公开(公告)号：US20060033905A1

公开(公告)日：2006-02-16

申请号：US10919548

申请日：2004-08-16

申请人： Mahmood Toofan ,  Florence Eschbach

发明人： Mahmood Toofan ,  Florence Eschbach

IPC分类号： G03B27/62

CPC分类号： G03B27/62

摘要： Methods for using and/or storing a pellicle-reticle assembly that does not result in the formation of haze on the reticle and/or the formation of wrinkles on the pellicle.

摘要翻译： 使用和/或存储防护薄膜组件的方法，其不会导致在掩模版上形成雾状和/或在防护薄膜组件上形成褶皱。

公开(公告)号：US20080094591A1

公开(公告)日：2008-04-24

申请号：US11957350

申请日：2007-12-14

申请人： Florence Eschbach ,  Paul Zimmerman ,  Alexander Tregub ,  Fu-Chang Lo

发明人： Florence Eschbach ,  Paul Zimmerman ,  Alexander Tregub ,  Fu-Chang Lo

IPC分类号： G03B27/52

CPC分类号： G03F1/64 ,  Y10T428/3154 ,  Y10T428/31544

摘要： A pellicle membrane is mounted between an outer frame and an inner frame. At least one of the frames is attached to the reticle without using conventional adhesives. The pellicle and reticle may be used in a lithography system. The pellicle allows radiation to pass through the pellicle to the reticle and may prevent particles from passing through the pellicle.

摘要翻译： 防护薄膜组件安装在外框架和内框架之间。 至少一个框架不使用传统的粘合剂连接到掩模版上。 防护薄膜组件和掩模版可用于光刻系统。 防护薄膜组件允许辐射通过防护薄膜到掩模版，并且可以防止颗粒通过防护薄膜。

公开(公告)号：US20060234134A1

公开(公告)日：2006-10-19

申请号：US10611070

申请日：2003-06-30

申请人： Alexander Tregub ,  Florence Eschbach ,  James Powers ,  Fu-Chang Lo

发明人： Alexander Tregub ,  Florence Eschbach ,  James Powers ,  Fu-Chang Lo

IPC分类号： A47G1/12 ,  G03F1/14 ,  G03F1/00

CPC分类号： G03F1/62

摘要： An embodiment of the present invention includes a technique to improve stability of a pellicle. The pellicle is pre-baked at a predetermined temperature substantially below a glass transition temperature. The pre-baked pellicle is purged with an inert gas. The purged pellicle is radiated by a radiation at a wavelength. In another embodiment, a chamber is sealed with a pellicle membrane which divides the chamber into first and second compartments. The chamber has an inflow opening in the first compartment and an outflow opening in the second compartment. A gas is injected into the inflow opening and penetrates the pellicle membrane to the outflow opening. In another embodiment, the chamber has first inflow and outflow openings and second inflow and outflow openings in the first and second compartments, respectively. A first gas is injected into the first inflow opening and a second gas into the second inflow opening. The first and second gases have a permeability difference. The first gas penetrates the pellicle membrane to the second outflow opening.

摘要翻译： 本发明的一个实施例包括提高防护薄膜的稳定性的技术。 防护薄膜组件在基本上低于玻璃化转变温度的预定温度下预烘烤。 预烘烤的防护薄膜组件用惰性气体吹扫。 被吹扫的防护薄膜组件以波长的辐射辐射。 在另一个实施例中，用隔热膜密封腔室，隔膜膜将腔室分成第一和第二隔室。 所述腔室在第一隔室中具有流入开口，并且在第二隔室中具有流出开口。 将气体注入到流入口中并将防护薄膜穿透到流出口。 在另一个实施例中，腔室分别具有第一和第二隔室中的第一流入口和第二流入口和第二流入口。 将第一气体注入第一流入口，将第二气体注入第二流入口。 第一和第二气体具有渗透率差异。 第一气体将防护薄膜穿入第二流出口。

公开(公告)号：US20060099890A1

公开(公告)日：2006-05-11

申请号：US11313070

申请日：2005-12-20

申请人： Florence Eschbach ,  Eric Lee ,  Peter Powell Phipps ,  Amanda Baer ,  Edward Pong Lee ,  Francisco Martin

发明人： Florence Eschbach ,  Eric Lee ,  Peter Powell Phipps ,  Amanda Baer ,  Edward Pong Lee ,  Francisco Martin

