公开(公告)号：US06337507B1

公开(公告)日：2002-01-08

申请号：US08769152

申请日：1996-12-18

申请人： Mark T. Bohr ,  Mohsen Alavi ,  Min-Chun Tsai

发明人： Mark T. Bohr ,  Mohsen Alavi ,  Min-Chun Tsai

IPC分类号： H01L2900

CPC分类号： H01L23/5256 ,  H01L2924/0002 ,  H01L2924/00

摘要： A fusible link device disposed on a semiconductor substrate for providing discretionary changes in resistance. The fusible link device of the invention includes a polysilicon layer having a first resistance. A silicide layer formed on the polysilicon layer has a second, lower resistance and includes a fuse region having a first notched region narrower than the center of the fuse region, a first contact region electrically coupled to one end of the fuse region and a second contact region electrically coupled to an opposite end of the fuse region. The silicide layer agglomerates to form an electrical discontinuity in the fuse region (usually in the notched region) in response to a current greater than or equal to a predetermined programming current flowing between the contact regions, such that the resistance of the fusible link device can be selectively increased.

摘要翻译： 一种设置在半导体衬底上的可熔连接装置，用于提供任意改变的电阻。 本发明的熔断连接装置包括具有第一电阻的多晶硅层。 形成在多晶硅层上的硅化物层具有第二较低电阻，并且包括具有比熔丝区域的中心窄的第一缺口区域的熔丝区域，电耦合到熔丝区域的一端的第一接触区域和第二接触点 区域电耦合到保险丝区域的相对端。 硅化物层响应于大于或等于在接触区域之间流动的预定编程电流的电流而聚集在熔丝区域（通常在缺口区域中）形成电中断，使得可熔连接装置的电阻可以 有选择地增加。

公开(公告)号：US08812998B2

公开(公告)日：2014-08-19

申请号：US13537005

申请日：2012-06-28

申请人： Jun Tao ,  Been-Der Chen ,  Yen-Wen Lu ,  Jiangwei Li ,  Min-Chun Tsai ,  Dong Mao

发明人： Jun Tao ,  Been-Der Chen ,  Yen-Wen Lu ,  Jiangwei Li ,  Min-Chun Tsai ,  Dong Mao

IPC分类号： G06F17/50

CPC分类号： G06F17/5081 ,  G03F1/70 ,  G03F7/70441

摘要： Described herein is a method for obtaining a preferred layout for a lithographic process, the method comprising: identifying an initial layout including a plurality of features; and reconfiguring the features until a termination condition is satisfied, thereby obtaining the preferred layout; wherein the reconfiguring comprises evaluating a cost function that measures how a lithographic metric is affected by a set of changes to the features for a plurality of lithographic process conditions, and expanding the cost function into a series of terms at least some of which are functions of characteristics of the features.

摘要翻译： 这里描述了一种用于获得光刻工艺的优选布局的方法，该方法包括：识别包括多个特征的初始布局; 并重新配置特征直到满足终止条件，从而获得优选布局; 其中所述重新配置包括评估成本函数，所述成本函数测量光刻度量如何受到用于多个平版印刷工艺条件的所述特征的一组变化的影响，以及将所述成本函数扩展成一系列术语，其中至少一些是 特点的特点。

公开(公告)号：US08443312B2

公开(公告)日：2013-05-14

申请号：US13007358

申请日：2011-01-14

申请人： Min-Chun Tsai ,  Been-Der Chen ,  Yen-Wen Lu

发明人： Min-Chun Tsai ,  Been-Der Chen ,  Yen-Wen Lu

IPC分类号： G06F17/50

CPC分类号： G06F17/50 ,  G03F1/36

摘要： Model-Based Sub-Resolution Assist Feature (SRAF) generation process and apparatus are disclosed, in which an SRAF guidance map (SGM) is iteratively optimized to finally output an optimized set of SRAFs as a result of enhanced signal strength obtained by iterations involving SRAF polygons and SGM image. SRAFs generated in a prior round of iteration are incorporated in a mask layout to generate a subsequent set of SRAFs. The iterative process is terminated when a set of SRAF accommodates a desired process window or when a predefined process window criterion is satisfied. Various cost functions, representing various lithographic responses, may be predefined for the optimization process.

