Lithography process for patterning HgI2 photonic devices
    1.
    发明授权
    Lithography process for patterning HgI2 photonic devices 有权
    用于图案化HgI2光子器件的平版印刷工艺

    公开(公告)号:US06821714B1

    公开(公告)日:2004-11-23

    申请号:US09712082

    申请日:2000-11-13

    IPC分类号: G03F700

    CPC分类号: H01L31/085 G03F7/09 G03F7/11

    摘要: A photolithographic process forms patterns on HgI2 surfaces and defines metal sublimation masks and electrodes to substantially improve device performance by increasing the realizable design space. Techniques for smoothing HgI2 surfaces and for producing trenches in HgI2 are provided. A sublimation process is described which produces etched-trench devices with enhanced electron-transport-only behavior.

    摘要翻译: 光刻工艺在HgI2表面上形成图案,并且通过增加可实现的设计空间来限定金属升华掩模和电极,以显着提高器件性能。 提供了平滑HgI2表面和在HgI2中产生沟槽的技术。 描述了产生具有增强的仅电子传输行为的蚀刻沟槽器件的升华过程。

    Method for surface passivation and protection of cadmium zinc telluride
crystals
    2.
    发明授权
    Method for surface passivation and protection of cadmium zinc telluride crystals 失效
    碲化锌晶体的表面钝化和保护方法

    公开(公告)号:US6043106A

    公开(公告)日:2000-03-28

    申请号:US118691

    申请日:1998-07-16

    IPC分类号: H01L21/465 C23F1/00

    CPC分类号: H01L21/465

    摘要: A method for reducing the leakage current in CZT crystals, particularly Cd.sub.1-x Zn.sub.x Te crystals (where x is greater than equal to zero and less than or equal to 0.5), and preferably Cd.sub.0.9 Zn.sub.0.1 Te crystals, thereby enhancing the ability of these crystal to spectrally resolve radiological emissions from a wide variety of radionuclides. Two processes are disclosed. The first method provides for depositing, via reactive sputtering, a silicon nitride hard-coat overlayer which provides significant reduction in surface leakage currents. The second method enhances the passivation by oxidizing the CZT surface with an oxygen plasma prior to silicon nitride deposition without breaking the vacuum state.

    摘要翻译: 一种降低CZT晶体,特别是Cd1-xZnxTe晶体(其中x大于等于零且小于或等于0.5)的漏电流的方法,优选为Cd0.9Zn0.1Te晶体,从而提高了这些晶体的能力 光谱地解决各种放射性核素的放射性排放。 公开了两个过程。 第一种方法提供了通过反应溅射沉积氮化硅硬涂层覆盖层,其提供了显着降低的表面泄漏电流。 第二种方法通过在氮化硅沉积之前用氧等离子体氧化CZT表面而不破坏真空状态来增强钝化。

    High speed piezoelectric optical system with tunable focal length
    4.
    发明授权
    High speed piezoelectric optical system with tunable focal length 有权
    具有可调谐焦距的高速压电光学系统

    公开(公告)号:US07826144B2

    公开(公告)日:2010-11-02

    申请号:US12115142

    申请日:2008-05-05

    申请人: Mark J. Mescher

    发明人: Mark J. Mescher

    IPC分类号: G02B1/06

    摘要: A varifocal optical system includes a substantially circular membrane deposited on a substrate, and a ring-shaped PZT thin film deposited on the outer portion of the circular membrane. The membrane may be a MEMS-micromachined membrane, made of thermal oxide, polysilicon, ZrO2 and SiO2. The membrane is initially in a buckled state, and may function as a mirror or a lens. Application of an electric voltage between an inner and outer electrode on the piezoelectric thin film induces a lateral strain on the PZT thin film, thereby altering the curvature of the membrane, and thus its focal length. Focal length tuning speeds as high as 1 MHz have been demonstrated. Tuning ranges of several hundred microns have been attained. The varifocal optical system can be used in many applications that require rapid focal length tuning, such as optical switching, scanning confocal microscopy, and vibration compensation in optical storage disks.

    摘要翻译: 变焦光学系统包括沉积在基底上的基本圆形的膜和沉积在圆形膜的外部上的环形PZT薄膜。 膜可以是由热氧化物,多晶硅,ZrO 2和SiO 2制成的MEMS微加工膜。 膜最初处于弯曲状态,并且可以用作镜子或透镜。 在压电薄膜上的内部和外部电极之间的电压施加在PZT薄膜上引起横向应变,从而改变膜的曲率,从而改变其焦距。 焦距调谐速度高达1 MHz已被证明。 达到数百微米的调谐范围。 变焦光学系统可用于需要快速焦距调谐的许多应用中,例如光学切换,扫描共焦显微镜和光学存储盘中的振动补偿。

    High speed piezoelectric optical system with tunable focal length
    9.
    发明授权
    High speed piezoelectric optical system with tunable focal length 有权
    具有可调谐焦距的高速压电光学系统

    公开(公告)号:US08605374B2

    公开(公告)日:2013-12-10

    申请号:US12917121

    申请日:2010-11-01

    申请人: Mark J. Mescher

    发明人: Mark J. Mescher

    IPC分类号: G02B7/02 G02B6/32 G02B1/06

    摘要: A varifocal optical system includes a substantially circular membrane deposited on a substrate, and a ring-shaped PZT thin film deposited on the outer portion of the circular membrane. The membrane may be a MEMS-micromachined membrane, made of thermal oxide, polysilicon, ZrO2 and SiO2. The membrane is initially in a buckled state, and may function as a mirror or a lens. Application of an electric voltage between an inner and outer electrode on the piezoelectric thin film induces a lateral strain on the PZT thin film, thereby altering the curvature of the membrane, and thus its focal length. Focal length tuning speeds as high as 1 MHz have been demonstrated. Tuning ranges of several hundred microns have been attained. The varifocal optical system can be used in many applications that require rapid focal length tuning, such as optical switching, scanning confocal microscopy, and vibration compensation in optical storage disks.

    摘要翻译: 变焦光学系统包括沉积在基底上的基本圆形的膜和沉积在圆形膜的外部上的环形PZT薄膜。 膜可以是由热氧化物,多晶硅,ZrO 2和SiO 2制成的MEMS微加工膜。 膜最初处于弯曲状态,并且可以用作镜子或透镜。 在压电薄膜上的内部和外部电极之间的电压施加在PZT薄膜上引起横向应变,从而改变膜的曲率,从而改变其焦距。 焦距调谐速度高达1 MHz已被证明。 达到数百微米的调谐范围。 变焦光学系统可用于需要快速焦距调谐的许多应用中,例如光学切换,扫描共焦显微镜和光学存储盘中的振动补偿。