IPC分类号： B24B7/30

CPC分类号： G11B5/1276 ,  B24B37/044 ,  C09G1/02 ,  Y10T29/49032 ,  Y10T29/49041 ,  Y10T29/49048

摘要： A method for simultaneously planarizing to relatively equal smoothness a thin film magnetic head hardbaked resist structure having relatively low surface energy and one or more additional thin film magnetic head structures containing other materials having comparatively higher surface energy, such as copper, hardbaked resist, alumina and NiFe. The method begins with preparation of a chemical mechanical polishing (CMP) slurry targeted at equaling the removal rate of the materials to be planarized. The CMP slurry includes a liquid vehicle, an abrasive, and a surfactant. The CMP slurry is applied to the surface of the structures to be planarized and the structures are simultaneously planarized using a CMP planarization technique.

公开(公告)号：US20110294048A1

公开(公告)日：2011-12-01

申请号：US13208300

申请日：2011-08-11

申请人： Florence Eschbach ,  Paul Zimmerman ,  Alexander Tregub ,  Fu-Chang Lo

发明人： Florence Eschbach ,  Paul Zimmerman ,  Alexander Tregub ,  Fu-Chang Lo

IPC分类号： G03F1/00

CPC分类号： G03F1/64 ,  Y10T428/3154 ,  Y10T428/31544

摘要： A pellicle membrane is mounted between an outer frame and an inner frame. At least one of the frames is attached to the reticle without using conventional adhesives. The pellicle and reticle may be used in a lithography system. The pellicle allows radiation to pass through the pellicle to the reticle and may prevent particles from passing through the pellicle.

摘要翻译： 防护薄膜组件安装在外框架和内框架之间。 至少一个框架不使用传统的粘合剂连接到掩模版上。 防护薄膜组件和掩模版可用于光刻系统。 防护薄膜组件允许辐射通过防护薄膜到掩模版，并且可以防止颗粒通过防护薄膜。

公开(公告)号：US07314667B2

公开(公告)日：2008-01-01

申请号：US10799435

申请日：2004-03-12

申请人： Alexander Tregub ,  Florence Eschbach ,  Fu-Chang Lo ,  Susan M. Holl

发明人： Alexander Tregub ,  Florence Eschbach ,  Fu-Chang Lo ,  Susan M. Holl

IPC分类号： B32B27/16 ,  B32B27/28

CPC分类号： G03F1/62 ,  Y10T428/3154 ,  Y10T428/31544

摘要： Disclosed are pellicle compositions and methods of making such pellicle compositions. The pellicle compositions provided include highly fluorinated polymers as well as fluorinated polymer/PVDF co-polymers.

摘要翻译： 公开了防护薄膜组合物和制备这种防护薄膜组合物的方法。 所提供的防护薄膜组合物包括高度氟化的聚合物以及氟化聚合物/ PVDF共聚物。

公开(公告)号：US08012651B2

公开(公告)日：2011-09-06

申请号：US11957350

申请日：2007-12-14

申请人： Florence Eschbach ,  Paul Zimmerman ,  Alexander Tregub ,  Fu-Chang Lo

发明人： Florence Eschbach ,  Paul Zimmerman ,  Alexander Tregub ,  Fu-Chang Lo

IPC分类号： G03F9/00

CPC分类号： G03F1/64 ,  Y10T428/3154 ,  Y10T428/31544

摘要： A pellicle membrane is mounted between an outer frame and an inner frame. At least one of the frames is attached to the reticle without using conventional adhesives. The pellicle and reticle may be used in a lithography system. The pellicle allows radiation to pass through the pellicle to the reticle and may prevent particles from passing through the pellicle.

摘要翻译： 防护薄膜组件安装在外框架和内框架之间。 至少一个框架不使用传统的粘合剂连接到掩模版上。 防护薄膜组件和掩模版可用于光刻系统。 防护薄膜组件允许辐射通过防护薄膜到掩模版，并且可以防止颗粒通过防护薄膜。

公开(公告)号：US07201637B2

公开(公告)日：2007-04-10

申请号：US11313070

申请日：2005-12-20

申请人： Florence Eschbach ,  Eric James Lee ,  Peter Beverley Powell Phipps ,  Amanda Baer ,  Edward Hin Pong Lee ,  Francisco Martin

发明人： Florence Eschbach ,  Eric James Lee ,  Peter Beverley Powell Phipps ,  Amanda Baer ,  Edward Hin Pong Lee ,  Francisco Martin