摘要翻译： 公开了基于模型的子分解辅助特征（SRAF）生成过程和装置，其中SRAF引导图（SGM）被迭代地优化，以最终输出优化的SRAF集合作为通过涉及SRAF的迭代获得的增强的信号强度的结果 多边形和SGM形象。 在前一轮迭代中生成的SRAF被并入到掩模布局中以产生随后的一组SRAF。 当一组SRAF适应期望的过程窗口或者当满足预定义的过程窗口标准时，迭代过程被终止。 代表各种光刻响应的各种成本函数可以为优化过程预定义。

公开(公告)号：US20130000505A1

公开(公告)日：2013-01-03

申请号：US13537005

申请日：2012-06-28

申请人： Jun Tao ,  Been-Der Chen ,  Yen-Wen Lu ,  Jiangwei Li ,  Min-Chun Tsai ,  Dong Mao

发明人： Jun Tao ,  Been-Der Chen ,  Yen-Wen Lu ,  Jiangwei Li ,  Min-Chun Tsai ,  Dong Mao

IPC分类号： B41F1/18

CPC分类号： G06F17/5081 ,  G03F1/70 ,  G03F7/70441

摘要： Described herein is a method for obtaining a preferred layout for a lithographic process, the method comprising: identifying an initial layout including a plurality of features; and reconfiguring the features until a termination condition is satisfied, thereby obtaining the preferred layout; wherein the reconfiguring comprises evaluating a cost function that measures how a lithographic metric is affected by a set of changes to the features for a plurality of lithographic process conditions, and expanding the cost function into a series of terms at least some of which are functions of characteristics of the features.

摘要翻译： 这里描述了一种用于获得光刻工艺的优选布局的方法，该方法包括：识别包括多个特征的初始布局; 并重新配置特征直到满足终止条件，从而获得优选布局; 其中所述重新配置包括评估成本函数，所述成本函数测量光刻度量如何受到用于多个平版印刷工艺条件的所述特征的一组变化的影响，以及将所述成本函数扩展成一系列术语，其中至少一些是 特点的特点。

公开(公告)号：US20120216156A1

公开(公告)日：2012-08-23

申请号：US13505286

申请日：2010-10-26

申请人： Hua-Yu Liu ,  Luoqi Chen ,  Hong Chen ,  Zhi-Pan Li ,  Jun Ye ,  Min-Chun Tsai ,  Youping Zhang ,  Yen-Wen Lu ,  Jiangwei Li

发明人： Hua-Yu Liu ,  Luoqi Chen ,  Hong Chen ,  Zhi-Pan Li ,  Jun Ye ,  Min-Chun Tsai ,  Youping Zhang ,  Yen-Wen Lu ,  Jiangwei Li

IPC分类号： G06F17/50

CPC分类号： G06F17/5081 ,  G03F1/144 ,  G03F1/36 ,  G03F7/70125 ,  G03F7/70425 ,  G03F7/70441 ,  G03F7/705 ,  G03F7/70666 ,  G06F17/50 ,  G06F17/5009

摘要： The present invention relates to a method of selecting a subset of patterns from a design, to a method of performing source and mask optimization, and to a computer program product for performing the method of selecting a subset of patterns from a design. According to certain aspects, the present invention enables coverage of the full design while lowering the computation cost by intelligently selecting a subset of patterns from a design in which the design or a modification of the design is configured to be imaged onto a substrate via a lithographic process. The method of selecting the subset of patterns from a design includes identifying a set of patterns from the design related to the predefined representation of the design. By selecting the subset of patterns according to the method, the selected subset of patterns constitutes a similar predefined representation of the design as the set of patterns.

