利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

30 条记录 (耗时 0.018 秒)

    Vertical magnetization type recording medium and manufacturing method therefor
    1.
    发明授权
    Vertical magnetization type recording medium and manufacturing method therefor 失效
    垂直磁化型记录介质及其制造方法

    公开(公告)号：US4717592A

    公开(公告)日：1988-01-05

    申请号：US809828

    申请日：1985-12-17

    申请人： Makoto Nagao ,  Fusao Yamanaka ,  Kunihiko Sano ,  Akira Nahara

    发明人： Makoto Nagao ,  Fusao Yamanaka ,  Kunihiko Sano ,  Akira Nahara

    IPC分类号： G11B5/66 ,  G11B5/85 ,  B05D5/00 ,  B05D5/12

    CPC分类号： G11B5/66 ,  G11B5/85 ,  Y10S428/90 ,  Y10S428/928

    摘要： In forming a vertical magnetization type recording medium, a first soft magnetic film layer is formed on each side of a film-shaped support by vacuum deposition or sputtering at a temperature of 30.degree. C. or lower, a second soft magnetic film layer is formed on each of the first soft magnetic film layers, and a vertical magnetization film layer essentially containing Co-Cr is formed on each of the second soft magnetic film layers. The thickness of the first soft magnetic film layer on one side of the support may be made different from that of the first soft magnetic film layer on the other side so that curling of the recording medium is substantially eliminated.

    摘要翻译： 在形成垂直磁化型记录介质时，在30℃或更低的温度下通过真空沉积或溅射在薄膜状载体的每一侧上形成第一软磁膜层，形成第二软磁膜层 并且在每个第二软磁性膜层上形成基本上含有Co-Cr的垂直磁化膜层。 支撑体一侧上的第一软磁性膜层的厚度可以与另一侧的第一软磁性膜层的厚度不同，从而基本上消除了记录介质的卷曲。

    Method of manufacturing vertical magnetization type recording medium
    5.
    发明授权
    Method of manufacturing vertical magnetization type recording medium 失效
    制造垂直磁化型记录介质的方法

    公开(公告)号：US4865878A

    公开(公告)日：1989-09-12

    申请号：US203840

    申请日：1988-06-07

    申请人： Makoto Nagao ,  Fusao Yamanaka ,  Akira Nahara

    发明人： Makoto Nagao ,  Fusao Yamanaka ,  Akira Nahara

    IPC分类号： G11B5/66 ,  G11B5/851

    CPC分类号： G11B5/851 ,  G11B5/66 ,  Y10S428/90 ,  Y10S428/928 ,  Y10T428/12569 ,  Y10T428/12937 ,  Y10T428/265 ,  Y10T428/269

    摘要： In a method of manufacturing a vertical magnetization type recording medium, a soft magnetic film layer is formed on each of the two sides of a non-magnetic support, and then a vertical magnetization film layer is formed on each soft magnetic film layer thus formed, thereby to provide a vertical magnetization type recording medium which has both sides uniform in characteristics and has characteristics making it excellent as a vertical magnetization type recording medium.This is a division of application Ser. No. 59,242 filed 6/10/87, which is a continuation of application Ser. No. 802,150 filed 11/27/85 both are now abandoned.

    摘要翻译： 在制造垂直磁化型记录介质的方法中，在非磁性载体的两侧形成软磁性膜层，然后在如此形成的各个软磁性膜层上形成垂直磁化膜层， 从而提供一种垂直磁化型记录介质，其具有两个特性均匀的特性，并且具有优异的垂直磁化型记录介质。 这是一个应用程序系列 第59,242号，申请日为6/10/87，是申请序号的延续。 2000年11月27日提交的第802,150号现在都被放弃。

    Apparatus for producing magnetic recording medium
    6.
    发明授权
    Apparatus for producing magnetic recording medium 失效
    磁记录介质的制造装置

