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公开(公告)号：US08325322B2
公开(公告)日：2012-12-04
申请号：US12700122
申请日：2010-02-04
申请人： Markus Hauf , Ulrich Schoenhoff , Payam Tayebati , Michael Thier , Tilmann Heil , Ole Fluegge , Arif Kazi , Alexander Sauerhoefer , Gerhard Focht , Jochen Weber , Toralf Gruner , Aksel Goehnermeier , Dirk Hellweg
发明人： Markus Hauf , Ulrich Schoenhoff , Payam Tayebati , Michael Thier , Tilmann Heil , Ole Fluegge , Arif Kazi , Alexander Sauerhoefer , Gerhard Focht , Jochen Weber , Toralf Gruner , Aksel Goehnermeier , Dirk Hellweg
CPC分类号： G02B7/008 , G02B7/1815 , G02B26/06 , G02B27/0025 , G03F7/70191 , G03F7/70308 , G03F7/70825 , G03F7/70891
摘要： The disclosure relates to an optical correction device with thermal actuators for influencing the temperature distribution in the optical correction device. The optical correction device is constructed from at least two partial elements which differ with regard to their ability to transport heat. Furthermore, the disclosure relates to methods for influencing the temperature distribution in an optical element.
摘要翻译： 本发明涉及具有用于影响光学校正装置中的温度分布的热致动器的光学校正装置。 光学校正装置由至少两个部分元件构成，这些部分元素关于其传送热量的能力而不同。 此外，本公开涉及影响光学元件中的温度分布的方法。
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公开(公告)号：US20100201958A1
公开(公告)日：2010-08-12
申请号：US12700122
申请日：2010-02-04
申请人： Markus Hauf , Ulrich Schoenhoff , Payam Tayebati , Michael Thier , Tilmann Heil , Ole Fluegge , Arif Kazi , Alexander Sauerhoefer , Gerhard Focht , Jochen Weber , Toralf Gruner , Aksel Goehnermeier , Dirk Hellweg
发明人： Markus Hauf , Ulrich Schoenhoff , Payam Tayebati , Michael Thier , Tilmann Heil , Ole Fluegge , Arif Kazi , Alexander Sauerhoefer , Gerhard Focht , Jochen Weber , Toralf Gruner , Aksel Goehnermeier , Dirk Hellweg
CPC分类号： G02B7/008 , G02B7/1815 , G02B26/06 , G02B27/0025 , G03F7/70191 , G03F7/70308 , G03F7/70825 , G03F7/70891
摘要： The disclosure relates to an optical correction device with thermal actuators for influencing the temperature distribution in the optical correction device. The optical correction device is constructed from at least two partial elements which differ with regard to their ability to transport heat. Furthermore, the disclosure relates to methods for influencing the temperature distribution in an optical element.
摘要翻译： 本发明涉及具有用于影响光学校正装置中的温度分布的热致动器的光学校正装置。 光学校正装置由至少两个部分元件构成，这些部分元素关于其传送热量的能力而不同。 此外，本公开涉及影响光学元件中的温度分布的方法。
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公开(公告)号：US20110080569A1
公开(公告)日：2011-04-07
申请号：US12966552
申请日：2010-12-13
申请人： Eric Eva , Payam Tayebati , Michael Thier , Markus Hauf , Ulrich Schoenhoff , Ole Fluegge , Arif Kazi , Alexander Sauerhoefer , Gerhard Focht , Jochen Weber , Toralf Gruner
发明人： Eric Eva , Payam Tayebati , Michael Thier , Markus Hauf , Ulrich Schoenhoff , Ole Fluegge , Arif Kazi , Alexander Sauerhoefer , Gerhard Focht , Jochen Weber , Toralf Gruner
CPC分类号： G03F7/70891 , G02B7/028 , G02B27/0068 , G03F7/70266
摘要： The disclosure relates to an optical element configure to at least partial spatially resolve correction of a wavefront aberration of an optical system (e.g., a projection exposure apparatus for microlithography) to which optical radiation can be applied, as well as related systems and methods.
