公开(公告)号：US20110186427A1

公开(公告)日：2011-08-04

申请号：US12887065

申请日：2010-09-21

申请人： Mark A. Bernick ,  Richard Newcomb

发明人： Mark A. Bernick ,  Richard Newcomb

IPC分类号： C23C14/35 ,  C23C14/54

CPC分类号： H01J37/3461 ,  C23C14/3407 ,  C23C14/35 ,  C23C14/54 ,  H01J37/3423 ,  H01J37/3435 ,  H01J37/345 ,  H01J37/347 ,  H01J2237/3323 ,  Y10T29/49002

摘要： A magnetron sputtering electrode for use in a rotatable cylindrical magnetron sputtering device, the electrode including a cathode body defining a magnet receiving chamber and a cylindrical target surrounding the cathode body. The target is rotatable about the cathode body A magnet arrangement is received within the magnet receiving chamber, the magnet arrangement including a plurality of magnets. A shunt is secured to the cathode body and proximate to a side of the magnet arrangement, the shunt extending in a plane substantially parallel to the side of the magnet arrangement. A method of fine-tuning a magnetron sputtering electrode in a rotatable cylindrical magnetron sputtering device is also disclosed.

摘要翻译： 一种用于可旋转圆柱形磁控溅射装置的磁控溅射电极，所述电极包括限定磁体接收室的阴极体和围绕阴极体的圆柱形靶。 目标物能够围绕阴极体旋转。磁体装置被容纳在磁体容纳室内，磁体装置包括多个磁体。 分流器固定到阴极体并且靠近磁体装置的一侧，分流器在基本平行于磁体装置侧面的平面中延伸。 还公开了一种在可旋转的圆柱形磁控溅射装置中微调磁控溅射电极的方法。

公开(公告)号：US08951394B2

公开(公告)日：2015-02-10

申请号：US12887065

申请日：2010-09-21

申请人： Mark A. Bernick ,  Richard Newcomb

发明人： Mark A. Bernick ,  Richard Newcomb

IPC分类号： C23C14/00 ,  C25B11/00 ,  C25B13/00 ,  C23C14/35 ,  C23C14/54

CPC分类号： H01J37/3461 ,  C23C14/3407 ,  C23C14/35 ,  C23C14/54 ,  H01J37/3423 ,  H01J37/3435 ,  H01J37/345 ,  H01J37/347 ,  H01J2237/3323 ,  Y10T29/49002

摘要： A magnetron sputtering electrode for use in a rotatable cylindrical magnetron sputtering device, the electrode including a cathode body defining a magnet receiving chamber and a cylindrical target surrounding the cathode body. The target is rotatable about the cathode body A magnet arrangement is received within the magnet receiving chamber, the magnet arrangement including a plurality of magnets. A shunt is secured to the cathode body and proximate to a side of the magnet arrangement, the shunt extending in a plane substantially parallel to the side of the magnet arrangement. A method of fine-tuning a magnetron sputtering electrode in a rotatable cylindrical magnetron sputtering device is also disclosed.

摘要翻译： 一种用于可旋转圆柱形磁控溅射装置的磁控溅射电极，所述电极包括限定磁体接收室的阴极体和围绕阴极体的圆柱形靶。 目标物能够围绕阴极体旋转。磁体装置被容纳在磁体容纳室内，磁体装置包括多个磁体。 分流器固定到阴极体并且靠近磁体装置的一侧，分流器在基本上平行于磁体装置侧面的平面中延伸。 还公开了一种在可旋转的圆柱形磁控溅射装置中微调磁控溅射电极的方法。