摘要翻译： 本发明涉及从设计中选择模式子集的方法，以及执行源和掩码优化的方法以及用于执行从设计中选择模式子集的方法的计算机程序产品。 根据某些方面，本发明能够覆盖整个设计，同时降低计算成本，通过智能地从设计中选择图案子集，其中设计的设计或修改被配置为经由光刻成像到衬底上 处理。 从设计中选择图案子集的方法包括从与设计的预定义表示相关的设计中识别一组图案。 通过根据该方法选择模式子集，所选择的模式子集构成与模式集合相似的设计表示。

公开(公告)号：US08739082B2

公开(公告)日：2014-05-27

申请号：US13505286

申请日：2010-10-26

申请人： Hua-Yu Liu ,  Luoqi Chen ,  Hong Chen ,  Zhi-Pan Li ,  Jun Ye ,  Min-Chun Tsai ,  Youping Zhang ,  Yen-Wen Lu ,  Jiangwei Li

发明人： Hua-Yu Liu ,  Luoqi Chen ,  Hong Chen ,  Zhi-Pan Li ,  Jun Ye ,  Min-Chun Tsai ,  Youping Zhang ,  Yen-Wen Lu ,  Jiangwei Li

IPC分类号： G06F17/50

CPC分类号： G06F17/5081 ,  G03F1/144 ,  G03F1/36 ,  G03F7/70125 ,  G03F7/70425 ,  G03F7/70441 ,  G03F7/705 ,  G03F7/70666 ,  G06F17/50 ,  G06F17/5009

摘要： The present invention relates to a method of selecting a subset of patterns from a design, to a method of performing source and mask optimization, and to a computer program product for performing the method of selecting a subset of patterns from a design. According to certain aspects, the present invention enables coverage of the full design while lowering the computation cost by intelligently selecting a subset of patterns from a design in which the design or a modification of the design is configured to be imaged onto a substrate via a lithographic process. The method of selecting the subset of patterns from a design includes identifying a set of patterns from the design related to the predefined representation of the design. By selecting the subset of patterns according to the method, the selected subset of patterns constitutes a similar predefined representation of the design as the set of patterns.

摘要翻译： 本发明涉及从设计中选择模式子集的方法，以及执行源和掩码优化的方法以及用于执行从设计中选择模式子集的方法的计算机程序产品。 根据某些方面，本发明能够覆盖整个设计，同时降低计算成本，通过智能地从设计中选择图案子集，其中设计的设计或修改被配置为经由光刻成像到衬底上 处理。 从设计中选择图案子集的方法包括从与设计的预定义表示相关的设计中识别一组图案。 通过根据该方法选择模式子集，所选择的模式子集构成与模式集合相似的设计表示。

公开(公告)号：US20100014199A1

公开(公告)日：2010-01-21

申请号：US12176801

申请日：2008-07-21

申请人： Jamil Kawa ,  Subarnarekha Sinha ,  Min-Chun Tsai ,  ZongWu Tang ,  Qing Su

发明人： Jamil Kawa ,  Subarnarekha Sinha ,  Min-Chun Tsai ,  ZongWu Tang ,  Qing Su

IPC分类号： H02H9/04 ,  G06F17/50

CPC分类号： H01L27/0251 ,  H01H59/0009

摘要： Embodiments of an interface circuit are described. This interface circuit includes an input pad, a control node and a transistor, which has three terminals. A first terminal is electrically coupled to the input pad and a second terminal is electrically coupled to the control node. Moreover, the interface circuit includes a micro-electromechanical system (MEMS) switch, which is electrically coupled to the input pad and the control node, where the MEMS switch is in parallel with the transistor. In the absence of a voltage applied to a control terminal of the MEMS switch, the MEMS switch is closed, thereby electrically coupling the input pad and the control node. Furthermore, when the voltage is applied to the control terminal of the MEMS switch, the MEMS switch is open, thereby electrically decoupling the input pad and the control node.

摘要翻译： 描述接口电路的实施例。 该接口电路包括具有三个端子的输入焊盘，控制节点和晶体管。 第一端子电耦合到输入焊盘，并且第二端子电耦合到控制节点。 此外，接口电路包括微机电系统（MEMS）开关，其电耦合到输入焊盘和控制节点，其中MEMS开关与晶体管并联。 在没有施加到MEMS开关的控制端子的电压的情况下，MEMS开关闭合，从而电耦合输入焊盘和控制节点。 此外，当将电压施加到MEMS开关的控制端子时，MEMS开关断开，由此使输入焊盘和控制节点电耦合。