    公开(公告)号：US4867101A

    公开(公告)日：1989-09-19

    申请号：US71941

    申请日：1987-07-10

    申请人： Fusao Yamanaka ,  Makoto Nagao ,  Akira Nahara

    发明人： Fusao Yamanaka ,  Makoto Nagao ,  Akira Nahara

    IPC分类号： C23C14/56 ,  G11B5/85 ,  G11B5/851

    CPC分类号： C23C14/564 ,  G11B5/85 ,  G11B5/851 ,  Y10S15/13

    摘要： Contaminant magnetic dust particles and flakes generated during the thin film coating of a substrate 9 in a vacuum chamber 1 are gravitationally collected in catch pans or troughs 8 disposed below the deposition zones. Magnets 10 are provided under the bottoms of the pans to enhance the attraction and retention of the particles. The contaminants may alternatively or additionally be removed directly from an upper surface of the substrate web by sandwiching one or more of its horizontal conveyance runs between a pair of magnets 22, 23, with the pole face area of the lower magnet being larger than that of the upper one.

    摘要翻译： 在真空室1中的基板9的薄膜涂覆期间产生的污染性磁粉尘颗粒和薄片被重力收集在设置在沉积区下方的卡盘或槽8中。 磁盘10设置在平底锅的底部以增强颗粒的吸引和保留。 可以通过将一个或多个水平输送路径夹在一对磁体22,23之间，从而可以直接从基板的上表面去除污染物，其中下磁体的极面区域大于 上一个。

    Method for preparing a magnetic recording medium and a magnetic disk using the same
    7.
    发明授权
    Method for preparing a magnetic recording medium and a magnetic disk using the same 失效
    制备磁记录介质的方法和使用其的磁盘

    公开(公告)号：US5061562A

    公开(公告)日：1991-10-29

    申请号：US246829

    申请日：1988-09-20

    申请人： Fusao Yamanaka ,  Makoto Nagao ,  Yasuyuki Yamada ,  Kazuhiko Morita

    发明人： Fusao Yamanaka ,  Makoto Nagao ,  Yasuyuki Yamada ,  Kazuhiko Morita

    IPC分类号： G11B5/725 ,  G11B5/84

    CPC分类号： G11B5/84 ,  G11B5/725 ,  Y10S428/90 ,  Y10T428/30

    摘要： A method for preparing a magnetic recording medium which comprises the steps:(a) providing on a non-magnetic support, a thin magnetic metal film,(b) providing on the thin magnetic film, a protective layer comprised substantially of carbon,(c) washing the surface of the protective layer at least once, each washing performed with one substance selected from the group consisting of an alkali detergent, a neutral detergent and an organic solvent, and(d) providing on the surface of the protective layer, a lubricating layer containing at least one organic lubricating agent.Where the magnetic recording mediums produced therefrom exhibit excellent lubricating properties and running durability and causes no attachments on a magnetic head. Magnetic disks produced from the magnetic recording mediums also exhibit excellent lubricating properties and running durability and also do not cause attachments on a magnetic head.

    摘要翻译： 一种制备磁记录介质的方法，包括以下步骤：（a）在非磁性载体上提供薄磁性金属膜，（b）在薄磁膜上提供基本上由碳组成的保护层，（c ）至少一次洗涤保护层的表面，每次用一种选自碱洗涤剂，中性洗涤剂和有机溶剂的物质进行洗涤，和（d）在保护层的表面上提供 含有至少一种有机润滑剂的润滑层。 其中由其制造的磁记录介质表现出优异的润滑性能和运行耐久性，并且不会在磁头上引起附着。 由磁记录介质产生的磁盘也表现出优异的润滑性能和运行耐久性，并且也不会在磁头上引起附着。

    Method for producing magnetic recording medium
    8.
    发明授权
    Method for producing magnetic recording medium 失效
    磁记录介质的制造方法