公开(公告)号：US09349576B2

公开(公告)日：2016-05-24

申请号：US11724026

申请日：2007-03-14

申请人： Mark A. Bernick ,  Richard Newcomb

发明人： Mark A. Bernick ,  Richard Newcomb

IPC分类号： C23C14/34 ,  H01J37/34 ,  C23C14/35

CPC分类号： H01J37/3405 ,  C23C14/3407 ,  C23C14/35 ,  H01J37/3452

摘要： A magnet arrangement which is usable as both a retrofit magnetic arrangement in a rotatable cylindrical magnetron sputtering electrode as well as a drive assembly in communication with the electrode for delivering high current into a target surface without adding highly incremental cost to the overall design of the electrode. The electrode includes a cathode body defining a magnet receiving chamber, a rotatable cylindrical target surrounding the cathode body, wherein the target is rotatable about the cathode body. The cathode body further defines a magnet arrangement received within the magnet receiving chamber, wherein the magnet arrangement comprised of a plurality of magnets wherein at least one of the magnets is a profiled magnet having a contoured top portion.

摘要翻译： 可用作可旋转的圆柱形磁控溅射电极中的改进磁性布置的磁体布置以及与电极连通的驱动组件，用于将高电流输送到目标表面中，而不会对电极的整体设计增加高度增加的成本 。 电极包括限定磁体接收室的阴极体，围绕阴极体的可旋转圆柱形靶，其中靶可围绕阴极体旋转。 阴极体进一步限定了一个容纳在磁体接收室内的磁体装置，其中磁体装置包括多个磁体，其中至少一个磁体是具有轮廓顶部的成型磁体。

公开(公告)号：US20090314631A1

公开(公告)日：2009-12-24

申请号：US12486797

申请日：2009-06-18

申请人： Mark A. Bernick ,  Richard Newcomb

发明人： Mark A. Bernick ,  Richard Newcomb

IPC分类号： C23C14/35

CPC分类号： C23C14/35 ,  H01J37/3405 ,  H01J37/3452 ,  H01J37/3458

摘要： A magnet assembly for a magnetron sputtering device having circular, linear or other types of planar targets including two permanent magnets and an electromagnet, e.g., electromagnetic coil between the permanent magnets associated with a sputtering target of a target assembly. An electrical control circuit is arranged to selectively adjust at least the current level and the direction of current to the electromagnet to alter the magnetic fields of the magnet assembly thereby encompassing the entire portions of the sputtering target, including the extreme inner and outer portions of the sputtering target to optimize the target uniformity and the sputtered film uniformity on a substrate. Methods for operating the magnet assembly of the magnetron sputtering devices, for optimizing the target utilization and sputtered film uniformity on a substrate, and for operating the magnetron sputtering process in a reactive gas environment to form an insulating or dielectric thin film are also provided.

摘要翻译： 一种用于磁控溅射装置的磁体组件，其具有圆形，线性或其它类型的平面靶，包括两个永磁体和电磁体，例如在与目标组件的溅射靶相关联的永磁体之间的电磁线圈。 电气控制电路布置成至少选择性地调节电流至电磁体的电流的方向，以改变磁体组件的磁场，从而包括溅射靶的整个部分，包括溅射靶的极端内部和外部 溅射靶以优化目标均匀性和基板上的溅射膜均匀性。 还提供了用于操作磁控溅射装置的磁体组件的方法，用于优化目标利用率和基板上的溅射膜均匀性，以及用于在反应气体环境中操作磁控溅射工艺以形成绝缘或电介质薄膜。

公开(公告)号：US06171461B2

公开(公告)日：2001-01-09

申请号：US09009219

申请日：1998-01-20

申请人： Mark A. Bernick

发明人： Mark A. Bernick

IPC分类号： C23C1434

CPC分类号： H01J37/3497 ,  C23C14/3407 ,  H01J37/3408

摘要： A magnetron sputtering electrode for use within a magnetron sputtering device having more uniform cooling of the target with the use of a water chamber including water diverters to establish a turbulent water flow within the water chamber. The electrode also includes a direct power coupling to the cathode body to avoid degradation of the power supplied to the electrode. The electrode further includes introduction of process gas in an interstitial space between the anode shield and the cathode shield. The electrode also includes the use of removable shaped magnets providing improved target utilization and run times and a choice of erosion pattern and balanced or unbalanced sputtering by simple magnet substitution. In one embodiment, the invention includes the use of a threaded anode shield and a threaded cathode shield which significantly reduces the overall electrode size for a given target diameter.