摘要翻译： 本公开涉及一种光学元件，其被配置为至少部分空间地解决可以应用光辐射的光学系统（例如，用于微光刻的投影曝光设备）的波前像差的校正，以及相关的系统和方法。
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公开(公告)号：US08891172B2
公开(公告)日：2014-11-18
申请号：US12402015
申请日：2009-03-11
申请人： Eric Eva , Payam Tayebati , Michael Thier , Markus Hauf , Ulrich Schoenhoff , Ole Fluegge , Arif Kazi , Alexander Sauerhoefer , Gerhard Focht , Jochen Weber , Toralf Gruner
发明人： Eric Eva , Payam Tayebati , Michael Thier , Markus Hauf , Ulrich Schoenhoff , Ole Fluegge , Arif Kazi , Alexander Sauerhoefer , Gerhard Focht , Jochen Weber , Toralf Gruner
CPC分类号： G03F7/70891 , G02B7/028 , G02B27/0068 , G03F7/70266
摘要： The disclosure relates to an optical element configure to at least partial spatially resolve correction of a wavefront aberration of an optical system (e.g., a projection exposure apparatus for microlithography) to which optical radiation can be applied, as well as related systems and methods.
摘要翻译： 本公开涉及一种光学元件，其被配置为至少部分空间地解决可以应用光辐射的光学系统（例如，用于微光刻的投影曝光设备）的波前像差的校正，以及相关的系统和方法。
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公开(公告)号：US20090257032A1
公开(公告)日：2009-10-15
申请号：US12402015
申请日：2009-03-11
申请人： Eric Eva , Payam Tayebati , Michael Thier , Markus Hauf , Ulrich Schoenhoff , Ole Fluegge , Arif Kazi , Alexander Sauerhoefer , Gerhard Focht , Jochen Weber , Toralf Gruner
发明人： Eric Eva , Payam Tayebati , Michael Thier , Markus Hauf , Ulrich Schoenhoff , Ole Fluegge , Arif Kazi , Alexander Sauerhoefer , Gerhard Focht , Jochen Weber , Toralf Gruner
CPC分类号： G03F7/70891 , G02B7/028 , G02B27/0068 , G03F7/70266
摘要： The disclosure relates to an optical element configure to at least partial spatially resolve correction of a wavefront aberration of an optical system (e.g., a projection exposure apparatus for microlithography) to which optical radiation can be applied, as well as related systems and methods.
摘要翻译： 本公开涉及一种光学元件，其被配置为至少部分空间地解决可以应用光辐射的光学系统（例如，用于微光刻的投影曝光设备）的波前像差的校正，以及相关的系统和方法。
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公开(公告)号：US08508854B2
公开(公告)日：2013-08-13
申请号：US12966552
申请日：2010-12-13
申请人： Eric Eva , Payam Tayebati , Michael Thier , Markus Hauf , Ulrich Schoenhoff , Ole Fluegge , Arif Kazi , Alexander Sauerhoefer , Gerhard Focht , Jochen Weber , Toralf Gruner
发明人： Eric Eva , Payam Tayebati , Michael Thier , Markus Hauf , Ulrich Schoenhoff , Ole Fluegge , Arif Kazi , Alexander Sauerhoefer , Gerhard Focht , Jochen Weber , Toralf Gruner
IPC分类号： G02B9/00
CPC分类号： G03F7/70891 , G02B7/028 , G02B27/0068 , G03F7/70266
摘要： The disclosure relates to an optical element configure to at least partial spatially resolve correction of a wavefront aberration of an optical system (e.g., a projection exposure apparatus for microlithography) to which optical radiation can be applied, as well as related systems and methods.
摘要翻译： 本公开涉及一种光学元件，其被配置为至少部分空间地解决可以应用光辐射的光学系统（例如，用于微光刻的投影曝光设备）的波前像差的校正，以及相关的系统和方法。
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公开(公告)号：US07990622B2
公开(公告)日：2011-08-02
申请号：US12896128
申请日：2010-10-01
申请人： Olaf Conradi , Boris Bittner , Sascha Bleidistel , Markus Hauf , Wolfgang Hummel , Arif Kazi , Baerbel Schwaer , Jochen Weber , Hubert Holderer , Payam Tayebati
发明人： Olaf Conradi , Boris Bittner , Sascha Bleidistel , Markus Hauf , Wolfgang Hummel , Arif Kazi , Baerbel Schwaer , Jochen Weber , Hubert Holderer , Payam Tayebati
CPC分类号： G02B27/0068 , G02B3/14 , G03F7/70266 , G03F7/70825
摘要： A projection objective of a microlithographic projection exposure apparatus comprises a manipulator for reducing rotationally asymmetric image errors. The manipulator in turn contains a lens, an optical element and an interspace formed between the lens and the optical element, which can be filled with a liquid. At least one actuator acting exclusively on the lens is furthermore provided, which can generate a rotationally asymmetric deformation of the lens.