公开(公告)号：US20130311960A1

公开(公告)日：2013-11-21

申请号：US13892984

申请日：2013-05-13

申请人： Min-Chun Tsai ,  Been-Der Chen ,  Yen-Wen Lu

发明人： Min-Chun Tsai ,  Been-Der Chen ,  Yen-Wen Lu

IPC分类号： G06F17/50

CPC分类号： G06F17/50 ,  G03F1/36

摘要： Model-Based Sub-Resolution Assist Feature (SRAF) generation process and apparatus are disclosed, in which an SRAF guidance map (SGM) is iteratively optimized to finally output an optimized set of SRAFs as a result of enhanced signal strength obtained by iterations involving SRAF polygons and SGM image. SRAFs generated in a prior round of iteration are incorporated in a mask layout to generate a subsequent set of SRAFs. The iterative process is terminated when a set of SRAF accommodates a desired process window or when a predefined process window criterion is satisfied. Various cost functions, representing various lithographic responses, may be predefined for the optimization process.

摘要翻译： 公开了基于模型的子分解辅助特征（SRAF）生成过程和装置，其中SRAF引导图（SGM）被迭代地优化，以最终输出优化的SRAF集合作为通过涉及SRAF的迭代获得的增强的信号强度的结果 多边形和SGM形象。 在前一轮迭代中生成的SRAF被并入到掩模布局中以产生随后的一组SRAF。 当一组SRAF适应期望的过程窗口或者当满足预定义的过程窗口标准时，迭代过程被终止。 代表各种光刻响应的各种成本函数可以为优化过程预定义。

公开(公告)号：US20110173578A1

公开(公告)日：2011-07-14

申请号：US13007358

申请日：2011-01-14

申请人： Min-Chun Tsai ,  Been-Der Chen ,  Yen-Wen Lu

发明人： Min-Chun Tsai ,  Been-Der Chen ,  Yen-Wen Lu

IPC分类号： G06F17/50

CPC分类号： G06F17/50 ,  G03F1/36

摘要： Model-Based Sub-Resolution Assist Feature (SRAF) generation process and apparatus are disclosed, in which an SRAF guidance map (SGM) is iteratively optimized to finally output an optimized set of SRAFs as a result of enhanced signal strength obtained by iterations involving SRAF polygons and SGM image. SRAFs generated in a prior round of iteration are incorporated in a mask layout to generate a subsequent set of SRAFs. The iterative process is terminated when a set of SRAF accommodates a desired process window or when a predefined process window criterion is satisfied. Various cost functions, representing various lithographic responses, may be predefined for the optimization process.

摘要翻译： 公开了基于模型的子分解辅助特征（SRAF）生成过程和装置，其中SRAF引导图（SGM）被迭代地优化，以最终输出优化的SRAF集合作为通过涉及SRAF的迭代获得的增强的信号强度的结果 多边形和SGM形象。 在前一轮迭代中生成的SRAF被并入到掩模布局中以产生随后的一组SRAF。 当一组SRAF适应期望的过程窗口或者当满足预定义的过程窗口标准时，迭代过程被终止。 代表各种光刻响应的各种成本函数可以为优化过程预定义。

公开(公告)号：US07823099B2

公开(公告)日：2010-10-26

申请号：US11756596

申请日：2007-05-31

申请人： Min-Chun Tsai ,  Charles C. Chiang

发明人： Min-Chun Tsai ,  Charles C. Chiang

IPC分类号： G06F17/50

CPC分类号： G06F17/5081 ,  G06F2217/12 ,  Y02P90/265

摘要： A fast method to detect hot spots using foundry independent models that do not require RET/OPC synthesis is presented. In some embodiments of the present invention, sensitive spots are located. Lithography models are used to simulate the geometry near the sensitive spots to produce a model of the area around the sensitive spots. The sensitive spots are scored using a measure such as intensity (of light) or scoring based on contrast.

摘要翻译： 提出了一种使用不需要RET / OPC合成的代工独立模型来检测热点的快速方法。 在本发明的一些实施例中，定位敏感点。 使用光刻模型来模拟敏感点附近的几何形状，以产生敏感点周围区域的模型。 使用诸如强度（光）或基于对比度的评分来测量敏感点。