摘要翻译： 一种用于磁控溅射装置的磁控溅射电极，其具有使用包括水分配器的水室更均匀地冷却靶材，以在水室内建立湍流水流。 电极还包括与阴极体的直接电力耦合，以避免供给电极的功率的劣化。 电极还包括在阳极屏蔽和阴极屏蔽之间的间隙空间中引入工艺气体。 电极还包括使用可移除的成形磁体，其提供改善的目标利用率和运行时间，以及通过简单磁体替代选择侵蚀模式和平衡或不平衡溅射。 在一个实施例中，本发明包括使用螺纹阳极屏蔽和螺纹阴极屏蔽，其显着降低给定目标直径的总体电极尺寸。

公开(公告)号：US08500972B2

公开(公告)日：2013-08-06

申请号：US12420935

申请日：2009-04-09

申请人： Mark A. Bernick

发明人： Mark A. Bernick

IPC分类号： C23C14/3414 ,  C23C14/3407 ,  Y02E30/40

CPC分类号： C23C14/3407 ,  H01J37/3405 ,  H01J37/3435 ,  Y10T29/49826

摘要： A rotatable cylindrical magnetron sputtering device that includes a cathode body defining a magnet receiving chamber and a cylindrical target assembly surrounding the cathode body, wherein the cylindrical target assembly is rotatable around the cathode body. The cylindrical target assembly includes a hollow mandrel and a target portion mounted around and spaced away from the hollow mandrel portion so as to create a space gap between the hollow mandrel and the target portion, wherein the space gap may be greater than 0.002 inch and less than 0.020 inch.

摘要翻译： 一种可旋转的圆柱形磁控溅射装置，其包括限定磁体接收室的阴极体和围绕阴极体的圆柱形目标组件，其中圆柱形目标组件可围绕阴极体旋转。 圆柱形目标组件包括中空心轴和安装在中空心轴部分周围并与之隔开的目标部分，以便在中空心轴和目标部分之间产生间隙，其中间隙可大于0.002英寸及更小 大于0.020英寸。

公开(公告)号：US20090260983A1

公开(公告)日：2009-10-22

申请号：US12420935

申请日：2009-04-09

申请人： Mark A. Bernick

发明人： Mark A. Bernick

IPC分类号： C23C14/35 ,  B23P13/04

CPC分类号： C23C14/3407 ,  H01J37/3405 ,  H01J37/3435 ,  Y10T29/49826

摘要： A rotatable cylindrical magnetron sputtering device that includes a cathode body defining a magnet receiving chamber and a cylindrical target assembly surrounding the cathode body, wherein the cylindrical target assembly is rotatable around the cathode body. The cylindrical target assembly includes a hollow mandrel and a target portion mounted around and spaced away from the hollow mandrel portion so as to create a space gap between the hollow mandrel and the target portion, wherein the space gap may be greater than 0.002 inch and less than 0.020 inch.

摘要翻译： 一种可旋转的圆柱形磁控溅射装置，其包括限定磁体接收室的阴极体和围绕阴极体的圆柱形目标组件，其中圆柱形目标组件可围绕阴极体旋转。 圆柱形目标组件包括中空心轴和安装在中空心轴部分周围并与之隔开的目标部分，以便在中空心轴和目标部分之间产生间隙，其中间隙可大于0.002英寸及更小 大于0.020英寸。

公开(公告)号：US08470141B1

公开(公告)日：2013-06-25

申请号：US11411427

申请日：2006-04-26

申请人： Mark A. Bernick

发明人： Mark A. Bernick

IPC分类号： C23C14/35

CPC分类号： C23C14/3407 ,  C23C14/3485 ,  C23C14/351

摘要： A magnetron sputtering electrode for use within a magnetron sputtering device that includes a cathode body, a target receiving area defined adjacent the cathode body, a plurality of magnets received within a magnet receiving chamber and an anode shield surrounding the cathode body. At least a portion of a coolant passageway is defined by the anode shield, whereby the coolant passageway is adapted to receive coolant to circulate therethrough thereby cooling the anode shield.