IPC分类号： B24B1/00 ,  G11B5/127

CPC分类号： G11B5/1276 ,  B24B37/044 ,  C09G1/02 ,  Y10T29/49032 ,  Y10T29/49041 ,  Y10T29/49048

摘要： A method for simultaneously planarizing to relatively equal smoothness a thin film magnetic head hardbaked resist structure having relatively low surface energy and one or more additional thin film magnetic head structures containing other materials having comparatively higher surface energy, such as copper, hardbaked resist, alumina and NiFe. The method begins with preparation of a chemical mechanical polishing (CMP) slurry targeted at equaling the removal rate of the materials to be planarized. The CMP slurry includes a liquid vehicle, an abrasive, and a surfactant. The CMP slurry is applied to the surface of the structures to be planarized and the structures are simultaneously planarized using a CMP planarization technique.

摘要翻译： 一种同时平面化相对平滑度的方法，具有相对较低表面能的薄膜磁头硬烘烤抗蚀剂结构和一种或多种另外的包含具有相对较高表面能的其它材料的附加薄膜磁头结构，例如铜，硬质烤漆抗蚀剂，氧化铝和 NiFe。 该方法开始于制备化学机械抛光（CMP）浆料，其目的是等于要平坦化的材料的去除速率。 CMP浆料包括液体载体，研磨剂和表面活性剂。 将CMP浆料施加到要平坦化的结构的表面上，并且使用CMP平坦化技术将结构同时平坦化。

公开(公告)号：US20050203254A1

公开(公告)日：2005-09-15

申请号：US10799435

申请日：2004-03-12

申请人： Alexander Tregub ,  Florence Eschbach ,  Fu-Chang Lo ,  Susan Holl

发明人： Alexander Tregub ,  Florence Eschbach ,  Fu-Chang Lo ,  Susan Holl

IPC分类号： C08F114/18

CPC分类号： G03F1/62 ,  Y10T428/3154 ,  Y10T428/31544

摘要： Disclosed are pellicle compositions and methods of making such pellicle compositions. The pellicle compositions provided include highly fluorinated polymers as well as fluorinated polymer/PVDF co-polymers.

摘要翻译： 公开了防护薄膜组合物和制备这种防护薄膜组合物的方法。 提供的防护薄膜组合物包括高度氟化的聚合物以及氟化聚合物/ PVDF共聚物。

公开(公告)号：US07763395B2

公开(公告)日：2010-07-27

申请号：US10611070

申请日：2003-06-30

申请人： Alexander (Alex) Tregub ,  Florence Eschbach ,  James Powers ,  Fu-Chang Lo

发明人： Alexander (Alex) Tregub ,  Florence Eschbach ,  James Powers ,  Fu-Chang Lo

IPC分类号： G03F1/00 ,  G03B27/42

CPC分类号： G03F1/62

摘要： An embodiment of the present invention includes a technique to improve stability of a pellicle. The pellicle is pre-baked at a predetermined temperature substantially below a glass transition temperature. The pre-baked pellicle is purged with an inert gas. The purged pellicle is radiated by a radiation at a wavelength. In another embodiment, a chamber is sealed with a pellicle membrane which divides the chamber into first and second compartments. The chamber has an inflow opening in the first compartment and an outflow opening in the second compartment. A gas is injected into the inflow opening and penetrates the pellicle membrane to the outflow opening. In another embodiment, the chamber has first inflow and outflow openings and second inflow and outflow openings in the first and second compartments, respectively. A first gas is injected into the first inflow opening and a second gas into the second inflow opening. The first and second gases have a permeability difference. The first gas penetrates the pellicle membrane to the second outflow opening.

摘要翻译： 本发明的一个实施例包括提高防护薄膜的稳定性的技术。 防护薄膜组件在基本上低于玻璃化转变温度的预定温度下预烘烤。 预烘烤的防护薄膜组件用惰性气体吹扫。 被吹扫的防护薄膜组件以波长的辐射辐射。 在另一个实施例中，用隔热膜密封腔室，隔膜膜将腔室分成第一和第二隔室。 所述腔室在第一隔室中具有流入开口，并且在第二隔室中具有流出开口。 将气体注入到流入口中并将防护薄膜穿透到流出口。 在另一个实施例中，腔室分别具有第一和第二隔室中的第一流入口和第二流入口和第二流入口。 将第一气体注入第一流入口，将第二气体注入第二流入口。 第一和第二气体具有渗透率差异。 第一气体将防护薄膜穿入第二流出口。