    公开(公告)号：US4994305A

    公开(公告)日：1991-02-19

    申请号：US318408

    申请日：1989-03-03

    申请人： Fusao Yamanaka ,  makoto Nagao ,  Kazuhiko Morita

    发明人： Fusao Yamanaka ,  makoto Nagao ,  Kazuhiko Morita

    IPC分类号： G11B5/85 ,  G11B5/84

    CPC分类号： G11B5/84

    摘要： A method for producing a magnetic recording medium in which a flexible nonmagnetic support is moved continuously while being retained in contact with a plurality of spaced apart cylindrical cans to form thin films of metal on opposite sides of the support successively at portions where the support is in contact with the cylindrical cans. The tension of the support with respect to the Young's modulus thereof is adjusted to satisfy predetermined conditional expressions in each of a plurality of support conveyance sections which are defined by the spaced cylindrical cans.

    摘要翻译： 一种用于制造磁性记录介质的方法，其中柔性非磁性载体被连续移动，同时保持与多个间隔开的圆柱形罐接触，以在支撑件的部分连续地在支撑体的相对侧上形成金属薄膜 与圆筒罐接触。 调节支撑体的杨氏模量的张力，以满足由间隔开的圆筒形罐限定的多个支承输送部中的预定条件表达式。

    Semiconductor laser device with a current non-injection region near a resonator end face, and fabrication method thereof
    10.
    发明申请
    Semiconductor laser device with a current non-injection region near a resonator end face, and fabrication method thereof 审中-公开
    在谐振器端面附近具有电流非注入区域的半导体激光器件及其制造方法

    公开(公告)号：US20050164420A1

    公开(公告)日：2005-07-28

    申请号：US11076918

    申请日：2005-03-11

    申请人： Toshiaki Kuniyasu ,  Fusao Yamanaka ,  Toshiaki Fukunaga

    发明人： Toshiaki Kuniyasu ,  Fusao Yamanaka ,  Toshiaki Fukunaga

    IPC分类号： H01S5/042 ,  H01S5/16 ,  H01S5/20 ,  H01S5/22 ,  H01S5/343 ,  H01L21/00

    CPC分类号： B82Y20/00 ,  H01S5/0425 ,  H01S5/16 ,  H01S5/2081 ,  H01S5/22 ,  H01S5/2203 ,  H01S5/3434

    摘要： An n-GaAs buffer layer, an n-AlGaAs lower cladding layer, an n- or i-InGaP lower optical waveguide layer, an InGaAsP quantum cell active layer, a p- or i-InGaP upper optical waveguide layer, a p-AlGaAs first upper cladding layer, a p- or i-InGaP etch-stopping layer, a p-AlGaAs second upper cladding layer, and a p-GaAs contact layer, are grown upon an n-GaAs substrate. A photoresist is coated on the wafer, and two grooves are formed by etching. Then, the photoresist on the perimeter of the device is removed and the contact layer is selectively etched. Next, the photoresist is lifted off. A SiO2 film is formed on the entire surface. After a window is formed in a portion of the SiO2 film corresponding to a ridge portion, a p-electrode is formed on a region of the SiO2 film other than the device perimeter.

    摘要翻译： n-GaAs缓冲层，n-AlGaAs下包层，n或i-InGaP下光波导层，InGaAsP量子单元有源层，p或i-InGaP上光波导层，p-AlGaAs 在n-GaAs衬底上生长第一上覆层，p或i-InGaP蚀刻停止层，p-AlGaAs第二上覆层和p-GaAs接触层。 在晶片上涂覆光致抗蚀剂，通过蚀刻形成两个沟槽。 然后，去除设备周边上的光致抗蚀剂并选择性地蚀刻接触层。 接下来，剥离光致抗蚀剂。 在整个表面上形成SiO 2膜。 在对应于脊部的SiO 2膜的一部分形成窗口之后，在除SiO 2膜以外的SiO 2膜的区域上形成p电极 设备周长。