摘要翻译： 一种用于磁控溅射装置的磁控溅射电极，其包括阴极体，邻近阴极体定义的靶接收区域，容纳在磁体容纳室内的多个磁体和围绕阴极体的阳极屏蔽层。 冷却剂通道的至少一部分由阳极屏蔽限定，由此冷却剂通道适于接收冷却剂以在其中循环通过其冷却阳极屏蔽。

公开(公告)号：US07223322B2

公开(公告)日：2007-05-29

申请号：US10624921

申请日：2003-07-22

申请人： Mark A. Bernick

发明人： Mark A. Bernick

IPC分类号： C23C14/35

CPC分类号： H01J37/3455 ,  H01J37/3408

摘要： A magnetron sputtering electrode for use with a magnetron sputtering device, wherein the magnetron sputtering electrode comprises a cathode body, a drive unit coupled to the cathode body, a target received by the cathode body, and a closed loop magnet arrangement received within a magnet receiving chamber and coupled to the drive unit. The closed loop magnet arrangement is comprised of a plurality of magnets adapted for motion relative to the target by the drive unit, wherein at least one of the plurality of magnets is a profiled magnet having a contoured top portion. A method of improving target utilization in sputtering applications is also disclosed.

摘要翻译： 一种与磁控管溅射装置一起使用的磁控溅射电极，其中磁控溅射电极包括阴极体，耦合到阴极体的驱动单元，由阴极体接收的靶，以及容纳在磁体接收中的闭环磁体装置 并联接到驱动单元。 闭环磁体布置由适于通过驱动单元相对于目标运动的多个磁体组成，其中多个磁体中的至少一个是具有轮廓顶部的成型磁体。 还公开了一种提高溅射应用中的目标利用率的方法。

公开(公告)号：US5736019A

公开(公告)日：1998-04-07

申请号：US612390

申请日：1996-03-07

申请人： Mark A. Bernick

发明人： Mark A. Bernick

IPC分类号： C23C14/34 ,  H01J37/34

CPC分类号： H01J37/3497 ,  C23C14/3407 ,  H01J37/3408

摘要： A magnetron sputtering electrode for use within a magnetron sputtering device having more uniform cooling of the target with the use of a water chamber including water diverters to establish a turbulent water flow within the water chamber. The electrode also includes a direct power coupling to the cathode body to avoid degradation of the power supplied to the electrode. The electrode further includes introduction of process gas in an interstitial space between the anode shield and the cathode shield. The electrode also includes the use of removable shaped magnets providing improved target utilization and run times and a choice of erosion pattern and balanced or unbalanced sputtering by simple magnet substitution. In one embodiment, the invention includes the use of a threaded anode shield and a threaded cathode shield which significantly reduces the overall electrode size for a given target diameter.

摘要翻译： 一种用于磁控管溅射装置的磁控溅射电极，其具有使用包括水分配器的水室更均匀地冷却靶材，以在水室内建立湍流水流。 电极还包括与阴极体的直接电力耦合，以避免供给电极的功率的劣化。 电极还包括在阳极屏蔽和阴极屏蔽之间的间隙空间中引入工艺气体。 电极还包括使用可移除的成形磁体，其提供改善的目标利用率和运行时间，以及通过简单磁体替代选择侵蚀模式和平衡或不平衡溅射。 在一个实施例中，本发明包括使用螺纹阳极屏蔽和螺纹阴极屏蔽，其显着降低给定目标直径的总体电极尺寸。