摘要翻译： 微光刻投影曝光装置的投影物镜包括用于减小旋转非对称图像误差的操纵器。 操纵器又包含透镜，光学元件和形成在透镜和光学元件之间的间隙，其可以填充液体。 此外还提供至少一个致动器作用于透镜，这可以产生透镜的旋转非对称变形。
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公开(公告)号：US20080239503A1
公开(公告)日：2008-10-02
申请号：US11971328
申请日：2008-01-09
申请人： Olaf Conradi , Sascha Bleidistel , Markus Hauf , Wolfgang Hummel , Arif Kazi , Baerbel Schwaer , Jochen Weber , Hubert Holderer , Payam Tayebati , Boris Bittner
发明人： Olaf Conradi , Sascha Bleidistel , Markus Hauf , Wolfgang Hummel , Arif Kazi , Baerbel Schwaer , Jochen Weber , Hubert Holderer , Payam Tayebati , Boris Bittner
CPC分类号： G02B27/0068 , G02B3/14 , G03F7/70266 , G03F7/70825
摘要： A projection objective of a microlithographic projection exposure apparatus comprises a manipulator for reducing rotationally asymmetric image errors. The manipulator in turn contains a lens, an optical element and an interspace formed between the lens and the optical element, which can be filled with a liquid. At least one actuator acting exclusively on the lens is furthermore provided, which can generate a rotationally asymmetric deformation of the lens.
摘要翻译： 微光刻投影曝光装置的投影物镜包括用于减小旋转非对称图像误差的操纵器。 操纵器又包含透镜，光学元件和形成在透镜和光学元件之间的间隙，其可以填充液体。 此外还提供至少一个致动器作用于透镜，这可以产生透镜的旋转非对称变形。
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公开(公告)号：US20110019169A1
公开(公告)日：2011-01-27
申请号：US12896128
申请日：2010-10-01
申请人： Olaf Conradi , Boris Bittner , Sascha Bleidistel , Markus Hauf , Wolfgang Hummel , Arif Kazi , Baerbel Schwaer , Jochen Weber , Hubert Holderer , Payam Tayebati
发明人： Olaf Conradi , Boris Bittner , Sascha Bleidistel , Markus Hauf , Wolfgang Hummel , Arif Kazi , Baerbel Schwaer , Jochen Weber , Hubert Holderer , Payam Tayebati
IPC分类号： G03B27/52
CPC分类号： G02B27/0068 , G02B3/14 , G03F7/70266 , G03F7/70825
摘要： A projection objective of a microlithographic projection exposure apparatus comprises a manipulator for reducing rotationally asymmetric image errors. The manipulator in turn contains a lens, an optical element and an interspace formed between the lens and the optical element, which can be filled with a liquid. At least one actuator acting exclusively on the lens is furthermore provided, which can generate a rotationally asymmetric deformation of the lens.
摘要翻译： 微光刻投影曝光装置的投影物镜包括用于减小旋转非对称图像误差的操纵器。 操纵器又包含透镜，光学元件和形成在透镜和光学元件之间的间隙，其可以填充液体。 此外还提供至少一个致动器作用于透镜，这可以产生透镜的旋转非对称变形。
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10.发明授权公开(公告)号：US07830611B2
公开(公告)日：2010-11-09
申请号：US11971328
申请日：2008-01-09
申请人： Olaf Conradi , Sascha Bleidistel , Markus Hauf , Wolfgang Hummel , Arif Kazi , Baerbel Schwaer , Jochen Weber , Hubert Holderer , Payam Tayebati , Boris Bittner
发明人： Olaf Conradi , Sascha Bleidistel , Markus Hauf , Wolfgang Hummel , Arif Kazi , Baerbel Schwaer , Jochen Weber , Hubert Holderer , Payam Tayebati , Boris Bittner
CPC分类号： G02B27/0068 , G02B3/14 , G03F7/70266 , G03F7/70825
摘要： A projection objective of a microlithographic projection exposure apparatus comprises a manipulator for reducing rotationally asymmetric image errors. The manipulator in turn contains a lens, an optical element and an interspace formed between the lens and the optical element, which can be filled with a liquid. At least one actuator acting exclusively on the lens is furthermore provided, which can generate a rotationally asymmetric deformation of the lens.
摘要翻译： 微光刻投影曝光装置的投影物镜包括用于减小旋转非对称图像误差的操纵器。 操纵器又包含透镜，光学元件和形成在透镜和光学元件之间的间隙，其可以填充液体。 此外还提供至少一个致动器作用于透镜，这可以产生透镜的旋转非对称变形。
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