap and the collector includes an element arranged in the path of the radiation beam on which the material emanating from the radiation source can deposit during propagation of the radiation beam in the radiation system. At least a part of the element disposed in the path of the radiation beam has a surface that has a highly specular grazing incidence reflectivity to reduce the absorption of the radiation beam in a direction of propagation of the radiation beam substantially non-parallel to the surface of the element, so that a thermal load experienced by the element is reduced.

    摘要翻译： 光刻设备包括用于提供辐射束的辐射系统。 辐射系统包括用于捕获从辐射源发出的材料的污染物阱和用于收集辐射束的收集器中的至少一个。 污染物捕集阱和收集器中的至少一个包括布置在辐射束的路径中的元件，在辐射束的辐射束在辐射系统中的传播期间，从辐射源发出的材料可以沉积。 设置在辐射束的路径中的元件的至少一部分具有表面，该表面具有高镜面的掠入射反射率，以减少辐射束在基本上不平行于表面的辐射束的传播方向上的吸收 的元件，使得元件经历的热负荷降低。

    Radiation system and lithographic apparatus
    7.
    发明申请
    Radiation system and lithographic apparatus 失效
    辐射系统和光刻设备

    公开(公告)号：US20070125968A1

    公开(公告)日：2007-06-07

    申请号：US11294347

    申请日：2005-12-06

    申请人： Derk Jan Klunder ,  Maarten Marinus Wilhelmus Van Herpen

    发明人： Derk Jan Klunder ,  Maarten Marinus Wilhelmus Van Herpen

    IPC分类号： G01J3/10

    CPC分类号： G03F7/70916 ,  G03F7/70008

    摘要： A radiation system for providing a projection beam of radiation is disclosed. The radiation system includes an extreme ultraviolet source for providing extreme ultra violet radiation, and a contamination barrier that includes a plurality of closely packed foil plates for trapping contaminant material coming from the radiation source. The contamination barrier encloses the extreme ultraviolet radiation source.

    摘要翻译： 公开了一种用于提供投影辐射束的辐射系统。 辐射系统包括用于提供极端紫外辐射的极紫外光源，以及包括多个紧密堆积的箔片的污染屏障，用于捕获来自辐射源的污染物质。 污染屏障包围着极紫外线辐射源。